JPH0776308B2 - Indophenol compound and optical recording medium containing the compound - Google Patents
Indophenol compound and optical recording medium containing the compoundInfo
- Publication number
- JPH0776308B2 JPH0776308B2 JP61146560A JP14656086A JPH0776308B2 JP H0776308 B2 JPH0776308 B2 JP H0776308B2 JP 61146560 A JP61146560 A JP 61146560A JP 14656086 A JP14656086 A JP 14656086A JP H0776308 B2 JPH0776308 B2 JP H0776308B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- unsubstituted
- recording medium
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 Indophenol compound Chemical class 0.000 title claims description 28
- 230000003287 optical effect Effects 0.000 title claims description 20
- 150000001875 compounds Chemical class 0.000 title description 19
- 239000000758 substrate Substances 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 125000005843 halogen group Chemical group 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 5
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 claims description 4
- 150000004982 aromatic amines Chemical class 0.000 claims description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 4
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 claims description 4
- 125000004442 acylamino group Chemical group 0.000 claims description 3
- 125000005415 substituted alkoxy group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 description 18
- 238000000576 coating method Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 12
- 238000010521 absorption reaction Methods 0.000 description 11
- 239000000975 dye Substances 0.000 description 11
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
- 239000004926 polymethyl methacrylate Substances 0.000 description 4
- HZNVUJQVZSTENZ-UHFFFAOYSA-N 2,3-dichloro-5,6-dicyano-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(C#N)=C(C#N)C1=O HZNVUJQVZSTENZ-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000001819 mass spectrum Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 2
- LBUJPTNKIBCYBY-UHFFFAOYSA-N 1,2,3,4-tetrahydroquinoline Chemical compound C1=CC=C2CCCNC2=C1 LBUJPTNKIBCYBY-UHFFFAOYSA-N 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 239000001007 phthalocyanine dye Substances 0.000 description 2
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- DRLMMVPCYXFPEP-UHFFFAOYSA-N 2-bromo-1,3-benzothiazole Chemical group C1=CC=C2SC(Br)=NC2=C1 DRLMMVPCYXFPEP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000005138 alkoxysulfonyl group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000000987 azo dye Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- RSAZYXZUJROYKR-UHFFFAOYSA-N indophenol Chemical compound C1=CC(O)=CC=C1N=C1C=CC(=O)C=C1 RSAZYXZUJROYKR-UHFFFAOYSA-N 0.000 description 1
- 239000001013 indophenol dye Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- XDJOIMJURHQYDW-UHFFFAOYSA-N phenalene Chemical compound C1=CC(CC=C2)=C3C2=CC=CC3=C1 XDJOIMJURHQYDW-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000000858 thiocyanato group Chemical group *SC#N 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/385—Contact thermal transfer or sublimation processes characterised by the transferable dyes or pigments
- B41M5/39—Dyes containing one or more carbon-to-nitrogen double bonds, e.g. azomethine
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、インドフエノール系化合物および該化合物を
用いた光学的記録媒体に関する。TECHNICAL FIELD The present invention relates to an indophenol compound and an optical recording medium using the compound.
レーザーを用いた光学記録は、高密度の情報記録保存お
よび再生を可能とするため、近年、特にその開発がとり
すゝめられている。Optical recording using a laser has been particularly developed in recent years because it enables high-density information recording storage and reproduction.
光学記録の一例としては、光デイスクをあげることがで
きる。An optical disc can be given as an example of the optical recording.
一般に、光デイスクは、円形の基体に設けられた薄い記
録層に、1μm程度に集束したレーザー光を照射し、高
密度の情報記録を行なうものである。その記録は、照射
されたレーザー光エネルギーの吸収によつて、その個所
の記録層に、分解、蒸発、溶解等の熱的変形が生成する
ことにより行なわれる。また、記録された情報の再生
は、レーザー光により変形が起きている部分と起きてい
ない部分の反射率の差を読み取ることにより行なわれ
る。In general, an optical disc is one in which a thin recording layer provided on a circular substrate is irradiated with laser light focused to about 1 μm to perform high density information recording. The recording is performed by the absorption of the irradiated laser light energy, which causes thermal deformation such as decomposition, evaporation, and dissolution in the recording layer at that location. The recorded information is reproduced by reading the difference in reflectance between the portion where the laser light is deformed and the portion where the laser light is not deformed.
したがつて、光学記録媒体としては、レーザ光のエネル
ギーを効率よく吸収する必要があるため、記録に使用す
る特定の波長のレーザー光に対する吸収が大きいこと、
情報の再生を正確に行なうため、再生に使用する特定波
長のレーザー光に対する反射率が高いことが必要とな
る。Therefore, as the optical recording medium, since it is necessary to efficiently absorb the energy of the laser light, the absorption of the laser light of a specific wavelength used for recording is large,
In order to accurately reproduce the information, it is necessary that the reflectance with respect to the laser light of the specific wavelength used for the reproduction is high.
この種の光学的記録媒体としては、種々の構成のものが
知られている。Various types of optical recording media are known as this type of optical recording medium.
