JPH088159A - 走査型露光装置 - Google Patents

走査型露光装置

Info

Publication number
JPH088159A
JPH088159A JP6135615A JP13561594A JPH088159A JP H088159 A JPH088159 A JP H088159A JP 6135615 A JP6135615 A JP 6135615A JP 13561594 A JP13561594 A JP 13561594A JP H088159 A JPH088159 A JP H088159A
Authority
JP
Japan
Prior art keywords
stage
speed
mask
scanning
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP6135615A
Other languages
English (en)
Japanese (ja)
Inventor
Susumu Makinouchi
進 牧野内
Toshio Ueda
稔夫 上田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP6135615A priority Critical patent/JPH088159A/ja
Priority to US08/464,369 priority patent/US5699145A/en
Priority to KR1019950016562A priority patent/KR960001902A/ko
Publication of JPH088159A publication Critical patent/JPH088159A/ja
Priority to US09/450,566 priority patent/US6259511B1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP6135615A 1993-07-14 1994-06-17 走査型露光装置 Withdrawn JPH088159A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6135615A JPH088159A (ja) 1994-06-17 1994-06-17 走査型露光装置
US08/464,369 US5699145A (en) 1993-07-14 1995-06-05 Scanning type exposure apparatus
KR1019950016562A KR960001902A (ko) 1994-06-17 1995-06-17 주사형 노광 장치
US09/450,566 US6259511B1 (en) 1993-07-14 1999-11-30 Scanning type exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6135615A JPH088159A (ja) 1994-06-17 1994-06-17 走査型露光装置

Publications (1)

Publication Number Publication Date
JPH088159A true JPH088159A (ja) 1996-01-12

Family

ID=15155954

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6135615A Withdrawn JPH088159A (ja) 1993-07-14 1994-06-17 走査型露光装置

Country Status (2)

Country Link
JP (1) JPH088159A (ko)
KR (1) KR960001902A (ko)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6646715B1 (en) 1997-01-14 2003-11-11 Nikon Corporation Scanning exposure apparatus and method with run-up distance control
US6884448B2 (en) 2000-05-09 2005-04-26 Nagatanien Co., Ltd. Sponge cake premix and method of manufacturing sponge cake by using said premix
KR100483982B1 (ko) * 1996-06-07 2005-08-10 가부시키가이샤 니콘 진동절연장치및노광장치
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
JP2006310849A (ja) * 2005-04-25 2006-11-09 Asml Netherlands Bv リソグラフィ装置、位置量コントローラ及び制御方法
JP2008060563A (ja) * 2006-08-29 2008-03-13 Asml Netherlands Bv 可動物体の位置を制御するための方法、位置決めシステム、および、リソグラフィ装置
WO2013161858A1 (ja) * 2012-04-24 2013-10-31 株式会社ニコン 制御装置、ステージ装置、露光装置、及び制御方法
WO2014010233A1 (ja) * 2012-07-09 2014-01-16 株式会社ニコン 駆動システム及び駆動方法、並びに露光装置及び露光方法
US8852751B2 (en) 2009-09-25 2014-10-07 Hamilton Sundstrand Corporation Wear resistant device and process therefor
JP2017083911A (ja) * 2012-04-27 2017-05-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
KR20200105841A (ko) * 2018-01-15 2020-09-09 구라시키 가코 가부시키가이샤 능동형 제진장치
CN115616868A (zh) * 2021-07-13 2023-01-17 佳能株式会社 曝光装置和制造物品的方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3982913B2 (ja) * 1998-07-17 2007-09-26 株式会社アドバンテスト 荷電粒子ビーム露光装置

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100483982B1 (ko) * 1996-06-07 2005-08-10 가부시키가이샤 니콘 진동절연장치및노광장치
US6646715B1 (en) 1997-01-14 2003-11-11 Nikon Corporation Scanning exposure apparatus and method with run-up distance control
US6884448B2 (en) 2000-05-09 2005-04-26 Nagatanien Co., Ltd. Sponge cake premix and method of manufacturing sponge cake by using said premix
JP2006203113A (ja) * 2005-01-24 2006-08-03 Nikon Corp ステージ装置、ステージ制御方法、露光装置及び方法、並びにデバイス製造方法
JP2006310849A (ja) * 2005-04-25 2006-11-09 Asml Netherlands Bv リソグラフィ装置、位置量コントローラ及び制御方法
JP2008060563A (ja) * 2006-08-29 2008-03-13 Asml Netherlands Bv 可動物体の位置を制御するための方法、位置決めシステム、および、リソグラフィ装置
US8852751B2 (en) 2009-09-25 2014-10-07 Hamilton Sundstrand Corporation Wear resistant device and process therefor
WO2013161858A1 (ja) * 2012-04-24 2013-10-31 株式会社ニコン 制御装置、ステージ装置、露光装置、及び制御方法
JP2017083911A (ja) * 2012-04-27 2017-05-18 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
WO2014010233A1 (ja) * 2012-07-09 2014-01-16 株式会社ニコン 駆動システム及び駆動方法、並びに露光装置及び露光方法
JPWO2014010233A1 (ja) * 2012-07-09 2016-06-20 株式会社ニコン 駆動システム及び駆動方法、並びに露光装置及び露光方法
KR20200105841A (ko) * 2018-01-15 2020-09-09 구라시키 가코 가부시키가이샤 능동형 제진장치
CN115616868A (zh) * 2021-07-13 2023-01-17 佳能株式会社 曝光装置和制造物品的方法

Also Published As

Publication number Publication date
KR960001902A (ko) 1996-01-26

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Legal Events

Date Code Title Description
A300 Application deemed to be withdrawn because no request for examination was validly filed

Free format text: JAPANESE INTERMEDIATE CODE: A300

Effective date: 20010904