JPH0636762U - Polishing waste liquid treatment device - Google Patents

Polishing waste liquid treatment device

Info

Publication number
JPH0636762U
JPH0636762U JP7859192U JP7859192U JPH0636762U JP H0636762 U JPH0636762 U JP H0636762U JP 7859192 U JP7859192 U JP 7859192U JP 7859192 U JP7859192 U JP 7859192U JP H0636762 U JPH0636762 U JP H0636762U
Authority
JP
Japan
Prior art keywords
liquid
coolant
polishing waste
waste liquid
storage tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7859192U
Other languages
Japanese (ja)
Other versions
JPH085008Y2 (en
Inventor
壽治 青木
秀 広津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Engineering Co Ltd
Original Assignee
Toray Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Engineering Co Ltd filed Critical Toray Engineering Co Ltd
Priority to JP7859192U priority Critical patent/JPH085008Y2/en
Publication of JPH0636762U publication Critical patent/JPH0636762U/en
Application granted granted Critical
Publication of JPH085008Y2 publication Critical patent/JPH085008Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Electrostatic Separation (AREA)

Abstract

(57)【要約】 【目的】 研磨廃液から不純物を分離した二次処理液の
流量及び濃度に対応させて所定量のクーラントを高精度
に補給し得て再使用に好適な再生液(研磨液)を迅速に
調整する。 【構成】 研磨廃液を遠心分離機で固液分離した後、静
電フイルタで濾過し、かかる濾過液の流量及び濃度に基
いて所定量のクーラントを濾過液に補給混合させて調整
し得るように構成。
(57) [Summary] [Purpose] A reclaimed liquid (polishing liquid) suitable for re-use that can replenish a predetermined amount of coolant with high precision according to the flow rate and concentration of the secondary treatment liquid that has separated impurities from the polishing waste liquid. ) Quickly adjust. [Structure] After solid-liquid separation of the polishing waste liquid with a centrifuge, it is filtered with an electrostatic filter so that a predetermined amount of coolant can be replenished and mixed with the filtered liquid based on the flow rate and concentration of the filtered liquid so as to be adjusted. Constitution.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、研磨廃液処理装置に関するものである。 The present invention relates to a polishing waste liquid treatment device.

【0002】[0002]

【従来の技術】[Prior art]

従来、研磨廃液の再生利用は広く実施されており、例えば、特公昭58−30 112号公報等において開示されているように、一般に、研磨廃液を固液分離処 理した後、その処理液に必要量のクーラントを補給混合して再生している。 Conventionally, the recycling of polishing waste liquid has been widely practiced. For example, as disclosed in Japanese Patent Publication No. 58-30112, etc., generally, the polishing waste liquid is subjected to a solid-liquid separation treatment, and then treated. It regenerates by replenishing and mixing the required amount of coolant.

【0003】[0003]

【考案が解決しようとする課題】[Problems to be solved by the device]

しかし、かかる再生処理は、スクリーンや遠心分離機等により固液分離した処 理液に直接、必要量のクーラントを補給して再生している関係上、固液分離能に 影響されて再生液の組成が一定しないと共に固液分離した処理液にクーラントを 補給混合しながら、その混合液のPHを測定してクーラントの補給量を所定に制 御している関係上、迅速な調整が困難であるといった諸々の欠点を有していた。 However, this regeneration treatment is affected by the solid-liquid separation ability because the regeneration amount is replenished by directly supplying the required amount of coolant to the treatment liquid that has been solid-liquid separated by a screen or a centrifuge. Since the composition is not constant and the coolant is replenished and mixed into the solid-liquid separated processing liquid, the PH of the mixed liquid is measured to control the replenishment amount of the coolant in a predetermined manner, which makes rapid adjustment difficult. It had various drawbacks.

【0004】 本考案は、このようなことに着目し、これを解決すべく各方面から鋭意検討の 結果、研磨廃液を遠心分離機で固液分離して得られる一次処理液を更に静電フイ ルタで濾過して二次処理液を得ると共に、かかる二次処理液の流量及び濃度に基 いてクーラントの補給量を制御するようにすれば、上述した欠点を一挙に解消し 得ることを見出したのである。The present invention pays attention to such a situation, and as a result of diligent investigations from various aspects to solve the problem, as a result, the primary treatment liquid obtained by solid-liquid separation of the polishing waste liquid with a centrifugal separator is further electrostatically filtered. It was found that the above-mentioned drawbacks can be solved all at once by controlling the replenishment amount of the coolant based on the flow rate and concentration of the secondary treatment liquid while filtering with a filter to obtain the secondary treatment liquid. Of.