例えば、特開昭55−97033号公報には、基板上にフタロ
シアニン系色素の単層を設けたものが開示されている。
しかしながらフタロシアニン系色素は感度が低く、また
分解点が高く蒸着しにくい等の問題点を有し、さらに有
機溶媒に対する溶解性が著しく低く、塗布によるコーテ
イングに使用することができないという問題点も有して
いる。For example, JP-A-55-97033 discloses a substrate in which a single layer of a phthalocyanine dye is provided.
However, phthalocyanine dyes have the problems of low sensitivity, high decomposition point and difficulty in vapor deposition, and also have very low solubility in organic solvents and thus cannot be used for coating by coating. ing.
また、特開昭58−83344号公報にはフエナレン系色素
を、特開昭58−224793号公報にはナフトキノン系色素を
記録層に設けたものが開示されている。しかし、このよ
うな色素は蒸発しやすいという利点の反面、反射率が低
いという問題点を有している。反射率が低いとレーザー
光により記録された部分と未記録部分との反射率に関係
するコントラストは低くなり、記録された情報の再生が
困難になる。更に、一般に有機系色素は保存安定性が劣
るという問題点を有している。Further, JP-A-58-83344 and JP-A-58-224793 disclose that a recording layer is provided with a phenalene dye and a naphthoquinone dye, respectively. However, while such a dye has an advantage of being easily evaporated, it has a problem of low reflectance. If the reflectance is low, the contrast relating to the reflectance between the portion recorded by the laser beam and the unrecorded portion becomes low, and it becomes difficult to reproduce the recorded information. In addition, organic dyes generally have a problem of poor storage stability.
本発明は、蒸着が容易で、有機溶媒に対する溶解性が高
く、塗布によるコーテイングも可能で、しかも、反射率
が高く、コントラストが良好で保存性にすぐれているイ
ンドフエノール系化合物及びそれを用いた光学的記録媒
体を提供することを目的とするものである。INDUSTRIAL APPLICABILITY The present invention uses an indophenol compound which is easy to deposit, has a high solubility in an organic solvent, can be coated by coating, has a high reflectance, has a good contrast, and has excellent storage stability. It is intended to provide an optical recording medium.
本発明は、レーザー光線によつて状態変化を生ぜしめる
ことによつて記録再生を行なうための光学的記録媒体の
色素として適した下記一般式〔I〕で表わされるインド
フェノール系化合物及びそれを基板に担持させた光学的
記録媒体をその要旨とするものである。The present invention provides an indophenol-based compound represented by the following general formula [I] suitable for use as a dye of an optical recording medium for recording / reproducing by causing a state change by a laser beam and a substrate thereof. The gist of the invention is a supported optical recording medium.
一般式〔I〕 (式中、 を表わし、Kは置換もしくは、非置換の芳香族アミンの
残基を表わし、R1、R2、R3は水素原子、ハロゲン原子、
ニトロ基、置換もしくは非置換のアルキル基、置換もし
くは非置換のアルコキシ基、置換もしくは非置換のアミ
ノカルボニル基、置換もしくは非置換のカルボニルアミ
ノ基、置換もしくは非置換のアミノスルホニル基、置換
もしくは非置換のスルホニルアミノ基または置換もしく
は非置換のチオカルボニルアミノ基を表わす。) 一般式〔I〕中、R1、R2、R3で示されるアルキル基、ア
ルコキシ基、アミノカルボニル基、カルボニルアミノ
基、アミノスルホニル基、スルホニルアミノ基またはチ
オカルボニルアミノ基の置換基としては、例えば、チオ
シアナト基、ニトロ基、ハロゲン原子、シアノ基、アル
キル基、アルキルスルホニル基、ヒドロキシアルキルス
ルホニル基、アルコキシスルホニル基、アルコキシアル
コキシスルホニル基、アリルスルホニル基、アルコキシ
カルボニル基、アルコキシアルコキシカルボニル基、ア
ルコキシアルコキシアルコキシカルボニル基、アルコキ
シ基、アルコキシアルコキシ基、アルコキシアルコキシ
アルコキシ基等で置換されていてもよいフエニル基、ナ
フチル基等のアリール基;アルキル基;ベンジル基等の
アラルキル基;テトラヒドロフルフリル基;シクロヘキ
シル基等のシクロアルキル基;フエニルアミノ基、アル
キルアミノ基、ジアルキルアミノ基等のアミノ基;ニト
ロチアゾリル基、ニトロベンゾチアゾリル基、アルキル
チオチアゾアジリル基、ジシアノアルキルジアゾリル
基、ブロムベンゾチアゾール基等の窒素原子、酸素原子
もしくは硫黄原子を含む5員または6員の置換もしくは
非置換の複素環残基等を挙げることができる。General formula [I] (In the formula, Represents a residue of a substituted or unsubstituted aromatic amine, R 1 , R 2 and R 3 represent a hydrogen atom, a halogen atom,
