JPH044231A - Heat-resistant film with low coefficient of linear expansion and production thereof - Google Patents
Heat-resistant film with low coefficient of linear expansion and production thereofInfo
- Publication number
- JPH044231A JPH044231A JP10288790A JP10288790A JPH044231A JP H044231 A JPH044231 A JP H044231A JP 10288790 A JP10288790 A JP 10288790A JP 10288790 A JP10288790 A JP 10288790A JP H044231 A JPH044231 A JP H044231A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyamic acid
- heat
- linear expansion
- acid solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 52
- 229920001721 polyimide Polymers 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims abstract description 10
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229920006015 heat resistant resin Polymers 0.000 claims abstract description 9
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 239000004642 Polyimide Substances 0.000 claims abstract description 4
- 239000000243 solution Substances 0.000 claims description 24
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 18
- 150000004985 diamines Chemical class 0.000 claims description 6
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims description 6
- CQMIJLIXKMKFQW-UHFFFAOYSA-N 4-phenylbenzene-1,2,3,5-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C1C1=CC=CC=C1 CQMIJLIXKMKFQW-UHFFFAOYSA-N 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 5
- 238000003756 stirring Methods 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims description 2
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 claims 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 abstract description 3
- 230000001681 protective effect Effects 0.000 abstract description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 abstract description 2
- 238000013019 agitation Methods 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 12
- 239000002904 solvent Substances 0.000 description 10
- 239000011521 glass Substances 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000002798 polar solvent Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- 238000012691 depolymerization reaction Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、電気絶縁材料や、保護フィルム、断熱材など
に利用される耐熱性樹脂のフィルムを作製するにあたり
、60〜150℃の温度で加熱して得られたポリアミッ
ク酸フィルムを、 2〜200 g / m m 2の
荷重で引っ張り、フィルムに5〜500Hzの振動をあ
たえながら加熱硬化を行う事により得られる、低線膨張
率耐熱性フィルムおよびその製造方法に係るものである
。Detailed Description of the Invention (Field of Industrial Application) The present invention is applicable to the production of heat-resistant resin films used for electrical insulating materials, protective films, heat insulating materials, etc. A heat-resistant film with a low linear expansion coefficient, which is obtained by pulling a polyamic acid film obtained by heating with a load of 2 to 200 g/mm2 and heat-curing it while applying vibrations of 5 to 500 Hz to the film. and its manufacturing method.
(従来の技術)
従来、耐熱性樹脂で低線膨張率のフィルムを得るために
は、フィルム製造過程に1軸または2軸方向に延伸する
方法が行われている。(Prior Art) Conventionally, in order to obtain a film of a heat-resistant resin with a low coefficient of linear expansion, a method of uniaxially or biaxially stretching has been used in the film manufacturing process.
しかしながら、この様な方法で得られるフィルムは、厚
みが不均一であったり、延伸による分子の配向性が幅方
向に分布するなどの問題点があり、製造条件を高度に制
御する必要があった。However, the films obtained by this method have problems such as non-uniform thickness and distribution of molecular orientation in the width direction due to stretching, so it was necessary to highly control the manufacturing conditions. .
さらに、近年より低熱膨張率のフィルムに対する需要が
高まってきているが、上述のような方法では充分に均一
で、低熱膨張のフィルムを得るのが難しかった。Furthermore, although the demand for films with a low coefficient of thermal expansion has been increasing in recent years, it has been difficult to obtain a sufficiently uniform film with a low coefficient of thermal expansion using the methods described above.
(発明が解決しようとする課題)
本発明は、これまでにかかる欠点を克服すべく鋭意検討
した結果、本発明で特定する方法を用いて製造した耐熱
性樹脂フィルムが、線膨張係数が非常に小さいとの知見
を得、本発明を完成するに至ったものである。(Problems to be Solved by the Invention) The present invention has been made as a result of intensive studies aimed at overcoming the above-mentioned drawbacks. As a result, the heat-resistant resin film produced using the method specified in the present invention has a very high coefficient of linear expansion. Based on this finding, the present invention was completed.
(課題を解決するための手段)
本発明は、耐熱性樹脂のフィルムを作製するにあたり、
60〜150℃の温度で加熱して得られたポリアミッ
ク酸フィルムを、 2〜200 g / mm2の荷重
で引っ張り、フィルムに5〜500Hzの振動をあたえ
ながら加熱硬化を行う事により得られる、低線膨張率耐
熱性フィルムおよびその製造方法である。(Means for Solving the Problems) The present invention provides the following features in producing a heat-resistant resin film:
A low wire film obtained by heating a polyamic acid film at a temperature of 60 to 150°C is stretched under a load of 2 to 200 g/mm2, and heat-cured while applying vibrations of 5 to 500 Hz to the film. A heat-resistant expansion film and a method for producing the same.
