JPH085008Y2 - Polishing waste liquid treatment device - Google Patents

Polishing waste liquid treatment device

Info

Publication number
JPH085008Y2
JPH085008Y2 JP7859192U JP7859192U JPH085008Y2 JP H085008 Y2 JPH085008 Y2 JP H085008Y2 JP 7859192 U JP7859192 U JP 7859192U JP 7859192 U JP7859192 U JP 7859192U JP H085008 Y2 JPH085008 Y2 JP H085008Y2
Authority
JP
Japan
Prior art keywords
liquid
coolant
polishing waste
waste liquid
storage tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP7859192U
Other languages
Japanese (ja)
Other versions
JPH0636762U (en
Inventor
壽治 青木
秀 広津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Engineering Co Ltd
Original Assignee
Toray Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Engineering Co Ltd filed Critical Toray Engineering Co Ltd
Priority to JP7859192U priority Critical patent/JPH085008Y2/en
Publication of JPH0636762U publication Critical patent/JPH0636762U/en
Application granted granted Critical
Publication of JPH085008Y2 publication Critical patent/JPH085008Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Landscapes

  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Electrostatic Separation (AREA)

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】本考案は、研磨廃液処理装置に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing waste liquid treatment device.

【0002】[0002]

【従来の技術】従来、研磨廃液の再生利用は広く実施さ
れており、例えば、特公昭58−30112号公報等に
おいて開示されているように、一般に、研磨廃液を固液
分離処理した後、その処理液に必要量のクーラントを補
給混合して再生している。
2. Description of the Related Art Conventionally, the recycling of polishing waste liquid has been widely practiced. For example, as disclosed in Japanese Examined Patent Publication No. 58-30112, the polishing waste liquid is generally subjected to solid-liquid separation treatment and then The processing liquid is regenerated by replenishing and mixing the required amount of coolant.

【0003】[0003]

【考案が解決しようとする課題】しかし、かかる再生処
理は、スクリーンや遠心分離機等により固液分離した処
理液に直接、必要量のクーラントを補給して再生してい
る関係上、固液分離能に影響されて再生液の組成が一定
しないと共に固液分離した処理液にクーラントを補給混
合しながら、その混合液のPHを測定してクーラントの
補給量を所定に制御している関係上、迅速な調整が困難
であるといった諸々の欠点を有していた。
However, such a regeneration treatment involves solid-liquid separation because it regenerates by replenishing the required amount of coolant directly to the treatment liquid that has been solid-liquid separated by a screen or a centrifuge. The composition of the regenerating liquid is not constant due to the performance, and while the coolant is replenished and mixed with the treatment liquid that has been solid-liquid separated, the PH of the mixed liquid is measured to control the replenishment amount of the coolant in a predetermined manner. It has various drawbacks such as difficulty in quick adjustment.

【0004】本考案は、このようなことに着目し、これ
を解決すべく各方面から鋭意検討の結果、研磨廃液を遠
心分離機で固液分離して得られる一次処理液を更に静電
フイルタで濾過して二次処理液を得ると共に、かかる二
次処理液の流量及び濃度に基いてクーラントの補給量を
制御するようにすれば、上述した欠点を一挙に解消し得
ることを見出したのである。
The present invention pays attention to such a situation, and as a result of intensive studies from various directions to solve this, as a result, the primary treatment liquid obtained by solid-liquid separation of the polishing waste liquid with a centrifugal separator is further electrostatically filtered. It has been found that the above-mentioned drawbacks can be solved at once by controlling the replenishment amount of the coolant based on the flow rate and the concentration of the secondary treatment liquid while filtering to obtain the secondary treatment liquid. is there.

