JPS6184876A - Method for manufacturing photoconductive elements - Google Patents

Method for manufacturing photoconductive elements

Info

Publication number
JPS6184876A
JPS6184876A JP59207413A JP20741384A JPS6184876A JP S6184876 A JPS6184876 A JP S6184876A JP 59207413 A JP59207413 A JP 59207413A JP 20741384 A JP20741384 A JP 20741384A JP S6184876 A JPS6184876 A JP S6184876A
Authority
JP
Japan
Prior art keywords
vacuum
manufacturing
heat treatment
photoconductive element
cds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59207413A
Other languages
Japanese (ja)
Other versions
JPH058593B2 (en
Inventor
Hiroko Wada
裕子 和田
Kosuke Ikeda
光佑 池田
Mikihiko Nishitani
幹彦 西谷
Noboru Yoshigami
由上 登
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59207413A priority Critical patent/JPS6184876A/en
Publication of JPS6184876A publication Critical patent/JPS6184876A/en
Publication of JPH058593B2 publication Critical patent/JPH058593B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/125The active layers comprising only Group II-VI materials, e.g. CdS, ZnS or CdTe

Landscapes

  • Light Receiving Elements (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はファクシミリや各種OA機器用読取りライセン
サ用の可視域の光センサとして使用される光導電素子の
製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a photoconductive element used as a visible range optical sensor for a reading license sensor for facsimiles and various office automation equipment.

従来例の構成とその問題点 従来、CdSやCdSe  を主体とする光センナは充
電流が大きく、特にこの種の化合物の固溶体Cd5− 
CdSe  を主体とする光センサでは可視光全域をカ
バーする感度を有するため、ファクシミリの密着型ライ
ンセンサ用などとして注目され開発されてきた。
Structures of conventional examples and their problems Conventionally, optical sensors mainly composed of CdS or CdSe have a large charging current, especially when solid solutions of this type of compounds, Cd5-
Optical sensors based on CdSe have a sensitivity that covers the entire visible light range, and have therefore been attracting attention and being developed for applications such as close-contact line sensors in facsimiles.

このCdS −CdSe  光センサの代表的製法は以
下の通りである。すなわち、適当な基板上にCdS −
CdS e 固溶体の薄膜を蒸着形成し、CdC1□の
蒸発源としての例えばCdS : CdC12(混合、
焼結、粉砕した)粉末を該薄膜と共にアルミナ等の半密
閉容器に入れて500°C程度の高温度に加熱して蒸発
したcacl、、の蒸気中で結晶成長させ、同時に増感
中心を形成させ大きな光電流を得るに至るのである(こ
の工程を活性化と称する)。上記の製法のま\では暗電
流がかなり大きいので(dS −CdSe薄膜の蒸着時
に同時に蒸発源に(u を例えばCdS、 −xSsx
: CuC1,、(o<x<1; CdS 、 CdS
e。
A typical manufacturing method for this CdS-CdSe optical sensor is as follows. That is, CdS −
A thin film of CdS e solid solution is formed by evaporation, e.g. CdS : CdC12 (mixture,
The sintered and pulverized) powder is placed in a semi-closed container made of alumina or the like with the thin film, heated to a high temperature of about 500°C, and crystals are grown in the vapor of evaporated cacl, forming sensitized centers at the same time. This leads to obtaining a large photocurrent (this process is called activation). Since the dark current is quite large in the above manufacturing method (dS), when the -CdSe thin film is deposited, the evaporation source is used at the same time (for example, when u is CdS, -xSsx
: CuC1, (o<x<1; CdS, CdS
e.

Curl 2を混合、焼結、粉砕したもの)の形で混入
しておき蒸着膜中にCu  を添加しておけば暗電流を
大巾に小さくすることができる。
If Cu is mixed into the deposited film in the form of mixed, sintered, and pulverized Curl 2, the dark current can be significantly reduced.

さて、CdCl2蒸気による活性化で増感中心を形成し
、光電子の寿命を長くし、結果として大きな光電流を得
ることができる反面、基本的には光電子の寿命が光応答
時間に対応するので光電流が大きいと応答時間が長くな
ってしまう。さらにこの様な多結晶薄膜では捕獲中心が
多いために低照度の場合には上記の光電子の寿命よりは
るかに光応答時間が長くなるという大きな欠点を有して
いる。
Now, activation by CdCl2 vapor forms sensitizing centers, lengthens the lifetime of photoelectrons, and as a result, it is possible to obtain a large photocurrent. However, basically, the lifetime of photoelectrons corresponds to the photoresponse time, so If the current is large, the response time will be long. Furthermore, such a polycrystalline thin film has a major drawback in that the photoresponse time is much longer than the above-mentioned lifetime of photoelectrons at low illuminance because of the large number of trapping centers.