(作用)
本発明で用いる耐熱性樹脂は、フィルム形成能があれば
よいが、つぎに示すようなポリイミドが目的にかなって
いる。(Function) The heat-resistant resin used in the present invention only needs to have film-forming ability, and the following polyimides suit the purpose.
すなわち、テトラカルボン酸二無水物成分とジアミン成
分とを、酸成分/アミン成分(モル比)を0.90〜1
.00として反応させるに当たり、3.3°、4,4°
−ビフェニルテトラカルボン酸二無水物とパラフェニレ
ンジアミンとを反応させて得られたポリアミック酸溶液
(A)と、 ピロメリット酸二無水物と4.4°−ジア
ミノジフェニルエーテルを反応させて得られたポリアミ
ック酸溶液(B)とを、A/B=45155〜1001
0の割合で混合撹拌して得られるポリアミック酸混合溶
液を加熱硬化させて得られるポリイミドである。That is, the tetracarboxylic dianhydride component and the diamine component are mixed at an acid component/amine component (molar ratio) of 0.90 to 1.
.. When reacting as 00, 3.3°, 4,4°
- A polyamic acid solution (A) obtained by reacting biphenyltetracarboxylic dianhydride and paraphenylene diamine, and a polyamic acid solution (A) obtained by reacting pyromellitic dianhydride and 4.4°-diaminodiphenyl ether. acid solution (B), A/B=45155-1001
It is a polyimide obtained by heating and curing a polyamic acid mixed solution obtained by mixing and stirring at a ratio of 0.
本発明の低線膨張率フィルムの製造方法は、まず上記の
ポリアミック酸溶液をガラス板などの基材上に直接流延
塗布し、これを樹脂層が皮膜化し、しかも完全硬化しな
い、 60〜150℃の温度で加熱して得られたポリア
ミック酸フィルムにl軸あるいは2軸方向に低周波振動
を与λながら連続的に100℃から350℃まで加熱硬
化を行うことによってポリイミドフィルムを得る。The method for producing a low linear expansion coefficient film of the present invention is to first directly cast the above-mentioned polyamic acid solution onto a substrate such as a glass plate, and form a resin layer into a film but not completely cure. A polyimide film is obtained by heating and curing the polyamic acid film obtained by heating at a temperature of 100° C. continuously from 100° C. to 350° C. while applying low frequency vibration in the l-axis or biaxial direction at λ.
本発明で用いるテトラカルボン酸二無水物とは、3.3
′,4,4′−ビフェニルテトラカルボン酸二無水物と
、ピロメリット酸二無水物であるが、この他の酸、例え
ば2.3.3°4−ビフェニルテトラカルボン酸二無水
物、3,3°、4.4’−ベンゾフェノンテトラカルボ
ン酸二無水物、3.3°、4.4°−P−テルフェニル
テトラカルボン酸二無水物、2.3.6.7−ナフタレ
ンテトラカルボン酸二無水物、3.3°、4.4−ベン
ゾフェノンテトラカルボン酸二無水物、3.3°、4.
4°−P−テルフェニルテトラカルボン酸二無水物、4
.4°−ヘキサフルオロイソプロピリデンビス(フタル
酸無水物)等も併用することが出来る。The tetracarboxylic dianhydride used in the present invention is 3.3
',4,4'-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride, but other acids such as 2.3.3°4-biphenyltetracarboxylic dianhydride, 3, 3°, 4.4'-benzophenonetetracarboxylic dianhydride, 3.3°, 4.4°-P-terphenyltetracarboxylic dianhydride, 2.3.6.7-naphthalenetetracarboxylic dianhydride Anhydride, 3.3°, 4.4-benzophenonetetracarboxylic dianhydride, 3.3°, 4.
4°-P-terphenyltetracarboxylic dianhydride, 4
.. 4°-hexafluoroisopropylidene bis (phthalic anhydride) and the like can also be used in combination.
本発明で用いるジアミンとは、バラフェニレンジアミン
と4,4°−ジアミノジフェニルエーテルであるがこの
他のアミン例えば4.4°−ジアミノジフェニルメタン
、3.3°−ジメチルベンジジン、4,4°−ジアミノ
−P−テルフェニル、4,4°−ジアミノ−P−クォー
ターフェニル、2.8−ジアミノジフェニレンオキサイ
ドなども併用することができる。The diamines used in the present invention include phenylenediamine and 4,4°-diaminodiphenyl ether, but other amines such as 4.4°-diaminodiphenylmethane, 3.3°-dimethylbenzidine, 4,4°-diamino- P-terphenyl, 4,4°-diamino-P-quarterphenyl, 2,8-diaminodiphenylene oxide, etc. can also be used in combination.
