JPH064861A - Method of manufacturing thin film magnetic disk - Google Patents
Method of manufacturing thin film magnetic diskInfo
- Publication number
- JPH064861A JPH064861A JP16448192A JP16448192A JPH064861A JP H064861 A JPH064861 A JP H064861A JP 16448192 A JP16448192 A JP 16448192A JP 16448192 A JP16448192 A JP 16448192A JP H064861 A JPH064861 A JP H064861A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- substrate
- manufacturing
- surface treatment
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】
【目的】プレ−ン基板にテクスチャ加工を行わないで、
円周方向に表面処理することで磁気異方性を付ける。
【構成】成膜工程(g)の前の表面処理工程(e)でN
i−P基板8の表面をエッチング作用のある親水性の表
面処理液7で濡らし、コンタクトローラー10で処理テ
ープ9を押し付け基板8を回転させて表面処理をする。
【効果】砥粒や研磨粉を含む加工液を使わないで表面処
理だけで済むため、処理後の洗浄が簡素になり、磁気異
方性が付くと共にヘッドの浮上特性が向上する。
(57) [Summary] [Purpose] Do not texture the plane board,
Magnetic anisotropy is given by surface treatment in the circumferential direction. [Structure] N in the surface treatment step (e) before the film formation step (g)
The surface of the i-P substrate 8 is wetted with the hydrophilic surface treatment liquid 7 having an etching action, and the treatment tape 9 is pressed by the contact roller 10 to rotate the substrate 8 for surface treatment. [Effect] Since only the surface treatment is required without using a working fluid containing abrasive grains or polishing powder, cleaning after the treatment is simplified, magnetic anisotropy is provided, and the flying characteristics of the head are improved.
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子計算機やワ−クス
テ−ション等の外部記憶装置として用いられる薄膜磁気
ディスクの製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thin film magnetic disk used as an external storage device such as an electronic computer or a workstation.
【0002】[0002]
【従来の技術】磁気ディスク等の磁気記録媒体を利用し
た記憶装置は、計算機やワ−クステ−ション等の外部記
憶装置として広く用いられており、近年の情報量の増大
に伴って益々大容量のものが要求されている。一方、装
置自身の形状は、より小型、軽量のものが望まれてお
り、これらを両立させるには記録媒体の飛躍的な記録密
度向上が不可欠となっている。2. Description of the Related Art A storage device using a magnetic recording medium such as a magnetic disk is widely used as an external storage device for a computer, a workstation, etc., and has a large capacity as the amount of information has increased in recent years. Are required. On the other hand, the shape of the apparatus itself is desired to be smaller and lighter, and in order to achieve both of them, it is essential to dramatically improve the recording density of the recording medium.
【0003】例えば、磁気ディスクの製造においては、
磁気特性を向上させるため磁性膜形成前に、磁気ディス
クの基板面、あるいは基板表面に予め下地膜として設け
られた例えばNi−Pメッキ上を、図2の一部破断斜視
図に示すように、磁気ディスク媒体の円周方向に、ほぼ
同心円状に加工痕を残す表面加工処理(以下、テクスチ
ャ加工と略す)が行われている。For example, in the manufacture of magnetic disks,
Before forming the magnetic film in order to improve the magnetic characteristics, the substrate surface of the magnetic disk, or Ni-P plating, for example, which is previously provided as a base film on the substrate surface, is shown in a partially broken perspective view of FIG. Surface treatment processing (hereinafter abbreviated as texturing) is performed in the circumferential direction of a magnetic disk medium to leave processing marks in a substantially concentric shape.
【0004】テクスチャ加工は、その利点として(1)
磁気ディスクの停止時に磁気ヘッドと磁気ディスク媒体
との間の吸着現象を軽減する効果、(2)加工表面上に
成膜される磁性膜に形状異方性を持たせることにより、
円周方向に磁気特性を均一化させる効果などを有する。
しかし、他方ではダイヤモンドやアルミナ等の砥粒を使
って加工するため、基板表面にバリや突起等が発生し易
く、これがもとで磁気ヘッドの浮上特性や磁性媒体の結
晶成長が不均一となり、保磁力等の磁気特性に向上が期
待できないと云う難点があった。Texturing is one of its advantages (1)
The effect of reducing the adsorption phenomenon between the magnetic head and the magnetic disk medium when the magnetic disk is stopped, and (2) by giving shape anisotropy to the magnetic film formed on the processed surface,
It has the effect of making the magnetic characteristics uniform in the circumferential direction.
However, on the other hand, since it is processed using abrasive grains such as diamond and alumina, burrs and protrusions are likely to occur on the substrate surface, which makes the flying characteristics of the magnetic head and the crystal growth of the magnetic medium uneven, However, there was a problem that magnetic properties such as coercive force could not be expected to improve.
【0005】なお、この種のテクスチャ加工に関連する
ものとしては、例えば特開昭62−262227号、特
開昭63−42019号、特開昭63−42027号、
特開昭63−249933号等の公報が挙げられる。Note that, as for those related to this kind of texturing, for example, JP-A-62-262227, JP-A-63-42019, JP-A-63-42027,
Publications such as JP-A-63-249933 are mentioned.
【0006】[0006]
【発明が解決しようとする課題】したがって本発明は上
記のような現状に鑑みて為されたものであり、その目的
とするところは従来のテクスチャ加工技術の問題を解消
することにあり、ヘッドの浮上特性を損なわず、且つ、
磁気特性を向上させることのできる改良された基板の表
面加工技術を有する薄膜磁気ディスクの製造方法を提供
することにある。SUMMARY OF THE INVENTION Therefore, the present invention has been made in view of the above situation, and an object thereof is to solve the problem of the conventional texturing technique. Without impairing the floating characteristics, and
It is an object of the present invention to provide a method for manufacturing a thin film magnetic disk having an improved substrate surface processing technique capable of improving magnetic characteristics.
【0007】[0007]
【課題を解決するための手段】上記目的を達成するため
に本発明では、磁性膜等の成膜前に下地Ni−Pメッキ
された基板表面を砥粒の無い表面処理液と表面処理テ−
プで同心円状に擦ること(表面処理をすること)を特徴
とする。すなわち、さらに具体的に説明すれば上記目的
は、磁性媒体を支えるNi−Pメッキ基板上に、下地
膜、磁性膜、保護膜、潤滑膜を順次成膜する工程を有す
る薄膜磁気ディスクの製造方法において、前記成膜工程
の前工程としてNi−P基板表面を表面処理液と表面処
理テ−プとを用いて表面処理する工程を付加して成る薄
膜磁気ディスクの製造方法により、達成される。In order to achieve the above object, according to the present invention, the surface of a substrate plated with an underlayer Ni-P before the formation of a magnetic film or the like is treated with an abrasive-free surface treatment liquid and a surface treatment tape.
It is characterized by rubbing in a concentric circle with a bur (surface treatment). That is, more specifically, the above object is a method for manufacturing a thin film magnetic disk including a step of sequentially forming an underlayer film, a magnetic film, a protective film, and a lubricating film on a Ni-P plated substrate supporting a magnetic medium. In the method of manufacturing a thin-film magnetic disk, the step of surface-treating the surface of a Ni-P substrate with a surface treatment solution and a surface treatment tape is added as a pre-step of the film forming step.
【0008】表面処理液としては、アルコール類、もし
くは界面活性剤等の親水性の処理液を主成分とするもの
が良く、これらはそれぞれ単独でも両者を混合して併用
しても良い。As the surface treatment liquid, those containing alcohol or a hydrophilic treatment liquid such as a surfactant as a main component are preferable, and these may be used alone or in combination of both.
【0009】アルコール類としては、例えばエチレング
リコ−ル、プロピレングリコール、ポリエチレングリコ
−ル、ポリプロピレングリコール、グリセリン等の多価
アルコ−ル系、もしくは適度な粘性を持つ高級アルコ−
ルが挙げられる。Examples of alcohols include polyhydric alcohols such as ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol and glycerin, or higher alcohols having an appropriate viscosity.
There is Le.
【0010】界面活性剤としては、例えばポリオキシエ
チレン系の非イオン界面活性剤等を主成分とするものが
良く、エッチング作用を有するものを使用すると表面処
理の効果が更に良くなり好ましい。同様にエチレングリ
コ−ル等のアルコール類の処理液についても、エッチン
グ作用を有する成分を添加することは有効である。As the surfactant, for example, one containing a polyoxyethylene-based nonionic surfactant as a main component is preferable, and it is preferable to use one having an etching action because the effect of the surface treatment is further improved. Similarly, it is effective to add a component having an etching action to a treatment liquid of alcohols such as ethylene glycol.
【0011】また、表面処理テープについては、例えば
ナイロンの如き脂肪族ポリアミド、ポリエステル、セル
ロ−ス等の合成繊維を使用することが好ましい。For the surface-treated tape, it is preferable to use synthetic fibers such as aliphatic polyamide such as nylon, polyester, cellulose and the like.
【0012】[0012]
【作用】磁気ディスクの基板となるプレ−ン基板は、マ
クロ的には平らな基板でもミクロ的には表面はランダム
に小さな傷が入っている。このため、この基板上に磁性
媒体を成膜しても磁気異方性は得られない。しかし、プ
レ−ン基板に表面処理液を付けてテ−プで円周方向に擦
ることで、このランダムな傷は無くなり、擦った方向に
微細な筋が残る。この表面処理液にエッチング処理能力
を保有させれば、さらに好ましい結果を得ることができ
る。The plane substrate, which is the substrate of the magnetic disk, is a flat substrate macroscopically, but has microscopically small scratches on the surface microscopically. Therefore, magnetic anisotropy cannot be obtained even if a magnetic medium is formed on this substrate. However, when the surface treatment liquid is applied to the plane substrate and the tape is rubbed in the circumferential direction with the tape, the random scratches are eliminated, and fine streaks remain in the rubbed direction. Further favorable results can be obtained by allowing the surface treatment liquid to have etching treatment ability.
【0013】この様に、円周方向に表面処理をすること
で、この上に成膜される磁性媒体には円周方向に磁気異
方性が表れ、また、テクスチャ加工のような砥粒による
切削等で発生するバリや突起は全く発生しないためヘッ
ドの浮上特性が向上する。By thus performing the surface treatment in the circumferential direction, magnetic anisotropy appears in the circumferential direction in the magnetic medium formed on the surface of the magnetic medium. Since burrs and protrusions generated by cutting are not generated at all, the flying characteristics of the head are improved.
【0014】[0014]
【実施例】以下、本発明の一実施例を図面を用いて説明
する。 〈実施例1〉図1は、本発明の薄膜磁気ディスクの製造
プロセスの一例を示す工程図、図2は、薄膜磁気ディス
クの構造を示す一部破断斜視図、図3は、表面処理方法
を実現する装置を模式的に示す斜視図、図4は、本発明
の製造プロセスで作製した基板の磁気特性を示す特性図
である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. <Embodiment 1> FIG. 1 is a process drawing showing an example of a manufacturing process of a thin film magnetic disk of the present invention, FIG. 2 is a partially cutaway perspective view showing the structure of a thin film magnetic disk, and FIG. 3 shows a surface treatment method. FIG. 4 is a perspective view schematically showing an apparatus to be realized, and FIG. 4 is a characteristic diagram showing magnetic characteristics of a substrate manufactured by the manufacturing process of the present invention.
【0015】薄膜磁気ディスクの構成は、図2に示すよ
うに磁性媒体を支えるアルミ合金基板1、基板に適度な
固さを持たせるためのNi−Pメッキ下地膜2、磁性媒
体の磁気異方性を付けるための下地膜3、磁性膜4、磁
性膜の摩耗を保護するための保護膜5、摩耗係数を小さ
くするための潤滑膜6で構成する。ただし、本実施例で
は図2のNi−Pメッキ下地膜2にはテクスチャ加工を
施さない。As shown in FIG. 2, the structure of the thin-film magnetic disk is as follows: an aluminum alloy substrate 1 for supporting the magnetic medium, a Ni--P plated underlayer 2 for giving the substrate an appropriate hardness, and a magnetic anisotropic medium of the magnetic medium. It is composed of a base film 3 for imparting properties, a magnetic film 4, a protective film 5 for protecting the magnetic film from wear, and a lubricating film 6 for reducing the wear coefficient. However, in this embodiment, the Ni—P plating base film 2 of FIG. 2 is not textured.
【0016】以下、本実施例の薄膜磁気ディスクの製造
方法を図1の工程図にしたがって説明する。工程(a)
でディスク基板としてアルミ合金基板1を準備する。工
程(b)で基板1に無電解メッキ法によりNi−Pメッ
キ2を10〜30μm付ける。工程(c)でNi−Pメ
ッキ2の表面を砥粒、研磨粉等を含む加工液を用いて鏡
面研磨する。工程(d)で基板表面を洗浄する。The method of manufacturing the thin film magnetic disk of this embodiment will be described below with reference to the process chart of FIG. Process (a)
Then, the aluminum alloy substrate 1 is prepared as a disc substrate. In step (b), Ni-P plating 2 is applied to the substrate 1 by electroless plating to a thickness of 10 to 30 μm. In the step (c), the surface of the Ni-P plating 2 is mirror-polished using a working liquid containing abrasive grains, polishing powder and the like. The substrate surface is washed in step (d).
【0017】工程(e)で表面処理液と処理テ−プで円
周方向に表面処理する。この表面処理方法が本発明の特
徴点であり、図3はそれを実現する装置の一例を示して
いる。表面処理方法としては、同図(a)に示すように
処理液7を、基板8とそれに直交して回転移動する処理
テ−プ9との間に滴下しながら、しかもコンタクトロ−
ラ−10で押し付けながら基板8を回転させる方法、同
図(b)に示すように基板8に処理液7をスプレ−で吹
き付けながら、しかも同様にコンタクトロ−ラ−10で
押し付けながら基板8を回転させる方法等があり、ま
た、基板8をこの処理液に浸漬した状態で行うこともで
きる。In step (e), a surface treatment is carried out in the circumferential direction with a surface treatment liquid and a treatment tape. This surface treatment method is a feature of the present invention, and FIG. 3 shows an example of an apparatus for realizing it. As the surface treatment method, as shown in FIG. 3A, the treatment liquid 7 is dropped between the substrate 8 and the treatment tape 9 which is rotationally moved orthogonally thereto, and the contact roll is used.
A method of rotating the substrate 8 while pressing it with a roller 10, as shown in FIG. 2B, spraying the treatment liquid 7 onto the substrate 8 and pressing the substrate 8 with a contact roller 10 in the same manner. There is a method of rotating the substrate, or the substrate 8 may be immersed in the treatment liquid.
【0018】コンタクトロ−ラ10の幅は、基板8の半
径より小さい幅、半径と同じ幅、基板8の直径と同じ幅
の何れでも良い。ただし、この場合、処理テ−プ9の幅
は、ロ−ラ10の幅と同じか、又はこれ以上のものを使
用する必要がある。コンタクトロ−ラ10と処理テ−プ
9を揺動することで基板表面を均一に処理することがで
きる。The width of the contact roller 10 may be smaller than the radius of the substrate 8, the same width as the radius, or the same width as the diameter of the substrate 8. However, in this case, the width of the processing tape 9 needs to be the same as or wider than the width of the roller 10. By swinging the contact roller 10 and the processing tape 9, the substrate surface can be uniformly processed.
【0019】テ−プ9の押し付け圧は、ロ−ラ10の幅
や材質、固さ等で変わるが、通常、1〜5kgfが望ま
しく、本実施例では例えば45mm幅のポリウレタン系
のロ−ラを使用した場合、2.5kgfで行った。この
場合の押し付け圧は、最低1kgfは必要である。ま
た、ディスクの回転数は100〜1000rpmの範囲
で良いが、本実施例では600rpmとした。また、処
理時間は数秒〜数分であり、処理液の組成、処理テープ
の種類により選択する。The pressing pressure of the tape 9 varies depending on the width, material, hardness, etc. of the roller 10, but normally 1 to 5 kgf is desirable. In this embodiment, for example, a 45 mm wide polyurethane roller is used. Was used at 2.5 kgf. The pressing pressure in this case needs to be at least 1 kgf. The rotation speed of the disk may be in the range of 100 to 1000 rpm, but in this embodiment, it is set to 600 rpm. The treatment time is several seconds to several minutes, and is selected depending on the composition of the treatment liquid and the type of treatment tape.
【0020】処理テ−プ9としては、例えばナイロンの
如きポリアミド、ポリエステル、セルロ−ス等の合成繊
維でテープ状に織ったものが望ましい。処理液は、基板
8と処理テ−プ9の滑り状態と基板表面への処理効果を
付けるため、親水性の処理液が良い。例えば、処理液の
主成分としてエチレングリコ−ル、プロピレングリコー
ル、ポリエチレングリコ−ル、ポリプロピレングリコー
ル、グリセリン等の多価アルコ−ル系、また、適度な粘
性を持つ高級アルコ−ル、更に界面活性剤等が好まし
い。界面活性剤の主成分はポリオキシエチレン系の非イ
オン界面活性剤等が良い。界面活性剤の場合、エッチン
グ作用のあるものを使用することにより、表面処理の効
果は更に良くなる。同様にエチレングリコ−ル等の他の
処理液についても、エッチング作用のある液を添加する
だけでも良い。表面処理後の洗浄〔工程(f)〕を考慮
すると、洗浄用の界面活性剤を使用することにより、洗
剤の濯ぎだけで済むのでプロセスは簡単に済む利点があ
る。こうして得られた基板8は、表面状態が均一とな
り、この後の工程で磁気特性の良い薄膜磁気ディスクが
得られる。The treatment tape 9 is preferably made of a synthetic fiber such as polyamide such as nylon, polyester, or cellulose in a tape shape. The treatment liquid is preferably a hydrophilic treatment liquid in order to provide a sliding state between the substrate 8 and the treatment tape 9 and a treatment effect on the substrate surface. For example, polyhydric alcohols such as ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, glycerin, etc. as the main component of the treatment liquid, higher alcohols having appropriate viscosity, and further surfactants. Etc. are preferred. The main component of the surfactant is preferably a polyoxyethylene-based nonionic surfactant or the like. In the case of a surfactant, the effect of the surface treatment is further improved by using one having an etching action. Similarly, with respect to other processing liquids such as ethylene glycol, a liquid having an etching action may be added. Considering the cleaning [step (f)] after the surface treatment, the use of the surfactant for cleaning has an advantage that the process is simple because only the rinsing of the detergent is required. The substrate 8 thus obtained has a uniform surface state, and a thin film magnetic disk having good magnetic characteristics can be obtained in the subsequent steps.
【0021】工程(f)で表面処理後の洗浄を行なう。
工程(g)で基板8上にスパッタ方法により所定の厚み
のCr下地膜3、Co磁性膜4、C保護膜5を順次成膜
する。工程(h)で成膜時のゴミや基板上の突起等を取
るために、図3の表面加工装置を用いてテープ9だけで
表面加工処理を行なう。この場合、処理液は使用しな
い。工程(i)で潤滑剤6を塗布する。工程(j)で最
後の検査を行う。以上の工程で図2の磁気ディスクを製
造した。In step (f), cleaning after the surface treatment is performed.
In step (g), a Cr underlayer film 3, a Co magnetic film 4, and a C protective film 5 having a predetermined thickness are sequentially formed on the substrate 8 by a sputtering method. In step (h), in order to remove dust and protrusions on the substrate during film formation, surface treatment is performed only with the tape 9 using the surface treatment apparatus shown in FIG. In this case, the processing liquid is not used. The lubricant 6 is applied in the step (i). The final inspection is performed in step (j). The magnetic disk of FIG. 2 was manufactured through the above steps.
【0022】図4は、工程(e)で表面処理した基板8
に、工程(g)でCr下地膜、Co磁性膜、C保護膜を
スパッタ方法で成膜した磁気ディスクについて、磁気異
方性を測定した結果を示したものである。縦軸には円周
方向の保磁力Hc(θ)と半径方向の保磁力Hc(R)
の比を示した。Hc(θ/R)が1の場合、磁気異方性
は無く、この値が大きい方が磁気異方性が付いており磁
気特性が良いことを示す。その結果、本実施例の表面処
理をすることにより、比較のために作成した未処理(プ
レ−ン基板)基板と比べ、磁気異方性が格段に付いてい
ることが判る。なお、本実施例による表面処理Aは処理
液の主成分にプロピレングリコ−ルを使用した場合、同
じく表面処理Bの処理液はポリオキシエチレン系の界面
活性剤が主成分の洗剤を使用した場合をそれぞれ示して
いる。FIG. 4 shows the substrate 8 surface-treated in the step (e).
9 shows the results of measuring the magnetic anisotropy of the magnetic disk having the Cr underlayer film, the Co magnetic film, and the C protective film formed by the sputtering method in the step (g). The vertical axis represents the coercive force Hc (θ) in the circumferential direction and the coercive force Hc (R) in the radial direction.
The ratio of When Hc (θ / R) is 1, there is no magnetic anisotropy, and the larger this value is, the more magnetic anisotropy is attached, indicating that the magnetic characteristics are good. As a result, it can be seen that the surface treatment of this example has markedly higher magnetic anisotropy than the untreated (plain substrate) substrate prepared for comparison. The surface treatment A according to this example uses propylene glycol as the main component of the treatment liquid, and the treatment liquid of surface treatment B also uses the detergent containing polyoxyethylene-based surfactant as the main component. Are shown respectively.
【0023】〈実施例2〉従来のテクスチャ加工はダイ
ヤモンドやアルミナ等の砥粒を使って加工するため、基
板表面にバリや突起等が発生し易く、これがもとで磁気
ヘッドの浮上特性や磁性媒体の結晶成長が不均一とな
り、保磁力等の磁気特性に向上が期待できなかったが、
このような場合でもテクスチャ加工後に本発明の表面処
理工程を採用すれば表面状態が改質され磁気特性の向上
が見られる。すなわち、この実施例は、実施例1の工程
(e)に2段階の処理を行なうものであり、初めに周知
の手法でNi−Pメッキ2の表面をテクスチャ加工し、
次いで実施例1の工程(e)と同様の表面処理を行な
う。<Embodiment 2> Since the conventional texturing is performed by using abrasive grains such as diamond and alumina, burrs and protrusions are apt to occur on the substrate surface, which causes levitation characteristics and magnetic properties of the magnetic head. The crystal growth of the medium became non-uniform, and we could not expect improvement in magnetic properties such as coercive force.
Even in such a case, if the surface treatment step of the present invention is adopted after texture processing, the surface condition is modified and the magnetic properties are improved. That is, in this example, the step (e) of Example 1 is performed in two steps. First, the surface of the Ni-P plating 2 is textured by a known method,
Then, the same surface treatment as in step (e) of Example 1 is performed.
【0024】以上、本発明の具体的な代表例として二つ
の実施例を説明したが、実施例1と実施例2とを対比し
てみると、本発明の特徴はテクスチャ加工を必ずしも必
要としないので、実用的には実施例2よりも実施例1で
行なうのが望ましい。Although two embodiments have been described above as concrete examples of the present invention, comparing the first embodiment with the second embodiment, the feature of the present invention is that the texturing is not always necessary. Therefore, in practice, it is preferable to carry out the first embodiment rather than the second embodiment.
【0025】[0025]
【発明の効果】以上説明したように本発明によれば、テ
クスチャ加工のように砥粒を使った加工をしないので、
基板表面に対しては処理液と処理テ−プで擦るだけの表
面処理のため、何れも従来の問題点を解消することがで
き、所期の目的を達成することができた。すなわち、
(1)バリや突起が発生しない、(2)砥粒を使わない
ので処理後の洗浄性が良い、(3)砥粒や研磨粉を含む
加工液を使わないで表面処理だけで済むため、処理後の
洗浄が簡素になり、(4)磁気異方性が付くと共にヘッ
ドの浮上特性が向上する効果がある。As described above, according to the present invention, since processing using abrasive grains is not performed unlike texture processing,
Since the substrate surface is treated by simply rubbing it with a treatment liquid and a treatment tape, the conventional problems can be solved and the intended purpose can be achieved. That is,
(1) No burrs or protrusions are generated, (2) Cleanability after treatment is good because no abrasive grains are used, and (3) Only surface treatment is required without using a machining liquid containing abrasive grains or polishing powder. Cleaning after the treatment is simplified, and (4) magnetic anisotropy is added, and the flying characteristics of the head are improved.
【図1】本発明の一実施例を示す薄膜磁気ディスクの製
造工程図。FIG. 1 is a manufacturing process diagram of a thin-film magnetic disk showing an embodiment of the present invention.
【図2】同じく薄膜磁気ディスクの構造を示す一部破断
斜視図。FIG. 2 is a partially cutaway perspective view showing the structure of a thin film magnetic disk.
【図3】同じく表面処理方法を実現する装置例を模式的
に示した斜視図。FIG. 3 is a perspective view schematically showing an example of an apparatus that also realizes the surface treatment method.
【図4】磁気特性として円周方向(θ)と半径方向
(R)の保持力比Hc(θ/R)を示した特性図。FIG. 4 is a characteristic diagram showing a holding force ratio Hc (θ / R) in a circumferential direction (θ) and a radial direction (R) as magnetic characteristics.
1…アルミ基板、 2…Ni−P
下地膜、3…下地膜、 4…
磁性膜、5…保護膜、 6…
潤滑膜、7…処理液、 8…
Ni−P基板、9…処理テ−プ、
10…コンタクトローラー。1 ... Aluminum substrate, 2 ... Ni-P
Base film, 3 ... Base film, 4 ...
Magnetic film, 5 ... Protective film, 6 ...
Lubrication film, 7 ... Treatment liquid, 8 ...
Ni-P substrate, 9 ... Processing tape,
10 ... Contact roller.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 武尾 典幸 神奈川県小田原市国府津2880番地株式会社 日立製作所小田原工場内 (72)発明者 渡辺 正博 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Noriyuki Takeo 2880 Kozu, Odawara, Kanagawa Hitachi Odawara Factory (72) Inventor Masahiro Watanabe 292 Yoshida-cho, Totsuka-ku, Yokohama, Kanagawa Inside the technical laboratory
Claims (10)
に、下地膜、磁性膜、保護膜、潤滑膜を順次成膜する工
程を有する薄膜磁気ディスクの製造方法において、前記
成膜工程の前工程としてNi−P基板表面を表面処理液
と表面処理テ−プとを用いて表面処理する工程を付加し
て成る薄膜磁気ディスクの製造方法。1. A method of manufacturing a thin film magnetic disk, comprising a step of sequentially forming a base film, a magnetic film, a protective film, and a lubricating film on a Ni-P plated substrate supporting a magnetic medium, before the film forming step. A method of manufacturing a thin-film magnetic disk, which additionally comprises a step of surface-treating the surface of a Ni-P substrate using a surface-treating liquid and a surface-treating tape.
表面を表面処理液と表面処理テ−プとを用いて表面処理
する工程を、基板面内の円周方向に表面処理する工程と
なし、円周方向に磁気異方性を付与して成る請求項1記
載の薄膜磁気ディスクの製造方法。2. A step of surface-treating a surface of a Ni-P substrate using a surface-treating liquid and a surface-treating tape, which is a pre-step of the film-forming step, in which the surface-treating is performed in a circumferential direction of the substrate surface. 2. The method for manufacturing a thin film magnetic disk according to claim 1, wherein the step is a step of providing magnetic anisotropy in the circumferential direction.
表面を表面処理液と表面処理テ−プとを用いて表面処理
する工程を、処理液を付けて表面処理テ−プで基板面内
の円周方向に擦る表面処理工程として成る請求項1記載
の薄膜磁気ディスクの製造方法。3. A step of surface-treating a surface of a Ni-P substrate using a surface treatment solution and a surface treatment tape, which is a pre-step of the film forming step, by applying a treatment solution to the surface treatment tape. 2. The method of manufacturing a thin-film magnetic disk according to claim 1, which comprises a surface treatment step of rubbing the substrate surface in a circumferential direction.
る請求項1記載の薄膜磁気ディスクの製造方法。4. The method for manufacturing a thin film magnetic disk according to claim 1, wherein the surface treatment liquid is a hydrophilic liquid.
与して成る請求項1記載の薄膜磁気ディスクの製造方
法。5. A method of manufacturing a thin film magnetic disk according to claim 1, wherein the surface treatment liquid is provided with an etching function.
び界面活性剤の少なくとも1種で構成して成る請求項4
もしくは5記載の薄膜磁気ディスクの製造方法。6. The surface treatment liquid is composed mainly of at least one of alcohols and surfactants.
Alternatively, the method for manufacturing the thin film magnetic disk according to the item 5.
高級アルコ−ルの少なくとも1種で構成して成る請求項
6記載の薄膜磁気ディスクの製造方法。7. The method of manufacturing a thin film magnetic disk according to claim 6, wherein the alcohol is composed of at least one of a polyhydric alcohol and a higher alcohol.
非イオン界面活性剤で構成して成る請求項6記載の薄膜
磁気ディスクの製造方法。8. The method of manufacturing a thin film magnetic disk according to claim 6, wherein the surfactant is a polyoxyethylene-based nonionic surfactant.
成る請求項1記載の薄膜磁気ディスクの製造方法。9. The method of manufacturing a thin film magnetic disk according to claim 1, wherein the surface-treated tape is made of synthetic fiber.
ル及びセルロ−スの少なくとも1種の繊維で構成して成
る請求項9記載の薄膜磁気ディスクの製造方法。10. A method of manufacturing a thin film magnetic disk according to claim 9, wherein the synthetic fiber is composed of at least one fiber selected from the group consisting of polyamide, polyester and cellulose.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16448192A JP3261161B2 (en) | 1992-06-23 | 1992-06-23 | Method of manufacturing thin-film magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16448192A JP3261161B2 (en) | 1992-06-23 | 1992-06-23 | Method of manufacturing thin-film magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH064861A true JPH064861A (en) | 1994-01-14 |
| JP3261161B2 JP3261161B2 (en) | 2002-02-25 |
Family
ID=15793996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16448192A Expired - Fee Related JP3261161B2 (en) | 1992-06-23 | 1992-06-23 | Method of manufacturing thin-film magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3261161B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE59611078D1 (en) | 1995-03-28 | 2004-10-14 | Brooks Automation Gmbh | Loading and unloading station for semiconductor processing systems |
| US7677859B2 (en) | 2002-07-22 | 2010-03-16 | Brooks Automation, Inc. | Substrate loading and uploading station with buffer |
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1992
- 1992-06-23 JP JP16448192A patent/JP3261161B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP3261161B2 (en) | 2002-02-25 |
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