【0005】[0005]

【課題を解決するための手段】すなわち、本考案に係る
研磨廃液処理装置は、研磨廃液を固液分離処理する遠心
分離機と、前記遠心分離機から直接若しくは中間貯留タ
ンクを経て供給される一次処理液を濾過する静電フイル
タと、前記静電フイルタから供給される二次処理液とク
ーラント補給装置から供給されるクーラントとを混合し
た再生液を貯留する再生液貯留タンクと、前記二次処理
液の流量及び濃度に基いて前記クーラントの補給量を制
御するクーラント補給量制御装置とを備えていることを
特徴とするものである。
[Means for Solving the Problems] That is, a polishing waste liquid treatment apparatus according to the present invention comprises a centrifuge for solid-liquid separating the polishing waste liquid, and a primary separator supplied directly from the centrifuge or through an intermediate storage tank. An electrostatic filter for filtering the processing liquid, a regenerating liquid storage tank for storing a regenerating liquid in which a secondary processing liquid supplied from the electrostatic filter and a coolant supplied from a coolant replenishing device are stored, and the secondary processing A coolant replenishment amount control device for controlling the replenishment amount of the coolant based on the flow rate and the concentration of the liquid.

【0006】[0006]

【実施例】以下、本考案に係る一実施例について図面に
基いて述べると、図1において、この研磨廃液処理装置
は、遠心分離機1と、静電フイルタ2と、クーラント補
給装置3と、クーラント補給量制御装置4と、原液貯留
タンク5と、中間貯留タンク6と、再生液貯留タンク7
等を備えている。
BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, this polishing waste liquid treatment device includes a centrifugal separator 1, an electrostatic filter 2, a coolant replenishing device 3, Coolant replenishment amount control device 4, stock solution storage tank 5, intermediate storage tank 6, regenerated liquid storage tank 7
And so on.

【0007】かかる分離機1は、原液貯留タンク5から
管路8を経て供給される研磨廃液を固液分離する。これ
により、研磨廃液中の固体粒子の大部分が除去され、そ
の一次処理液が管路9を経て中間貯留タンク6に送られ
る。続いて、ここから管路10を経て静電フイルタ2に
供給されて濾過されるが、この濾過により一次処理液中
の残留固体粒子(遠心分離機1による固液分離に際して
リークした固体粒子)が除去される。その際、遠心分離
機1で前処理の固液分離をしているので、静電フイルタ
2の目詰りを長期間にわたって防止することができる。
The separator 1 solid-liquid separates the polishing waste liquid supplied from the stock solution storage tank 5 through the pipe line 8. As a result, most of the solid particles in the polishing waste liquid are removed, and the primary treatment liquid is sent to the intermediate storage tank 6 via the pipe 9. Then, from here, it is supplied to the electrostatic filter 2 through the pipe line 10 and filtered, and the residual solid particles in the primary treatment liquid (solid particles leaked during solid-liquid separation by the centrifuge 1) are filtered by this filtration. To be removed. At that time, since the solid-liquid separation of the pretreatment is performed by the centrifugal separator 1, the clogging of the electrostatic filter 2 can be prevented for a long period of time.

【0008】なお、遠心分離機1を用いているのは、エ
マルジョン状態に懸濁している、有価物たるクーラント
成分の除去阻止の為であって、他の固液分離手段では、
溶解しているクーラント成分の除去を阻止し得ても、エ
マルジョン状態に懸濁しているクーラント成分について
はそれが困難であるからである。
The centrifuge 1 is used to prevent the removal of the valuable coolant component suspended in the emulsion state, and other solid-liquid separation means
This is because even if the removal of the dissolved coolant component can be prevented, it is difficult for the coolant component suspended in the emulsion state.

【0009】すなわち、比重が約1のクーラントと、例
えば、比重が約2の固体微粒子との比重差を利用して遠
心力により固体粒子の大部分を除去し、そして、これに
おいてリークした固体粒子を、クーラントよりも目開き
の大きい静電フイルタ2で除去している。
That is, most of the solid particles are removed by centrifugal force by utilizing the difference in specific gravity between the coolant having a specific gravity of about 1 and the solid fine particles having a specific gravity of about 2, and the leaked solid particles are removed. Is removed by the electrostatic filter 2 having a larger opening than the coolant.

