JPH0680452B2 - Liquid crystal filling cell - Google Patents

Liquid crystal filling cell

Info

Publication number
JPH0680452B2
JPH0680452B2 JP61243764A JP24376486A JPH0680452B2 JP H0680452 B2 JPH0680452 B2 JP H0680452B2 JP 61243764 A JP61243764 A JP 61243764A JP 24376486 A JP24376486 A JP 24376486A JP H0680452 B2 JPH0680452 B2 JP H0680452B2
Authority
JP
Japan
Prior art keywords
panel
liquid crystal
cell
adhesive layer
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61243764A
Other languages
Japanese (ja)
Other versions
JPS64517A (en
JPH01517A (en
Inventor
顕 小川
久夫 星
淳 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP61243764A priority Critical patent/JPH0680452B2/en
Publication of JPS64517A publication Critical patent/JPS64517A/en
Publication of JPH01517A publication Critical patent/JPH01517A/en
Publication of JPH0680452B2 publication Critical patent/JPH0680452B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は液晶表示装置に係わり、更に詳細には、強誘電
性液晶を封入すると好適な液晶封入用セルに関する。
The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal encapsulating cell that is suitable for encapsulating a ferroelectric liquid crystal.

(従来技術) 第3図にツイストネマチック液晶(以下TN型液晶と略
す)をもちいた透過型液晶表示装置の一例をしめす。光
源(1)は三波長型螢光灯・自然光等であり、光源
(1)を出た光は偏光子(2)、透明基板(3)、画素
電極(4)、配向膜(5)、液晶(6)、配向膜
(7)、対向電極(8)、透明基板(9)、検光子(1
0)を通過する。液晶(6)はスペーサー(11)で一定
間隔に保たれ、又封止材(12)で外気から保護される。
画素電極(4)と対向電極(8)間に電圧を印加すると
表示装置として動作する。液晶(6)の厚みは、従来の
TN型液晶・ゲストホスト型液晶(以下GH型液晶と略
す。)では5μないし10μであって、液晶(6)の厚
み、即ち電極間隔はスペーサー(11)で規制していた。
スペーサー(11)は従来ガラスファイバー、ガラスビー
ズ、樹脂ビーズ等を適宜、散布するだけで第一パネル
(A)と第二パネル(B)とを接合していなかった。第
一パネル(A)と第二パネル(B)の接合はもっぱら封
止材(12)が担い、該封止材(12)は予め第一パネル
(A)または第二パネル(B)にシルクスクリーン等で
接着剤を印刷した後、二つのパネルを密着して、加熱硬
化させていた。
(Prior Art) FIG. 3 shows an example of a transmissive liquid crystal display device using a twisted nematic liquid crystal (hereinafter abbreviated as TN type liquid crystal). The light source (1) is a three-wavelength fluorescent lamp, natural light, etc., and the light emitted from the light source (1) is a polarizer (2), a transparent substrate (3), a pixel electrode (4), an alignment film (5), Liquid crystal (6), alignment film (7), counter electrode (8), transparent substrate (9), analyzer (1
Pass 0). The liquid crystal (6) is kept at a constant interval by the spacer (11) and is protected from the outside air by the sealing material (12).
When a voltage is applied between the pixel electrode (4) and the counter electrode (8), it operates as a display device. The thickness of the liquid crystal (6) is
The thickness of the TN type liquid crystal / guest host type liquid crystal (hereinafter abbreviated as GH type liquid crystal) is 5 to 10 μm, and the thickness of the liquid crystal (6), that is, the electrode interval is regulated by the spacer (11).
Conventionally, the spacer (11) did not join the first panel (A) and the second panel (B) only by appropriately spraying glass fiber, glass beads, resin beads and the like. The joining of the first panel (A) and the second panel (B) is solely carried out by the encapsulating material (12), and the encapsulating material (12) is previously silk-coated on the first panel (A) or the second panel (B). After printing the adhesive with a screen or the like, the two panels were brought into close contact with each other and cured by heating.

(発明が解決しよとする問題点) 最近、強誘電性液晶(以下単にフェロ液晶と称する)の
特性が明らかになり、応答性・コントラスト比・メモリ
ー効果・広視野角等の卓越性が注目され、表示装置への
展開が多方面で検討されている。フェロ液晶の特徴を発
現させるためには、液晶封入用セルの電極間隔である液
晶の厚みをセル全域にわたり十分狭く、即ち2μ以下、
望ましくは1μ以下に保持するのが好ましい。しかし、
従来スペーサーとして使われていた前記ガラスファイバ
ー、ガラスビーズ、樹脂ビーズ等の外径を2μ以下の高
精度に加工するのが困難であるばかりか、散布作業時の
工程で塵埃等による汚染があって、電極間隔を2μ以下
に保つことが困難であった。更にまた封止材(12)を2
μ以下に均一に印刷することも極めて困難であった。従
って均一な電極間隔とすることが出来ず、実用的な強誘
電性液晶封入用セルの製作ができなかった。
(Problems to be solved by the invention) Recently, characteristics of ferroelectric liquid crystal (hereinafter simply referred to as ferro liquid crystal) have been clarified, and attention has been paid to excellence in response, contrast ratio, memory effect, wide viewing angle, etc. Therefore, the development to the display device has been studied in various fields. In order to bring out the characteristics of the ferro-liquid crystal, the thickness of the liquid crystal which is the electrode interval of the liquid crystal encapsulation cell is sufficiently narrow over the entire cell, that is, 2 μm or less,
It is desirable to keep it at 1 μm or less. But,
Not only is it difficult to process the outer diameter of the glass fibers, glass beads, resin beads, etc., which were conventionally used as spacers, with a precision of 2μ or less, and there is contamination by dust etc. in the process of spraying work. However, it was difficult to keep the electrode spacing at 2 μm or less. Furthermore, the sealing material (12) is 2
It was also extremely difficult to print evenly to a size of μ or less. Therefore, a uniform electrode interval cannot be obtained, and a practical ferroelectric liquid crystal encapsulating cell cannot be manufactured.

また第一パネル(A′)と第二パネル(B′)の隙間が
極端に狭いため、シールおよびスペーサー部分の電気的
絶縁性が不足する。そのために十分な印可電圧を液晶に
加えることができず、液晶を駆動するための障害となっ
ていた。
Further, since the gap between the first panel (A ') and the second panel (B') is extremely narrow, the electrical insulation properties of the seal and the spacer portion are insufficient. Therefore, a sufficient applied voltage cannot be applied to the liquid crystal, which is an obstacle to driving the liquid crystal.

(問題点を解決するための具体的手段) すなわち、本発明は、透明基板上に少なくとも透明な画
素電極および該画素電極上に配向膜を設けた第一パネル
と、透明基板上に少なくとも透明な対向電極を設けた第
二パネルの間に、強誘電性液晶を封入すべく設けられた
液晶封入用セルにおいて、液晶セル表示面に略均等かつ
微細パターン状をなし、前記第一パネルと第二パネルの
それぞれの面にて接着している接着層として、かつ非画
素部を遮光すべく黒色顔料を含有してなる遮光層とし
て、かつセルギャップを維持するスペーサーとしての構
成を兼ねる部材を、第一パネルと第二パネルの間に設け
ることにより、第一パネルと第二パネルの間を2μm以
下にしたことを特徴とする液晶封入用セルである。
(Specific Means for Solving Problems) That is, according to the present invention, at least a transparent pixel electrode on a transparent substrate and a first panel provided with an alignment film on the pixel electrode, and at least a transparent substrate on the transparent substrate. In the liquid crystal encapsulation cell provided to enclose the ferroelectric liquid crystal between the second panels provided with the counter electrodes, the liquid crystal cell display surface has a substantially uniform and fine pattern, and the first panel and the second panel A member that also serves as an adhesive layer that adheres to each surface of the panel, a light-shielding layer containing a black pigment to shield the non-pixel portion from light, and a spacer that maintains the cell gap, The liquid crystal encapsulating cell is characterized in that the distance between the first panel and the second panel is set to 2 μm or less by providing the cell between the first panel and the second panel.

本発明の具体的な実施例を示す図面に基いて詳細に説明
する。
A detailed description will be given based on the drawings showing a specific embodiment of the present invention.

第1図(イ)及び第1図(ロ)で本発明になる液晶封入
用セルの構成を示す。透明基板(3)上にセグメント表
示もしくはマトリクス表示のための透明な画素電極
(4)を設け、更に該画素電極(4)上に配向膜(5)
を設けた第1パネル(A′)と、透明基板(9)上にセ
グメント表示あるいはマトリクス表示に対応して透明な
対向電極(8)を設ける。該対向電極(8)上に、必要
に応じ、絶縁膜(13)を形成した第2パネル(B′)と
を対峙させた状態で、液晶セル表示面の全面に略平均し
て微細パターン状に設けられ、スペーサーと遮光層とを
兼ねる該接着層(以下、単に接着層と称する。)(1
4′)で第一パネル(A′)と第二パネル(B′)とを
接合する。封止材(12)は接着層(14)と同様にして形
成することができる。また、必要に応じ第1図(ハ)に
示すように接着層(14)の近傍に該接着層(14)と同一
膜厚である剛性の補助スペーサー(14′)を設けてもよ
い。透明基板(3)及び透明基板(9)は、厚み0.5mm
ないし1.5mmのガラス基板が適応でき、光学研磨をした
無アルカリ金属ガラスが好ましいが、酸化硅素をコート
した青板ガラスでもよい。画素電極(4)及び対向電極
(8)は酸化スズ、酸化インジューム又はその混合物
(ITO)をスパッタ蒸着法等で成膜し、常法に従って任
意形状にパターン加工する。配向膜(5)はポリビニル
アルコール、ポリイミド等をオフセット印刷、スピンコ
ータ等で塗布・乾燥後必要に応じ適宜パターン化したラ
ビングする。また、配向膜(5)としてSiO2の斜方蒸着
等も適応できる。絶縁膜(13)は必要に応じSiO2又はAl
2O3等をスパッター等により膜厚0.2μmないし0.5μm
に形成する。絶縁膜(13)は耐圧性を向上させる。接着
層(14)はカゼイン、グリュー、ゼラチン、低分子量ゼ
ラチン、ノボラック樹脂、ゴム、ポリビニルアルコー
ル、ビニルポリマー、アクリレート樹脂、ポリアクリル
アミド、ビスフェノール樹脂、ポリイミド、ポリエステ
ル、ポリウレタン、またはポリアミドから選択される少
なくとも一種の樹脂からなるか、あるいは、これら上記
の樹脂から選択される少なくとも一種の樹脂を感光性樹
脂化したものからなる。付言すれば、ここで言うゴムと
は、イソプレン系環化ゴム、ブタジエン系環化ゴムが好
ましい。第1図(ロ)に示す様に表示面の全面にわたり
均等に分布形成する。該接着層(14)の膜厚は2μm以
下好ましくは1μm以下である。また該接着層(14)の
形状としてはドット又はライン状のいずれでもよく、大
きさは表示効果を損わない範囲で十分広いことが望まし
い。該接着層(14)を遮光性を持つ部材にするために
は、黒色顔料等を含有させることにより行なう。そし
て、この該接着層(14)の材料を表示装置中の遮光すべ
き非画素領域に対して適宜にパターニングすることによ
り形成される。
1 (a) and 1 (b) show the structure of the liquid crystal encapsulating cell according to the present invention. A transparent pixel electrode (4) for segment display or matrix display is provided on a transparent substrate (3), and an alignment film (5) is further provided on the pixel electrode (4).
A transparent counter electrode (8) corresponding to segment display or matrix display is provided on the first panel (A ') provided with and the transparent substrate (9). If necessary, a second panel (B ') having an insulating film (13) formed thereon is provided on the counter electrode (8) so as to face the entire surface of the liquid crystal cell, and the average pattern is a fine pattern. The adhesive layer (hereinafter, simply referred to as an adhesive layer) which is provided on the substrate and serves as a spacer and a light shielding layer (1).
The first panel (A ') and the second panel (B') are joined at 4 '). The sealing material (12) can be formed in the same manner as the adhesive layer (14). If necessary, a rigid auxiliary spacer (14 ') having the same film thickness as the adhesive layer (14) may be provided near the adhesive layer (14) as shown in FIG. Transparent substrate (3) and transparent substrate (9) have a thickness of 0.5 mm
A glass substrate of 1.5 mm to 1.5 mm is applicable, and an alkali metal glass which is optically polished is preferable, but a soda lime glass coated with silicon oxide may be used. For the pixel electrode (4) and the counter electrode (8), tin oxide, indium oxide or a mixture thereof (ITO) is formed into a film by a sputter deposition method or the like, and patterned into an arbitrary shape according to a conventional method. The alignment film (5) is formed by applying polyvinyl alcohol, polyimide or the like by offset printing, coating with a spin coater or the like, and then rubbing appropriately patterned if necessary. Further, as the orientation film (5), oblique vapor deposition of SiO 2 or the like can be applied. The insulating film (13) is made of SiO 2 or Al if necessary.
The film thickness of 2 O 3 etc. is 0.2 μm to 0.5 μm by sputtering etc.
To form. The insulating film (13) improves pressure resistance. The adhesive layer (14) is at least one selected from casein, glue, gelatin, low molecular weight gelatin, novolac resin, rubber, polyvinyl alcohol, vinyl polymer, acrylate resin, polyacrylamide, bisphenol resin, polyimide, polyester, polyurethane, or polyamide. Or a resin obtained by converting at least one resin selected from the above resins into a photosensitive resin. In addition, the rubber referred to herein is preferably an isoprene-based cyclized rubber or a butadiene-based cyclized rubber. As shown in FIG. 1 (b), it is formed uniformly over the entire display surface. The thickness of the adhesive layer (14) is 2 μm or less, preferably 1 μm or less. The shape of the adhesive layer (14) may be either dot or line, and the size is preferably sufficiently wide so as not to impair the display effect. In order to make the adhesive layer (14) a member having a light-shielding property, a black pigment or the like is contained. Then, the adhesive layer (14) is formed by appropriately patterning the material of the adhesive layer (14) with respect to the non-pixel region in the display device to be shielded from light.

さらに付言すると、近時の液晶表示装置はカラー表示を
するものが賞用されているが、この場合は、カラーフィ
ルター層を第一パネルまたは第二パネルのいずれか一方
に設けることになる。カラーフィルターは透明基板と透
明電極(画素電極または対向電極)の間に介在させる構
造と、透明電極の上方に設ける構造があり、いずれも本
発明の実施を妨げない。必要に応じて液晶と接する最上
面に配向膜を設ける。
In addition, although a liquid crystal display device of recent years has been favorably used as a liquid crystal display device, in this case, the color filter layer is provided on either the first panel or the second panel. The color filter has a structure in which it is interposed between the transparent substrate and the transparent electrode (pixel electrode or the counter electrode) and a structure in which it is provided above the transparent electrode, both of which do not hinder the practice of the present invention. An alignment film is provided on the uppermost surface that contacts the liquid crystal, if necessary.

また、接着層が対向する透明電極の間にあって電荷のリ
ークを生じる惧れがある場合には、電極を有するパネル
と接着層の間に絶縁層を介在させる手段がある。他の手
段として、透明電極がパターン状(例えば万線パター
ン、セグメントパターン)に形状されている時は、接着
層を設ける位置を、透明電極が存在しない部分に選択設
定して、すなわち、画素電極および対向電極の両方と電
気的に接しないか、あるいは一方のみと電気的に接する
位置に接着層を設ければ良い。
Further, when there is a possibility that charge leakage may occur between the transparent electrodes where the adhesive layers face each other, there is a means for interposing an insulating layer between the panel having the electrodes and the adhesive layer. As another means, when the transparent electrode is formed in a pattern (for example, a line pattern or a segment pattern), the position where the adhesive layer is provided is selectively set to a portion where the transparent electrode does not exist, that is, the pixel electrode. The adhesive layer may be provided at a position where it does not make electrical contact with both of the counter electrode and the counter electrode, or makes electrical contact with only one of them.

接着層(14)の形成方法について具体的に述べると、第
一パネルの配向膜(5)又は、第二パネルの対向電極
(8)上あるいは、必要に応じ形成された絶縁膜(13)
上の一方又は、両方にカゼイン、グリュー、ゼラチン、
ノボラック、ゴム、ポリビニルアルコール、ビニルポリ
マー、アクリレート、アクリルアミド、ビスフェノー
ル、ポリイミド、ポリエステル、ポリウレタン、ナイロ
ン系の樹脂または上記樹脂を感光性樹脂化したもの等の
選択される少なくとも一種類をスピンナーで塗布後乾燥
し、感光性を有する場合はそのままで、また感光性が無
い場合はその上にフォトレジストをスピンナーで塗布後
乾燥してから任意形状のパターン露光後、常法であるフ
ォトエッチング法に従って現像する。また必要に応じて
ウエットまたはドライエッチングをしてパターン化す
る。また不要なレジストを除去、洗浄する。次に第一パ
ネル(A′)と第二パネル(B′)を対峙させ、パネル
全面に均一に加圧または、第一パネル(A′)と第二パ
ネル(B′)に挾まれた空間を減圧にしながらカゼイ
ン、グリュー、ゼラチン、低分子量ゼラチン、ノボラッ
ク樹脂、ゴム、ポリビニルアルコール、ビニルポリマ
ー、アクリレート樹脂、ポリアクリルアミド、ビスフェ
ノール樹脂、ポリイミド、ポリエステル、ポリウレタ
ン、ポリアミド系の樹脂または上記樹脂を感光性樹脂化
したものの軟化温度に加熱して、一定時間保持した後冷
却してから加圧状態を解除する。以上の工程で第一パネ
ル(A′)と第二パネル(B′)の同位置に接着層(1
4)を形成し、位置合わせ後接合することにより接着強
度はより強化される。第1図(ハ)に示すように接着層
(14)の近傍に膜厚が等しい補助スペーサー(14′)を
形成することにより、第一パネル(A′)と第二パネル
(B′)加熱加圧時に接着層(14)が広がることを防ぐ
ことができる。とくに透明基板(3)及び透明基板
(9)の平面性が劣る状態にあると均一に加圧した場合
でもパネル全面内で局部的に圧力差が生じ、圧力の集中
した部分で接着層(14)が広がり易く、かかる場合に極
めて有効である。
The method of forming the adhesive layer (14) will be described in detail. An insulating film (13) formed on the alignment film (5) of the first panel or the counter electrode (8) of the second panel or formed as necessary.
Casein, mulberry, gelatin on one or both of the above,
At least one selected from novolac, rubber, polyvinyl alcohol, vinyl polymer, acrylate, acrylamide, bisphenol, polyimide, polyester, polyurethane, nylon resin or photosensitive resin of the above resin is applied with a spinner and dried. If it has photosensitivity, it is left as it is. If it has no photosensitivity, it is coated with a spinner on it, dried, exposed to a pattern of an arbitrary shape, and developed according to a conventional photoetching method. If necessary, wet or dry etching is performed to form a pattern. Also, unnecessary resist is removed and washed. Next, the first panel (A ′) and the second panel (B ′) are faced to each other, and the entire surface of the panel is uniformly pressed or a space sandwiched between the first panel (A ′) and the second panel (B ′). While reducing the pressure, casein, glue, gelatin, low molecular weight gelatin, novolac resin, rubber, polyvinyl alcohol, vinyl polymer, acrylate resin, polyacrylamide, bisphenol resin, polyimide, polyester, polyurethane, polyamide resin or the above resin is photosensitive. The resin is heated to the softening temperature, held for a certain period of time, cooled, and then released from the pressurized state. Through the above steps, the adhesive layer (1) is formed at the same position on the first panel (A ') and the second panel (B').
By forming 4) and aligning and then joining, the adhesive strength is further strengthened. By forming an auxiliary spacer (14 ') having the same film thickness in the vicinity of the adhesive layer (14) as shown in FIG. 1 (c), the first panel (A') and the second panel (B ') are heated. It is possible to prevent the adhesive layer (14) from spreading when pressure is applied. Especially, when the flatness of the transparent substrate (3) and the transparent substrate (9) is inferior, even if pressure is applied uniformly, a pressure difference locally occurs within the entire panel surface, and the adhesive layer (14 ) Easily spreads and is extremely effective in such a case.

また第1図(ニ)示すように接着層を2層以上の多層構
造にすることによりガラスとの接着性、パターニング
性、パネル間接着時の接着性の良い物を種々組み合わせ
て作る事が出来る。これによりパネル作製時の制約が緩
和される。例えば、ノボラック系ホトレジストのAZ1350
(米国シップレイファーイースト社製製品)はパネル間
接着時の接着性は良いが接着時の加熱で極度に柔らかく
なり、セルギャップの精度磯持が難しくなる。そこで、
ポリイミドまたはアクリル酸樹脂を塗布パターニングし
てその上にAZ1350の接着層を作る事によりセルギャップ
の精度がよく、再現性の高い構造となる。このようにパ
ネル作製時の制約緩和に極めて有効であり、またこのよ
うな処理により実用的なパネル作製が初めて可能となっ
た。
Further, as shown in FIG. 1 (d), by forming the adhesive layer into a multi-layered structure of two or more layers, it is possible to make various combinations of materials having good adhesiveness to glass, patterning property, and adhesiveness between panels. . This alleviates the restrictions on the panel fabrication. For example, AZ1350, a novolac photoresist
(A product manufactured by Shipray Far East Co., Ltd. in the United States) has good adhesiveness when bonding between panels, but it becomes extremely soft when heated during bonding, making it difficult to maintain the accuracy of the cell gap. Therefore,
By applying and patterning a polyimide or acrylic acid resin and forming an adhesive layer of AZ1350 on it, the cell gap is highly accurate and the structure has high reproducibility. In this way, it is extremely effective in relaxing the constraints during the panel fabrication, and such treatment made it possible for the first time to produce a practical panel.

本発明の従来技術との際立った相違点は接着層(14)に
ある。従来技術ではスペーサー(11)は、第一パネル
(A)と第二パネル(B)とを接着する役割は無かった
のに対して、本発明になる接着層(14)はスペーサー
(11)の役割と同時に第一パネル(A′)と第二パネル
(B′)とを強固に接着している点にある。更に接着層
(14)は任意の場所に任意の大きさで意図的に設けるこ
とができるので表示効果を損なうことがない。接着層
(14)にカゼイン、グリュー、ゼラチン、低分子量ゼラ
チン、ノボラック樹脂、ゴム、ポリビニルアルコール、
ビニルポリマー、アクリレート樹脂、ポリアクリルアミ
ド、ビスフェノール樹脂、ポリイミド、ポリエステル、
ポリウレタン、ポリアミド系の樹脂またはこれらのホト
レジスト等を使用することにより、加熱溶融して接着さ
せることにより強固な接着層(14)を得る。また絶縁膜
を介在すれば上下電極間の電気絶縁性の向上により実用
的駆動が可能となったところにある。
The significant difference between the present invention and the prior art lies in the adhesive layer (14). In the prior art, the spacer (11) did not play a role of adhering the first panel (A) and the second panel (B), whereas the adhesive layer (14) according to the present invention is formed of the spacer (11). At the same time as the role, the first panel (A ') and the second panel (B') are firmly bonded. Further, since the adhesive layer (14) can be intentionally provided in any place and in any size, the display effect is not impaired. Casein, glue, gelatin, low molecular weight gelatin, novolac resin, rubber, polyvinyl alcohol,
Vinyl polymer, acrylate resin, polyacrylamide, bisphenol resin, polyimide, polyester,
By using polyurethane, polyamide-based resin, photoresists thereof, or the like, a strong adhesive layer (14) is obtained by heating, melting, and adhering. In addition, if an insulating film is interposed, the electric insulation between the upper and lower electrodes is improved and practical driving is possible.

(本発明の効果) 本発明による液晶封入用セルにより従来困難であった強
誘電性液晶を用いた液晶表示装置を構成することが可能
となった。また、接着層(14)がスペーサーの役割のみ
でなくパネルどうしの接合に用いることが可能となっ
た。またスペーサーの間隔を自由にかつ細かく調整で
き、その形状についても自由度が高い。さらに絶縁膜を
設ければ、上下電極間の絶縁性の向上によって実用的駆
動が可能となった。さらに、この封止方法について多く
の設備を必要とせず、その原料の樹脂またはそれらを感
光性樹脂化したものも安価であり、液晶層の間隙として
0.3〜2.0μ程度の封止が容易に行なうことが可能となっ
た。そして、スペーサーの役割と遮光性とを有する接着
層が、表示装置中の遮光すべき非画素部領域に存在する
ことにより、画像表示を損なうことなく液晶の厚さを薄
く且つ均一に出来、厚さ2μm以下に維持出来るように
なった。尚、特に非画素部領域に則して連続したパター
ンを有する場合には、液晶の厚さの維持能力が一層堅固
に出来た。この画像表示を損なわないことと堅固さとが
相まって、強誘電性液晶が本来持つ高速応答性、高コン
トラスト性、メモリー性そして広視野角性等を引き立た
せることにもなった。
(Effect of the present invention) The liquid crystal encapsulating cell according to the present invention makes it possible to construct a liquid crystal display device using a ferroelectric liquid crystal, which has been difficult in the past. In addition, the adhesive layer (14) can be used not only as a spacer but also for joining panels together. In addition, the spacing between the spacers can be adjusted freely and finely, and the shape is highly flexible. Further, if an insulating film is provided, the insulating property between the upper and lower electrodes is improved, so that the driving can be practically performed. Furthermore, this sealing method does not require a lot of equipment, and the raw material resins or those obtained by converting them into photosensitive resins are also inexpensive, and are used as gaps in the liquid crystal layer.
It became possible to easily perform sealing of about 0.3 to 2.0μ. Since the adhesive layer having the role of the spacer and the light shielding property is present in the non-pixel portion region of the display device to be shielded, the thickness of the liquid crystal can be made thin and uniform without impairing the image display. It can be maintained below 2 μm. In particular, in the case of having a continuous pattern in accordance with the non-pixel portion region, the ability to maintain the thickness of the liquid crystal could be made more robust. The fact that the image display is not impaired and the robustness of the liquid crystal make it possible to enhance the high-speed response, high contrast, memory, and wide viewing angle that a ferroelectric liquid crystal originally has.

<実施例1> 3インチ角厚み1.6mmのガラス基板を光学研磨し平面の
平坦性を2μm以内に加工して透明基板(3)を得た。
該透明基板(3)上に400Åの酸化インジウム〜酸化ス
ズの透明導電膜(以下ITO膜という)をスパッタリング
法で製膜し、常法のフォトエッチング法に従って線巾28
0μm、ピッチ300μm、長さ60mmの万線パターンの画素
電極(4)を形成した。次に該画素電極(4)上にポリ
イミド樹脂PIX−1400(日立化成工業株式会社製)を300
0rpmで2分間スピンナーコート後80℃15分、200℃30
分、300℃30分加熱した。次にラビング装置をもちいて
配向処理を行って配向膜(5)を設計第一パネル
(A′)を製造した。他方光学研磨した厚み0.5mm、3
インチ角のガラス基板の表面にITO膜をスパッタリング
法で製膜し前記同様に線巾280μm、ピッチ300μm、長
さ60mmの万線からなる対向電極(8)を形成し、更に絶
縁膜(13)を設けて第二パネル(B′)を得た。更に該
第二パネル(B′)上に、ゴム系レジストOMR−83(東
京応化工業株式会社製)に黒色顔料を添加したものの粘
度30cp、溶液3000rpmで15秒間回転塗布し、常法のフォ
トエッチング法に従って、サイズ50μm角、ピッチ150
μmのパターン露光し現像し、接着層(14)を設けた。
このときの現像後膜厚は0.6μmであった。次に第一パ
ネル(A′)と第二パネル(B′)をITO膜に万線パタ
ーンが直交するように封密着させ、1kg/cm2の圧力で加
圧し常温より5℃/1分間の昇温速度で180℃まで昇温し
1時間保持し引き続いて冷却し圧力をはずして液晶封入
用セルを製造した。これにより接着層(14)で両パネル
が接着した。このときのセル間隔は表示面の全域にわた
であった。
<Example 1> A glass substrate having a thickness of 3 inches and a thickness of 1.6 mm was optically polished and processed to have a flatness of 2 µm or less to obtain a transparent substrate (3).
A transparent conductive film of 400 Å indium oxide to tin oxide (hereinafter referred to as ITO film) is formed on the transparent substrate (3) by a sputtering method, and a line width of 28
Pixel electrodes (4) having a line pattern of 0 μm, a pitch of 300 μm and a length of 60 mm were formed. Next, a polyimide resin PIX-1400 (manufactured by Hitachi Chemical Co., Ltd.) on the pixel electrode (4)
After spinner coating at 0 rpm for 2 minutes, 80 ℃ for 15 minutes, 200 ℃ for 30 minutes
Min, heated at 300 ° C for 30 minutes. Next, an alignment treatment was performed by using a rubbing device to design an alignment film (5) to manufacture a first panel (A '). On the other hand, optically polished thickness 0.5 mm, 3
An ITO film was formed on the surface of an inch square glass substrate by a sputtering method, and a counter electrode (8) consisting of lines having a line width of 280 μm, a pitch of 300 μm and a length of 60 mm was formed in the same manner as above, and an insulating film (13) was also formed. Was provided to obtain a second panel (B '). Further, on the second panel (B '), a rubber resist OMR-83 (manufactured by Tokyo Ohka Kogyo Co., Ltd.) with a black pigment added was coated with a solution having a viscosity of 30 cp and a solution of 3000 rpm for 15 seconds by spin coating. According to the law, size 50μm square, pitch 150
A μm pattern was exposed and developed to provide an adhesive layer (14).
The film thickness after development at this time was 0.6 μm. Next, the first panel (A ') and the second panel (B') are sealed and adhered to the ITO film so that the line patterns are orthogonal to each other, and the pressure is applied at a pressure of 1 kg / cm 2 and the temperature is kept at room temperature for 5 ° C / 1 minute. The liquid crystal encapsulating cell was manufactured by raising the temperature to 180 ° C. at a temperature rising rate, maintaining the temperature for 1 hour, subsequently cooling and releasing the pressure. As a result, both panels were adhered by the adhesive layer (14). The cell spacing at this time is over the entire display surface. Met.

なお、このときのITO膜パターン加工法は以下の通りで
ある。
The ITO film pattern processing method at this time is as follows.

(1)ITO膜上にポジ型ホトレジストを塗布し90℃30分
の乾燥後マスク露光し専用現像剤で現像後130℃30分間
ポストベークした。
(1) A positive photoresist was coated on the ITO film, dried at 90 ° C. for 30 minutes, exposed to a mask, developed with a dedicated developer, and post-baked at 130 ° C. for 30 minutes.

(2)次に塩化第2鉄液及び塩酸の混合液を60℃に加熱
して前記ITO膜を浸漬してエッチングした。
(2) Next, a mixed solution of ferric chloride solution and hydrochloric acid was heated to 60 ° C. to immerse and etch the ITO film.

(3)専用リムーバーでOFPRIIを製膜し純水で洗浄し
た。
(3) OFPRII was formed into a film with a dedicated remover and washed with pure water.

また、液晶を封入するときは、液晶封入用セルを加熱オ
ーブン中でフェロ液晶(15)としてcs−1011(チッソ株
式会社製)を120℃に加熱し、封入口(16)より該フェ
ロ液晶(15)を封入して、良好な液晶表示パネルを製造
した。
Further, when the liquid crystal is sealed, the cell for liquid crystal sealing is heated in a heating oven as cs-1011 (manufactured by Chisso Corporation) as a ferro liquid crystal (15) at 120 ° C., and the ferro liquid crystal (16) is discharged from the sealing port (16). By encapsulating 15), a good liquid crystal display panel was manufactured.

<実施例2> 実施例1と同様に第一パネル(A′)に画素電極(4)
ならびに配向膜(5)を形成し、ゴム系レジストJSR−C
BR−M901(日本合成ゴム株式会社製)に黒色顔料を添加
したものの粘度25cpを2000rpmで回転塗布し、常法のフ
ォトエッチング法に従って線巾20μm、ピッチ300μm
のパターンを該画素電極(4)の余白部に接着層(14)
を形成した。次に3インチ角、厚み2.6mmのガラス基板
を研磨して透明基板(9)を得た。該透明基板(9)上
に実施例1と同様にして対向電極(8)を形成後、酸化
硅素をスパッタリングで膜厚500Åに製膜して絶縁層(1
3)を形成した。次にポリイミド樹脂であるセミコファ
インsp−910(東レ株式会社製)1gに対しエチルセロソ
ルブ0.5gの割合で稀釈撹拌し3000rpmで2分間回転塗布
後135℃で30分間乾燥した。その後全面にフォトレジス
トOFPRII(東京応化工業株式会社製)を回転塗布し、第
一パネル(A′)の接着層(14)に近接して10μm径の
丸パターンをマスク露光して、ノンメタル専用現像剤で
OFPRIIを現像すると同時に、レジストで保護されない下
層の前記セミコファインsp−910を溶解エッチングし、
引きつづいて酢酸ノルマルブチルとイソプロピルアルコ
ールの1対1容積比の混合溶剤でOFPRIIのみを溶解し
た。その後第一パネル(A′)を200℃30分、300℃30分
加熱焼成してポリイミド樹脂の補助スペーサー(14′)
を形成した。以降実施例1と同様にに第一パネルと第二
パネルを密着して加圧しながら150℃30分、200℃30分に
加熱して、補助スペーサー(14′)を有する液晶封入用
セルを製造した。なお、このときのITO膜パターン加工
法と液晶封入方法も実施例1と同様である。
<Example 2> As in Example 1, the pixel electrode (4) was formed on the first panel (A ').
And an alignment film (5) are formed, and a rubber-based resist JSR-C
BR-M901 (manufactured by Nippon Synthetic Rubber Co., Ltd.) with a black pigment added was spin-coated at a viscosity of 25 cp at 2000 rpm, and the line width was 20 μm and the pitch was 300 μm according to a conventional photo-etching method.
Adhesive layer (14) on the margin of the pixel electrode (4)
Was formed. Next, a 3-inch square glass substrate having a thickness of 2.6 mm was polished to obtain a transparent substrate (9). After forming the counter electrode (8) on the transparent substrate (9) in the same manner as in Example 1, a silicon oxide film was formed by sputtering to a film thickness of 500 Å.
3) formed. Next, 1 g of Semicofine sp-910 (manufactured by Toray Industries, Inc.), which is a polyimide resin, was diluted and stirred at a rate of 0.5 g of ethyl cellosolve, spin-coated at 3000 rpm for 2 minutes, and dried at 135 ° C. for 30 minutes. After that, a photoresist OFPRII (manufactured by Tokyo Ohka Kogyo Co., Ltd.) is spin-coated on the entire surface, and a circular pattern with a diameter of 10 μm is mask-exposed in the vicinity of the adhesive layer (14) of the first panel (A ′), and non-metal dedicated development is performed. With agent
At the same time of developing OFPRII, the semi-cofine sp-910 of the lower layer which is not protected by a resist is dissolved and etched,
Subsequently, OFPRII alone was dissolved in a mixed solvent of normal butyl acetate and isopropyl alcohol in a volume ratio of 1: 1. After that, the first panel (A ') is heated and baked at 200 ° C for 30 minutes and 300 ° C for 30 minutes, and an auxiliary spacer (14') made of polyimide resin.
Was formed. Thereafter, in the same manner as in Example 1, the first panel and the second panel were closely adhered to each other and heated to 150 ° C. for 30 minutes and 200 ° C. for 30 minutes to manufacture a liquid crystal encapsulating cell having an auxiliary spacer (14 ′). did. The ITO film pattern processing method and the liquid crystal sealing method at this time are the same as those in the first embodiment.

<実施例3> 実施例1同様な透明基板(3)上にポリイミド樹脂のセ
ミコファインsp−910、青色有機顔料及び分散助剤から
成る青色ワニスをスピンナー塗布し、125℃で30分間の
乾燥後、OFPRIIをスピンナー塗布し80℃30分間乾燥し
た。線巾150μm、ピッチ450μmの万線パターンで上記
OFPRIIを露光し、アルカリ現像液により150μm幅の未
露光部を残して上記青色ワニスをエッチングした。その
後実施例2と同様にしてOFPRIIを溶解し200℃30分、250
℃30分、300℃30分と順次昇温し青色フィルター(B)
を形成した。
Example 3 A transparent substrate (3) similar to that in Example 1 was spinner coated with a blue varnish consisting of semi-cofine sp-910 of polyimide resin, a blue organic pigment and a dispersion aid, and dried at 125 ° C. for 30 minutes. , OFPRII was applied on a spinner and dried at 80 ° C. for 30 minutes. Above with a parallel line pattern with a line width of 150 μm and a pitch of 450 μm
OFPRII was exposed to light, and the blue varnish was etched with an alkali developing solution, leaving an unexposed portion having a width of 150 μm. After that, OFPRII was dissolved in the same manner as in Example 2 at 200 ° C. for 30 minutes and 250
Blue filter (B) that is heated up to 30 ℃ for 30 minutes and 300 ℃ for 30 minutes
Was formed.

以下、第2図に示す様に順次緑フィルター(G)、赤フ
ィルター(R)を形成した。尚、各色ワニスの組成は以
下の通りであった。
Thereafter, as shown in FIG. 2, a green filter (G) and a red filter (R) were sequentially formed. The composition of each color varnish was as follows.

赤色ワニス 緑色ワニス 青色ワニス 次に該色フィルター上にITOを全面スパッタ製膜し色フ
ィルターと位置を合せながら常法のフォトエッチング法
に従ってパターン加工し線巾130μm、ピッチ150μmの
画素電極(4)及び配向膜(5)(第2図参照)を形成
した。以下実施例1と同様にして接着層を形成し第二パ
ネル(B′)を形成し、第一パネル(A′)と第二パネ
ル(B′)を接合して液晶封入用セルを製造した。
Red varnish Green varnish Blue varnish Next, ITO is sputtered on the entire surface of the color filter, and pattern processing is performed according to a conventional photo-etching method while aligning the position with the color filter. A pixel electrode (4) having a line width of 130 μm and a pitch of 150 μm and an alignment film (5) ( (See FIG. 2). Thereafter, an adhesive layer was formed in the same manner as in Example 1 to form a second panel (B '), and the first panel (A') and the second panel (B ') were joined to manufacture a liquid crystal encapsulating cell. .

さらにまた、この場合のITO膜パターン加工法と液晶封
入方法について、実施例1、実施例2で示されたものと
同一である。
Furthermore, the ITO film pattern processing method and the liquid crystal encapsulation method in this case are the same as those shown in the first and second embodiments.

<実施例4> 実施例1と同様に第一パネル(A′)に画素電極(4)
ならびに配向膜(5)を形成し、ポリビニルアルコール
系感光性樹脂“アゾベースN感光液”(岡本化学工業
(株)製)に黒色顔料を添加したものを4000rpmで回転
塗布し、常法に従って幅巾20μ、ピッチ300μの万線パ
ターンを画素電極(4)の余白に接着層(14)を形成し
た。つぎに3インチ角厚み2.6mmのガラス基板を光学研
磨し平面の平坦性を2μ以内に加工して透明基板(9)
を得た。該透明基板(9)上に400ÅのITO膜をスパッタ
リング法で成膜し、常法に従って線巾280μ、ピッチ300
μ長さ60mmの万線パターンの対向電極(8)を形成した
後、SiO2をスパッタリングで膜厚500Åに成膜して絶縁
膜(13)を形成した。つぎに“セミコファインsp−910"
((株)東レ製)1gにたいしてエチルセロソルブ0.5gの
割合で稀釈撹拌し3000rpmで2分間回転塗布後135℃で30
分間乾燥した。その後全面に“OFPRII"(東京応化工業
(株)製)を回転塗布し、第一パネル(A′)の接着層
(14)に近傍して10μ幅のパターンをマスク露光して、
ノンメタル専用現像剤でOFPRIIを現像すると同時に前記
セミコファインsp−910をエッチングする。引続き酢酸
ノルマルブチルとイソプロピルアルコールの1対1容積
比の混合溶剤でOFPRIIを溶解した。その後第一パネル
(A′)を80℃30分、200℃30分、300℃30分加熱焼成し
て補助スペーサー(14′)を形成した。他方光学研磨し
た厚み1.6mm、3インチ角のガラス基板の表面に400Åの
ITO膜をスパッタリング法で成膜し、常法であるフォト
エッチング法に従って線巾280μ、ピッチ300μ長さ60mm
の万線パターンからなる対向画素電極(8)を形成し第
二パネル(B′)を得た。以後実施例1と同様に第一パ
ネルと第二パネルを密着させ、1kg/cm2の圧力で加圧し
常温より5℃/minの昇温速度で180℃まで昇温し、1時
間保持し引き続いて冷却し圧力を外して液晶封入用セル
を製造した。この時のセル間隔は0.5μで表示面の全面
にわたり均一であった。
<Example 4> Similar to Example 1, the pixel electrode (4) was formed on the first panel (A ').
Then, an alignment film (5) was formed, and a polyvinyl alcohol-based photosensitive resin "azo base N photosensitive liquid" (manufactured by Okamoto Chemical Industry Co., Ltd.) to which a black pigment was added was spin-coated at 4000 rpm, and the width was expanded according to a conventional method. The adhesive layer (14) was formed in the blank of the pixel electrode (4) with a parallel line pattern having a pitch of 20μ and 300μ. Next, a glass substrate with a thickness of 3 inches and a thickness of 2.6 mm is optically polished and processed to have a flatness of 2 μm or less to obtain a transparent substrate (9).
Got A 400 Å ITO film was formed on the transparent substrate (9) by a sputtering method, and a line width of 280 μ and a pitch of 300 were formed according to a conventional method.
After forming a parallel line pattern counter electrode (8) having a μ length of 60 mm, SiO 2 was sputtered to a film thickness of 500 Å to form an insulating film (13). Next, "Semico Fine sp-910"
(Manufactured by Toray Industries, Inc.) 1 g of ethyl cellosolve was diluted and stirred at a ratio of 0.5 g, spin-coated at 3000 rpm for 2 minutes, and then coated at 135 ° C. for 30 minutes.
Dry for minutes. After that, "OFPRII" (manufactured by Tokyo Ohka Kogyo Co., Ltd.) is spin-coated on the entire surface, and a pattern of 10 μm width is mask-exposed near the adhesive layer (14) of the first panel (A ').
OFPRII is developed with a non-metal-dedicated developer, and at the same time, the semicofine sp-910 is etched. Subsequently, OFPRII was dissolved in a mixed solvent of normal butyl acetate and isopropyl alcohol in a volume ratio of 1: 1. Then, the first panel (A ′) was heated and baked at 80 ° C. for 30 minutes, 200 ° C. for 30 minutes, and 300 ° C. for 30 minutes to form the auxiliary spacer (14 ′). On the other hand, 400 Å is optically polished on the surface of a 3 mm square glass substrate with a thickness of 1.6 mm.
ITO film is formed by sputtering method, line width 280μ, pitch 300μ, length 60mm according to the usual photo-etching method.
The opposite pixel electrode (8) having the parallel line pattern was formed to obtain the second panel (B '). Thereafter, as in Example 1, the first panel and the second panel were brought into close contact with each other, pressurized at a pressure of 1 kg / cm 2 , heated from room temperature to 180 ° C. at a heating rate of 5 ° C./min, kept for 1 hour, and then continued. Then, the liquid crystal was sealed and the pressure was released to manufacture a cell for enclosing a liquid crystal. The cell spacing at this time was 0.5 μm, which was uniform over the entire display surface.

<実施例5> 実施例1と同様に第一パネルおよび第二パネルを作成
し、第二パネル側にカゼイン系フォトレジスト「フジレ
ジストNo.15」(富士薬品(株)製)溶液で黒色顔料を
添加したものを5000rpmで15秒間回転塗布し、常法であ
るマスク露光法に従ってサイズ50μ角、ピッチ300μ間
隔のパターン露光し現像した。このときの現像後膜厚は
0.6μであった。次に第一パネルと第二パネルを密着さ
せ、1kg/cm2の圧力で加圧し常温より5℃/minの昇温速
度で180℃まで昇温し、1時間保持し引き続いて冷却し
圧力を外して液晶封入用セルを製造した。この時のセル
間隔は0.5μで表示面の全面にわたり均一であった。
<Example 5> A first panel and a second panel were prepared in the same manner as in Example 1, and a casein photoresist "Fujiresist No. 15" (manufactured by Fuji Yakuhin Co., Ltd.) solution was used as a black pigment on the second panel side. Was added by spin coating at 5000 rpm for 15 seconds, and a pattern exposure with a size of 50 μ square and a pitch of 300 μ was performed and developed according to a conventional mask exposure method. The film thickness after development at this time is
It was 0.6μ. Next, the first panel and the second panel are brought into close contact with each other, pressurized at a pressure of 1 kg / cm 2 , heated to 180 ° C. from room temperature at a heating rate of 5 ° C./min, kept for 1 hour, and then cooled to a pressure. The cell for liquid crystal encapsulation was manufactured by removing it. The cell spacing at this time was 0.5 μm, which was uniform over the entire display surface.

<実施例6> 実施例1と同様に第一パネル(A′)に画素電極(4)
ならびに配向膜(5)を形成した。つぎに3インチ角厚
み1.6mmのガラス基板を光学研磨し平面の平坦性を2μ
以内に加工して透明基板(9)を得た。該透明基板
(9)上に400ÅのITO膜のスパッタリング法で成膜し、
常法に従って線巾280μ、ピッチ300μ長さ60mmの万線パ
ターンの対向電極(8)を形成した後、SiO2をスパッタ
リングで膜厚500Åに成膜して絶縁膜(13)を形成し
た。つぎにポリイミド樹脂の“セミコファインsp−910"
((株)東レ製)に黒色顔料を添加したものの1gにたい
してエチルセロソルブ0.5gの割合で稀釈撹拌し3000rpm
で2分間回転塗布後135℃で30分間乾燥した。その後全
面に“OFPRII"(東京応化工業(株)製)を4000rpmで回
転塗布し、接着層(14)をマスク露光して、ノンメタル
専用現像剤でOFPRIIを現像すると同時に前記セミコファ
インsp−910をエッチングする。このようにしてポリイ
ミドとOFPRIIの2層構造の接着層(14)を形成し第二パ
ネル(B′)を得た。ここで、黒色顔料を添加するの
は、前記ポリイミド樹脂とフォトレジストとのいずれか
片方でもあるいは両方でもいずれでもよい。以後実施例
1と同様に第一パネルと第二パネルを密着させ、1kg/cm
2の圧力で加圧し常温より5℃/minの昇温速度で180℃ま
で昇温し、1時間保持し引き続いて冷却し圧力を外して
液晶封入用セルを製造した。この時のセル間隔は0.5μ
で表示面の全面にわたり均一であった。
<Example 6> As in Example 1, the pixel electrode (4) was formed on the first panel (A ').
And an alignment film (5) was formed. Next, a 3-inch square glass substrate with a thickness of 1.6 mm is optically polished to obtain a flatness of 2 μm.
It was processed within to obtain a transparent substrate (9). A 400 Å ITO film is formed on the transparent substrate (9) by a sputtering method,
After forming a counter electrode (8) in a line pattern having a line width of 280 μm and a pitch of 300 μm and a length of 60 mm according to a conventional method, SiO 2 was sputtered to a film thickness of 500 Å to form an insulating film (13). Next, polyimide resin "Semicofine sp-910"
(Toray Co., Ltd.) black pigment was added to 1 g of ethyl cellosolve 0.5 g, and the mixture was diluted and stirred at 3000 rpm.
After spin coating for 2 minutes at 130 ° C., it was dried at 135 ° C. for 30 minutes. After that, "OFPRII" (manufactured by Tokyo Ohka Kogyo Co., Ltd.) is spin-coated at 4000 rpm, the adhesive layer (14) is mask-exposed, and OFPRII is developed with a non-metal-dedicated developer. Etching. In this way, a two-layer adhesive layer (14) of polyimide and OFPRII was formed to obtain a second panel (B '). Here, the black pigment may be added to either one or both of the polyimide resin and the photoresist. Thereafter, the first panel and the second panel were brought into close contact with each other in the same manner as in Example 1, and 1 kg / cm
A cell for liquid crystal encapsulation was manufactured by pressurizing at a pressure of 2 and raising the temperature from room temperature to 180 ° C. at a temperature rising rate of 5 ° C./min, holding for 1 hour and subsequently cooling and releasing the pressure. The cell spacing at this time is 0.5μ
It was uniform over the entire display surface.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の液晶封入用セルの一実施例を示すもの
であって、第1図(イ)は断面図、第1図(ロ)は平面
図、第1図(ハ)は要部拡大平面図、第1図(ニ)は他
の実施例を示す要部断面図であり、第2図は、カラーフ
ィルター付きの液晶封入セル用パネルの一実施例を示す
断面図であり、第3図は、従来のツイストネマチック型
液晶封入用セルの一例を示す断面図である。 (1)……光源、(10)……検光子、(16)……液晶封
入口 (2)……偏光子、(11)……スペーサー (3)(9)……透明基板、(12)……封止材 (4)……画素電極、(13)……絶縁膜 (5)(7)……配向膜、(14)……接着層 (6)……液晶、(14′)……補助スペーサー (8)……対向電極、(15)……フェロ液晶
FIG. 1 shows an embodiment of a liquid crystal encapsulating cell of the present invention. FIG. 1 (a) is a sectional view, FIG. 1 (b) is a plan view, and FIG. Partial enlarged plan view, FIG. 1 (d) is a cross-sectional view of an essential part showing another embodiment, and FIG. 2 is a cross-sectional view showing an embodiment of a liquid crystal sealed cell panel with a color filter, FIG. 3 is a sectional view showing an example of a conventional twist nematic type liquid crystal encapsulating cell. (1) …… Light source, (10) …… Analyzer, (16) …… Liquid crystal inlet (2) …… Polarizer, (11) …… Spacer (3) (9) …… Transparent substrate, (12 ) …… Sealant (4) …… Pixel electrode, (13) …… Insulating film (5) (7) …… Alignment film, (14) …… Adhesive layer (6) …… Liquid crystal, (14 ′) …… Auxiliary spacer (8) …… Counter electrode, (15) …… Ferro liquid crystal

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭54−651(JP,A) 特開 昭48−71596(JP,A) ─────────────────────────────────────────────────── ─── Continuation of front page (56) References JP-A-54-651 (JP, A) JP-A-48-71596 (JP, A)

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】透明基板上に少なくとも透明な画素電極お
よび該画素電極上に配向膜を設けた第一パネルと、透明
基板上に少なくとも透明な対向電極を設けた第二パネル
の間に、強誘電性液晶を封入すべく設けられた液晶封入
用セルにおいて、液晶セル表示面に略均等かつ微細パタ
ーン状をなし、前記第一パネルと第二パネルのそれぞれ
の面にて接着している接着層として、かつ非画素部を遮
光すべく黒色顔料を含有してなる遮光層として、かつセ
ルギャップを維持するスペーサーとしての構成を兼ねる
部材を、第一パネルと第二パネルの間に設けることによ
り、第一パネルと第二パネルの間を2μm以下にしたこ
とを特徴とする液晶封入用セル。
1. A strong panel between a first panel having at least a transparent pixel electrode and an alignment film provided on the pixel substrate on a transparent substrate, and a second panel having at least a transparent counter electrode on the transparent substrate. In a liquid crystal encapsulating cell provided for encapsulating a dielectric liquid crystal, an adhesive layer having a substantially uniform and fine pattern on the liquid crystal cell display surface and adhering to each surface of the first panel and the second panel. As a light-shielding layer containing a black pigment to shield the non-pixel portion, and also serving as a spacer for maintaining the cell gap, by providing a member between the first panel and the second panel, A cell for liquid crystal encapsulation, wherein the distance between the first panel and the second panel is 2 μm or less.
【請求項2】前記接着層と遮光層とスペーサーとを兼ね
る部材の近傍に、該部材と同一膜厚である剛性の補助ス
ペーサーを設けたことを特徴とする特許請求の範囲第1
項記載の液晶封入用セル。
2. A rigid auxiliary spacer having the same film thickness as the member is provided in the vicinity of the member also serving as the adhesive layer, the light shielding layer and the spacer.
The liquid crystal encapsulating cell according to the item.
【請求項3】前記接着層と遮光層とスペーサーとを兼ね
る部材が、カゼイン、グリュー、ゼラチン、低分子量ゼ
ラチン、ノボラック樹脂、ゴム、ポリビニルアルコー
ル、ビニルポリマー、アクリレート樹脂、ポリアクリル
アミド、ビスフェノール樹脂、ポリイミド、ポリエステ
ル、ポリウレタン、またはポリアミドから選択される少
なくとも一種の樹脂からなることを特徴とする特許請求
の範囲第1項記載の液晶封入用セル。
3. The member also serving as an adhesive layer, a light-shielding layer and a spacer is casein, glue, gelatin, low molecular weight gelatin, novolac resin, rubber, polyvinyl alcohol, vinyl polymer, acrylate resin, polyacrylamide, bisphenol resin, polyimide. The liquid crystal encapsulating cell according to claim 1, which is made of at least one resin selected from the group consisting of polyester, polyurethane, and polyamide.
【請求項4】前記接着層と遮光層とスペーサーとを兼ね
る部材が、カゼイン、グリュー、ゼラチン、低分子量ゼ
ラチン、ノボラック樹脂、ゴム、ポリビニルアルコー
ル、ビニルポリマー、アクリレート樹脂、ポリアクリル
アミド、ビスフェノール樹脂、ポリイミド、ポリエステ
ル、ポリウレタン、またはポリアミドから選択される少
なくとも一種の樹脂を感光性樹脂化したものからなるこ
とを特徴とする特許請求の範囲第1項記載の液晶封入用
セル。
4. The member also serving as the adhesive layer, the light-shielding layer and the spacer is casein, glue, gelatin, low molecular weight gelatin, novolac resin, rubber, polyvinyl alcohol, vinyl polymer, acrylate resin, polyacrylamide, bisphenol resin, polyimide. The cell for liquid crystal encapsulation according to claim 1, which is made of a photosensitive resin of at least one resin selected from polyester, polyurethane, or polyamide.
【請求項5】前記接着層と遮光層とスペーサーとを兼ね
る部材と、電極を有するパネルとの間に、絶縁層を介在
した特許請求の範囲第1項記載の液晶封入用セル。
5. The liquid crystal encapsulating cell according to claim 1, wherein an insulating layer is interposed between the member having the function of the adhesive layer, the light shielding layer and the spacer, and the panel having the electrode.
【請求項6】第一パネルまたは第二パネルの透明基板上
にカラーフィルタを介して画素電極または対向電極を設
け、必要に応じてその上に配向膜を配したことを特徴と
する特許請求の範囲第1項記載の液晶封入用セル。
6. A pixel electrode or a counter electrode is provided on a transparent substrate of the first panel or the second panel via a color filter, and an alignment film is arranged thereon if necessary. A cell for enclosing a liquid crystal according to item 1.
【請求項7】第一パネルまたは第二パネルの画素電極上
または対向電極にカラーフィルタを設け、必要に応じて
その上に配向膜を配したことを特徴とする特許請求の範
囲第1項記載の液晶封入用セル。
7. A color filter is provided on the pixel electrode or the counter electrode of the first panel or the second panel, and an alignment film is arranged on the color filter if necessary, and the alignment film is provided. Cell for liquid crystal filling.
【請求項8】前記接着層と遮光層とスペーサーとを兼ね
る部材が、樹脂と感光性樹脂の二重構造である特許請求
の範囲第1項記載の液晶封入用セル。
8. The liquid crystal encapsulating cell according to claim 1, wherein the member serving also as the adhesive layer, the light shielding layer, and the spacer has a double structure of resin and photosensitive resin.
【請求項9】前記接着層と遮光層とスペーサーとを兼ね
る部材が、画素電極および対向電極の両方と電気的に接
しないか、または一方のみと電気的に接する位置に設け
られている特許請求の範囲第1項記載の液晶封入用セ
ル。
9. A member, which also functions as an adhesive layer, a light-shielding layer, and a spacer, is provided at a position that does not make electrical contact with both the pixel electrode and the counter electrode, or has electrical contact with only one of them. The cell for liquid crystal encapsulation according to item 1 above.
JP61243764A 1985-10-24 1986-10-14 Liquid crystal filling cell Expired - Lifetime JPH0680452B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61243764A JPH0680452B2 (en) 1985-10-24 1986-10-14 Liquid crystal filling cell

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP23789885 1985-10-24
JP60-237898 1985-10-24
JP60-252509 1985-11-11
JP25250985 1985-11-11
JP61-174871 1986-07-25
JP17487186 1986-07-25
JP61243764A JPH0680452B2 (en) 1985-10-24 1986-10-14 Liquid crystal filling cell

Publications (3)

Publication Number Publication Date
JPS64517A JPS64517A (en) 1989-01-05
JPH01517A JPH01517A (en) 1989-01-05
JPH0680452B2 true JPH0680452B2 (en) 1994-10-12

Family

ID=27474599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61243764A Expired - Lifetime JPH0680452B2 (en) 1985-10-24 1986-10-14 Liquid crystal filling cell

Country Status (1)

Country Link
JP (1) JPH0680452B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750735Y2 (en) * 1989-06-15 1995-11-15 三洋電機株式会社 Liquid crystal display
JP3210126B2 (en) * 1993-03-15 2001-09-17 株式会社東芝 Manufacturing method of liquid crystal display device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4871596A (en) * 1971-12-25 1973-09-27
JPS54651A (en) * 1977-06-03 1979-01-06 Sumitomo Bakelite Co Liquid crystal indicator
JPS5886518A (en) * 1981-11-18 1983-05-24 Mitsubishi Electric Corp Liquid crystal display device
JPS5897023A (en) * 1981-12-04 1983-06-09 Sharp Corp Liquid crystal display cell and its production
JPS6021028A (en) * 1983-07-15 1985-02-02 Canon Inc Optical modulating element and its production

Also Published As

Publication number Publication date
JPS64517A (en) 1989-01-05

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