JPH058593B2 - - Google Patents

Info

Publication number
JPH058593B2
JPH058593B2 JP59207413A JP20741384A JPH058593B2 JP H058593 B2 JPH058593 B2 JP H058593B2 JP 59207413 A JP59207413 A JP 59207413A JP 20741384 A JP20741384 A JP 20741384A JP H058593 B2 JPH058593 B2 JP H058593B2
Authority
JP
Japan
Prior art keywords
vacuum
photoconductive element
manufacturing
cds
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59207413A
Other languages
Japanese (ja)
Other versions
JPS6184876A (en
Inventor
Hiroko Wada
Kosuke Ikeda
Mikihiko Nishitani
Noboru Yoshigami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59207413A priority Critical patent/JPS6184876A/en
Publication of JPS6184876A publication Critical patent/JPS6184876A/en
Publication of JPH058593B2 publication Critical patent/JPH058593B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/125The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe

Landscapes

  • Light Receiving Elements (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

産業上の利用分野 本発明はフアクシミリや各種OA機器用読取り
ラインセンサ用の可視域の光センサとして使用さ
れる光導電素子の製造方法に関するものである。 従来例の構成とその問題点 従来、CdSやCdSeを主体とする光センサは光
電流が大きく、特にこの種の化合物の固溶体CdS
−CdSeを主体とする光センサでは可視光全域を
カバーする感度を有するため、フアクシミリの密
着型ラインセンサ用などとして注目され開発され
てきた。 このCdS−CdSe光センサの代表的製法は以下
の通りである。すなわち、適当な基板上にCdS−
CdSe固溶体の薄膜を蒸着形成し、CdCl2の蒸発源
としての例えばCdS:CdCl2(混合、焼結、粉砕し
た)粉末を該薄膜と共にアルミナ等の半密閉容器
に入れて500℃程度の高温度に加熱して蒸発した
CdCl2の蒸気中で結晶成長させ、同時に増感中心
を形成させ大きな光電流を得るに至るのである
(この工程を活性化と称する)。上記の製法のまゝ
では暗電流がかなり大きいのでCdS−CdSe薄膜
の蒸着時に同時に蒸発源にCuを例えばCdS1-x
Sex:CuCl2(0x1;CdS、CdSe、CuCl2
混合、焼結、粉砕したもの)の形で混入しておき
蒸着膜中にCuを添加しておけば暗電流を大巾に
小さくすることができる。 さて、CdCl2蒸気による活性化で増感中心を形
成し、光電子の寿命を長くし、結果として大きな
光電流を得ることができる反面、基本的には光電
子の寿命が光応答時間に対応するので光電流が大
きいと応答時間が長くなつてしまう。さらにこの
様な多結晶薄膜では捕獲中心が多いために低照度
の場合には上記の光電子の寿命よりはるかに光応
答時間が長くなるという大きな欠点を有してい
る。 発明の目的 本発明は光電流の大きさを損わずして、その光
応答時間が短かい光導電素子を製造する方法を提
供する。 発明の構成 本発明はCdS、CdSeあるいはこれら2種の化
合物の固溶体CdS−CdSeを主成分として成り、
これに微量のCuを含んだ薄膜を基板上に形成し、
CdCl2の蒸発源と共に半密閉容器に入れ、高温度
にて該薄膜をCdCl2の蒸気に暴露して結晶成長と
共に活性化し、電極を形成して後、さらに真空中
において、しかも暗中で加熱処理することを特徴
とする光導電素子の製造方法である。 実施例の説明 薄膜の厚さは2000〜10000Åであり、結晶成長
の温度は450〜600℃である。真空中処理時の温度
は120〜200℃が好ましい。120℃以下だと効果が
でるのに時間がかゝり過ぎ、200℃以上だと変化
が大きすぎコントロールが難しくなるからであ
る。真空中熱処理の時間は0.25〜4時間が好まし
い。0.25時間以下では効果が得られ難く、4時間
以上だと変化時に光電流の減少が著しい。真空中
熱処理時の真空度は広い範囲の真空度で有効であ
るが0.01気圧以下であることが好ましい。0.01気
圧以上だと効果が小さかつたり、変化が起るのに
時間がかゝりすぎたりする。また真空中熱処理時
は暗中であることが好ましく、明るいと変化が起
り難く、また変化量が小さい。特に10ルツクス以
下の方が効果が大きい。 以下、本発明の具体実施例について説明する。
図は本発明に用いるボートの断面を示し、1はボ
ート本体、2はボートふた、3はガラス基板、4
はCdS:CdCl2粉末である。 ガラス基板(コーニング社7059、230×50×1.2
mm)の上にCdS0.6Se0.4:CuCl2を蒸発源として約
4000Åの厚さに蒸着した。蒸着膜中には含まれる
Cuの量は、0.008モル%であつた。この基板3を
図に享る様にアルミナ製ボート1に上向きに置き
ボートの中央底部にCdS:CdCl2(2モル%)粉末
4を0.2g/cmの割合で長さ方向に置き、ふた2
をして500℃で1時間加熱した。この様にして得
た膜にNiCr/Auの電極を蒸着形成(巾2mm、ギ
ヤツプ1mm)して後、真空中(0.01気圧)、しか
も暗中(10ルツクス)で175℃にて0.25、0.5、
1、2および4時間加熱処理した。この様にして
得た光導電素子にDC10Vを印加して100ルツクス
の緑色光(波長555nm)を照射(1Hzで0.5secず
つ点滅)して光電流Jpとその立上り時間τr(0か
ら飽和値の90%に上がるまでの時間)、立下り時
間τd(飽和値からその10%に下がるまでの時間)
を測定した。結果をこの様な真空中加熱処理のな
い場合の結果と共に次表に載せる。
INDUSTRIAL APPLICATION FIELD The present invention relates to a method of manufacturing a photoconductive element used as a visible range optical sensor for a facsimile machine or a reading line sensor for various office equipment. Conventional configurations and their problems Conventionally, optical sensors based mainly on CdS and CdSe have large photocurrents, especially when using CdS, a solid solution of this type of compound.
-CdSe-based optical sensors have sensitivity that covers the entire visible light range, so they have attracted attention and have been developed for applications such as contact-type line sensors in facsimiles. A typical manufacturing method for this CdS-CdSe optical sensor is as follows. That is, CdS− is placed on a suitable substrate.
A thin film of CdSe solid solution is formed by vapor deposition, and a CdS:CdCl 2 (mixed, sintered, and pulverized) powder as an evaporation source of CdCl 2 is placed together with the thin film in a semi-closed container made of alumina or the like and heated to a high temperature of about 500°C. evaporated by heating to