Nitro group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkoxy group, substituted or unsubstituted aminocarbonyl group, substituted or unsubstituted carbonylamino group, substituted or unsubstituted aminosulfonyl group, substituted or unsubstituted Represents a sulfonylamino group or a substituted or unsubstituted thiocarbonylamino group. ) In the general formula [I], as a substituent of the alkyl group, alkoxy group, aminocarbonyl group, carbonylamino group, aminosulfonyl group, sulfonylamino group or thiocarbonylamino group represented by R 1 , R 2 and R 3 , For example, thiocyanato group, nitro group, halogen atom, cyano group, alkyl group, alkylsulfonyl group, hydroxyalkylsulfonyl group, alkoxysulfonyl group, alkoxyalkoxysulfonyl group, allylsulfonyl group, alkoxycarbonyl group, alkoxyalkoxycarbonyl group, alkoxy An aryl group such as a phenyl group and a naphthyl group which may be substituted with an alkoxyalkoxycarbonyl group, an alkoxy group, an alkoxyalkoxy group, an alkoxyalkoxyalkoxy group and the like; an alkyl group; an aralkyl group such as a benzyl group; Trahydrofurfuryl group; cycloalkyl group such as cyclohexyl group; amino group such as phenylamino group, alkylamino group, dialkylamino group; nitrothiazolyl group, nitrobenzothiazolyl group, alkylthiothiazoazilyl group, dicyanoalkyldiazolyl And a 5-membered or 6-membered substituted or unsubstituted heterocyclic residue containing a nitrogen atom, an oxygen atom or a sulfur atom, such as a group or a bromobenzothiazole group.
また、Kで示される置換もしくは非置換の芳香族アミン
の残基としては、例えば、テトラヒドロキノリン類、或
いは、下記一般式〔II〕 (式中、XおよびYは水素原子、アルキル基、アシルア
ミノ基、アルコキシ基またはハロゲン原子を表わし、R4
およびR5は水素原子;C1〜C20の置換もしくは非置換のア
ルキル基、アリール基またはシクロヘキシル基を表わ
す。) で示される基等が挙げられる。式中、−R4および−R5で
示されるアルキル基、アリール基またはシクロヘキシル
基の置換基としては、例えば、アルコキシ基、アルコキ
シアルコキシ基、アルコキシアルコキシアルコキシ基、
アリルオキシ基、アリール基、アリールオキシ基、シア
ノ基、ヒドロキシ基、テトラヒドロフリル基等が挙げら
れる。The residue of the substituted or unsubstituted aromatic amine represented by K is, for example, tetrahydroquinoline or the following general formula [II] (In the formula, X and Y represent a hydrogen atom, an alkyl group, an acylamino group, an alkoxy group or a halogen atom, and R 4
And R 5 represents a hydrogen atom; a C 1 -C 20 substituted or unsubstituted alkyl group, aryl group or cyclohexyl group. ) And the like. In the formula, as the substituent of the alkyl group, aryl group or cyclohexyl group represented by -R 4 and -R 5 , for example, an alkoxy group, an alkoxyalkoxy group, an alkoxyalkoxyalkoxy group,
Examples thereof include an allyloxy group, an aryl group, an aryloxy group, a cyano group, a hydroxy group, and a tetrahydrofuryl group.
前記一般式〔I〕で示されるインドフエノール系化合物
は、600〜800nmの波長帯域で吸収を有し、しかも分子吸
収係数が104〜105cm-1である。The indophenol compound represented by the general formula [I] has absorption in the wavelength band of 600 to 800 nm and has a molecular absorption coefficient of 10 4 to 10 5 cm -1 .
本発明の一般式〔I〕で示されるインドフエノール系化
合物の一般的合成は、たとえば、P.W.Vittum and G.H.B
rown,J.Am.Soc.Chem.,682235(1946)に記載に準じて行
うことができる。The general synthesis of the indophenol compound represented by the general formula [I] of the present invention can be carried out by, for example, PW Vittum and GHB
It can be performed according to the description in rown, J. Am. Soc. Chem., 68 2235 (1946).
本発明の光学的記録媒体は、基本的には基板とインドフ
エノール系化合物を含む記録層とから構成されるもので
あるが、さらに必要に応じて基板上に下引き層をまた記
録層上に保護層を設けることができる。The optical recording medium of the present invention basically comprises a substrate and a recording layer containing an indophenol compound, but if necessary, an undercoat layer may be formed on the substrate and a recording layer may be formed on the recording layer. A protective layer can be provided.
本発明における基板としては、使用するレーザー光に対
して透明または不透明のいずれでもよい。基板材料の材
質としては、ガラス、プラスチツク、紙、板状または箔
状の金属等の一般の記録材料の支持体が挙げられるが、
プラスチツクが種々の点から好適である。プラスチツク
としては、アクリル樹脂、メタアクリル樹脂、酢酸ビニ
ル樹脂、塩化ビニル樹脂、ニトロセルロース、ポリエチ
レン樹脂、ポリプロピレン樹脂、ポリカーボネート樹
脂、ポリイミド樹脂、エポキシ樹脂、ポリサルホン樹脂
等が挙げられる。The substrate in the present invention may be transparent or opaque to the laser light used. Examples of the material for the substrate material include glass, plastic, paper, and a support for general recording material such as plate-shaped or foil-shaped metal.