テトラカルボン酸二無水物成分とジアミン成分との反応
は酸成分/アミン成分(モル比)0.90〜1.00で
行うのが好ましく、 0.90より低いと重合度が上が
らず硬化後の皮膜特性が悪い。The reaction between the tetracarboxylic dianhydride component and the diamine component is preferably carried out at an acid component/amine component (molar ratio) of 0.90 to 1.00. If it is lower than 0.90, the degree of polymerization will not increase and the reaction after curing will be Poor film properties.
1、00より大きいと、硬化時にガスを発生し、平滑な
皮膜を得ることが出来ない。If it is larger than 1.00, gas will be generated during curing, making it impossible to obtain a smooth film.
反応は通常、テトラカルボン酸二無水物およびジアミン
類と反応しない有機極性溶媒中で行われる0反応系に対
して不活性であり、かつ生成物に対して溶媒であること
以外に、この有機極性溶媒は反応成分の少なくとも一方
、好ましくは両者に対して良溶媒でなければならない、
この種の溶媒として代表的なものは、N、N−ジメチル
ホルムアミド、N、N−ジメチルアセトアミド、ジメチ
ルスルホン、ジメチルスルホキシド、N−メチル−2−
ビロリドン等があり、これらの溶媒は単独または組み合
わせて使用される。この他にも溶媒として組み合わせて
用いられるものとしてベンゼン、 ジオキサン、キシレ
ン、 トルエン、シクロヘキサン等の非極性溶媒が、原
料の分散媒、反応調節剤あるいは生成物からの揮散調節
剤、皮膜平滑剤等として使用される。The reaction is usually carried out in an organic polar solvent that does not react with the tetracarboxylic dianhydride and diamines.In addition to being inert to the reaction system and being a solvent for the product, this organic polar solvent The solvent must be a good solvent for at least one, preferably both, of the reaction components;
Typical solvents of this type include N,N-dimethylformamide, N,N-dimethylacetamide, dimethylsulfone, dimethylsulfoxide, and N-methyl-2-
There are pyrrolidone and the like, and these solvents are used alone or in combination. In addition, non-polar solvents such as benzene, dioxane, xylene, toluene, and cyclohexane are also used in combination as solvents, as dispersion media for raw materials, reaction regulators, volatilization regulators from products, film smoothing agents, etc. used.
反応は一般的に無水の条件下で行うことが好ましい、こ
れはテトラカルボン酸二無水物が水により開環し、不活
性化し、反応を停止させる恐れがあるためである。この
ため仕込原料中の水分も溶媒中の水分も除去する必要が
ある。しかし一方、反応の進行を調節し、樹脂重合度を
コントロールするためにあえて水を添加することも行わ
れる。It is generally preferable to carry out the reaction under anhydrous conditions, since the tetracarboxylic dianhydride may be ring-opened by water, becoming inactivated, and terminating the reaction. Therefore, it is necessary to remove both the moisture in the raw materials and the moisture in the solvent. However, on the other hand, water is intentionally added in order to adjust the progress of the reaction and control the degree of resin polymerization.
また反応は不活性ガス雰囲気中で行われることが好まし
い、これはジアミン類の酸化を防止するためである。不
活性ガスとしては一般的に乾燥窒素ガスが使用される。Further, the reaction is preferably carried out in an inert gas atmosphere in order to prevent oxidation of the diamines. Dry nitrogen gas is generally used as the inert gas.
本発明で用いるポリイミド樹脂の合成反応は以下の様な
方法で行われる。即ち、3,3°、4.4°−ビフェニ
ルテトラカルボン酸二無水物とパラフェニレンジアミン
とを反応させて得られたポリアミック酸(Aとする)と
ピロメリット酸二無水物と4.4゜ジアミノジフェニル
エーテルとを反応させて得られたポリアミック酸(Bと
する)とをA/B=45155〜10010の割合で混
合撹拌することによってポリアミック酸(Cとする)を
得る方法である。The synthesis reaction of the polyimide resin used in the present invention is carried out in the following manner. That is, a polyamic acid (referred to as A) obtained by reacting 3,3°, 4.4°-biphenyltetracarboxylic dianhydride and paraphenylenediamine, pyromellitic dianhydride, and 4.4° This is a method of obtaining a polyamic acid (referred to as C) by mixing and stirring a polyamic acid obtained by reacting with diaminodiphenyl ether (referred to as B) at a ratio of A/B = 45155 to 10010.
Aの比率が上述の割合よりも少ないときには線膨張率が
充分に小さくならない。When the ratio of A is less than the above-mentioned ratio, the coefficient of linear expansion will not become sufficiently small.