Crystals are grown in CdCl 2 vapor, and at the same time sensitizing centers are formed to obtain a large photocurrent (this process is called activation). If the above manufacturing method is used, the dark current is quite large, so when depositing the CdS-CdSe thin film, Cu is used as an evaporation source at the same time, for example, CdS 1-x.
Se x : If CuCl 2 is mixed in the form of CuCl 2 (0x1; CdS, CdSe, and CuCl 2 mixed, sintered, and crushed) and added to the deposited film, the dark current can be greatly reduced. be able to. Now, activation by CdCl 2 vapor forms sensitizing centers, lengthens the lifetime of photoelectrons, and as a result, it is possible to obtain a large photocurrent, but basically the lifetime of photoelectrons corresponds to the photoresponse time. If the photocurrent is large, the response time will be long. Furthermore, such a polycrystalline thin film has a large number of trapping centers, so it has a major drawback in that the photoresponse time is much longer than the above-mentioned lifetime of photoelectrons at low illuminance. OBJECTS OF THE INVENTION The present invention provides a method for manufacturing a photoconductive element whose photoresponse time is short without compromising the magnitude of the photocurrent. Structure of the Invention The present invention is mainly composed of CdS, CdSe, or a solid solution of these two types of compounds, CdS-CdSe.
A thin film containing a small amount of Cu is then formed on the substrate.
The thin film is placed in a semi-closed container together with a CdCl 2 evaporation source, and the thin film is exposed to CdCl 2 vapor at high temperature to activate it along with crystal growth, forming an electrode, and then heat-treated in vacuum and in the dark. A method of manufacturing a photoconductive element is characterized in that: Description of Examples The thickness of the thin film is 2000-10000 Å, and the temperature of crystal growth is 450-600°C. The temperature during vacuum treatment is preferably 120 to 200°C. This is because if it is below 120℃, it will take too long for it to be effective, and if it is above 200℃, the changes will be too large and control will be difficult. The time for heat treatment in vacuum is preferably 0.25 to 4 hours. If it is less than 0.25 hours, it is difficult to obtain an effect, and if it is more than 4 hours, the photocurrent decreases significantly during the change. The degree of vacuum during the heat treatment in vacuum is effective over a wide range of degrees of vacuum, but it is preferably 0.01 atmosphere or less. If the pressure is above 0.01 atm, the effect may be small or it may take too long for a change to occur. Further, during the heat treatment in vacuum, it is preferable to perform the heat treatment in the dark; if it is bright, changes will be less likely to occur and the amount of change will be small. In particular, the effect is greater when the amount is less than 10 lux. Hereinafter, specific examples of the present invention will be described.
The figure shows a cross section of a boat used in the present invention, where 1 is the boat body, 2 is the boat lid, 3 is the glass substrate, and 4 is the boat lid.
is CdS: CdCl2 powder. Glass substrate (Corning 7059, 230 x 50 x 1.2
CdS 0.6 Se 0.4 : CuCl 2 as evaporation source
It was deposited to a thickness of 4000 Å. Contained in the deposited film
The amount of Cu was 0.008 mol%. As shown in the figure, this substrate 3 is placed in an alumina boat 1 facing upward, and CdS:CdCl 2 (2 mol%) powder 4 is placed in the longitudinal direction at a ratio of 0.2 g/cm at the center bottom of the boat.
and heated at 500°C for 1 hour. After forming NiCr/Au electrodes (width: 2 mm, gap: 1 mm) on the film obtained in this way, 0.25, 0.5
Heat treatment was performed for 1, 2 and 4 hours. DC10V was applied to the photoconductive element obtained in this way, and 100 lux green light (wavelength 555nm) was irradiated (flashing at 1Hz, 0.5sec increments) to increase the photocurrent J p and its rise time τ r (from 0 to saturation). (time to rise to 90% of the value), fall time τ d (time to fall to 10% of the saturation value)
was measured. The results are listed in the following table along with the results without such vacuum heat treatment.