【0005】[0005]

【課題を解決するための手段】[Means for Solving the Problems]

すなわち、本考案に係る研磨廃液処理装置は、研磨廃液を固液分離処理する遠 心分離機と、前記遠心分離機から直接若しくは中間貯留タンクを経て供給される 一次処理液を濾過する静電フイルタと、前記静電フイルタから供給される二次処 理液とクーラント補給装置から供給されるクーラントとを混合した再生液を貯留 する再生液貯留タンクと、前記二次処理液の流量及び濃度に基いて前記クーラン トの補給量を制御するクーラント補給量制御装置とを備えていることを特徴とす るものである。 That is, the polishing waste liquid treatment apparatus according to the present invention comprises a centrifugal separator for solid-liquid separation of polishing waste liquid and an electrostatic filter for filtering the primary treatment liquid supplied directly from the centrifuge or through an intermediate storage tank. Based on the flow rate and concentration of the secondary treatment liquid, and a regenerant storage tank that stores a regenerant liquid in which a secondary treatment liquid supplied from the electrostatic filter and a coolant supplied from a coolant replenishing device are mixed. In addition, a coolant replenishment amount control device for controlling the replenishment amount of the coolant is provided.

【0006】[0006]

【実施例】【Example】

以下、本考案に係る一実施例について図面に基いて述べると、図1において、 この研磨廃液処理装置は、遠心分離機1と、静電フイルタ2と、クーラント補給 装置3と、クーラント補給量制御装置4と、原液貯留タンク5と、中間貯留タン ク6と、再生液貯留タンク7等を備えている。 An embodiment according to the present invention will be described below with reference to the drawings. In FIG. 1, this polishing waste liquid treatment device includes a centrifuge 1, an electrostatic filter 2, a coolant replenishing device 3, and a coolant replenishment amount control. It is equipped with a device 4, a stock solution storage tank 5, an intermediate storage tank 6, a reclaimed solution storage tank 7, and the like.

【0007】 かかる分離機1は、原液貯留タンク5から管路8を経て供給される研磨廃液を 固液分離する。これにより、研磨廃液中の固体粒子の大部分が除去され、その一 次処理液が管路9を経て中間貯留タンク6に送られる。続いて、ここから管路1 0を経て静電フイルタ2に供給されて濾過されるが、この濾過により一次処理液 中の残留固体粒子(遠心分離機1による固液分離に際してリークした固体粒子) が除去される。その際、遠心分離機1で前処理の固液分離をしているので、静電 フイルタ2の目詰りを長期間にわたって防止することができる。The separator 1 solid-liquid separates the polishing waste liquid supplied from the stock solution storage tank 5 through the pipe line 8. As a result, most of the solid particles in the polishing waste liquid are removed, and the primary treatment liquid is sent to the intermediate storage tank 6 via the pipe 9. Then, from here, it is supplied to the electrostatic filter 2 through the pipe line 10 and filtered, and the residual solid particles in the primary treatment liquid due to this filtration (solid particles leaked during solid-liquid separation by the centrifuge 1) Are removed. At that time, the solid-liquid separation of the pretreatment is performed by the centrifuge 1, so that clogging of the electrostatic filter 2 can be prevented for a long period of time.

【0008】 なお、遠心分離機1を用いているのは、エマルジョン状態に懸濁している、有 価物たるクーラント成分の除去阻止の為であって、他の固液分離手段では、溶解 しているクーラント成分の除去を阻止し得ても、エマルジョン状態に懸濁してい るクーラント成分についてはそれが困難であるからである。The centrifuge 1 is used to prevent the removal of the coolant component, which is a valent substance, suspended in the emulsion state, and is dissolved in other solid-liquid separation means. This is because even if it is possible to prevent the removal of the existing coolant components, it is difficult for the coolant components suspended in the emulsion state.

