JPH0783164B2 - Print resistance film - Google Patents
Print resistance filmInfo
- Publication number
- JPH0783164B2 JPH0783164B2 JP17540787A JP17540787A JPH0783164B2 JP H0783164 B2 JPH0783164 B2 JP H0783164B2 JP 17540787 A JP17540787 A JP 17540787A JP 17540787 A JP17540787 A JP 17540787A JP H0783164 B2 JPH0783164 B2 JP H0783164B2
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- resistance
- whisker
- pigment
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 40
- 229910052799 carbon Inorganic materials 0.000 claims description 26
- 239000000049 pigment Substances 0.000 claims description 22
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000000576 coating method Methods 0.000 claims description 17
- 229910002804 graphite Inorganic materials 0.000 claims description 14
- 239000010439 graphite Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 9
- 239000011230 binding agent Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 6
- 229910021397 glassy carbon Inorganic materials 0.000 claims description 3
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 229920000592 inorganic polymer Polymers 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- 238000001947 vapour-phase growth Methods 0.000 claims description 2
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000976 ink Substances 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910021383 artificial graphite Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910034327 TiC Inorganic materials 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- LNDJVIYUJOJFSO-UHFFFAOYSA-N cyanoacetylene Chemical group C#CC#N LNDJVIYUJOJFSO-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229920002681 hypalon Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229920003987 resole Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は印刷によつて構成する抵抗被膜で、セルミツ
ク、有機絶縁材のプリント回路板等の上に構成する印刷
抵抗被膜に関する。The present invention relates to a resistance coating formed by printing, and relates to a printing resistance coating formed on a ceramic, a printed circuit board of an organic insulating material, or the like.
（従来の技術） 印刷抵抗はガラスエポキシ、紙フエノール基板上にカー
ボン系のレジンインキを印刷して多数の抵抗素子を同意
に公称抵抗値として33Ω〜470KΩ構成するが十分な特性
が得られないのでチツプ抵抗に代用できない。(Prior art) As for printing resistance, a carbon-based resin ink is printed on a glass epoxy or paper phenol substrate, and a large number of resistance elements are agreed to form 33Ω to 470KΩ as nominal resistance values, but sufficient characteristics cannot be obtained. You cannot substitute for chip resistance.
チツプ抵抗はそれ自身の電気特性については十分満足で
きるが回路板への搭載に於いて経済性個数があり、又チ
ツプ抵抗をハンダで搭載する場合、フラツクスの処理な
どわずらわしい工程がある。更に印刷抵抗ほどに薄くで
きないので小型化、薄型化できず、個数の多いとき工程
時間が大であるという欠点を有している。Although the chip resistor is sufficiently satisfactory in its own electric characteristics, it is economical to mount it on a circuit board, and when mounting the chip resistor with solder, there are troublesome steps such as the processing of the flux. Further, since it cannot be made as thin as the printing resistance, it cannot be made smaller and thinner, and has a drawback that the process time is long when the number is large.
抵抗被膜面上を摺動子が移動して抵抗調整を行うボリユ
ーム抵抗体に於いては、安定な接触抵抗を公称抵抗値10
0Ω〜1MΩの範囲で変化する。材質として炭素被膜、メ
タルグレーズ被膜の半固定抵抗、ボリユーム抵抗があ
る。炭素被膜は摺動寿命、摺動雑音特性は良いがメタル
グレーズ被膜ほどの電気特性が得られない。In the case of volume resistors, in which the slider moves on the surface of the resistance film to adjust the resistance, a stable contact resistance is obtained with a nominal resistance value of 10
It varies in the range of 0Ω to 1MΩ. Materials include carbon film, metal glaze film semi-fixed resistance, volume resistance. The carbon coating has good sliding life and sliding noise characteristics, but it does not have the electrical characteristics of the metal glaze coating.
ポテンシヨメーターはボリユーム抵抗体より更に変化特
性精度、耐久性を必要とする為、表面平滑性が要求さ
れ、製造方法として鏡面板より転写した被膜よりなるポ
テンシヨメーターがある。Since the potentiometer requires higher accuracy of change characteristics and durability than the volume resistor, surface smoothness is required, and as a manufacturing method, there is a potentiometer composed of a film transferred from a mirror plate.
以上大きく分けて２つの抵抗体どちらに於いても公称抵
抗値500Ω〜10KΩ位のものについてやや満足できても、
それ以下の抵抗値、それ以上の抵抗値の抵抗素子につい
てはカーボン、グラフアイトの単独材料では困難であ
る。そこで低抵抗に於いてはカーボン、グラフアイトで
できにくいので、しかたなくAgの混入を行い、高抵抗に
於いては絶縁物質の混入を行つている。The resistance can be broadly divided into two resistors and the nominal resistance of 500Ω to 10KΩ can be satisfied,
For a resistance element having a resistance value lower than that or a resistance value higher than that, it is difficult to use carbon or graphite alone. Therefore, at low resistance, it is difficult to make it with carbon and graphite, so it is unavoidable to mix Ag, and at high resistance, an insulating material is mixed.
（発明が解決しようとする問題点） 本発明の目的は摺動寿命、摺動雑音特性に優れた印刷抵
抗被膜を提供することにある。(Problems to be Solved by the Invention) An object of the present invention is to provide a printed resistance film having excellent sliding life and sliding noise characteristics.
又、本発明の目的はAgや絶縁物質の添加なしで優れた電
気特性を発揮し、低抵抗値から高抵抗値までの抵抗値を
有する印刷抵抗被膜を提供することにある。Another object of the present invention is to provide a printed resistance film which exhibits excellent electrical characteristics without adding Ag or an insulating substance and has a resistance value from a low resistance value to a high resistance value.
（問題点を解決するための手段） 本発明はウイスカー状顔料、導電性カーボン、フレーク
状グラフアイト及びバインダーを含有する塗料を基板に
印刷して得られる印刷抵抗被膜に係る。(Means for Solving Problems) The present invention relates to a print resistance film obtained by printing a coating material containing a whisker-like pigment, conductive carbon, flake-like graphite and a binder on a substrate.
本発明の印刷抵抗被膜は各種の公知の用途に使用され、
例えばフイルム上の導体回路、摺動性の良い導体回路、
メツキレジストと導体を共用した導電被膜接点としての
働きなどに適応できる。又、印刷抵抗の範囲でなくデジ
タイザータブレツトの抵抗体、静電防止フイルム、セン
サー電極、導体配線部等にも使用できる。The printed resistance coating of the present invention is used in various known applications,
For example, a conductor circuit on the film, a conductor circuit with good slidability,
It can be applied to the function as a conductive film contact that shares the conductor with the plating resist. Further, it can be used not only in the range of the printing resistance but also in the resistor of the digitizer tablet, the antistatic film, the sensor electrode, the conductor wiring portion and the like.
本発明においてウイスカー状顔料としては導電性チタン
酸アルカリウイスカー、カーボン或いはグラフアイト層
よりなるウイスカー、気相生長によつて得られたカーボ
ンウイスカー、SiC、Si4N5、WC、TiC、TiO2、MoCのウイ
スカー、及び／又はカーボンウイスカーをグラフアイト
化したもの、又一般に得られるウイスカーに着炭したも
の、有機又は無機高分子をコートして酸素のない状態で
分解させてガラス状カーボン化したもの等が例示でき、
市販品ではデントールBK150、BK200、BK300、WK100（大
塚化学製）、グラフアイトウイスカー、グラスカー、Si
Nウイスカー、SnO2−Sb2O3コートウイスカー、UGCF等を
挙げることができる。As the whisker-like pigment in the present invention, conductive alkali titanate whiskers, whiskers consisting of carbon or graphite layer, carbon whiskers obtained by vapor phase growth, SiC, Si 4 N 5 , WC, TiC, TiO 2 , Graphite made of MoC whiskers and / or carbon whiskers, generally obtained whiskers carbonized, organic or inorganic polymer coated and decomposed in the absence of oxygen to glassy carbon Etc. can be exemplified,
Commercially available products are Dentor BK150, BK200, BK300, WK100 (Otsuka Chemical), Graphite Whiskers, Glass Cars, Si
N whiskers, SnO 2 —Sb 2 O 3 coated whiskers, UGCF and the like can be mentioned.
導電性カーボンとしては全てがカーボンで構成されてい
るものと、骨材は別材料でその表面を炭素被膜でコート
したものの両方が使用でき、カーボン単独以外、即ち低
抵抗系ではカーボン源としてシアノアセチレンを用い、
インターカラントとしてドナー型にFe、アクセプター型
にH2SO4を用いてより低抵抗化を計つた素材も使用でき
る。高抵抗系ではカーボン源として有機金属を用い熱分
解してカーボンセラミツクとし炭素と酸化物の比で抵抗
値をコントロールした素材も使用できる。市販品ではEC
Dj600、＃3050B、＃3950、＃3015B、＃3190、AB、MA−
８、Aerosil R972等を挙げることができる。Both conductive carbon that is entirely composed of carbon and aggregate that is a different material with its surface coated with a carbon coating can be used.Other than carbon alone, that is, cyanoacetylene as a carbon source in low resistance systems. Using
It is also possible to use a material having a lower resistance by using Fe for the donor type and H 2 SO 4 for the acceptor type as the intercalant. In a high resistance system, a material in which the resistance value is controlled by the ratio of carbon and oxide by using an organic metal as a carbon source and thermally decomposing it into a carbon ceramic can be used. EC for commercial products
Dj600, # 3050B, # 3950, # 3015B, # 3190, AB, MA-
8, Aerosil R972 and the like can be mentioned.
フレーク状グラフアイトとしては人造黒鉛、天然鱗片状
黒鉛、着炭マイカ、ガラス状カーボン等が例示され、市
販品としてはOFG2、OFG5、OFG10、OFG30、KS15、KS25、
NC−１、CSPE、GP78等が挙げられる。Examples of the flake graphite include artificial graphite, natural flake graphite, carbonized mica, glassy carbon, and the like, and commercially available products OFG2, OFG5, OFG10, OFG30, KS15, KS25,
NC-1, CSPE, GP78, etc. are mentioned.
本発明において上記成分の好ましい形状は A:ウイスカー状顔料 直径 ｔ＝0.8μｍ以下 大きさ ｄ＝７〜15μｍ アスペクト比 20以上 B:導電性カーボン 粒子径 ｔ＝0.01〜0.05μｍ 吸油量 100〜400ml/100g 比表面積 50〜1800m2/g C:フレーク状グラフアイト 厚さ ｔ＝１μｍ以下 大きさ ｄ＝20μｍ以下 アスペクト比 20以上 上記成分の割合はA:30〜80重量％、B:20〜50重量％、C:
1〜50重量％の範囲が好ましい。In the present invention, the preferred shape of the above components is A: whisker pigment diameter t = 0.8 μm or less size d = 7 to 15 μm aspect ratio 20 or more B: conductive carbon particle diameter t = 0.01 to 0.05 μm oil absorption 100 to 400 ml / 100g Specific surface area 50 to 1800m 2 / g C: Flake graphite Thickness t = 1μm or less Size d = 20μm or less Aspect ratio 20 or more Amount ratio of the above components is A: 30 to 80% by weight, B: 20 to 50% by weight %, C:
A range of 1 to 50% by weight is preferred.
本発明においてバインダーとしては耐熱性、耐湿性、摺
動性、密着性の良い有機及び無機バインダーを用いるこ
とができ、有機バインダーとしてはレゾール樹脂、アル
キツド樹脂、メラミン樹脂、エポキシ樹脂、ウレタン樹
脂、ニトロセルロース、アクリル樹脂、フエノール樹
脂、シリコン樹脂、変性シリコン樹脂、ポバール、ポリ
フエニレンサルフアイド（PPS）、ポリイミド、ポリア
ミド、ポリアミドイミド、ブチラール樹脂、酢酸ビニル
樹脂、塩化ビニル樹脂、ゴム系樹脂、不飽和ポリエステ
ル及び上記樹脂の共重合体など、無機バインダーとして
はアルカリ金属ケイ酸塩、コロイダルシリカ、エチルシ
リケートなどを挙げることができる。In the present invention, heat and humidity resistance, slidability, and organic and inorganic binders having good adhesion can be used as the binder, and as the organic binder, a resole resin, an alkyd resin, a melamine resin, an epoxy resin, a urethane resin, or a nitro resin can be used. Cellulose, acrylic resin, phenol resin, silicone resin, modified silicone resin, poval, polyphenylene sulfide (PPS), polyimide, polyamide, polyamideimide, butyral resin, vinyl acetate resin, vinyl chloride resin, rubber resin, unsaturated Examples of inorganic binders such as polyesters and copolymers of the above resins include alkali metal silicates, colloidal silica and ethyl silicate.
本発明では上記Ａ〜Ｃ成分、バインダー及び必要により
添加される公知の成分を含む塗料を作成し、これを基板
に印刷して抵抗被膜を得る。In the present invention, a paint containing the above-mentioned components A to C, a binder and known components optionally added is prepared and printed on a substrate to obtain a resistance coating.
インキを印刷する基板としてはガラスエポキシ、紙フエ
ノール、ポリエステル、ポリイミド製の基板が一般に用
いられ、更にセラミツク基板を用いることもできる。印
刷よりなる抵抗レジン被膜の厚さは一般に20〜35μｍの
範囲が好ましい。A substrate made of glass epoxy, paper phenol, polyester or polyimide is generally used as a substrate for printing ink, and a ceramic substrate can also be used. Generally, the thickness of the resistance resin coating formed by printing is preferably in the range of 20 to 35 μm.
本発明の印刷抵抗被膜は50Ω／□〜500KΩ／□の面積抵
抗値でチツプ抵抗に近い特性を満足する。The printed resistance film of the present invention has a sheet resistance value of 50 Ω / □ to 500 KΩ / □ and satisfies characteristics close to chip resistance.
本発明で得た印刷抵抗被膜は次のような特長をもつ。The printed resistance film obtained by the present invention has the following features.
（イ）抵抗体巾ｄ＝70μｍ、ギヤツプＣ＝70μｍの印刷
が可能である。(A) It is possible to print with a resistor width d = 70 μm and a gap C = 70 μm.
（ロ）抵抗体巾ｄ＝0.8mmでのバラツキΔd/dを10％以下
にできる。(B) The variation Δd / d when the resistor width d = 0.8 mm can be 10% or less.
（ハ）被膜厚ｔ＝20〜25μｍと薄くても電気特性が良
い。(C) Good electrical characteristics even if the coating thickness t is as thin as 20 to 25 μm.
（ニ）平滑レベリングの良い被膜となる。(D) The film has good smooth leveling.
（ホ）抵抗値分布ΔR/Rを±10％以下にできる。(E) Resistance value distribution ΔR / R can be kept within ± 10%.
（ヘ）スクリーンに乗せたインキで300枚連続で40％以
下の抵抗値のバラツキしか生じない。(F) With the ink placed on the screen, there is only 40% or less variation in the resistance value for 300 consecutive sheets.
（ト）硬化条件の設定の多少のバラツキでも抵抗値のバ
ラツキは小さい。(G) Even if the setting of the curing condition is slightly different, the resistance value is not greatly varied.
（チ）密着性の良い被膜となる。(H) The film has good adhesion.
（リ）熱シヨツクに対して抵抗値の変化が少ない（ハン
ダひたしなど）。(I) There is little change in the resistance value with respect to the heat shock (such as a wet solder).
（ヌ）温度係数が−100ppm/deg以下である。(G) The temperature coefficient is -100 ppm / deg or less.
（ル）摺動性の良い被膜が得られる。(L) A film having good slidability can be obtained.
（オ）摺動雑音が少ない。(E) Little sliding noise.
アスペクト比大なるフレーク顔料とウイスカー顔料とそ
の空間を埋めてくれるコロイド状カーボンブラツクより
なる複合導電顔料で、好ましいマトリツクスを選んで適
性含有量の抵抗被膜とすることによつて従来にてできな
い電気特性の抵抗素子となる。A composite conductive pigment consisting of a flake pigment with a large aspect ratio, a whisker pigment, and a colloidal carbon black that fills the space, and by selecting a preferred matrix and forming a resistive coating with an appropriate content, electrical characteristics that cannot be achieved conventionally. It becomes the resistance element of.
今までの印刷抵抗、ボリユーム抵抗体についてはせいぜ
いフレーク顔料とコロイド粉の組合せで行つていたが、
ウイスカー顔料の開発でしかも抵抗値を任意に10Ω／□
〜10MΩ／□までコントロールできることによつて高特
性のレジン被膜を得ることが可能となる。Up to now, printing resistors and volume resistors have been done at best with a combination of flake pigment and colloidal powder.
With the development of whisker pigments, the resistance value can be arbitrarily set to 10Ω / □
By being able to control up to ~ 10 MΩ / □, it is possible to obtain a resin film with high characteristics.
（実 施 例） 以下に実施例及び比較例を挙げて説明する。尚、単に％
とあるのは重量％を示す。(Examples) Examples and comparative examples will be described below. In addition, simply%
"%" Means "% by weight".
実施例１ 第１表に示す配合の塗料を作成した。Example 1 A paint having the composition shown in Table 1 was prepared.
上記のように樹脂としてベルパールS890を酢酸カルビト
ールに溶解して樹脂固形分50％にして、低抵抗用、高抵
抗用顔料を選定含有量30,40,45,50,55,60％のインキを
使つて両端にAgレジン被膜を設けた電極に印刷して顔料
の含有量と抵抗値の関係を第１図に示す。テストパター
ンは上記のように40×4mmで両端にAgレジン被膜で電極
を構成し、基板は紙フエノール基板（三菱ガス化学PC10
00、ｔ＝0.4mm）を用いた。 As described above, Belpearl S890 is dissolved in carbitol acetate as a resin to make resin solid content 50%, and low resistance and high resistance pigments are selected. Ink with content of 30,40,45,50,55,60% FIG. 1 shows the relationship between the pigment content and the resistance value printed on an electrode provided with Ag resin coating on both ends by using. The test pattern is 40 x 4 mm as above and the electrodes are composed of Ag resin coating on both ends, and the substrate is a paper phenol substrate (Mitsubishi Gas Chemical PC10
00, t = 0.4 mm) was used.
実施例２ 第２表に示す配合の塗料を作成した。Example 2 A paint having the composition shown in Table 2 was prepared.
実施例１と同様にして得た印刷抵抗素子の顔料の含有量
と抵抗値の関係を第２図に示す。尚AT40はオリエンタル
工業社の人造黒鉛である。 The relationship between the pigment content and the resistance value of the printed resistance element obtained in the same manner as in Example 1 is shown in FIG. AT40 is artificial graphite manufactured by Oriental Industrial Co., Ltd.
比較例１ 実施例１に対する比較ということで第３表に記載のウイ
スカー状導電顔料を使用しない３種の低抵抗レジンイン
キを使用して実施例１と同様にしてＲLD1,RLD2,RLD３を
得た。Comparative Example 1 In comparison with Example 1, RLD 1 , RLD 2 and RLD 3 were used in the same manner as in Example 1 except that three low resistance resin inks containing no whisker-like conductive pigment shown in Table 3 were used. Got
これらについて顔料の含有量と抵抗値の関係を第３図に
示す。どれも面積抵抗10Ω／□を得ることはできず、印
刷条件をうまく設定して12Ω／□を得ることができる程
度である。 FIG. 3 shows the relationship between the pigment content and the resistance value for these. None of them can obtain a sheet resistance of 10 Ω / □, and it is only possible to obtain 12 Ω / □ by setting printing conditions well.
ＲLD１はカーボンのみでの導電被膜で、ＲLD２はボリユ
ーム抵抗体の電極部つなぎ部分に、ＲLD３はAgレジン被
膜のマイグレーシヨン防止で厚さ方向の抵抗値を小にし
てくれる。実施例１と比較して以下の第４表のようにな
る。ウイスカーの顔料が含まれた分だけその顔料の特長
とする特性が導電性カーボンレジン被膜に表われてい
る。RLD 1 is a conductive coating made of only carbon, RLD 2 is a connecting portion of the electrode part of the volume resistor, and RLD 3 is a Ag resin coating to prevent migration and reduce the resistance value in the thickness direction. The results are shown in Table 4 below in comparison with Example 1. The conductive carbon resin film shows the characteristic properties of the pigment as much as it contains the whisker pigment.
比較例２ 実施例２の比較で低抵抗ＲLと高抵抗ＲHの顔料組成を下
記第５表のようにした。尚、NAoRは日本ルツボ社の土状
黒鉛である。 Comparative Example 2 A pigment composition of low resistance RL and high resistance RH in comparison with Example 2 is shown in Table 5 below. NAoR is graphite in the form of Japan Crucible.
印刷によつて得られるレジン被膜の抵抗値は30Ω／□〜
3kΩ／□位までは全ての電気特性に於いて安定している
ものが得られるが、30Ω／□以下の抵抗値に銀粉の混入
で、3KΩ／□以上では含有量を小にするか、高い抵抗値
の顔料を入れるか絶縁の顔料を入れて高い公称抵抗値を
得る。 The resistance value of the resin film obtained by printing is 30Ω / □ ~
Stable in all electrical characteristics up to about 3 kΩ / □ can be obtained, but the resistance value of 30 Ω / □ or less is mixed with silver powder, and the content is 3 KΩ / □ or more, the content is small or high. A high nominal resistance value is obtained by adding a resistance pigment or an insulating pigment.
従つてこのような抵抗体は諸々の電気特性に於いて悪
い。Therefore, such a resistor is bad in various electric characteristics.
実施例２及び比較例２の特性を下記第６表に示す。尚定
格電力は1/64W、使用温度範囲は−30℃〜＋100℃、保存
温度範囲は−50℃〜＋100℃、定格電圧は25Vmaxであ
る。The characteristics of Example 2 and Comparative Example 2 are shown in Table 6 below. The rated power is 1 / 64W, the operating temperature range is -30 ℃ to + 100 ℃, the storage temperature range is -50 ℃ to + 100 ℃, and the rated voltage is 25Vmax.
第１〜３図は実施例１〜２及び比較例１のそれぞれの印
刷抵抗素子における、顔料の含有量と抵抗値の関係を示
すグラフである。1 to 3 are graphs showing the relationship between the pigment content and the resistance value in each of the printed resistance elements of Examples 1 and 2 and Comparative Example 1.
Claims (3)
ーク状グラフアイト及びバインダーを含有する塗料を基
板に印刷して得られる印刷抵抗被膜。1. A printed resistance film obtained by printing a coating material containing a whisker-like pigment, conductive carbon, flake graphite and a binder on a substrate.
被膜。2. The print resistant coating according to claim 1, which is used in a proportion of 30 to 80% by weight of whisker-like pigment, 20 to 50% by weight of conductive carbon, and 1 to 50% by weight of flake graphite.
カリウイスカー、カーボン或いはグラフアイト層よりな
るウイスカー、気相生長によつて得られたカーボンウイ
スカー、SiC、Si4N5、WC、TiC、TiO2、MoCのウイスカ
ー、及び／又はカーボンウイスカーをグラフアイト化し
たもの、又一般に得られるウイスカーに着炭したもの、
有機又は無機高分子をコートして酸素のない状態で分解
させてガラス状カーボン化したものから選ばれる１種又
はそれ以上である特許請求の範囲第１項記載の印刷抵抗
被膜。3. The whisker-like pigment is a conductive alkali titanate whisker, a whisker comprising carbon or a graphite layer, a carbon whisker obtained by vapor phase growth, SiC, Si 4 N 5 , WC, TiC, TiO 2. 2 , MoC whiskers and / or carbon whiskers made into graphite, or carbonized whiskers generally obtained,
The print resistance film according to claim 1, which is one or more selected from those which are coated with an organic or inorganic polymer and decomposed in the absence of oxygen to form glassy carbon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17540787A JPH0783164B2 (en) | 1987-07-14 | 1987-07-14 | Print resistance film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17540787A JPH0783164B2 (en) | 1987-07-14 | 1987-07-14 | Print resistance film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6418296A JPS6418296A (en) | 1989-01-23 |
| JPH0783164B2 true JPH0783164B2 (en) | 1995-09-06 |
Family
ID=15995554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17540787A Expired - Fee Related JPH0783164B2 (en) | 1987-07-14 | 1987-07-14 | Print resistance film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0783164B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003318004A (en) * | 2002-04-25 | 2003-11-07 | Ibiden Co Ltd | Resistor composition, resistor, and printed wiring board |
| WO2007055164A1 (en) * | 2005-11-10 | 2007-05-18 | Mitsuba Corporation | Carbon brush of motor and method for producing the same |
-
1987
- 1987-07-14 JP JP17540787A patent/JPH0783164B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6418296A (en) | 1989-01-23 |
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