【表】 発明の効果 以上のように、この電極形成後の暗中における
真空中加熱処理によつて光電流が大きいまゝでそ
の立上り時間、立下り時を著しく短くすることが
できる。この光センサを用いれば大電流で信号処
理の容易な高速の密着型イメージセンサを作るこ
とができ、その工業的価値は大きい。
[Table] Effects of the Invention As described above, by performing the heat treatment in vacuum in the dark after forming the electrode, the rise time and fall time of the photocurrent can be significantly shortened while the photocurrent remains large. By using this optical sensor, it is possible to create a high-speed contact image sensor that uses a large current and has easy signal processing, and its industrial value is great.

【図面の簡単な説明】[Brief explanation of the drawing]

図はアルミナ製ボートの断面図である。 1……ボート本体、2……ボートふた、3……
ガラス基板、4……CdS:CdCl2粉末。
The figure is a cross-sectional view of an alumina boat. 1...Boat body, 2...Boat lid, 3...
Glass substrate, 4...CdS: CdCl2 powder.

Claims (1)

【特許請求の範囲】 1 CdS,CdSeあるいはこれら2種の化合物の
固溶体CdS−CdSeを主体として成り、これに微
量のCuを含んだ薄膜を基板上に形成し、前記薄
膜をCdCl2の蒸気中にて加熱処理して結晶成長と
共に活性化し、電極を形成して後、さらに真空中
において、しかも暗中で加熱処理することを特徴
とする光導電素子の製造方法。 2 真空中での加熱処理の温度が120〜200℃であ
ることを特徴とする特許請求の範囲第1項記載の
光導電素子の製造方法。 3 真空中での加熱処理の時間が0.25〜4時間で
あることを特徴とする特許請求の範囲第1項また
は第2項に記載の光導電素子の製造方法。 4 真空中での熱処理の際の真空度が0.01気圧を
上限とすることを特徴とする特許請求の範囲第1
項〜第3項の何れかに記載の光導電素子の製造方
法。 5 真空中において、しかも暗中において加熱処
理する際の照度が10ルツクスを上限とすることを
特徴とする特許請求の範囲第1項〜第4項の何れ
かに記載の光導電素子の製造方法。
[Claims] 1. A thin film mainly composed of CdS, CdSe, or a solid solution of these two compounds, CdS-CdSe, containing a trace amount of Cu, is formed on a substrate, and the thin film is soaked in CdCl 2 vapor. 1. A method for manufacturing a photoconductive element, which comprises heating the photoconductive element in a vacuum to activate it along with crystal growth, forming an electrode, and then heating in a vacuum and in the dark. 2. The method for manufacturing a photoconductive element according to claim 1, wherein the temperature of the heat treatment in vacuum is 120 to 200°C. 3. The method for manufacturing a photoconductive element according to claim 1 or 2, wherein the heat treatment time in vacuum is 0.25 to 4 hours. 4 Claim 1, characterized in that the degree of vacuum during heat treatment in vacuum is set at 0.01 atm as an upper limit.
A method for manufacturing a photoconductive element according to any one of items 1 to 3. 5. The method for manufacturing a photoconductive element according to any one of claims 1 to 4, characterized in that the illuminance during the heat treatment in vacuum and in the dark is 10 lux as an upper limit.
JP59207413A 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements Granted JPS6184876A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59207413A JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59207413A JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Publications (2)

Publication Number Publication Date
JPS6184876A JPS6184876A (en) 1986-04-30
JPH058593B2 true JPH058593B2 (en) 1993-02-02

Family

ID=16539331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59207413A Granted JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Country Status (1)

Country Link
JP (1) JPS6184876A (en)

Also Published As

Publication number Publication date
JPS6184876A (en) 1986-04-30

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