Plastic is preferable from various points. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, vinyl chloride resin, nitrocellulose, polyethylene resin, polypropylene resin, polycarbonate resin, polyimide resin, epoxy resin and polysulfone resin.
本発明の光学的記録媒体における情報記録層としてイン
ドフエノール系化合物を使用する際、膜厚は100Å〜5
μm、好ましくは1000Å〜3μmである。成膜法として
は真空蒸着法、スパツタリング法、ドクターブレード
法、キヤスト法、スピナー法、浸漬法など一般に行なわ
れている薄膜形成法で成膜することができる。また、必
要に応じてバインダーを使用することもできる。バイン
ダーとしてはPVA、PVP、ニトロセルロース、酢酸セルロ
ース、ポリビニルブチラール、ポリカーボネートなど既
知のものが用いられ、樹脂に対するイドフエノール系化
合物の量は重量比で0.01以上あることが望ましい。スピ
ナー法により成膜の場合、回転数は500〜5000rpmが好ま
しく、スピンコートの後、場合によつては、加熱あるい
は溶媒蒸気にあてる等の処理を行なつてもよい。また、
記録体の安定性や耐光性向上のために、一重項酸素クエ
ンチヤーとして遷移金属キレート化合物(たとえば、ア
セチルアセトナートキレート、ビスフエニルジチオー
ル、サリチルアルデヒドオキシム、ビスジチオ−α−ジ
ケトン等)を含有していてもよい。更に、必要に応じて
他の色素を併用するとができる。他の色素としては別の
種類のインドフエノール系色素でもよいし、トリアリー
ルメタン系色素、アゾ染料、ジアニン系色素、スクワリ
リウム系色素など他系統の色素でもよい。When an indophenol compound is used as an information recording layer in the optical recording medium of the present invention, the film thickness is 100Å to 5
μm, preferably 1000Å to 3 μm. As the film forming method, a generally used thin film forming method such as a vacuum vapor deposition method, a sputtering method, a doctor blade method, a cast method, a spinner method, and a dipping method can be used. Further, a binder can be used if necessary. Known binders such as PVA, PVP, nitrocellulose, cellulose acetate, polyvinyl butyral, and polycarbonate are used, and the amount of the idphenol compound with respect to the resin is preferably 0.01 or more by weight. In the case of film formation by the spinner method, the rotation speed is preferably 500 to 5000 rpm, and after spin coating, treatment such as heating or applying to solvent vapor may be performed depending on the case. Also,
In order to improve the stability and light resistance of the recording material, a transition metal chelate compound (for example, acetylacetonate chelate, bisphenyldithiol, salicylaldehyde oxime, bisdithio-α-diketone, etc.) is contained as a singlet oxygen quencher. May be. Furthermore, other dyes can be used in combination, if necessary. Other dyes may be other types of indophenol dyes, or may be other types of dyes such as triarylmethane dyes, azo dyes, dianine dyes, squarylium dyes.
ドクターブレード法、キヤスト法、スピナー法、浸漬
法、特に、スピナー法等の塗布方法により記録層を形成
する場合の塗布溶媒としては、テトラクロロエタン、ブ
ロモホルム、ジブロモエタン、エチルセロソルブ、キシ
レン、クロロベンゼン、シクロヘキサノン等の沸点120
〜160℃のものが好適に使用される。Doctor blade method, cast method, spinner method, dipping method, especially as a coating solvent when forming the recording layer by a coating method such as spinner method, tetrachloroethane, bromoform, dibromoethane, ethyl cellosolve, xylene, chlorobenzene, cyclohexanone Boiling point of 120
Those having a temperature of up to 160 ° C are preferably used.
本発明の光学記録体の記録層は基板の両面に設けてもよ
いし、片面だけに設けてもよい。The recording layer of the optical recording medium of the present invention may be provided on both sides of the substrate, or may be provided on only one side.
上記の様にして得られた記録体への記録は、基体の両面
または、片面に設けた記録層に1μm程度に集束したレ
ーザー光、好ましくは、半導体レーザーの光にあてる事
により行なう。レーザー光の照射された部分は、レーザ
ーエネルギーの吸収による、分解、蒸発、溶融等の記録
層の熱的変形が起こる。Recording on the recording medium obtained as described above is performed by exposing the recording layer provided on both sides or one side of the substrate to a laser beam focused to about 1 μm, preferably a semiconductor laser beam. In the portion irradiated with laser light, thermal deformation of the recording layer such as decomposition, evaporation, and melting occurs due to absorption of laser energy.
記録された、情報の再生は、レーザー光により、熱的変
形が起きている部分と起きていない部分の反射率の差を
読み取る事により行なう。Reproduction of the recorded information is performed by reading the difference in reflectance between a portion where thermal deformation has occurred and a portion where thermal deformation has not occurred, using laser light.