【0009】 すなわち、比重が約1のクーラントと、例えば、比重が約2の固体微粒子との 比重差を利用して遠心力により固体粒子の大部分を除去し、そして、これにおい てリークした固体粒子を、クーラントよりも目開きの大きい静電フイルタ2で除 去している。That is, most of the solid particles are removed by centrifugal force by utilizing the difference in specific gravity between the coolant having a specific gravity of about 1 and the solid fine particles having a specific gravity of about 2, and the leaked solid is then removed. The particles are removed by the electrostatic filter 2 having a larger opening than the coolant.

【0010】 以下、静電フイルタ2から排出される二次処理液は、管路11を経て再生液貯 留タンク7に送られると共に、これと並行してクーラント補給装置3によりクー ラントが前記二次処理液に補給される。この補給装置3は、弁13を閉じ、かつ 弁14を開いた状態で、タンク15に貯留されているクーラントをポンプ16で 循環、すなわち、クーラントを管路17,18を経て循環させることができ、ま た、弁13,14を所定に開き、タンク15から抜き出したクーラントの一部を 循環させると共に残部を、前記二次処理液に補給することができる。Thereafter, the secondary treatment liquid discharged from the electrostatic filter 2 is sent to the regenerant storage tank 7 via the pipe 11, and at the same time, the coolant is supplied by the coolant replenishing device 3 to the secondary treatment liquid. It is replenished with the next processing liquid. In this replenishing device 3, the coolant stored in the tank 15 can be circulated by the pump 16 with the valve 13 closed and the valve 14 opened, that is, the coolant can be circulated through the pipelines 17 and 18. Further, the valves 13 and 14 can be opened in a predetermined manner so that a part of the coolant extracted from the tank 15 can be circulated and the rest can be replenished to the secondary treatment liquid.

【0011】 なお、前記二次処理液に補給されたクーラントは、管路11に装着されている 静止型混合器19により、前記二次処理液と混合され、その混合液(以下、これ を再生液という。)が再生液貯留タンク7に送られる。かかるクーラントの補給 において、クーラント補給量制御装置4でその補給量が所定に制御される。The coolant replenished with the secondary treatment liquid is mixed with the secondary treatment liquid by the static mixer 19 attached to the pipe 11, and the mixed liquid (hereinafter, this is regenerated). Liquid) is sent to the regeneration liquid storage tank 7. In such coolant replenishment, the coolant replenishment amount control device 4 controls the replenishment amount to a predetermined amount.

【0012】 この補給量制御装置4は、管路11に装着されている測定装置20により、静 電フイルタ2から排出される前記二次処理液の流量及び濃度を測定し、それらの 測定信号に基いてポンプ16を駆動するモータ21を所定に回転制御してクーラ ントの補給量を制御する。The replenishment amount control device 4 measures the flow rate and the concentration of the secondary treatment liquid discharged from the electrostatic filter 2 by the measuring device 20 attached to the pipe line 11, and outputs the measured signals as those measurement signals. Based on this, the motor 21 that drives the pump 16 is rotationally controlled in a predetermined manner to control the coolant replenishment amount.

【0013】 測定装置20は、濃度測定手段として紫外線吸光度計を用いているので、流下 中の前記二次処理液であっても迅速かつ正確に測定することができ、従って、モ ータ21を高精度に制御することができて、常に一定組成の再生液に保つことが でき、再使用に好適な研磨液を得ることができる。Since the measuring device 20 uses the ultraviolet absorptiometer as the concentration measuring means, it is possible to quickly and accurately measure even the secondary treatment liquid which is flowing down. It can be controlled with high precision and can be always maintained in a regenerant liquid having a constant composition, and a polishing liquid suitable for reuse can be obtained.

【0014】 なお、再生液貯留タンク7に、再生液を循環させる循環管路22が装着されて いると共に、かかる再生液(研磨液)は、管路23を経て研磨作業箇所へポンプ 送りされる。図中、24〜26は各管路に装着されているポンプを、また、27 〜29は循環管路を夫々示している。The regenerant storage tank 7 is equipped with a circulation line 22 for circulating the regenerant, and the regenerant (polishing liquid) is pumped to a polishing work site via a line 23. . In the figure, reference numerals 24 to 26 denote pumps attached to the respective pipelines, and 27 to 29 denote circulation pipelines.

【0015】 以上、本考案に係る一実施例について述べたが、本考案においては、中間貯留 タンク6を設置しないで、遠心分離機1から一次処理液を直接、静電フイルタ2 に供給してもよい。また、クーラントは、界面活性剤等の研磨粉分散剤や凝集防 止剤あるいは防錆剤、その他の研磨液用液体添加剤等が含有されたものなど、い かなる組成のものであってもよい。Although one embodiment according to the present invention has been described above, in the present invention, the primary treatment liquid is directly supplied from the centrifuge 1 to the electrostatic filter 2 without installing the intermediate storage tank 6. Good. Further, the coolant may be of any composition, such as one containing a polishing powder dispersant such as a surfactant, an anti-aggregation agent or an anticorrosive agent, and other liquid additive for polishing liquid. Good.

【0016】[0016]

【考案の効果】[Effect of device]

上述したように、本考案によると、遠心分離機及び静電フイルタを用いている ので、研磨廃液中の有価物たるクーラント成分の除去を阻止しながら固体粒子を 良好に除去することができ、かつ、静電フイルタからの二次処理液の流量及び濃 度に基いて所定量のクーラントを補給するクーラント補給量制御装置を装着して いるので、常に一定組成の再使用に好適な研磨液を得ることができる。 As described above, according to the present invention, since the centrifugal separator and the electrostatic filter are used, it is possible to satisfactorily remove the solid particles while preventing the removal of the coolant component which is the valuable material in the polishing waste liquid, and Since a coolant replenishment amount control device that replenishes a predetermined amount of coolant based on the flow rate and concentration of the secondary treatment liquid from the electrostatic filter is installed, a polishing liquid suitable for reuse with a constant composition is always obtained. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】研磨廃液処理装置のフローシート図である。FIG. 1 is a flow sheet diagram of a polishing waste liquid processing apparatus.

【符号の説明】[Explanation of symbols]

1 遠心分離機 2 静電フイルタ 3 クーラント補給装置 4 クーラント補給量制御装置 5 原液貯留タンク 6 中間貯留タンク 7 再生液貯留タンク 1 Centrifuge 2 Electrostatic Filter 3 Coolant Replenishing Device 4 Coolant Replenishing Volume Control Device 5 Stock Solution Storage Tank 6 Intermediate Storage Tank 7 Regeneration Liquid Storage Tank

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 研磨廃液を固液分離処理する遠心分離機
と、前記遠心分離機から直接若しくは中間貯留タンクを
経て供給される一次処理液を濾過する静電フイルタと、
前記静電フイルタから供給される二次処理液とクーラン
ト補給装置から供給されるクーラントとを混合した再生
液を貯留する再生液貯留タンクと、前記二次処理液の流
量及び濃度に基いて前記クーラントの補給量を制御する
クーラント補給量制御装置とを備えていることを特徴と
する研磨廃液処理装置。
1. A centrifuge for solid-liquid separating the polishing waste liquid, and an electrostatic filter for filtering the primary treatment liquid supplied from the centrifuge directly or through an intermediate storage tank.
A regeneration liquid storage tank that stores a regeneration liquid in which a secondary treatment liquid supplied from the electrostatic filter and a coolant supplied from a coolant replenishing device are stored, and the coolant based on the flow rate and concentration of the secondary treatment liquid. And a coolant replenishment amount control device for controlling the replenishment amount of the polishing waste liquid treatment device.
JP7859192U 1992-10-16 1992-10-16 Polishing waste liquid treatment device Expired - Lifetime JPH085008Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7859192U JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7859192U JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Publications (2)

Publication Number Publication Date
JPH0636762U true JPH0636762U (en) 1994-05-17
JPH085008Y2 JPH085008Y2 (en) 1996-02-14

Family

ID=13666156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7859192U Expired - Lifetime JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Country Status (1)

Country Link
JP (1) JPH085008Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008058823A1 (en) 2008-11-25 2010-05-27 Rohde & Schwarz Gmbh & Co. Kg Method and apparatus for analyzing code domain power and code domain error power

Also Published As

Publication number Publication date
JPH085008Y2 (en) 1996-02-14

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