A、 Bを合成し、また、 これらを混合してCを得
る反応温度は0〜100℃であることが望ましい。The reaction temperature for synthesizing A and B and mixing them to obtain C is preferably 0 to 100°C.
0℃以下だと反応の速度が遅く、 100℃以上である
と生成したポリアミック酸の閉環反応および解重合反応
が開始するためである。通常、反応は20℃前後で行わ
れる。This is because if the temperature is below 0°C, the reaction rate will be slow, and if it is above 100°C, the ring-closing reaction and depolymerization reaction of the produced polyamic acid will start. Usually, the reaction is carried out at around 20°C.
本発明により製造されたポリアミック酸生成物は、使用
するに当たって各種のシランカップリング剤、ボランカ
ップリング剤、チタネート系カップリング剤1、アルミ
ニウム系カップリング剤その他キレート系の接着性・密
着性向上剤や各種溶剤、フローエージ1ントを加えても
よく、またゴムや低分子エポキシ等の可どう性賦与剤や
粘度調整剤、あるいはポリアミドイミド、 ポリエーテ
ルイミド、ポリエステルイミドや、他のポリアミック酸
等をブレンドしてもよくタルク、マイカ、石英粉末等の
充填剤、カーポンプラッ久 フタロシアニンブルー等の
着色剤、テトラブロモフェニルメタン等の難燃剤、三酸
化アンチモン等の難燃助剤の少量を加えてもよい。When using the polyamic acid product produced according to the present invention, various silane coupling agents, borane coupling agents, titanate coupling agents 1, aluminum coupling agents and other chelate-based adhesion/adhesion improvers can be used. Various solvents, flow agents, etc. may be added, and ductility agents and viscosity modifiers such as rubber and low-molecular epoxy, polyamideimide, polyetherimide, polyesterimide, and other polyamic acids may also be added. A small amount of fillers such as talc, mica, quartz powder, colorants such as phthalocyanine blue, flame retardants such as tetrabromophenylmethane, and flame retardant aids such as antimony trioxide may be added. .
本発明で使用されるポリアミック酸フィルムには、上記
のポリアミック酸溶液をガラス板などの基材上に直接流
延塗布し、樹脂層が皮膜化し、しかも完全硬化しない6
0−150”Cの状態まで加熱したものが用いられる。The polyamic acid film used in the present invention is produced by directly casting the above-mentioned polyamic acid solution onto a base material such as a glass plate, so that the resin layer forms a film but does not completely cure.
The material heated to 0-150''C is used.
60℃以下の温度では溶剤の蒸発が十分ではなく、フィ
ルムが得られにくい、 150”C以上の濃度では硬
化が必要以上に進み、つぎに振動を与えながら加熱を行
っても線膨張率が十分に小さくならない。At temperatures below 60°C, the solvent does not evaporate sufficiently and it is difficult to obtain a film. At concentrations above 150"C, curing progresses more than necessary, and the coefficient of linear expansion is insufficient even when heated with vibration. does not become smaller.
本発明でポリアミック酸フィルムの作製に使用される基
材は、ガラス板が用いられるが、アルミ板、ニッケル板
、ステンレス板、なども用いることが出来、また、連続
的に生産する場合にはステンレスドラムを用いる。The base material used in the production of polyamic acid film in the present invention is a glass plate, but aluminum plates, nickel plates, stainless steel plates, etc. can also be used, and in the case of continuous production, stainless steel plates can also be used. Use a drum.
次いで、得られたポリアミック酸フィルムの1軸あるい
は2軸方向を低周波振動子で固定し、2〜200 g/
mm2の荷重で引っ張り、 5〜5ooH2の振動周波
数で励振しながら加熱硬化を行う。Next, the obtained polyamic acid film is fixed in uniaxial or biaxial directions with a low frequency vibrator, and 2 to 200 g/
It is pulled under a load of mm2 and heated and cured while being excited at a vibration frequency of 5 to 5ooH2.
引っ張り荷重が2gより少ないとフィルムがたるみ、振
動を充分に伝えることが出来ず、 200gより大きい
と加熱時にフィルムが伸び、硬化の前後で寸法が変化し
てしまう。If the tensile load is less than 2g, the film will sag and vibrations cannot be transmitted sufficiently, and if it is more than 200g, the film will stretch during heating and its dimensions will change before and after curing.
振動数は5〜500Hzであればよいが、5H2以下か
または500Hz以上では線膨張係数が充分に小さくな
らない。The vibration frequency may be from 5 to 500 Hz, but if the frequency is less than 5H2 or more than 500 Hz, the coefficient of linear expansion will not become sufficiently small.
