JPH08324087A - スタンプ素材およびスタンプ素材用パッケージ - Google Patents
スタンプ素材およびスタンプ素材用パッケージInfo
- Publication number
- JPH08324087A JPH08324087A JP8035242A JP3524296A JPH08324087A JP H08324087 A JPH08324087 A JP H08324087A JP 8035242 A JP8035242 A JP 8035242A JP 3524296 A JP3524296 A JP 3524296A JP H08324087 A JPH08324087 A JP H08324087A
- Authority
- JP
- Japan
- Prior art keywords
- stamp
- photosensitive resin
- base
- resin
- adhesive strength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 70
- 229920005989 resin Polymers 0.000 claims abstract description 133
- 239000011347 resin Substances 0.000 claims abstract description 133
- 239000000853 adhesive Substances 0.000 claims abstract description 50
- 230000001070 adhesive effect Effects 0.000 claims abstract description 50
- 239000007787 solid Substances 0.000 claims abstract description 7
- 239000012790 adhesive layer Substances 0.000 claims description 25
- 230000000903 blocking effect Effects 0.000 claims description 9
- 238000009423 ventilation Methods 0.000 claims description 9
- 229920002050 silicone resin Polymers 0.000 claims description 7
- 230000035699 permeability Effects 0.000 claims description 5
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 41
- 238000003825 pressing Methods 0.000 description 9
- 238000003860 storage Methods 0.000 description 7
- 229920006267 polyester film Polymers 0.000 description 6
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000002390 adhesive tape Substances 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229920000544 Gore-Tex Polymers 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 230000029058 respiratory gaseous exchange Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8035242A JPH08324087A (ja) | 1995-03-30 | 1996-02-22 | スタンプ素材およびスタンプ素材用パッケージ |
| TW085103215A TW314491B (2) | 1995-03-30 | 1996-03-18 | |
| US08/623,403 US5915299A (en) | 1995-03-30 | 1996-03-28 | Stamp making unit and package therefor |
| KR1019960008685A KR100203543B1 (ko) | 1995-03-30 | 1996-03-28 | 스템프 소재 및 스템프 소재용 패키지 |
| CN96107307A CN1075000C (zh) | 1995-03-30 | 1996-03-29 | 印模材料 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7-99775 | 1995-03-30 | ||
| JP9977595 | 1995-03-30 | ||
| JP8035242A JPH08324087A (ja) | 1995-03-30 | 1996-02-22 | スタンプ素材およびスタンプ素材用パッケージ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08324087A true JPH08324087A (ja) | 1996-12-10 |
Family
ID=26374192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8035242A Pending JPH08324087A (ja) | 1995-03-30 | 1996-02-22 | スタンプ素材およびスタンプ素材用パッケージ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5915299A (2) |
| JP (1) | JPH08324087A (2) |
| KR (1) | KR100203543B1 (2) |
| CN (1) | CN1075000C (2) |
| TW (1) | TW314491B (2) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6460456B1 (en) * | 1999-03-31 | 2002-10-08 | Brother Kogo Kabushiki Kaisha | Stamp making apparatus and attachment thereof |
| KR100689166B1 (ko) * | 1999-07-06 | 2007-03-08 | 부라더 고교 가부시키가이샤 | 스탬프용 도장 부재 및 이를 이용한 스탬프 유닛 |
| US6371022B1 (en) * | 1999-07-31 | 2002-04-16 | Enid R. Crystal | Detachable handle for inkpads |
| US6732649B1 (en) * | 1999-09-28 | 2004-05-11 | Alexander C. Wall | Methods for providing custom rubber stamps |
| WO2003014832A1 (en) * | 2001-08-10 | 2003-02-20 | Paul Mayo Holt | Methods and apparatus for use in photopolymer plate manufacture |
| GB2372575B (en) * | 2001-08-10 | 2003-01-15 | Chemence Ltd | Method for forming a sachet |
| US10029396B2 (en) * | 2014-10-30 | 2018-07-24 | Shachihata Inc. | Seal carving apparatus and thermal carving machine |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5237855B2 (2) * | 1973-12-03 | 1977-09-26 | ||
| JPH0585027A (ja) * | 1991-09-27 | 1993-04-06 | Taisei Plus Kk | 押印具の製造方法及び押印具材料 |
| JP3317126B2 (ja) * | 1995-03-30 | 2002-08-26 | セイコーエプソン株式会社 | スタンプ素材およびスタンプ素材の作成方法 |
-
1996
- 1996-02-22 JP JP8035242A patent/JPH08324087A/ja active Pending
- 1996-03-18 TW TW085103215A patent/TW314491B/zh not_active IP Right Cessation
- 1996-03-28 KR KR1019960008685A patent/KR100203543B1/ko not_active Expired - Fee Related
- 1996-03-28 US US08/623,403 patent/US5915299A/en not_active Expired - Fee Related
- 1996-03-29 CN CN96107307A patent/CN1075000C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR100203543B1 (ko) | 1999-06-15 |
| TW314491B (2) | 1997-09-01 |
| US5915299A (en) | 1999-06-29 |
| CN1075000C (zh) | 2001-11-21 |
| CN1139620A (zh) | 1997-01-08 |
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