発明の目的 本発明は光電流の大きさを損わずして、その光応答時間
が短かい光導電素子を製造する方法を提供する。
OBJECTS OF THE INVENTION The present invention provides a method for manufacturing a photoconductive element whose photoresponse time is short without compromising the magnitude of the photocurrent.

発明の構成 本発明はCdS 、 CdSe  あるいはこれら2種
の化合物の固溶体(dS −CdSe  を生成分とし
て成り、これに微量の−を含んだ薄膜を基板上に形成し
、CdC12の蒸発源と共に半密閉容器に入れ、高温度
にて該薄膜をCdCl2の蒸気に暴露して結晶成長と共
に活性化し、電極を形成して後、さらに真空中において
、しかも暗中で加熱処理することを特徴とする光導電素
子の製造方法である。
Structure of the Invention The present invention consists of a solid solution of CdS, CdSe, or these two types of compounds (dS-CdSe as a product component), and a thin film containing a trace amount of - is formed on a substrate, and a thin film is formed on a substrate in a semi-hermetically sealed state together with an evaporation source of CdC12. A photoconductive element characterized in that the thin film is placed in a container and exposed to CdCl2 vapor at high temperature to activate it along with crystal growth to form an electrode, and then heat-treated in vacuum and in the dark. This is a manufacturing method.

実施例の説明 薄膜の厚さは2000〜10000人であり、結晶成長
の温度は450〜600°Cである。
Description of Examples The thickness of the thin film is 2000-10000, and the temperature of crystal growth is 450-600°C.

真空中処理時の温度は120〜200’Cが好ましい。The temperature during vacuum treatment is preferably 120 to 200'C.

120’C以下だと効果がでるのに時間がか\り過ぎ、
200°C以上だと変化が大きすぎコントロールが難し
くなるからである。真空中熱処理の時間は0.25〜4
時間が好ましい。0.25時間以下では効果が得られ難
く、4時間以上だと変化特に光電流の減少が著しい。真
空中熱処理時の真空度は広い範囲の真空度で有効である
が0.01気圧以下であることが好ましい。0.01気
圧以上だと効果が小さかったり、変化が起るのに時間が
か\りすぎたりする。また真空中熱処理時は暗中である
ことが好ましく、明るいと変化が起り難く、また変化量
が小さい。特に1Qルyクス以下の方が効果が大きい。
If the temperature is below 120'C, it will take too long to be effective.
This is because if the temperature exceeds 200°C, the changes will be too large and control will become difficult. The time for heat treatment in vacuum is 0.25 to 4
time is preferable. If it is less than 0.25 hours, it is difficult to obtain an effect, and if it is more than 4 hours, the change, especially the decrease in photocurrent, is significant. The degree of vacuum during the heat treatment in vacuum is effective over a wide range of degrees of vacuum, but it is preferably 0.01 atmosphere or less. If the pressure is above 0.01 atm, the effect may be small or it may take too long for a change to occur. Further, during the heat treatment in vacuum, it is preferable to perform the heat treatment in the dark; if it is bright, changes will be less likely to occur and the amount of change will be small. In particular, the effect is greater for 1Q lux or less.

以下、本発明の具体実施例について説明する。Hereinafter, specific examples of the present invention will be described.

図は本発明に用いるボートの断面を示し、1はボート本
体、2はボートふた、3はガラス基板、4はCdS :
 CdCl2粉末である。
The figure shows a cross section of the boat used in the present invention, where 1 is the boat body, 2 is the boat lid, 3 is the glass substrate, and 4 is CdS:
It is CdCl2 powder.

ガラス基板(コーニング社7059.230×50X 
1.2 nest’ )の上にCd5(,65so4:
 01101□  を蒸発源として約4000人の厚さ
に蒸着した。蒸着膜中には含まれるCu  の量は、0
.008モル%であった。この基板3を図に見る様にア
ルミナ製ボート1に上向きに置きボートの中央底部にC
dS : CdC112(2モル%)粉末4を0.2 
!y/cynの割合で長さ方向に置き、ふた2をして6
00°Cで1時間加熱した。この様にして得た膜iCN
iCr /ムUの電極を蒸着形成(巾2朋、ギャップ1
羽)して後、真空中(0,01気圧)、しかも暗中(1
0ルックス)で175°Cにて0.25 、0.5 。
Glass substrate (Corning 7059.230×50X
1.2 nest') on top of Cd5 (,65so4:
01101□ was evaporated to a thickness of approximately 4000 mm using the evaporation source. The amount of Cu contained in the deposited film is 0.
.. It was 0.008 mol%. As shown in the figure, place this board 3 in an alumina boat 1 facing upward and place it at the center bottom of the boat.
dS: 0.2 of CdC112 (2 mol%) powder 4
! Place it in the length direction at a ratio of y/cyn, cover it with a lid 2, and
Heated at 00°C for 1 hour. Membrane iCN obtained in this way
Vapor deposition formation of iCr/muU electrode (width 2 mm, gap 1
After removing the feathers), it is placed in a vacuum (0.01 atm) and in the dark (1
0 lux) and 0.25 and 0.5 at 175°C.

1.2および4時間加熱処理した。この様にして得た光
導電素子にDClovを印加して100ルックスの緑色
光(波長555nm)を照射(1−で0.s seaず
つ)して光電流J、とその立上り時間τr (oから飽
和値の9o%に上がるまでの時間)、立下り時間τd 
(飽和値からその10%に下がるまでの時間)を測定し
た。結果をこの様な真空中加熱処理のない場合の結果と
共に次表に載せる。
Heat treatment was performed for 1.2 and 4 hours. DClov was applied to the photoconductive element obtained in this way, and 100 lux green light (wavelength 555 nm) was irradiated (0.s sea at 1-) to increase the photocurrent J and its rise time τr (from o time until it reaches 9o% of the saturation value), fall time τd
(The time required for the saturation value to drop to 10% of the saturation value) was measured. The results are listed in the following table along with the results without such vacuum heat treatment.

(以下余白) 特性表(Jp、τ1.τ、) 発明の効果 以上のように、この電極形成後の暗中における真空中加
熱処理によって光電流が大きいま\でその立上り時間、
立下り時間を著しく短くすることができる。この光セン
ナを用いれば大電流で信号処理の容易な高速の密着型イ
メージセンナを作ることかでさ、その工業的価値は太き
い。
(Margins below) Characteristic table (Jp, τ1.τ,) Effects of the invention As mentioned above, the photocurrent is large due to the heat treatment in vacuum in the dark after electrode formation, and its rise time is
Fall time can be significantly shortened. If this optical sensor is used, it will be possible to create a high-speed contact type image sensor with large current and easy signal processing, which has great industrial value.

【図面の簡単な説明】[Brief explanation of the drawing]

図はアルミナ製ボートの断面図である。 1−・・・・ホード本体、2・・・・・・ボートふた、
3・・・・・ガラス基板、4・・・・・・CdS : 
CdC1□粉末。
The figure is a cross-sectional view of an alumina boat. 1-...Hoard body, 2...Boat lid,
3...Glass substrate, 4...CdS:
CdC1□ powder.

Claims (5)

【特許請求の範囲】[Claims] (1)CdS、CdSeあるいはこれら2種の化合物の
固溶体CdS−CdSeを主体として成り、これに微量
のCuを含んだ薄膜を基板上に形成し、前記薄膜をCd
Cl_2の蒸気中にて加熱処理して結晶成長と共に活性
化し、電極を形成して後、さらに真空中において、しか
も暗中で加熱処理することを特徴とする光導電素子の製
造方法。
(1) A thin film mainly composed of CdS, CdSe, or a solid solution of these two types of compounds, CdS-CdSe, containing a trace amount of Cu is formed on a substrate, and the thin film is
A method for manufacturing a photoconductive element, which comprises heat-treating in Cl_2 vapor to activate crystal growth and forming electrodes, and then heat-treating in vacuum and in the dark.
(2)真空中での加熱処理の温度が120〜2000℃
であることを特徴とする特許請求の範囲第1項記載の光
導電素子の製造方法。
(2) Temperature of heat treatment in vacuum is 120-2000℃
A method for manufacturing a photoconductive element according to claim 1, characterized in that:
(3)真空中での加熱処理の時間が0.25〜4時間で
あることを特徴とする特許請求の範囲第1項または第2
項に記載の光導電素子の製造方法。
(3) Claim 1 or 2, characterized in that the heat treatment time in vacuum is 0.25 to 4 hours.
A method for manufacturing a photoconductive element according to 2.
(4)真空中での熱処理の際の真空度が0.01気圧以
下であることを特徴とする特許請求の範囲第1項〜第3
項の何れかに記載の光導電素子の製造方法。
(4) Claims 1 to 3, characterized in that the degree of vacuum during heat treatment in vacuum is 0.01 atmosphere or less.
A method for manufacturing a photoconductive element according to any one of paragraphs.
(5)真空中において、しかも暗中において加熱処理す
る際の照度が10ルックス以下であることを特徴とする
特許請求の範囲第1〜4項の何れかに記載の光導電素子
の製造方法。
(5) The method for manufacturing a photoconductive element according to any one of claims 1 to 4, characterized in that the illuminance during heat treatment in vacuum and in the dark is 10 lux or less.
JP59207413A 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements Granted JPS6184876A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59207413A JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59207413A JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Publications (2)

Publication Number Publication Date
JPS6184876A true JPS6184876A (en) 1986-04-30
JPH058593B2 JPH058593B2 (en) 1993-02-02

Family

ID=16539331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59207413A Granted JPS6184876A (en) 1984-10-03 1984-10-03 Method for manufacturing photoconductive elements

Country Status (1)

Country Link
JP (1) JPS6184876A (en)

Also Published As

Publication number Publication date
JPH058593B2 (en) 1993-02-02

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