JPH08318232A - Washing method - Google Patents

Washing method

Info

Publication number
JPH08318232A
JPH08318232A JP12477795A JP12477795A JPH08318232A JP H08318232 A JPH08318232 A JP H08318232A JP 12477795 A JP12477795 A JP 12477795A JP 12477795 A JP12477795 A JP 12477795A JP H08318232 A JPH08318232 A JP H08318232A
Authority
JP
Japan
Prior art keywords
tank
cleaning
immersed
solvent
aqueous solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP12477795A
Other languages
Japanese (ja)
Inventor
Hajime Takimoto
肇 滝本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP12477795A priority Critical patent/JPH08318232A/en
Publication of JPH08318232A publication Critical patent/JPH08318232A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PURPOSE: To shorten a washing line of a member such as an optical part after processing. CONSTITUTION: An article to be washed after processing is immersed in a non- aqueous solvent to be washed ultrasonically and subsequently immersed in a hydrophilic solvent or a non-aqueous solvent high in volatility to be washed ultrasonically. Or, the article to be washed after processing is immersed in a non-aqueous solvent to be washed ultrasonically and subsequently immersed in the hydrophilic solvent to be washed ultrasonically and further immersed in the non-aqueous solvent high in volatility to be washed ultrasonically.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は機構部材等の金属部品、
レンズ、プリズム等の光学部品、電子部品を実装する実
装基板やリードフレーム等の電気部品を精密に洗浄する
洗浄方法に関する。
BACKGROUND OF THE INVENTION The present invention relates to metal parts such as mechanical members,
The present invention relates to a cleaning method for precisely cleaning optical components such as lenses and prisms, mounting boards for mounting electronic components, and electrical components such as lead frames.

【0002】[0002]

【従来の技術】上述のような各種部品の精密洗浄の従来
方法としては、特開平5−68951号公報に開示され
ている。この方法は、パークロルエチレン等の塩素系
溶剤による脱脂工程、界面活性剤による水系への置換
工程、市水及び界面活性剤による仕上げ洗浄工程、
市水によるリンス工程、温純水への浸漬及び引き上げ
工程、温風吹きつけによる乾燥工程を有し、全部で6
工程によって洗浄している。
2. Description of the Related Art A conventional method for precision cleaning of various parts as described above is disclosed in Japanese Patent Laid-Open No. 5-68951. This method is a degreasing process with a chlorine-based solvent such as perchlorethylene, a water-based replacement process with a surfactant, a final cleaning process with city water and a surfactant,
It has a rinse process with city water, a dipping and pulling process in warm pure water, and a drying process by blowing warm air.
It is washed by the process.

【0003】[0003]

【発明が解決しようとする課題】上述した従来方法で
は、全部で6工程を必要としており、長い洗浄工程とな
っている。また塩素系溶剤を用いているため、地下水汚
染等の環境、人体に及ぼす影響が大きいという問題があ
ると共に、近い将来、塩素系溶剤使用の規制の可能性が
ある。さらには、リンス工程及び引き上げ工程では水を
用いているところから、乾燥後に被洗浄物の表面にシミ
が発生する問題を有している。
The above-mentioned conventional method requires a total of 6 steps, which is a long washing step. Further, since the chlorine-based solvent is used, there is a problem that it has a great influence on the environment such as groundwater pollution and the human body, and there is a possibility that the use of the chlorine-based solvent will be restricted in the near future. Further, since water is used in the rinsing step and the pulling step, there is a problem that stains are generated on the surface of the article to be cleaned after drying.

【0004】本発明はこのような事情を考慮してなされ
たものであり、洗浄工程を短縮でき、しかも環境、人体
に悪影響なく、さらには被洗浄物表面にシミ等の発生の
ない洗浄方法を提供することを目的とする。
The present invention has been made in consideration of the above circumstances, and provides a cleaning method which can shorten the cleaning process, has no adverse effect on the environment and the human body, and has no stain on the surface of the object to be cleaned. The purpose is to provide.

【0005】[0005]

【課題を解決するための手段および作用】本発明の洗浄
方法は、加工後の被洗浄物を非水系溶剤に浸漬して超音
波により洗浄した後、親水性溶剤または揮発性の高い非
水系溶剤に浸漬して超音波により洗浄するものである。
Means and Actions for Solving the Problems In the cleaning method of the present invention, a processed object is immersed in a non-aqueous solvent and ultrasonically cleaned, and then a hydrophilic solvent or a highly volatile non-aqueous solvent is used. It is immersed in and washed with ultrasonic waves.

【0006】この方法における作用を光学部品を例とし
て説明する。レンズ等の光学部品は加工によりピッチ、
保護膜等が表面に付着しており、この光学部品を適当に
加温した非水系溶剤に浸漬し、超音波を作用させると、
ピッチは超音波の物理力と溶剤の溶解力とにより剥離或
いは溶解する。次に、この光学部品を親水性溶剤あるい
は揮発性の高い非水系溶剤に浸漬して超音波を作用させ
る。この工程では、前工程での非水系溶剤が超音波の物
理力と液の相溶性により、親水性溶剤あるいは揮発性の
高い非水系溶剤へ置換される。このとき、たとえ、非水
系溶剤を用いる第1の工程でピッチが若干残留していて
も、この第2の工程の親水性溶剤或いは非水系溶剤への
浸漬により完全に除去される。また、この場合、親水性
溶剤と揮発性の高い非水系溶剤は常温での蒸気圧が比較
的高いものを選択することにより、乾燥を速やかに行う
ことができる。
The operation of this method will be described by taking an optical component as an example. Optical parts such as lenses are pitched by processing,
A protective film is attached to the surface, and when this optical component is immersed in a suitably heated non-aqueous solvent and ultrasonic waves are applied,
The pitch is peeled or dissolved by the physical force of ultrasonic waves and the dissolving power of the solvent. Next, this optical component is immersed in a hydrophilic solvent or a non-volatile solvent having high volatility to apply ultrasonic waves. In this step, the non-aqueous solvent in the previous step is replaced with a hydrophilic solvent or a highly volatile non-aqueous solvent due to the physical force of ultrasonic waves and the compatibility of the liquid. At this time, even if some pitch remains in the first step using the non-aqueous solvent, it is completely removed by the immersion in the hydrophilic solvent or the non-aqueous solvent in the second step. Further, in this case, the hydrophilic solvent and the non-volatile solvent having high volatility are selected such that the vapor pressure at room temperature is relatively high, whereby the drying can be carried out quickly.

【0007】本発明の別の洗浄方法は、加工後の被洗浄
物を被水系溶剤に浸漬して超音波により洗浄した後、親
水性溶剤に浸漬して超音波により洗浄し、更に揮発性の
高い非水系溶剤に浸漬して超音波により洗浄するもので
ある。
In another cleaning method of the present invention, the processed object is immersed in a water-based solvent and ultrasonically cleaned, then immersed in a hydrophilic solvent and ultrasonically cleaned, and further volatile. It is immersed in a high non-aqueous solvent and ultrasonically cleaned.

【0008】この方法は非水系溶剤内での超音波洗浄の
後、親水性溶剤に浸漬することにより、イオン的極性の
汚れを除去する。その後、水を全く含まない非水系溶剤
で仕上げる為、非洗浄物の表面はレベルの高い仕上がり
状態となる。
In this method, ionic polarity stains are removed by immersing in a hydrophilic solvent after ultrasonic cleaning in a non-aqueous solvent. After that, the surface is finished with a non-aqueous solvent containing no water, so that the surface of the non-washed product has a high-level finish.

【0009】本発明では、このような非水系溶剤、親水
性溶剤及び揮発性の高い非水系溶剤を収納する洗浄槽を
複数とすることができ、これにより、二次付着のない良
好な工程を設定できる。この洗浄槽の数は投入される被
洗浄物の数と要求される洗浄品質により調整されるが、
概して洗浄ラインで5〜10槽、洗浄タクトが無視でき
る場合は2〜5槽の数で十分であり、これにより工程数
が少なくなり、ラインの短縮化を行うことができる。
In the present invention, it is possible to provide a plurality of cleaning tanks for accommodating such a non-aqueous solvent, a hydrophilic solvent and a highly volatile non-aqueous solvent, whereby a good process without secondary adhesion can be achieved. Can be set. The number of cleaning tanks is adjusted depending on the number of objects to be cleaned and the required cleaning quality.
Generally, the number of tanks is 5 to 10 in the cleaning line, and the number of tanks is 2 to 5 when the cleaning tact is negligible, which reduces the number of steps and shortens the line.

【0010】本発明において、非水系溶剤として、商品
名「EE−4110」、「EE−4210」(オリンパ
ス光学工業(株)製)、イソパラフィン系炭化水素、ナ
フテン系炭化水素等の内、1種または複数を選択するこ
とができる。親水性溶剤としては、イソプロピルアルコ
ール(IPA)、エタノール等のアルコールの内の1種
または複数を選択することができる。揮発性の高い非水
系溶剤としては、商品名「EE−3110」(オリンパ
ス光学工業(株)製)、イソパラフィン系炭化水素、ナ
フテン系炭化水素等の内の1種または複数を選択するこ
とができる。この場合、この揮発性の高い非水系溶剤と
しては、沸点が30〜200℃の範囲のものが好適であ
る。このような低い沸点の溶剤は常温での蒸気圧が比較
的高く、乾燥し易いためである。
In the present invention, as the non-aqueous solvent, one of trade name "EE-4110", "EE-4210" (manufactured by Olympus Optical Co., Ltd.), isoparaffin hydrocarbon, naphthene hydrocarbon, etc. Or a plurality can be selected. As the hydrophilic solvent, one or more of alcohols such as isopropyl alcohol (IPA) and ethanol can be selected. As the highly volatile non-aqueous solvent, one or more selected from trade names “EE-3110” (manufactured by Olympus Optical Co., Ltd.), isoparaffin hydrocarbons, naphthene hydrocarbons and the like can be selected. . In this case, the highly volatile non-aqueous solvent preferably has a boiling point in the range of 30 to 200 ° C. This is because such a low boiling point solvent has a relatively high vapor pressure at room temperature and is easily dried.

【0011】[0011]

【実施例】【Example】

(実施例1)図1は本発明の実施例1を示す。第1槽1
〜第4槽4は第1工程に用いられ、これらの槽1〜4に
は非水系溶剤である商品名「EE−4110」の洗浄液
が充填されている。この洗浄剤「EE−4110」はオ
リンパス光学工業(株)製の炭化水素系のピッチ、ワッ
クス専用洗浄液である。
(Embodiment 1) FIG. 1 shows Embodiment 1 of the present invention. First tank 1
-The 4th tank 4 is used for the 1st process, and these tanks 1-4 are filled with the washing | cleaning liquid of brand name "EE-4110" which is a non-aqueous solvent. This cleaning agent "EE-4110" is a cleaning liquid for hydrocarbon pitch and wax manufactured by Olympus Optical Co., Ltd.

【0012】第5槽5〜第7槽7は第2工程に用いら
れ、IPAが充填されており、第1工程に用いられた
「EE−4110」をIPAに置換する。第8層8は第
3工程に用いられ、エアーブローによって液切りを行
う。第9槽9は第4工程に用いられ、温風乾燥を行う。
The fifth tank to the seventh tank 7 are used in the second step and are filled with IPA, and "EE-4110" used in the first step is replaced with IPA. The eighth layer 8 is used in the third step and is drained by air blow. The ninth tank 9 is used in the fourth step and performs warm air drying.

【0013】このような構成に対して、洗浄サンプルと
して、研磨後のピッチ付きのレンズを1列、20個入れ
の三点支持の洗浄かごに3列並べて配置した。すなわ
ち、本実施例ではレンズが1カゴに60個配置したもの
をサンプルとして、洗浄した。第1槽1〜第7槽の底部
には28KHz/600Wの出力の超音波振動子が取り
付けられている。
With respect to such a structure, as a cleaning sample, one row of pitched lenses after polishing was arranged in three rows in a three-point supporting cleaning basket containing 20 pieces. That is, in this example, 60 lenses in one basket were used as a sample for cleaning. An ultrasonic transducer with an output of 28 KHz / 600 W is attached to the bottoms of the first tank 1 to the seventh tank.

【0014】洗浄条件は第1〜4槽の液温が60℃、第
5〜7槽の液温が25〜30℃、第8槽のエアー温度が
常温、第9槽の温風が80℃に設定した。第1槽1と第
4槽4とは、蒸留再生機21によって連結されており、
第1槽の汚液は蒸留再生機21で再生されて、第4槽に
供給される。第4槽4からオーバーフローした溶剤は第
3槽3に流入し、以降、順次前槽に流入して第1槽まで
導かれる。第5槽5〜7槽7は各槽単独でフィルタリン
グされ、循環する構造となっている。各槽の循環流量は
5リットル/minとした。洗浄タクトは90secと
し、搬送時間を除いた正味の洗浄時間は60secであ
った。
The cleaning conditions are as follows: the liquid temperature in the first to fourth tanks is 60 ° C., the liquid temperature in the fifth to seventh tanks is 25 to 30 ° C., the air temperature in the eighth tank is room temperature, and the hot air in the ninth tank is 80 ° C. Set to. The first tank 1 and the fourth tank 4 are connected by a distillation regenerator 21,
The waste liquid in the first tank is regenerated by the distillation regenerator 21 and supplied to the fourth tank. The solvent overflowing from the fourth tank 4 flows into the third tank 3, and thereafter sequentially flows into the previous tank and is guided to the first tank. The fifth tank 5 to the seventh tank 7 have a structure in which each tank is filtered and circulated. The circulation flow rate in each tank was 5 liters / min. The cleaning tact was 90 seconds, and the net cleaning time excluding the transportation time was 60 seconds.

【0015】表1はこの実施例によって洗浄した結果を
示す。同表における評価は反射防止膜をコーティングし
た後、蛍光灯下での目視によるシミ発生数で判断した。
結果は、従来のピッチ洗浄ライン(比較例1)とほぼ同
等の良好な結果となったが、本実施例は比較例1(図4
参照)に比べて、洗浄槽数を3槽減少させることができ
た。
Table 1 shows the results of cleaning according to this example. The evaluation in the table was judged by the number of spots visually observed under a fluorescent lamp after coating the antireflection film.
The result is a good result which is almost the same as that of the conventional pitch cleaning line (Comparative Example 1).
It was possible to reduce the number of washing tanks by three compared with the reference).

【0016】[0016]

【表1】 [Table 1]

【0017】(実施例2)図2は本発明の実施例2の構
成を示し、実施例1と同様な要素は同一の符号により対
応させてある。本実施例では第1槽1〜第4槽4は第1
工程であり、「EE−4110」を用いたピッチ除去を
行う。第5槽5〜第7槽7は第2工程であり、IPAを
用いてEE−4110の置換を行う。第8槽8及び第9
槽9は第3工程であり、「EE−3110」を用いてI
PAの置換を行う。第10槽10は第4工程であり、温
風による乾燥を行う。「EE−3110」はオリンパス
光学工業(株)製のフロンに替わるシリコーン系乾燥専
用液である。洗浄サンプルとしては、実験例1と全く同
様のサンプルを用い、洗浄タクトタイム等の条件は実施
例1と全く同条件で洗浄を実施した。但し、第8槽8及
び第9槽9における「EE−3110」の液温は常温
(25℃)とし、第9槽9の引き上げ速度を1.5〜3
mm/secの低速で行った。
(Embodiment 2) FIG. 2 shows the structure of Embodiment 2 of the present invention, and the same elements as those of Embodiment 1 are designated by the same reference numerals. In this embodiment, the first tank 1 to the fourth tank 4 are the first
This is a step, and pitch removal using "EE-4110" is performed. The fifth tank 5 to the seventh tank 7 are the second step, in which IPE is used to replace the EE-4110. 8th tank 8 and 9th
The tank 9 is the third step, and the "EE-3110" is used to
Replace PA. The tenth tank 10 is the fourth step, and performs drying with warm air. "EE-3110" is an exclusive liquid for drying silicone, which replaces CFC manufactured by Olympus Optical Co., Ltd. As the cleaning sample, the same sample as in Experimental Example 1 was used, and the cleaning was performed under the same conditions as in Example 1 such as the cleaning tact time. However, the liquid temperature of “EE-3110” in the eighth tank 8 and the ninth tank 9 is room temperature (25 ° C.), and the pulling rate of the ninth tank 9 is 1.5 to 3
It was performed at a low speed of mm / sec.

【0018】表2は本実施例の洗浄の結果を示す。評価
は洗浄後の蛍光灯下の呼気試験によるシミの発生数で判
断した。表2における槽の増減は実施例1との比較の槽
数であり、実施例1よりも1槽増しただけとなっている
が、図4に示す比較例1に比べて、槽数が2槽少なくな
っている。
Table 2 shows the cleaning results of this example. The evaluation was judged by the number of spots generated by the breath test under a fluorescent lamp after washing. The increase / decrease in the number of tanks in Table 2 is the number of tanks in comparison with Example 1, and only one tank is added compared to Example 1, but the number of tanks is 2 compared to Comparative Example 1 shown in FIG. The tank is running low.

【0019】[0019]

【表2】 [Table 2]

【0020】(実施例3)図3は本発明の実施例3の構
成を示す。第1槽1及び第2槽2は第1工程であり、
「EE−4110」によりピッチを除去する。第3槽3
及び第4槽4は第2工程であり、「EE−3110」に
より「EE−4110」を置換する。第5槽5は「EE
−3110」の液切りを行う第3工程、第6槽6は温風
によって乾燥を行う第4工程である。
(Embodiment 3) FIG. 3 shows the construction of Embodiment 3 of the present invention. The first tank 1 and the second tank 2 are the first step,
The pitch is removed by "EE-4110". Third tank 3
And the 4th tank 4 is a 2nd process and replaces "EE-4110" by "EE-3110". The fifth tank 5 is "EE
-3110 "is the third step of draining, and the sixth tank 6 is the fourth step of drying with warm air.

【0021】洗浄サンプルとしては、レンズピッチが残
っているリセス皿を用い、洗浄時間を各槽3分とした。
なおリセス皿は直径が50mm程度の微小レンズ用のも
のである。第1槽1〜第4槽4の底部には超音波振動子
20が取り付けられている。また第1槽1と第2槽2は
蒸留再生機21によって連結され、第1槽1の汚液が蒸
留再生されて、第2槽2に再供給される。第3槽3及び
第4槽4内の「EE−3110」液は図示を省略した予
備槽と循環する構造となっており、フィルタリングが行
われる。フィルタリング流量及び再生流量とも、3リッ
トル/min程度に調整した。第1槽1及び第2槽2の
液温は40°C、第3槽3及び第4槽4の液温は25°
C、第5槽5のエアー温度は常温、第6槽6の温風温度
は60°Cとした。
As a cleaning sample, a recess dish with the lens pitch remaining was used, and the cleaning time was 3 minutes in each tank.
The recess dish is for a micro lens having a diameter of about 50 mm. An ultrasonic transducer 20 is attached to the bottoms of the first tank 1 to the fourth tank 4. Further, the first tank 1 and the second tank 2 are connected by a distillation regenerator 21, and the waste liquid in the first tank 1 is distilled and regenerated and resupplied to the second tank 2. The "EE-3110" solution in the third tank 3 and the fourth tank 4 has a structure in which it circulates with a preliminary tank (not shown), and is filtered. Both the filtering flow rate and the regeneration flow rate were adjusted to about 3 liters / min. The liquid temperature of the first tank 1 and the second tank 2 is 40 ° C, and the liquid temperature of the third tank 3 and the fourth tank 4 is 25 °
C, the air temperature of the fifth tank 5 was room temperature, and the hot air temperature of the sixth tank 6 was 60 ° C.

【0022】表3は本実施例の洗浄結果を示す。評価は
蛍光灯下での目視により、皿面くぼみのピッチが完全に
除去されているかで行った。本実施例の結果は図5に示
す比較例2と同等に良好なレベルとなっている。
Table 3 shows the cleaning results of this example. The evaluation was performed by visually observing under a fluorescent lamp to see if the pitch of the dish recesses was completely removed. The result of this example is at a level as good as that of the comparative example 2 shown in FIG.

【0023】[0023]

【表3】 [Table 3]

【0024】(比較例1)図4は比較例1の構成を示
す。第1槽1〜第4槽4はパークロルエチレンを用いた
ピッチ除去を行う第1工程、第5槽5〜第7槽7は界面
活性剤を用いたパークロルエチレンの乳化を行う第2工
程、第8槽8及び第9槽9は市水を用いた界面活性剤の
置換を行う第3工程、第10槽10〜第11槽11は温
純水を用いた市水の置換を行う第3工程、第12槽12
は温風によって乾燥を行う第4工程である。この比較例
における洗浄サンプル、洗浄条件は実施例1及び2と同
様であり、その結果を表1に示す。
Comparative Example 1 FIG. 4 shows the structure of Comparative Example 1. The first tank 1 to the fourth tank 4 are the first step for performing pitch removal using perchlorethylene, and the fifth tank 5 to the seventh tank 7 are the second step for emulsifying perchlorethylene using a surfactant. The eighth tank 8 and the ninth tank 9 are the third step of replacing the surfactant with city water, and the tenth tank to the eleventh tank 11 are the third step of replacing the city water with warm pure water. , Twelfth tank 12
Is the fourth step of drying with warm air. The washing sample and washing conditions in this comparative example are the same as those in Examples 1 and 2, and the results are shown in Table 1.

【0025】(比較例2)図5は実施例3に対応する比
較例2の構成を示す。第1槽1〜第3槽3はトリクレン
を用いたピッチ除去工程であり、超音波振動子20によ
り超音波洗浄を行う。第4槽4は乾燥工程であり、トリ
クレンベーパーを用いている。洗浄サンプル及び洗浄条
件を実施例3と同様に行ったところ、洗浄品質に問題は
なかった。
Comparative Example 2 FIG. 5 shows the structure of Comparative Example 2 corresponding to Example 3. The first tank 1 to the third tank 3 are pitch removing steps using trichlene, and ultrasonic cleaning is performed by the ultrasonic vibrator 20. The fourth tank 4 is a drying process and uses trichlene vapor. When the washing sample and the washing conditions were the same as in Example 3, there was no problem in the washing quality.

【0026】[0026]

【発明の効果】本発明は加工後の被洗浄物を非水系溶剤
に浸漬して超音波により洗浄した後、親水性溶剤または
揮発性の高い非水系溶剤に浸漬して超音波により洗浄す
るものであり、また、加工後の被洗浄物を被水系溶剤に
浸漬して超音波により洗浄した後、親水性溶剤に浸漬し
て超音波により洗浄し、更に揮発性の高い非水系溶剤に
浸漬して超音波により洗浄するものであり、これらによ
り、良好な洗浄仕上がりとすることができると共に、洗
浄ラインを短縮することができる。
Industrial Applicability According to the present invention, a processed object is immersed in a non-aqueous solvent and ultrasonically cleaned, and then immersed in a hydrophilic solvent or a highly volatile non-aqueous solvent and ultrasonically cleaned. Also, after the processed object is immersed in a water-based solvent and ultrasonically cleaned, immersed in a hydrophilic solvent and ultrasonically cleaned, further immersed in a highly volatile non-aqueous solvent The cleaning is performed by ultrasonic waves, which makes it possible to obtain a good cleaning finish and shorten the cleaning line.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1の構成を示す側面図。FIG. 1 is a side view showing a configuration of a first embodiment.

【図2】実施例2の構成を示す側面図。FIG. 2 is a side view showing the configuration of the second embodiment.

【図3】実施例3の構成を示す側面図。FIG. 3 is a side view showing the configuration of the third embodiment.

【図4】比較例1の構成を示す側面図。FIG. 4 is a side view showing the configuration of Comparative Example 1.

【図5】比較例2の構成を示す側面図。5 is a side view showing the configuration of Comparative Example 2. FIG.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 加工後の被洗浄物を非水系溶剤に浸漬し
て超音波により洗浄した後、親水性溶剤または揮発性の
高い非水系溶剤に浸漬して超音波により洗浄することを
特徴とする洗浄方法。
1. The object to be cleaned after processing is immersed in a non-aqueous solvent and ultrasonically cleaned, and then immersed in a hydrophilic solvent or a highly volatile non-aqueous solvent and ultrasonically cleaned. How to wash.
【請求項2】 加工後の被洗浄物を被水系溶剤に浸漬し
て超音波により洗浄した後、親水性溶剤に浸漬して超音
波により洗浄し、更に揮発性の高い非水系溶剤に浸漬し
て超音波により洗浄することを特徴とする洗浄方法。
2. The processed object is immersed in a water-based solvent and ultrasonically cleaned, then immersed in a hydrophilic solvent and ultrasonically cleaned, and further immersed in a highly volatile non-aqueous solvent. Cleaning method characterized by ultrasonic cleaning.
JP12477795A 1995-05-24 1995-05-24 Washing method Withdrawn JPH08318232A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12477795A JPH08318232A (en) 1995-05-24 1995-05-24 Washing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12477795A JPH08318232A (en) 1995-05-24 1995-05-24 Washing method

Publications (1)

Publication Number Publication Date
JPH08318232A true JPH08318232A (en) 1996-12-03

Family

ID=14893863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12477795A Withdrawn JPH08318232A (en) 1995-05-24 1995-05-24 Washing method

Country Status (1)

Country Link
JP (1) JPH08318232A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6603248B1 (en) 1998-03-24 2003-08-05 Corning Incorporated External electrode driven discharge lamp
KR101446121B1 (en) * 2013-02-13 2014-10-30 동원이엠 주식회사 Cleaning apparatus having quick drying means

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6603248B1 (en) 1998-03-24 2003-08-05 Corning Incorporated External electrode driven discharge lamp
US6981903B2 (en) 1998-03-24 2006-01-03 Corning Incorporated External electrode driven discharge lamp
KR101446121B1 (en) * 2013-02-13 2014-10-30 동원이엠 주식회사 Cleaning apparatus having quick drying means

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