加熱は低温から徐々に高くする方が好ましい。It is preferable to gradually increase the heating from a low temperature.
例えば、 100℃から350℃まで0. 5時間以上
かけて連続的に加熱する。0. 5時間未満であると膜
厚にもよるが、脱溶媒が不十分であったり、イミドの閉
環が不十分で特性が十分に発揮されないことがある。ま
た例えば、 100℃で30分、ついで150℃で30
分、200℃で30分、 250℃で30分 300℃
で30分 350℃で20分という具合いに段階的に昇
温してもよい。For example, from 100℃ to 350℃. Heat continuously for 5 hours or more. 0. If the time is less than 5 hours, depending on the film thickness, solvent removal may be insufficient or imide ring closure may be insufficient, resulting in insufficient properties. For example, at 100℃ for 30 minutes, then at 150℃ for 30 minutes.
minutes, 30 minutes at 200℃, 30 minutes at 250℃ 300℃
The temperature may be raised stepwise, such as 30 minutes at 350°C and 20 minutes at 350°C.
本発明で用いる低周波振動装置は一般に油圧駆動のタイ
プが好適に用いられるが、その他の形式の物でも上記の
振動周波数を満たせば使用できる。The low frequency vibration device used in the present invention is generally of a hydraulically driven type, but other types can also be used as long as they satisfy the above vibration frequency.
(実施例1)
温度計、撹拌装置、環流コンデンサーおよび乾燥窒素ガ
ス吹き込み口を備えた4つロセパラブルフラスコに精製
した無水のパラフェニレンジアミン108gをとり、こ
れに無水のN−メチル−2−ピロリドン90重量%とト
ルエン10重量%の混合溶剤を、全仕込原料中の固形分
割合が20重量%になるだけの量を加えて溶解した。乾
燥窒素ガスは反応の準備段階より生成物取り出しまでの
全行程にわたり流しておいた。ついで精製した無水の3
゜3°、4.4°−ビフェニルテトラカルボン酸二無水
物294gを攪はんしながら少量ずつ添加するが発熱反
応であるため、外部水槽に約15℃の冷水を循環させて
これを冷却した。添加後、内部温度を20℃に設定し、
5時間撹拌し反応を終了してポリアミック酸溶液(A
とする)を得た。次に上記と同様の装置及び方法で無水
の4.4°−ジアミノジフェニルエーテル200gと精
製した無水のピロメリット酸二無水物218gを反応さ
せてポリアミック酸(Bとする)を得た。次にAおよび
Bを、モル比がA/B=60/40になるように混合撹
拌した。得られた生成物は、黄色透明の極めて粘稠なポ
リアミック酸溶液であり、N−メチル−2−ピロリドン
中0. 5重量%溶液の固有粘度は0.81(30℃)
であった、このポリアミック酸溶液をガラス板上に流延
塗布した後80℃の乾燥器にいれて2時間かけてポリア
ミック酸フィルムを作製した。(Example 1) 108 g of purified anhydrous para-phenylenediamine was placed in a four-separable flask equipped with a thermometer, a stirrer, a reflux condenser, and a dry nitrogen gas inlet, and anhydrous N-methyl-2- A mixed solvent of 90% by weight of pyrrolidone and 10% by weight of toluene was added and dissolved in an amount sufficient to make the solid content ratio in the total raw materials 20% by weight. Dry nitrogen gas was allowed to flow throughout the reaction from the preparatory stage to the product removal. Then purified anhydrous 3
294 g of ゜3°, 4.4°-biphenyltetracarboxylic dianhydride was added little by little while stirring, but since it was an exothermic reaction, cold water of about 15°C was circulated in an external water tank to cool it. . After addition, set the internal temperature to 20 °C,
After stirring for 5 hours to complete the reaction, the polyamic acid solution (A
) was obtained. Next, 200 g of anhydrous 4.4°-diaminodiphenyl ether and 218 g of purified anhydrous pyromellitic dianhydride were reacted using the same apparatus and method as above to obtain a polyamic acid (referred to as B). Next, A and B were mixed and stirred so that the molar ratio was A/B=60/40. The product obtained is a clear yellow, extremely viscous polyamic acid solution with a 0.0% concentration in N-methyl-2-pyrrolidone. The intrinsic viscosity of a 5% by weight solution is 0.81 (30°C)
This polyamic acid solution was cast onto a glass plate and then placed in a dryer at 80°C for 2 hours to produce a polyamic acid film.
この様にして製造されたポリアミック酸フィルムに低周
波振動子を固定し、 20g/mm2の荷重で引っ張り
、 30Hzの振動を加えながら150℃から350℃
まで2時間かけて昇温し、ポリイミドフィルムを得た。A low-frequency vibrator was fixed to the polyamic acid film produced in this way, and the film was pulled under a load of 20 g/mm2 and heated from 150°C to 350°C while applying 30Hz vibration.
The temperature was raised over 2 hours to obtain a polyimide film.
この様にして製造されたポリイミドフィルムは、線膨張
率が一2ppmで、耐熱性、耐燃性も優れたフィルムで
あった。The polyimide film produced in this manner had a coefficient of linear expansion of 12 ppm, and was also excellent in heat resistance and flame resistance.
(実施例2)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3°、4.4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4,4゛−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が70/30になる
ように混合撹拌した。(Example 2) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3°, 4,4-biphenyltetracarboxylic dianhydride,
A polyamic acid solution (referred to as B) consisting of 4,4'-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 70/30.
生成物の固有粘度は0.90であった。このポリアミッ
ク酸溶液をガラス板上に流延塗布した後100℃の乾燥
器に入れ、 1時間かけてポリアミック酸フィルムを得
た。The product had an intrinsic viscosity of 0.90. This polyamic acid solution was cast onto a glass plate and placed in a dryer at 100°C for 1 hour to obtain a polyamic acid film.
この様にして製造されたポリアミック酸フィルムを低周
波振動子で固定し、 100g/mm2の荷重で引っ張
り、400Hzの振動を与えながら150℃から350
℃まで連続的に1時間30分がけて昇温し、ポリイミド
フィルムを得た。The polyamic acid film produced in this way was fixed with a low-frequency vibrator, pulled under a load of 100 g/mm2, and heated from 150°C to 350°C while applying 400Hz vibration.
The temperature was continuously raised to ℃ over 1 hour and 30 minutes to obtain a polyimide film.
この様にして製造されたポリイミドフィルムは、線膨張
率が3ppmで、耐熱性、耐燃性も優れたポリイミドフ
ィルムであった。The polyimide film produced in this manner had a coefficient of linear expansion of 3 ppm and was excellent in heat resistance and flame resistance.
(比較例1)
実施例1と同様な装置及び方法で作製したポリアミック
酸溶液をガラス板上に直接流延塗布し、170℃で1時
間加熱してフィルムを得た。こうして得られたフィルム
を低周波振動子で固定し、30 g / m m 2の
荷重で引っ張り、 30Hzの振動を加えながら、 1
50℃から350℃まで2時間かけて昇温し、ポリイミ
ドフィルムを得た。(Comparative Example 1) A polyamic acid solution prepared using the same apparatus and method as in Example 1 was directly cast onto a glass plate, and heated at 170° C. for 1 hour to obtain a film. The film thus obtained was fixed with a low-frequency vibrator, pulled under a load of 30 g/mm2, and subjected to vibrations of 30 Hz.
The temperature was raised from 50°C to 350°C over 2 hours to obtain a polyimide film.
この様にして製造されたポリイミドフィルムは、線膨張
率が21ppmと高かった。The polyimide film produced in this way had a high coefficient of linear expansion of 21 ppm.
(比較例2)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3°、4.4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4.4°−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が35/65になる
ように混合撹拌した。(Comparative Example 2) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3.3°, 4,4-biphenyltetracarboxylic dianhydride,
4. A polyamic acid solution (referred to as B) consisting of 4°-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 35/65.
このポリアミック酸溶液をガラス板上に流延塗布した後
乾燥器にいれ100℃で1時間加熱し、ポリアミック酸
フィルムを得た。This polyamic acid solution was cast onto a glass plate and then placed in a dryer and heated at 100°C for 1 hour to obtain a polyamic acid film.
この様にして得られたポリアミック酸フィルムを低周波
振動子で固定し、 100g/mm2の荷重で引っ張り
、振動を加えずに、 150’Cから350℃まで2時
間かけて昇温し、ポリイミドフィルムを得た。The polyamic acid film obtained in this way was fixed with a low frequency vibrator, pulled under a load of 100 g/mm2, and heated from 150'C to 350°C over 2 hours without adding vibration, to form a polyimide film. I got it.
この様にして製造されたポリイミドフィルムは、線膨張
率が17ppmと高かった。The polyimide film produced in this manner had a linear expansion coefficient as high as 17 ppm.
(比較例3)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3,3°、4.4−ビフェニルテトラカルボン酸
二無水物からなるポリアミック酸溶液(Aとする)と、
4.4°−ジアミノジフェニルエーテルとピロメリット
酸二無水物からなるポリアミック酸溶液(Bとする)を
合成した。つぎに、AとBをモル比が60/40になる
ように混合撹拌した。(Comparative Example 3) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3,3°, 4,4-biphenyltetracarboxylic dianhydride,
4. A polyamic acid solution (referred to as B) consisting of 4°-diaminodiphenyl ether and pyromellitic dianhydride was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 60/40.