本発明の光学的記録媒体について使用されるレーザー光
はN2、He−Cd、Ar、He−Ne、ルビー、半導体、色素レー
ザーなどがあげられるが、特に、軽量性、取扱いの容易
さ、コンパクト性などの点から半導体レーザーが好適で
ある。Laser light used for the optical recording medium of the present invention is N 2, He-Cd, Ar , He-Ne, ruby, semiconductor, but such a dye laser and the like, in particular, light weight, ease of handling, compactness A semiconductor laser is preferable from the viewpoint of properties and the like.
実 施 例 以下実施例によりこの発明を具体的に説明するが、かか
る実施例は本発明を限定するものではない。EXAMPLES The present invention will be specifically described below with reference to examples, but the examples do not limit the present invention.
実施例1 (a) 製造例 下記構造式 で表わされる化合物0.42gをDMF20mlに加え、撹拌した。
シアン化カリウム0.1gを水2.5mlに溶解した液を加え、
室温で2時間反応させた。次いでDDQ(ジシアノジクロ
ロベンゾキノン)0.28gを加えて室温で2時間反応させ
た。反応終了後、水5mlを添加し、生成した結晶を
過、水洗した後乾燥し、下記構造式で表わされるインド
フエノール系化合物0.35g(78%)を得た。Example 1 (a) Production Example Structural formula below 0.42 g of the compound represented by was added to 20 ml of DMF, and the mixture was stirred.
Add a solution of 0.1 g of potassium cyanide dissolved in 2.5 ml of water,
The reaction was carried out at room temperature for 2 hours. Next, 0.28 g of DDQ (dicyanodichlorobenzoquinone) was added, and the mixture was reacted at room temperature for 2 hours. After completion of the reaction, 5 ml of water was added, and the formed crystals were washed with water, dried, and 0.35 g (78%) of the indophenol compound represented by the following structural formula was obtained.
本化合物の可視部吸収スペクトル(アセトン中)は、λ
max710nm(図−1)であり、マススペクトルは下記の通
りであつた。(測定条件:70eV、150℃) m/e 363,365(M++H2) 348,350(M++H2−CH3)(base peak) (b) 記録媒体例 前記構造式のインドフエノール系化合物を2×10-5Torr
の真空下で、約80〜150℃に加熱し、板厚1.2mmのメタア
クリル樹脂(以下、PMMAと記す)基板上に真空蒸着し
た。蒸着膜厚は水晶振動式膜厚計による真空蒸着膜厚測
定の結果、2015Åであつた。分光光度計による最大吸収
波長は、730nmであり、スペクルの形状は、幅広かつ
た。 The visible absorption spectrum (in acetone) of this compound is λ
It was max710 nm (Fig. 1), and the mass spectrum was as follows. (Measurement condition: 70 eV, 150 ° C.) m / e 363,365 (M + + H 2 ) 348,350 (M + + H 2 —CH 3 ) (base peak) (b) Example of recording medium 2 × 10 -5 Torr
Under vacuum, heated to about 80 to 150 ° C., and vacuum-deposited on a methacrylic resin (hereinafter referred to as PMMA) substrate having a plate thickness of 1.2 mm. The vapor deposition film thickness was 2015Å as a result of the vacuum vapor deposition film thickness measurement by a crystal vibration type film thickness meter. The maximum absorption wavelength measured by the spectrophotometer was 730 nm, and the shape of the spectrum was wide.
この塗布膜に、中心波長780nmの半導体レーザー光を出
力6mWでビーム径1μmで照射した所、幅約1μm、ピ
ツト長約2μmの輪郭の極めて明瞭なピツトが形成され
た。C/N比、保存安定性(60℃、80%RH)は良好であつ
た。When the coating film was irradiated with a semiconductor laser beam having a central wavelength of 780 nm at an output of 6 mW and a beam diameter of 1 μm, a very clear pit having a width of about 1 μm and a pit length of about 2 μm was formed. The C / N ratio and storage stability (60 ℃, 80% RH) were good.
実施例2 (a) 製造例 下記構造式 で表わされる化合物0.45gをDMF10mlに加えて撹拌し、更
に、シアン化カリウム0.1gを水2.5mlに溶解した液を加
えて室温で2時間反応させた。反応後、DDQ0.28gを加
え、更に、室温で2時間反応させた。反応後、過し、
水洗、乾燥して下記構造式で表わされるインドフエノー
ル系化合物0.4g(83%)を得た。Example 2 (a) Production Example The following structural formula 0.45 g of the compound represented by 10 ml of DMF was added and stirred, and a solution of 0.1 g of potassium cyanide dissolved in 2.5 ml of water was added and reacted at room temperature for 2 hours. After the reaction, DDQ (0.28 g) was added, and the mixture was further reacted at room temperature for 2 hours. After the reaction,
After washing with water and drying, 0.4 g (83%) of an indophenol compound represented by the following structural formula was obtained.
