JPH0821363B2 - 真空チエンバ内へプラズマを標本抽出する方法及びそのためのｒｆバイアスを有する装置 - Google Patents

真空チエンバ内へプラズマを標本抽出する方法及びそのためのｒｆバイアスを有する装置

Info

Publication number: JPH0821363B2
Authority: JP; Japan
Prior art keywords: vacuum chamber; voltage; plasma; opening; plate
Prior art date: 1985-04-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP61095855A

Other languages

English (en)

Japanese (ja)

Other versions

JPS61248348A (ja

Inventor

ジェームスダグラスドナルド

Original Assignee

エムディーエスヘルスグループリミッテッド

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1985-04-24

Filing date

1986-04-24

Publication date

1996-03-04

1986-04-24 Application filed by エムディーエスヘルスグループリミッテッド filed Critical エムディーエスヘルスグループリミッテッド

1986-11-05 Publication of JPS61248348A publication Critical patent/JPS61248348A/ja

1996-03-04 Publication of JPH0821363B2 publication Critical patent/JPH0821363B2/ja

2011-03-04 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

238000005070 sampling Methods 0.000 title claims description 12
238000000034 method Methods 0.000 title claims description 11
150000002500 ions Chemical class 0.000 claims description 56
230000006698 induction Effects 0.000 claims description 6
230000008859 change Effects 0.000 claims description 3
238000005192 partition Methods 0.000 claims description 2
230000008878 coupling Effects 0.000 claims 2
238000010168 coupling process Methods 0.000 claims 2
238000005859 coupling reaction Methods 0.000 claims 2
230000010363 phase shift Effects 0.000 description 9
230000000694 effects Effects 0.000 description 7
239000007789 gas Substances 0.000 description 6
230000003287 optical effect Effects 0.000 description 6
238000002474 experimental method Methods 0.000 description 5
238000010438 heat treatment Methods 0.000 description 5
239000000463 material Substances 0.000 description 5
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
238000004458 analytical method Methods 0.000 description 4
239000012159 carrier gas Substances 0.000 description 4
238000001816 cooling Methods 0.000 description 4
238000010586 diagram Methods 0.000 description 3
238000010884 ion-beam technique Methods 0.000 description 3
230000003321 amplification Effects 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
230000005540 biological transmission Effects 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
230000006378 damage Effects 0.000 description 2
239000003574 free electron Substances 0.000 description 2
238000004949 mass spectrometry Methods 0.000 description 2
230000007246 mechanism Effects 0.000 description 2
238000003199 nucleic acid amplification method Methods 0.000 description 2
238000001228 spectrum Methods 0.000 description 2
230000002159 abnormal effect Effects 0.000 description 1
230000009471 action Effects 0.000 description 1
230000008033 biological extinction Effects 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
230000009931 harmful effect Effects 0.000 description 1
238000009413 insulation Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000009467 reduction Effects 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
238000011144 upstream manufacturing Methods 0.000 description 1
229910052720 vanadium Inorganic materials 0.000 description 1
LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
238000004804 winding Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Electron Tubes For Measurement (AREA)

JP61095855A 1985-04-24 1986-04-24 真空チエンバ内へプラズマを標本抽出する方法及びそのためのｒｆバイアスを有する装置 Expired - Lifetime JPH0821363B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
CA000479934A CA1246246A (fr)	1985-04-24	1985-04-24	Methode et appareil a polarisation rf pour echantillonner un plasma dans une chambre a vide
CA479934		1985-04-24

Publications (2)

Publication Number	Publication Date
JPS61248348A JPS61248348A (ja)	1986-11-05
JPH0821363B2 true JPH0821363B2 (ja)	1996-03-04

Family

ID=4130351

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP61095855A Expired - Lifetime JPH0821363B2 (ja)	1985-04-24	1986-04-24	真空チエンバ内へプラズマを標本抽出する方法及びそのためのｒｆバイアスを有する装置

Country Status (4)

Country	Link
EP (1)	EP0199455B1 (fr)
JP (1)	JPH0821363B2 (fr)
CA (1)	CA1246246A (fr)
DE (1)	DE3665379D1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS62219452A (ja) *	1986-03-20	1987-09-26	Yokogawa Electric Corp	高周波誘導結合プラズマ・質量分析計
GB8813149D0 (en) *	1988-06-03	1988-07-06	Vg Instr Group	Mass spectrometer
JP2568253B2 (ja) *	1988-07-01	1996-12-25	日本電子株式会社	高周波誘導結合プラズマ質量分析装置
GB8901975D0 (en) *	1989-01-30	1989-03-22	Vg Instr Group	Plasma mass spectrometer
FR2656926B1 (fr) *	1990-01-05	1993-06-11	Air Liquide	Perfectionnement au procede d'analyse elementaire d'un echantillon par spectrometrie de masse couplee a un plasma induit par haute frequence et a l'installation pour la mise en óoeuvre de ce procede.
US5229605A (en) *	1990-01-05	1993-07-20	L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude	Process for the elementary analysis of a specimen by high frequency inductively coupled plasma mass spectrometry and apparatus for carrying out this process
JP2731512B2 (ja) *	1994-10-07	1998-03-25	株式会社日立製作所	プラズマ質量分析計
GB2636826B (en) *	2023-12-22	2026-03-18	Thermo Fisher Scient Bremen Gmbh	Spacer for an orifice element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA1189201A (fr) *	1982-12-08	1985-06-18	Donald J. Douglas	Methode et dispositif d'echantillonnage d'un plasma dans un tube sous vide

1985
- 1985-04-24 CA CA000479934A patent/CA1246246A/fr not_active Expired
1986
- 1986-03-18 EP EP19860301974 patent/EP0199455B1/fr not_active Expired
- 1986-03-18 DE DE8686301974T patent/DE3665379D1/de not_active Expired
- 1986-04-24 JP JP61095855A patent/JPH0821363B2/ja not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0199455B1 (fr)	1989-08-30
DE3665379D1 (en)	1989-10-05
CA1246246A (fr)	1988-12-06
JPS61248348A (ja)	1986-11-05
EP0199455A3 (en)	1987-05-13
EP0199455A2 (fr)	1986-10-29

Similar Documents

Publication	Publication Date	Title
US4682026A (en)	1987-07-21	Method and apparatus having RF biasing for sampling a plasma into a vacuum chamber
US6545270B2 (en)	2003-04-08	Plasma mass spectrometer
JP4339588B2 (ja)	2009-10-07	プラズマを用いた処理用ガスのための装置
JP4511505B2 (ja)	2010-07-28	軸電界を有する分析計
JP2648235B2 (ja)	1997-08-27	イオン銃
US4992665A (en)	1991-02-12	Filamentless magnetron-ion source and a process using it
EP0407539B2 (fr)	1995-03-08	Spectrometre de masse a plasma
JP3414398B2 (ja)	2003-06-09	イオンビームガン
JP2724416B2 (ja)	1998-03-09	高分解能プラズマ質量スペクトロメータ
JP2013545243A (ja)	2013-12-19	質量分析法における改良及び質量分析法に関係する改良
JPH0821363B2 (ja)	1996-03-04	真空チエンバ内へプラズマを標本抽出する方法及びそのためのｒｆバイアスを有する装置
US5925886A (en)	1999-07-20	Ion source and an ion implanting apparatus using it
US4804838A (en)	1989-02-14	Inductively-coupled radio frequency plasma mass spectrometer
Huf et al.	1983	A microwave-induced plasma between electrodes as a detector for gas and liquid chromatography
US20250132142A1 (en)	2025-04-24	Ion Analyzer and Ion Analyzing Method
JP2806641B2 (ja)	1998-09-30	高周波誘導結合プラズマ質量分析装置
Leitner et al.	1999	High-current, high-duty-factor experiments with the H ion source for the Spallation Neutron Source
Yoshida et al.	2000	The use of magnetic fields in a partial-coaxial microwave cavity holey-plate ion source
JPH07263184A (ja)	1995-10-13	マイクロ波プラズマ発生装置
Moritake Tamba	1997	CW metal arc discharge under high vacuum
JPH0465059A (ja)	1992-03-02	高周波誘導結合プラズマ質量分析装置
JPH04291713A (ja)	1992-10-15	プラズマｃｖｄ装置
Risler et al.	1974	Investigation of a polarized neutral atomic beam
JPH09259780A (ja)	1997-10-03	フィードスルー挿入型高周波導入プラズマ生成機構
Walther et al.	1988	Production of atomic or molecular nitrogen ion beams using a nutticusp and

Legal Events

Date	Code	Title	Description
2004-04-20	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2005-03-15	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2006-03-07	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2006-04-24	EXPY	Cancellation because of completion of term