このポリアミック酸溶液をガラス板上に流延塗布した後
100℃の乾燥器に入れ、 1時間かけてポリアミック
酸フィルムを得た。This polyamic acid solution was cast onto a glass plate and placed in a dryer at 100°C for 1 hour to obtain a polyamic acid film.
この様にして製造されたポリアミック酸フィルムを低周
波振動子で固定し、50g/mm2の荷重で引っ張り、
700Hzの振動を与えながら150℃から350℃
まで連続的に1時間30分かけて昇温し、ポリイミドフ
ィルムを得た。The polyamic acid film produced in this way was fixed with a low frequency vibrator and pulled under a load of 50 g/mm2.
150℃ to 350℃ while applying 700Hz vibration
The temperature was raised continuously over 1 hour and 30 minutes to obtain a polyimide film.
この様にして製造されたポリイミドフィルムは、線膨張
率が20ppmと高かった。The polyimide film produced in this manner had a linear expansion coefficient as high as 20 ppm.
(比較例4)
実施例1と同様な装置及び方法で、パラフェニレンジア
ミンと3.3′,4,4′−ビフェニルテトラカルボン
酸二無水物からなるポリアミック酸溶液(Aとする)と
、4.4°−ジアミノジフェニルエーテルとピロメリッ
ト酸二無水物からなるポリアミック酸溶液(Bとする)
を合成した。つぎに、AとBをモル比が60/40にな
るように混合撹拌した。(Comparative Example 4) Using the same apparatus and method as in Example 1, a polyamic acid solution (referred to as A) consisting of paraphenylene diamine and 3,3',4,4'-biphenyltetracarboxylic dianhydride, and 4 .4°-Diamino diphenyl ether and pyromellitic dianhydride polyamic acid solution (referred to as B)
was synthesized. Next, A and B were mixed and stirred so that the molar ratio was 60/40.
このポリアミック酸溶液をガラス板上に流延塗布した後
100℃の乾燥器に入れ、 1時間がけてポリアミック
酸フィルムを得た。This polyamic acid solution was cast onto a glass plate and placed in a dryer at 100°C for 1 hour to obtain a polyamic acid film.
この様にして製造されたポリアミック酸フィルムを低周
波振動子で固定し、 Ig/mrn’の荷重で引っ張り
、 120Hzの振動を与えながら150℃から350
℃まで連続的に1時間30分かけて昇温し、ポリイミド
フィルムを得た。The polyamic acid film produced in this way was fixed with a low-frequency vibrator, pulled under a load of Ig/mrn', and heated from 150°C to 350°C while applying 120Hz vibration.
The temperature was continuously raised to ℃ over 1 hour and 30 minutes to obtain a polyimide film.
この様にして製造されたポリイミドフィルムは、線膨張
率が18ppmと高かった。The polyimide film produced in this manner had a linear expansion coefficient as high as 18 ppm.
(発明の効果)
本発明の方法で製造したポリイミドフィルムは、線膨張
率が低く、耐熱性や耐燃性に非常に優れ、電気特性や機
械特性も優れたフィルムであった。(Effects of the Invention) The polyimide film produced by the method of the present invention had a low coefficient of linear expansion, excellent heat resistance and flame resistance, and excellent electrical and mechanical properties.
本発明で得られる低線膨張率耐熱フィルムはフレキシブ
ルプリント回路用基板やモーターの絶縁、各種の保護フ
ィルム、磁気テープやフロッピーディスオのベースフィ
ルム、粘着テープ、断熱材などにも利用される。The heat-resistant film with a low coefficient of linear expansion obtained by the present invention can also be used as insulation for flexible printed circuit boards and motors, various protective films, base films for magnetic tapes and floppy discs, adhesive tapes, and heat insulating materials.
Claims (2)
〜150℃の温度で加熱して得られたポリアミック酸フ
ィルムを、2〜200g/mm^2の荷重で引っ張り、
フィルムに5〜500Hzの振動をあたえながら加熱硬
化を行う事により得られる、線膨張率が−5〜5ppm
の耐熱性フィルムおよびその製造方法。(1) When producing a film of heat-resistant resin, 60
The polyamic acid film obtained by heating at a temperature of ~150°C was pulled under a load of 2 to 200 g/mm^2,
A linear expansion coefficient of -5 to 5 ppm obtained by heating and curing the film while applying vibrations of 5 to 500 Hz.
heat-resistant film and its manufacturing method.
ジアミン成分とを、酸成分/アミン成分(モル比)を0
.90〜1.00として反応させるに当たり、3,3′
,4,4′−ビフェニルテトラカルボン酸二無水物とパ
ラフェニレンジアミンとを反応させて得られたポリアミ
ック酸溶液(A)と、ピロメリット酸二無水物と4,4
′−ジアミノジフェニルエーテルを反応させて得られた
ポリアミック酸溶液(B)とを、A/B=45/55〜
100/0の割合で混合撹拌して得られるポリアミック
酸混合溶液を加熱硬化させて得られるポリイミドである
、特許請求項第1項記載の耐熱性フィルム。(2) The heat-resistant resin contains a tetracarboxylic dianhydride component and a diamine component, and the acid component/amine component (molar ratio) is 0.
.. 90 to 1.00 when reacting, 3,3'
, 4,4'-biphenyltetracarboxylic dianhydride and paraphenylenediamine, and a polyamic acid solution (A) obtained by reacting pyromellitic dianhydride and 4,4'-biphenyltetracarboxylic dianhydride.
'-diaminodiphenyl ether and the polyamic acid solution (B) obtained by reacting with A/B=45/55~
The heat-resistant film according to claim 1, which is a polyimide obtained by heating and curing a polyamic acid mixed solution obtained by mixing and stirring at a ratio of 100/0.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2102887A JP3001061B2 (en) | 1990-04-20 | 1990-04-20 | Heat-resistant film with low linear expansion coefficient and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2102887A JP3001061B2 (en) | 1990-04-20 | 1990-04-20 | Heat-resistant film with low linear expansion coefficient and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH044231A true JPH044231A (en) | 1992-01-08 |
| JP3001061B2 JP3001061B2 (en) | 2000-01-17 |
Family
ID=14339376
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2102887A Expired - Fee Related JP3001061B2 (en) | 1990-04-20 | 1990-04-20 | Heat-resistant film with low linear expansion coefficient and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3001061B2 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05263049A (en) * | 1992-03-19 | 1993-10-12 | Kanegafuchi Chem Ind Co Ltd | TAB tape and method for producing the same |
| EP0529097A4 (en) * | 1991-03-12 | 1994-01-26 | Sumitomo Bakelite Company Limited | |
| EP0879839A1 (en) * | 1997-05-21 | 1998-11-25 | Toray-DuPont Company, Ltd. | Polyimide copolymer, polyimide copolymer resin molded products and their preparation |
| JP2005314669A (en) * | 2004-03-30 | 2005-11-10 | Du Pont Toray Co Ltd | Polyimide film and copper-clad laminate based thereon |
| JP2011068867A (en) * | 2009-08-21 | 2011-04-07 | Du Pont Toray Co Ltd | Polyimide film |
| WO2014173085A1 (en) * | 2013-04-23 | 2014-10-30 | 广东丹邦科技有限公司 | Novel transparent polyimide film, pre-polymer thereof, and preparation method thereof |
| CN116960453A (en) * | 2023-08-30 | 2023-10-27 | 安徽创速新能源科技有限公司 | Hybrid solid electrolyte film with efficient flame retardant property and preparation method and application thereof |
-
1990
- 1990-04-20 JP JP2102887A patent/JP3001061B2/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0529097A4 (en) * | 1991-03-12 | 1994-01-26 | Sumitomo Bakelite Company Limited | |
| US5507903A (en) * | 1991-03-12 | 1996-04-16 | Sumitomo Bakelite Company Limited | Process for producing two-layered tape for tab |
| JPH05263049A (en) * | 1992-03-19 | 1993-10-12 | Kanegafuchi Chem Ind Co Ltd | TAB tape and method for producing the same |
| EP0879839A1 (en) * | 1997-05-21 | 1998-11-25 | Toray-DuPont Company, Ltd. | Polyimide copolymer, polyimide copolymer resin molded products and their preparation |
| US5859171A (en) * | 1997-05-21 | 1999-01-12 | Dupont Toray | Polyimide copolymer, polyimide copolymer resin molded products and their preparation |
| JP2005314669A (en) * | 2004-03-30 | 2005-11-10 | Du Pont Toray Co Ltd | Polyimide film and copper-clad laminate based thereon |
| JP2011068867A (en) * | 2009-08-21 | 2011-04-07 | Du Pont Toray Co Ltd | Polyimide film |
| WO2014173085A1 (en) * | 2013-04-23 | 2014-10-30 | 广东丹邦科技有限公司 | Novel transparent polyimide film, pre-polymer thereof, and preparation method thereof |
| CN116960453A (en) * | 2023-08-30 | 2023-10-27 | 安徽创速新能源科技有限公司 | Hybrid solid electrolyte film with efficient flame retardant property and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3001061B2 (en) | 2000-01-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |