JPH065383B2 - 紫外線を透過するペリクルとその製法 - Google Patents

紫外線を透過するペリクルとその製法

Info

Publication number: JPH065383B2
Authority: JP; Japan
Prior art keywords: pellicle; film; acetate butyrate; cellulose acetate; thickness
Prior art date: 1984-10-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP23088085A

Other languages

English (en)

Japanese (ja)

Other versions

JPS61106243A (ja

Inventor

ジヨセフ・ゴードン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

DEYU HON TAU LAB Inc

Original Assignee

DEYU HON TAU LAB Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-10-16

Filing date

1985-10-16

Publication date

1994-01-19

1985-10-16 Application filed by DEYU HON TAU LAB Inc filed Critical DEYU HON TAU LAB Inc

1986-05-24 Publication of JPS61106243A publication Critical patent/JPS61106243A/ja

1994-01-19 Publication of JPH065383B2 publication Critical patent/JPH065383B2/ja

2009-01-19 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title claims description 12
229920006217 cellulose acetate butyrate Polymers 0.000 claims description 21
238000000576 coating method Methods 0.000 claims description 20
230000005540 biological transmission Effects 0.000 claims description 19
239000011248 coating agent Substances 0.000 claims description 18
230000003595 spectral effect Effects 0.000 claims description 14
239000002904 solvent Substances 0.000 claims description 13
239000000758 substrate Substances 0.000 claims description 13
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexyloxide Natural products O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 9
125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 6
239000000377 silicon dioxide Substances 0.000 claims description 5
229920002678 cellulose Polymers 0.000 claims description 2
239000001913 cellulose Substances 0.000 claims description 2
239000010408 film Substances 0.000 claims 11
239000010409 thin film Substances 0.000 claims 2
UGZICOVULPINFH-UHFFFAOYSA-N acetic acid;butanoic acid Chemical compound CC(O)=O.CCCC(O)=O UGZICOVULPINFH-UHFFFAOYSA-N 0.000 claims 1
125000002243 cyclohexanonyl group Chemical group *C1(*)C(=O)C(*)(*)C(*)(*)C(*)(*)C1(*)* 0.000 claims 1
239000000463 material Substances 0.000 description 10
229920001220 nitrocellulos Polymers 0.000 description 10
238000001393 microlithography Methods 0.000 description 8
239000000020 Nitrocellulose Substances 0.000 description 7
238000000034 method Methods 0.000 description 7
238000009987 spinning Methods 0.000 description 7
239000011521 glass Substances 0.000 description 5
229910052751 metal Inorganic materials 0.000 description 5
239000002184 metal Substances 0.000 description 5
238000002834 transmittance Methods 0.000 description 5
238000005516 engineering process Methods 0.000 description 4
229920002301 cellulose acetate Polymers 0.000 description 3
230000000694 effects Effects 0.000 description 3
230000003287 optical effect Effects 0.000 description 3
230000005855 radiation Effects 0.000 description 3
239000004065 semiconductor Substances 0.000 description 3
239000007787 solid Substances 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 2
FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
239000006117 anti-reflective coating Substances 0.000 description 2
WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 2
229910001634 calcium fluoride Inorganic materials 0.000 description 2
238000004140 cleaning Methods 0.000 description 2
238000001914 filtration Methods 0.000 description 2
239000000203 mixture Substances 0.000 description 2
239000002245 particle Substances 0.000 description 2
229920002120 photoresistant polymer Polymers 0.000 description 2
239000000047 product Substances 0.000 description 2
IJZUPZAYWWVHIO-UHFFFAOYSA-N 1,4-dichloropentane Chemical compound CC(Cl)CCCCl IJZUPZAYWWVHIO-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
229920002799 BoPET Polymers 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
239000005041 Mylar™ Substances 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
230000002411 adverse Effects 0.000 description 1
239000012459 cleaning agent Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
230000007423 decrease Effects 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
229920006332 epoxy adhesive Polymers 0.000 description 1
239000012943 hotmelt Substances 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
239000012528 membrane Substances 0.000 description 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
229910052753 mercury Inorganic materials 0.000 description 1
238000000465 moulding Methods 0.000 description 1
125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
239000012466 permeate Substances 0.000 description 1
-1 poly (chloro-p-xylylene) Polymers 0.000 description 1
229920000052 poly(p-xylylene) Polymers 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000002023 wood Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/02—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
- B29C41/12—Spreading-out the material on a substrate, e.g. on the surface of a liquid
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2001/00—Use of cellulose, modified cellulose or cellulose derivatives, e.g. viscose, as moulding material
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2001/00—Use of cellulose, modified cellulose or cellulose derivatives, e.g. viscose, as moulding material
- B29K2001/08—Cellulose derivatives
- B29K2001/12—Cellulose acetate
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/0058—Liquid or visquous
- B29K2105/0073—Solution
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
- C08J2301/08—Cellulose derivatives
- C08J2301/14—Mixed esters