本化合物の可視部吸収スペクトル(アセトン中)はλma
x615nm(図−2)であり、マススペクトルは下記の通り
であつた。(測定条件:70eV、250℃) m/e 384(M+−H2) 369(M+−H2−CH3)(base peak) (b) 記録媒体例 前記構造式のイドフエノール系化合物1gをジブロモエタ
ン50gに溶解し、0.22μのフイルターで過し、溶解液
を得た。この溶液2mlを、深さ700Å、幅0.7μの紫外線
硬化樹脂による溝(グルーブ)つきPMMA樹脂基板(5イ
ンチ)上に滴下し、スピナー法により1200rpmの回転数
で塗布した。塗布後、60℃で10分間乾燥した。同一条件
でガラス板に塗布して、α−ステツプによる膜厚測定し
たところ、700Åであつた。塗布膜の最大吸収波長は620
nmであり、スペクトルの形状は幅広かつた。 The visible absorption spectrum (in acetone) of this compound is λma
x615 nm (Fig. 2), and the mass spectrum was as follows. (Measurement conditions: 70 eV, 250 ° C) m / e 384 (M + -H 2 ) 369 (M + -H 2 -CH 3 ) (base peak) (b) Recording medium example Idphenol compound of the above structural formula 1 g Was dissolved in 50 g of dibromoethane and passed through a 0.22 μ filter to obtain a solution. 2 ml of this solution was dropped onto a PMMA resin substrate (5 inches) having a depth of 700 L and a width of 0.7 μ and a groove (groove) made of an ultraviolet curable resin, and applied by a spinner method at a rotation speed of 1200 rpm. After coating, it was dried at 60 ° C. for 10 minutes. When it was applied to a glass plate under the same conditions and the film thickness was measured by α-step, it was 700Å. The maximum absorption wavelength of the coating film is 620
nm, and the shape of the spectrum was wide.
このようにして得られた薄膜に、光源としてHe−Neレー
ザーを用いビーム径2.4μm、波長632.8nmで書き込みを
行なつたところ、均一かつ明瞭な形状のピツト(孔)が
得られた。キヤリヤーレベル/ノイズレベル(C/N)比
および保存安定性も良好であつた。When a thin film thus obtained was written with a He-Ne laser as a light source at a beam diameter of 2.4 μm and a wavelength of 632.8 nm, uniform and clear pits were obtained. The carrier level / noise level (C / N) ratio and storage stability were also good.
実施例3 (a) 製造例 実施例2において下記構造式 で表わされる化合物0.45gの代りに、下記構造式 で表わされる化合物0.48gを用いた以外は実施例2と同
様に行ない、下記構造式で表わされるインドフエノール
系化合物0.4gを得た。Example 3 (a) Manufacturing Example In Example 2, the following structural formula was used. Instead of 0.45 g of the compound represented by The same procedure as in Example 2 was carried out except that 0.48 g of the compound represented by the formula (1) was used to obtain 0.4 g of the indophenol compound represented by the following structural formula.
本化合物の可視部の吸収スペクトル(クロロホルム中)
は、λmax650nm(図−3)であり、マススペクトルは下
記の通りであつた。(測定条件;70eV、250℃) m/e 402(H++H2)(base peak) 387(M++H2−CH3) (b) 記録媒体例 前記構造式で示されるインドフエノール系化合物を、実
施例2に記載の方法に従つて溝(グルーブ)つきPMMA樹
脂基板上にスピナー法による塗布を行なつた。 Absorption spectrum of this compound in the visible region (in chloroform)
Is λmax 650 nm (Fig. 3), and the mass spectrum is as follows. (Measurement condition: 70 eV, 250 ° C.) m / e 402 (H + + H 2 ) (base peak) 387 (M + + H 2 —CH 3 ) (b) Recording medium example An indophenol compound represented by the above structural formula was used. According to the method described in Example 2, the PMMA resin substrate with grooves was coated by the spinner method.
塗布膜厚は、タリステツプ法による膜厚測定したとこ
ろ、800Åであつた。塗布膜の最大吸収波長は650nmであ
り、スペクトルの形状は幅広かつた。The coating film thickness was 800Å when measured by the Tarisstep method. The coating film had a maximum absorption wavelength of 650 nm and had a broad spectrum shape.
このようにして得られた薄膜に、光源としてHe−Neレー
ザーを用い、ビーム径2.4μm、波長632.8nmで書き込み
を行なつたところ、均一かつ明瞭な形状のピツト(孔)
が得られた。C/N比および保存安定性も良好であつた。When a He-Ne laser was used as a light source on the thin film thus obtained and writing was performed with a beam diameter of 2.4 μm and a wavelength of 632.8 nm, pits (holes) with a uniform and clear shape were formed.
was gotten. The C / N ratio and storage stability were also good.
実施例4 (a) 製造例 実施例3において下記構造式 で表わされる化合物0.45gの代りに下記構造式 で表わされる化合物0.50gを用いた以外は実施例3と同
様に行ない、下記構造式で表わされるインドフエノール
系化合物0.45gを得た。Example 4 (a) Manufacturing Example In Example 3, the following structural formula was used. Instead of 0.45 g of the compound represented by The same procedure as in Example 3 was carried out except that 0.50 g of the compound represented by the above formula was used to obtain 0.45 g of the indophenol compound represented by the following structural formula.
本化合物の可視部の吸収スペクトル(クロロホルム中)
はλmax660nm(図−4)であつた。 Absorption spectrum of this compound in the visible region (in chloroform)
Was λmax 660 nm (Fig. 4).
(b) 記録媒体例 前記構造式で示されるインドフエノール系化合物を、実
施例2に記載の方法に従つて、溝(グルーブ)つきPMMA
樹脂基板上にスピナー法による塗布を行なつた。(B) Example of Recording Medium According to the method described in Example 2, PMMA with grooves was prepared by using the indophenol compound represented by the above structural formula.
A resin substrate was applied by the spinner method.
塗布膜厚は、タリステツプ法による膜厚測定したとこ
ろ、750Åであつた。塗布膜の最大吸収波長は660nmであ
り、スペクトルの形状は幅広かつた。The coating film thickness was 750Å as measured by the Tarisstep method. The maximum absorption wavelength of the coating film was 660 nm, and the shape of the spectrum was broad.
このようにして得られた薄膜に、光源としてHe−Neレー
ザーを用い、ビーム径2.4μm、波長632.8nmで書き込み
を行なつたところ、均一かつ明瞭な形状のピツト(孔)
が得られた。C/N比および保存性も良好であつた。When a He-Ne laser was used as a light source on the thin film thus obtained and writing was performed with a beam diameter of 2.4 μm and a wavelength of 632.8 nm, pits (holes) with a uniform and clear shape were formed.
was gotten. The C / N ratio and storability were also good.
実施例5 実施例1において用いたインドフエノール系化合物の代
わりに下記第1表に示した化合物を使用して蒸着したと
ころ、下記第1表に示す最大吸収波長をもつ薄膜基板を
得た。このようにして得られた薄膜に光源としてHe−Ne
レーザーまたは半導体レーザーを用いて書き込みを行な
つたところ均一かつ明瞭な形状のピツトが得られた。C/
N比も良好であり、保存性も良好であつた。Example 5 The compounds shown in Table 1 below were used for vapor deposition instead of the indophenol compound used in Example 1 to obtain a thin film substrate having the maximum absorption wavelength shown in Table 1 below. The thin film thus obtained was used as a light source for He-Ne.
When writing was carried out using a laser or a semiconductor laser, uniform and clear pits were obtained. C /
The N ratio was also good and the storage stability was good.
実施例6 実施例2において用いたインドフエノール系化合物の代
わりに下記第2表に示した化合物を使用して塗布したと
ころ、下記第2表に示す最大吸収波長をもつ薄膜基板を
得た。このようにして得られた薄膜に光源としてHe−Ne
レーザーまたは半導体レーザーを用いて書き込みを行な
つたところ、均一かつ明瞭な形状のピツトが得られた。
C/N比も良好であり、保存性も良好であつた。 Example 6 The compounds shown in Table 2 below were used in place of the indophenol compound used in Example 2 to obtain a thin film substrate having the maximum absorption wavelength shown in Table 2 below. The thin film thus obtained was used as a light source for He-Ne.
When writing was carried out using a laser or a semiconductor laser, uniform and clear pits were obtained.
The C / N ratio was also good, and the storage stability was also good.
〔発明の効果〕 本発明のインドフエノール系化合物は、蒸着が容易であ
り、また有機溶媒に対する溶解性が高く、塗布によるコ
ーテイングも可能であり、しかも、反射率が高く、コン
トラスが良好であり且つ保存安定性がすぐれているの
で、該化合物を用いた光学記録媒体は極めて有用なもの
である。 [Advantages of the Invention] The indophenol compound of the present invention is easy to deposit, has high solubility in an organic solvent, and can be coated by coating, and has high reflectance and good contrast. Since the storage stability is excellent, the optical recording medium using the compound is extremely useful.
図−1〜図−4は、本発明のインドフエノール系化合物
4例の可視部吸収スペクトルを表わすものであり、縦軸
は吸光度、横軸は波長(nm)を表わす。FIGS. 1 to 4 show absorption spectra in the visible region of four examples of the indophenol compound of the present invention, where the vertical axis represents absorbance and the horizontal axis represents wavelength (nm).
Claims (4)
基を表わし、R1、R2、R3は水素原子、ハロゲン原子、ニ
トロ基、置換もしくは非置換のアルキル基、置換もしく
は非置換のアルコキシ基、置換もしくは非置換のアミノ
カルボニル基、置換もしくは非置換のカルボニルアミノ
基、置換もしくは非置換のアミノスルホニル基、置換も
しくは非置換のスルホニルアミノ基、または置換もしく
は非置換のチオカルボニルアミノ基を表わす。) で示されるインドフエノール系化合物。1. A general formula [I] (In the formula, And K represents a residue of a substituted or unsubstituted aromatic amine, R 1 , R 2 and R 3 represent a hydrogen atom, a halogen atom, a nitro group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted An alkoxy group, a substituted or unsubstituted aminocarbonyl group, a substituted or unsubstituted carbonylamino group, a substituted or unsubstituted aminosulfonyl group, a substituted or unsubstituted sulfonylamino group, or a substituted or unsubstituted thiocarbonylamino group Represent. ) An indophenol compound represented by.
ミノ基、アルコキシ基またはハロゲン原子を表わし、R4
およびR5は水素原子、C1〜C20の置換もしくは非置換の
アルキル基、アリール基またはシクロヘキシル基を表わ
す。)で示される特許請求の範囲第1項記載のインドフ
エノール系化合物。2. In the general formula [I], K is a general formula [II]. (In the formula, X and Y represent a hydrogen atom, an alkyl group, an acylamino group, an alkoxy group or a halogen atom, and R 4
And R 5 represents a hydrogen atom, a C 1 -C 20 substituted or unsubstituted alkyl group, an aryl group or a cyclohexyl group. ) The indophenol compound according to claim 1, wherein
ることによつて記録再生を行なうための光学的記録媒体
であつて、基板に一般式〔I〕 (式中、 を表わし、−Kは置換もしくは非置換の芳香族アミンの
残基を表わし、−R1、R2、R3は水素原子、ハロゲン原
子、ニトロ基、置換もしくは非置換のアルキル基、置換
もしくは非置換のアルコキシ基、置換もしくは非置換の
アミノカルボニル基、置換もしくは非置換のカルボニル
アミノ基、置換もしくは非置換のアミノスルホニル基、
置換もしくは非置換のスルホニルアミノ基または置換も
しくは非置換のチオカルボニルアミノ基を表わす)で示
されるインドフエノール系化合物を含有する記録層を設
けたことを特徴とする光学的記録媒体。3. An optical recording medium for recording / reproducing by causing a state change by a laser beam, the substrate having the general formula [I] (In the formula, And -K represents a residue of a substituted or unsubstituted aromatic amine, -R 1 , R 2 and R 3 represent a hydrogen atom, a halogen atom, a nitro group, a substituted or unsubstituted alkyl group, a substituted or non-substituted A substituted alkoxy group, a substituted or unsubstituted aminocarbonyl group, a substituted or unsubstituted carbonylamino group, a substituted or unsubstituted aminosulfonyl group,
An optical recording medium comprising a recording layer containing an indophenol compound represented by a substituted or unsubstituted sulfonylamino group or a substituted or unsubstituted thiocarbonylamino group.
ミノ基、アルコキシ基またはハロゲン原子を表わし、R4
およびR5は水素原子;C1〜C20の置換もしくは非置換のア
ルキル基、アリール基またはシクロヘキシル基を表わ
す。)で示されるインドフエノール系化合物であること
を特徴とする特許請求の範囲第3項記載の光学的記録媒
体。4. In the general formula [I], K is a general formula [II]. (In the formula, X and Y represent a hydrogen atom, an alkyl group, an acylamino group, an alkoxy group or a halogen atom, and R 4
And R 5 represents a hydrogen atom; a C 1 -C 20 substituted or unsubstituted alkyl group, aryl group or cyclohexyl group. 4. An optical recording medium according to claim 3, which is an indophenol compound represented by the formula (4).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61146560A JPH0776308B2 (en) | 1986-06-23 | 1986-06-23 | Indophenol compound and optical recording medium containing the compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61146560A JPH0776308B2 (en) | 1986-06-23 | 1986-06-23 | Indophenol compound and optical recording medium containing the compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS633062A JPS633062A (en) | 1988-01-08 |
| JPH0776308B2 true JPH0776308B2 (en) | 1995-08-16 |
Family
ID=15410434
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61146560A Expired - Lifetime JPH0776308B2 (en) | 1986-06-23 | 1986-06-23 | Indophenol compound and optical recording medium containing the compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0776308B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0540785Y2 (en) * | 1988-05-17 | 1993-10-15 | ||
| JPH0794185B2 (en) * | 1988-10-05 | 1995-10-11 | 富士写真フイルム株式会社 | Thermal transfer material |
| US5460930A (en) * | 1993-10-28 | 1995-10-24 | Eastman Kodak Company | Photographic elements containing indoaniline dummy dyes |
| TW200809850A (en) * | 2006-05-31 | 2008-02-16 | Fujifilm Corp | Optical recording medium, method of using dye compound and method of recording visible information |
| CN106083649B (en) * | 2016-06-06 | 2017-10-20 | 陕西师范大学 | A kind of synthetic method of the Cyclohexadiene derivatives of 3,5 diaryl, 2,6,6 tricyano, 1 imino group 2,4 |
-
1986
- 1986-06-23 JP JP61146560A patent/JPH0776308B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS633062A (en) | 1988-01-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |