JPH08324087A - スタンプ素材およびスタンプ素材用パッケージ - Google Patents

スタンプ素材およびスタンプ素材用パッケージ

Info

Publication number
JPH08324087A
JPH08324087A JP8035242A JP3524296A JPH08324087A JP H08324087 A JPH08324087 A JP H08324087A JP 8035242 A JP8035242 A JP 8035242A JP 3524296 A JP3524296 A JP 3524296A JP H08324087 A JPH08324087 A JP H08324087A
Authority
JP
Japan
Prior art keywords
stamp
photosensitive resin
base
resin
adhesive strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8035242A
Other languages
English (en)
Japanese (ja)
Inventor
Hiroshi Kuriyama
弘 栗山
Kozo Gyoda
幸三 行田
Masahiko Nunokawa
正彦 布川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP8035242A priority Critical patent/JPH08324087A/ja
Priority to TW085103215A priority patent/TW314491B/zh
Priority to US08/623,403 priority patent/US5915299A/en
Priority to KR1019960008685A priority patent/KR100203543B1/ko
Priority to CN96107307A priority patent/CN1075000C/zh
Publication of JPH08324087A publication Critical patent/JPH08324087A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
JP8035242A 1995-03-30 1996-02-22 スタンプ素材およびスタンプ素材用パッケージ Pending JPH08324087A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP8035242A JPH08324087A (ja) 1995-03-30 1996-02-22 スタンプ素材およびスタンプ素材用パッケージ
TW085103215A TW314491B (2) 1995-03-30 1996-03-18
US08/623,403 US5915299A (en) 1995-03-30 1996-03-28 Stamp making unit and package therefor
KR1019960008685A KR100203543B1 (ko) 1995-03-30 1996-03-28 스템프 소재 및 스템프 소재용 패키지
CN96107307A CN1075000C (zh) 1995-03-30 1996-03-29 印模材料

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP7-99775 1995-03-30
JP9977595 1995-03-30
JP8035242A JPH08324087A (ja) 1995-03-30 1996-02-22 スタンプ素材およびスタンプ素材用パッケージ

Publications (1)

Publication Number Publication Date
JPH08324087A true JPH08324087A (ja) 1996-12-10

Family

ID=26374192

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8035242A Pending JPH08324087A (ja) 1995-03-30 1996-02-22 スタンプ素材およびスタンプ素材用パッケージ

Country Status (5)

Country Link
US (1) US5915299A (2)
JP (1) JPH08324087A (2)
KR (1) KR100203543B1 (2)
CN (1) CN1075000C (2)
TW (1) TW314491B (2)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6460456B1 (en) * 1999-03-31 2002-10-08 Brother Kogo Kabushiki Kaisha Stamp making apparatus and attachment thereof
KR100689166B1 (ko) * 1999-07-06 2007-03-08 부라더 고교 가부시키가이샤 스탬프용 도장 부재 및 이를 이용한 스탬프 유닛
US6371022B1 (en) * 1999-07-31 2002-04-16 Enid R. Crystal Detachable handle for inkpads
US6732649B1 (en) * 1999-09-28 2004-05-11 Alexander C. Wall Methods for providing custom rubber stamps
WO2003014832A1 (en) * 2001-08-10 2003-02-20 Paul Mayo Holt Methods and apparatus for use in photopolymer plate manufacture
GB2372575B (en) * 2001-08-10 2003-01-15 Chemence Ltd Method for forming a sachet
US10029396B2 (en) * 2014-10-30 2018-07-24 Shachihata Inc. Seal carving apparatus and thermal carving machine

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5237855B2 (2) * 1973-12-03 1977-09-26
JPH0585027A (ja) * 1991-09-27 1993-04-06 Taisei Plus Kk 押印具の製造方法及び押印具材料
JP3317126B2 (ja) * 1995-03-30 2002-08-26 セイコーエプソン株式会社 スタンプ素材およびスタンプ素材の作成方法

Also Published As

Publication number Publication date
KR100203543B1 (ko) 1999-06-15
TW314491B (2) 1997-09-01
US5915299A (en) 1999-06-29
CN1075000C (zh) 2001-11-21
CN1139620A (zh) 1997-01-08

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