Landscapes

Engineering & Computer Science (AREA)
Chemical & Material Sciences (AREA)
Manufacturing & Machinery (AREA)
Medicinal Chemistry (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Mechanical Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Laminated Bodies (AREA)
Manufacture Of Macromolecular Shaped Articles (AREA)

JP23088085A 1984-10-16 1985-10-16 紫外線を透過するペリクルとその製法 Expired - Lifetime JPH065383B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US66157784A	1984-10-16	1984-10-16
US661577		2000-09-14

Publications (2)

Publication Number	Publication Date
JPS61106243A JPS61106243A (ja)	1986-05-24
JPH065383B2 true JPH065383B2 (ja)	1994-01-19

Family

ID=24654183

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP23088085A Expired - Lifetime JPH065383B2 (ja)	1984-10-16	1985-10-16	紫外線を透過するペリクルとその製法

Country Status (5)

Country	Link
JP (1)	JPH065383B2 (it)
DE (1)	DE3536708A1 (it)
FR (1)	FR2573219B1 (it)
GB (1)	GB2165545B (it)
IT (1)	IT1187747B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA1330860C (en) *	1987-10-26	1994-07-26	Muneyuki Matsumoto	Dust-proof film
JP5950467B2 (ja) *	2013-09-24	2016-07-13	信越化学工業株式会社	ペリクル

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB716398A (en) *	1952-07-07	1954-10-06	Rose Rand	Improvements in or relating to purses or handbags
US3549248A (en) *	1967-12-15	1970-12-22	Polaroid Corp	Optical devices comprising cellulose acetate and cellulose acetate butyrate
US4453828A (en) *	1981-12-02	1984-06-12	Advanced Semiconductor Products, Inc.	Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes
JPS58219023A (ja) *	1982-06-15	1983-12-20	Daicel Chem Ind Ltd	樹脂薄膜の製造方法
US4482591A (en) *	1983-03-08	1984-11-13	J. T. Baker Chemical Company	Polyvinyl butyrate pellicle compositions and pellicles thereof for projection printing

1985
- 1985-09-25 GB GB08523609A patent/GB2165545B/en not_active Expired
- 1985-10-02 IT IT22329/85A patent/IT1187747B/it active
- 1985-10-03 FR FR858514692A patent/FR2573219B1/fr not_active Expired
- 1985-10-15 DE DE19853536708 patent/DE3536708A1/de not_active Withdrawn
- 1985-10-16 JP JP23088085A patent/JPH065383B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
IT8522329A0 (it)	1985-10-02
IT1187747B (it)	1987-12-23
GB8523609D0 (en)	1985-10-30
DE3536708A1 (de)	1986-04-17
JPS61106243A (ja)	1986-05-24
FR2573219B1 (fr)	1989-02-03
GB2165545A (en)	1986-04-16
FR2573219A1 (fr)	1986-05-16
GB2165545B (en)	1988-03-30

Publication	Publication Date	Title
US4861402A (en)	1989-08-29	Method of making a cellulose acetate butyrate pellicle
US4657805A (en)	1987-04-14	Dust cover superior in transparency for photomask reticle use and process for producing the same
TWI470343B (zh)	2015-01-21	Production method of photomask mask film and mask for dust film
US5168001A (en)	1992-12-01	Perfluoropolymer coated pellicle
US20090042107A1 (en)	2009-02-12	Pellicle for high numerical aperture exposure device
JPH065383B2 (ja)	1994-01-19	紫外線を透過するペリクルとその製法
US4796973A (en)	1989-01-10	Pellicle structure for transmission of mid ultraviolet light
KR101902262B1 (ko)	2018-09-28	수지 증착 코팅층을 구비한 펠리클 프레임
JPS6322576B2 (it)	1988-05-12
EP1843201B1 (en)	2012-01-18	Pellicle for lithography
FR2486259A1 (fr)	1982-01-08	Procede pour la realisation de configurations en relief de surface, en vue d'applications micro-lithographiques
US5234742A (en)	1993-08-10	Pellicle for lithography
JP4371458B2 (ja)	2009-11-25	ペリクルの製造方法
KR20120081667A (ko)	2012-07-20	펠리클 막 및 그 제조방법
JP3302268B2 (ja)	2002-07-15	ペリクルの製造方法
US5100957A (en)	1992-03-31	Protective dust cover for photomask or reticle
JPH06100826B2 (ja)	1994-12-12	リソグラフイー用ペリクル
JPS63163463A (ja)	1988-07-06	フオトマスク、レチクルの保護防塵体
JPH06230560A (ja)	1994-08-19	ペリクル
JPS63163462A (ja)	1988-07-06	マスクの保護防塵体
JP3810226B2 (ja)	2006-08-16	有機薄膜体及びその製造方法
JPH01179946A (ja)	1989-07-18	剥離性の改良されたマスクの保護防塵体
JP2790850B2 (ja)	1998-08-27	ペリクル用セルロース薄膜
JPS6042708A (ja)	1985-03-07	着色パタ−ンの製造方法
JPH0461892B2 (it)	1992-10-02