【0010】以下、静電フイルタ2から排出される二次
処理液は、管路11を経て再生液貯留タンク7に送られ
ると共に、これと並行してクーラント補給装置3により
クーラントが前記二次処理液に補給される。この補給装
置3は、弁13を閉じ、かつ弁14を開いた状態で、タ
ンク15に貯留されているクーラントをポンプ16で循
環、すなわち、クーラントを管路17,18を経て循環
させることができ、また、弁13,14を所定に開き、
タンク15から抜き出したクーラントの一部を循環させ
ると共に残部を、前記二次処理液に補給することができ
る。
Thereafter, the secondary treatment liquid discharged from the electrostatic filter 2 is sent to the regeneration liquid storage tank 7 through the pipe line 11, and at the same time, the coolant is replenished by the coolant replenishing device 3 to perform the secondary treatment. It is replenished with liquid. In this replenishing device 3, the coolant stored in the tank 15 can be circulated by the pump 16 with the valve 13 closed and the valve 14 opened, that is, the coolant can be circulated through the pipelines 17 and 18. , And open the valves 13 and 14 as desired,
It is possible to circulate a part of the coolant extracted from the tank 15 and replenish the rest with the secondary treatment liquid.

【0011】なお、前記二次処理液に補給されたクーラ
ントは、管路11に装着されている静止型混合器19に
より、前記二次処理液と混合され、その混合液(以下、
これを再生液という。)が再生液貯留タンク7に送られ
る。かかるクーラントの補給において、クーラント補給
量制御装置4でその補給量が所定に制御される。
The coolant replenished with the secondary treatment liquid is mixed with the secondary treatment liquid by the static mixer 19 mounted on the pipe 11, and the mixed liquid (hereinafter,
This is called a regenerant. ) Is sent to the regenerant storage tank 7. In such coolant replenishment, the coolant replenishment amount control device 4 controls the replenishment amount to a predetermined level.

【0012】この補給量制御装置4は、管路11に装着
されている測定装置20により、静電フイルタ2から排
出される前記二次処理液の流量及び濃度を測定し、それ
らの測定信号に基いてポンプ16を駆動するモータ21
を所定に回転制御してクーラントの補給量を制御する。
The replenishment amount control device 4 measures the flow rate and concentration of the secondary treatment liquid discharged from the electrostatic filter 2 by means of the measuring device 20 mounted on the pipe line 11, and outputs the measured signals as those measurement signals. A motor 21 that drives the pump 16 based on
Is controlled in a predetermined manner to control the amount of coolant replenishment.

【0013】測定装置20は、濃度測定手段として紫外
線吸光度計を用いているので、流下中の前記二次処理液
であっても迅速かつ正確に測定することができ、従っ
て、モータ21を高精度に制御することができて、常に
一定組成の再生液に保つことができ、再使用に好適な研
磨液を得ることができる。
Since the measuring device 20 uses the ultraviolet ray absorptiometer as the concentration measuring means, it is possible to quickly and accurately measure even the secondary treatment liquid which is flowing down. Therefore, the motor 21 is highly accurate. Can be controlled to a constant value, and a regenerated liquid having a constant composition can be always maintained, and a polishing liquid suitable for reuse can be obtained.

【0014】なお、再生液貯留タンク7に、再生液を循
環させる循環管路22が装着されていると共に、かかる
再生液(研磨液)は、管路23を経て研磨作業箇所へポ
ンプ送りされる。図中、24〜26は各管路に装着され
ているポンプを、また、27〜29は循環管路を夫々示
している。
The regenerant storage tank 7 is provided with a circulation line 22 for circulating the regenerant, and the regenerant (polishing liquid) is pumped to a polishing work site via a line 23. . In the figure, 24 to 26 indicate pumps attached to the respective pipelines, and 27 to 29 indicate circulation pipelines.

【0015】以上、本考案に係る一実施例について述べ
たが、本考案においては、中間貯留タンク6を設置しな
いで、遠心分離機1から一次処理液を直接、静電フイル
タ2に供給してもよい。また、クーラントは、界面活性
剤等の研磨粉分散剤や凝集防止剤あるいは防錆剤、その
他の研磨液用液体添加剤等が含有されたものなど、いか
なる組成のものであってもよい。
Although one embodiment according to the present invention has been described above, in the present invention, the intermediate treatment tank 6 is not installed and the primary treatment liquid is directly supplied from the centrifuge 1 to the electrostatic filter 2. Good. Further, the coolant may have any composition, such as one containing a polishing powder dispersant such as a surfactant, an agglomeration inhibitor or a rust preventive agent, and other liquid additive for polishing liquid.

【0016】[0016]

【考案の効果】上述したように、本考案によると、遠心
分離機及び静電フイルタを用いているので、研磨廃液中
の有価物たるクーラント成分の除去を阻止しながら固体
粒子を良好に除去することができ、かつ、静電フイルタ
からの二次処理液の流量及び濃度に基いて所定量のクー
ラントを補給するクーラント補給量制御装置を装着して
いるので、常に一定組成の再使用に好適な研磨液を得る
ことができる。
As described above, according to the present invention, since the centrifugal separator and the electrostatic filter are used, the solid particles are satisfactorily removed while preventing the removal of the valuable coolant component in the polishing waste liquid. Since it is equipped with a coolant replenishment amount control device that replenishes a predetermined amount of coolant based on the flow rate and concentration of the secondary treatment liquid from the electrostatic filter, it is always suitable for reusing a constant composition. A polishing liquid can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】研磨廃液処理装置のフローシート図である。FIG. 1 is a flow sheet diagram of a polishing waste liquid processing apparatus.

【符号の説明】[Explanation of symbols]

1 遠心分離機 2 静電フイルタ 3 クーラント補給装置 4 クーラント補給量制御装置 5 原液貯留タンク 6 中間貯留タンク 7 再生液貯留タンク 1 Centrifuge 2 Electrostatic Filter 3 Coolant Replenishing Device 4 Coolant Replenishing Volume Control Device 5 Stock Solution Storage Tank 6 Intermediate Storage Tank 7 Regeneration Liquid Storage Tank

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】 研磨廃液を固液分離処理する遠心分離機
と、前記遠心分離機から直接若しくは中間貯留タンクを
経て供給される一次処理液を濾過する静電フイルタと、
前記静電フイルタから供給される二次処理液とクーラン
ト補給装置から供給されるクーラントとを混合した再生
液を貯留する再生液貯留タンクと、前記二次処理液の流
量及び濃度に基いて前記クーラントの補給量を制御する
クーラント補給量制御装置とを備えていることを特徴と
する研磨廃液処理装置。
1. A centrifuge for solid-liquid separating the polishing waste liquid, and an electrostatic filter for filtering the primary treatment liquid supplied from the centrifuge directly or through an intermediate storage tank.
A regeneration liquid storage tank that stores a regeneration liquid in which a secondary treatment liquid supplied from the electrostatic filter and a coolant supplied from a coolant replenishing device are stored, and the coolant based on the flow rate and concentration of the secondary treatment liquid. And a coolant replenishment amount control device for controlling the replenishment amount of the polishing waste liquid treatment device.
JP7859192U 1992-10-16 1992-10-16 Polishing waste liquid treatment device Expired - Lifetime JPH085008Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7859192U JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7859192U JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Publications (2)

Publication Number Publication Date
JPH0636762U JPH0636762U (en) 1994-05-17
JPH085008Y2 true JPH085008Y2 (en) 1996-02-14

Family

ID=13666156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7859192U Expired - Lifetime JPH085008Y2 (en) 1992-10-16 1992-10-16 Polishing waste liquid treatment device

Country Status (1)

Country Link
JP (1) JPH085008Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5830112B2 (en) 2008-11-25 2015-12-09 ローデ ウント シュワルツ ゲーエムベーハー ウント コー カーゲー Code domain power and code domain error power analysis method and apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5830112B2 (en) 2008-11-25 2015-12-09 ローデ ウント シュワルツ ゲーエムベーハー ウント コー カーゲー Code domain power and code domain error power analysis method and apparatus

Also Published As

Publication number Publication date
JPH0636762U (en) 1994-05-17

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