JPH09323980A - 2−(2,4−ジヒドロキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−s−トリアジンの製造方法 - Google Patents
2−(2,4−ジヒドロキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−s−トリアジンの製造方法Info
- Publication number
- JPH09323980A JPH09323980A JP8353216A JP35321696A JPH09323980A JP H09323980 A JPH09323980 A JP H09323980A JP 8353216 A JP8353216 A JP 8353216A JP 35321696 A JP35321696 A JP 35321696A JP H09323980 A JPH09323980 A JP H09323980A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- mol
- formula
- cyanuric chloride
- lewis acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
- C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
- C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
- C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
- C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH354195 | 1995-12-14 | ||
| CH3541/95 | 1995-12-14 | ||
| US08/758,316 US5726310A (en) | 1995-12-14 | 1996-12-03 | Process for the preparation of 2-(2,4-dihydroxylphenyl)-4,6-bis(2,4-dimehylphenyl)-s-triazine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09323980A true JPH09323980A (ja) | 1997-12-16 |
| JPH09323980A5 JPH09323980A5 (2) | 2004-11-25 |
Family
ID=25693273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8353216A Withdrawn JPH09323980A (ja) | 1995-12-14 | 1996-12-16 | 2−(2,4−ジヒドロキシフェニル)−4,6−ビス(2,4−ジメチルフェニル)−s−トリアジンの製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US5726310A (2) |
| EP (1) | EP0779280B1 (2) |
| JP (1) | JPH09323980A (2) |
| CA (1) | CA2192774A1 (2) |
| CZ (1) | CZ291267B6 (2) |
| SK (1) | SK283174B6 (2) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002529538A (ja) * | 1998-11-17 | 2002-09-10 | サイテク・テクノロジー・コーポレーシヨン | ルイス酸と反応促進剤の組み合わせを用いるトリアジン類の製造方法 |
| WO2009148040A1 (ja) | 2008-06-04 | 2009-12-10 | 株式会社Adeka | 2,4,6-トリス(ヒドロキシフェニル)-1,3,5-トリアジン化合物の製造方法 |
| JP2009292754A (ja) * | 2008-06-04 | 2009-12-17 | Adeka Corp | 2,4,6−トリス(ヒドロキシフェニル)−1,3,5−トリアジン化合物の製造方法 |
| JP2009292753A (ja) * | 2008-06-04 | 2009-12-17 | Adeka Corp | 2,4,6−トリス(ヒドロキシフェニル)−1,3,5−トリアジン化合物の製造方法 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6297377B1 (en) | 1998-06-22 | 2001-10-02 | Cytec Technology Corporation | Benzocycle-substituted triazine and pyrimidine ultraviolet light absorbers |
| US6239276B1 (en) | 1998-06-22 | 2001-05-29 | Cytec Technology Corporation | Non-yellowing para-tertiary-alkyl phenyl substituted triazine and pyrimidine ultraviolet light absorbers |
| JP2002524452A (ja) * | 1998-09-04 | 2002-08-06 | サイテク・テクノロジー・コーポレーシヨン | 2−(2,4−ジヒドロキシフェニル)もしくは2−(2,4−ジアルコキシフェニル)−4,6−ビスアリール−1,3,5−トリアジンの製造方法 |
| KR20010073101A (ko) * | 1998-09-04 | 2001-07-31 | 에프. 아. 프라저, 에른스트 알테르 (에. 알테르), 한스 페터 비틀린 (하. 페. 비틀린), 피. 랍 보프, 브이. 스펜글러, 페. 아에글러 | 2-하이드록시-4-알콕시페닐 또는 2,4-디하이드록시페닐치환된 1,3,5-트리아진 uv 흡수제의 제조방법 |
| JP2002524451A (ja) * | 1998-09-04 | 2002-08-06 | サイテク・テクノロジー・コーポレーシヨン | 2−(2−ヒドロキシ−4−アルコキシフェニル)−4、6−ビスアリール−1、3、5−トリアジンの製造方法 |
| WO2000014076A1 (en) * | 1998-09-04 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Process for making 2,4-dihydroxyphenyl and 2-hydroxy-4-alkoxyphenyl substituted triazine compounds |
| US6867250B1 (en) | 2000-10-30 | 2005-03-15 | Cytec Technology Corp. | Non-yellowing ortho-dialkyl aryl substituted triazine ultraviolet light absorbers |
| US6632944B2 (en) | 2001-06-22 | 2003-10-14 | Cytec Technology Corp. | Process for isolation of monophenolic-bisaryl triazines |
| US6855269B2 (en) | 2001-11-09 | 2005-02-15 | Cytec Technology Corp. | Phenyl ether-substituted hydroxyphenyl triazine ultraviolet light absorbers |
| CN101076528B (zh) | 2004-12-10 | 2012-06-20 | 三菱化学株式会社 | 有机化合物、电荷传输材料和有机电致发光器件 |
| ES2463674T3 (es) | 2009-01-19 | 2014-05-28 | Basf Se | Pigmentos negros orgánicos y su preparación |
| CN121045689B (zh) * | 2025-11-04 | 2026-02-27 | 山东东信新材料科技股份有限公司 | 一种聚丙烯用阻燃母粒及其制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1169947B (de) | 1958-12-24 | 1964-05-14 | Ciba Geigy | Verfahren zur Herstellung von 2-(2', 4'-Dimethylphenyl)-4, 6-dichlor-1, 3, 5-triazin oder 2, 4-Di-(2', 4'-dimethylphenyl)-6-chlor-1, 3, 5-triazin |
| GB884802A (en) * | 1958-12-24 | 1961-12-20 | Ciba Ltd | New alkylphenyl-halo triazines and process for their manufacture |
| NL275368A (2) * | 1961-03-06 | |||
| NL130993C (2) * | 1963-02-07 | |||
| US4092466A (en) | 1976-07-19 | 1978-05-30 | Nasa | Heat resistant polymers of oxidized styrylphosphine |
-
1996
- 1996-12-03 EP EP96810845A patent/EP0779280B1/de not_active Expired - Lifetime
- 1996-12-03 US US08/758,316 patent/US5726310A/en not_active Expired - Fee Related
- 1996-12-12 SK SK1601-96A patent/SK283174B6/sk unknown
- 1996-12-12 CZ CZ19963657A patent/CZ291267B6/cs not_active IP Right Cessation
- 1996-12-12 CA CA002192774A patent/CA2192774A1/en not_active Abandoned
- 1996-12-16 JP JP8353216A patent/JPH09323980A/ja not_active Withdrawn
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002529538A (ja) * | 1998-11-17 | 2002-09-10 | サイテク・テクノロジー・コーポレーシヨン | ルイス酸と反応促進剤の組み合わせを用いるトリアジン類の製造方法 |
| WO2009148040A1 (ja) | 2008-06-04 | 2009-12-10 | 株式会社Adeka | 2,4,6-トリス(ヒドロキシフェニル)-1,3,5-トリアジン化合物の製造方法 |
| JP2009292754A (ja) * | 2008-06-04 | 2009-12-17 | Adeka Corp | 2,4,6−トリス(ヒドロキシフェニル)−1,3,5−トリアジン化合物の製造方法 |
| JP2009292753A (ja) * | 2008-06-04 | 2009-12-17 | Adeka Corp | 2,4,6−トリス(ヒドロキシフェニル)−1,3,5−トリアジン化合物の製造方法 |
| KR20110026432A (ko) | 2008-06-04 | 2011-03-15 | 가부시키가이샤 아데카 | 2,4,6-트리스(하이드록시페닐)-1,3,5-트리아진 화합물의 제조 방법 |
| EP2573076A1 (en) | 2008-06-04 | 2013-03-27 | Adeka Corporation | Method for producing 2,4,6-tris(hydroxyphenyl)-1,3,5-triazine compound |
| US8716474B2 (en) | 2008-06-04 | 2014-05-06 | Adeka Corporation | Method for producing 2,4,6-tris(hydroxyphenyl)-1,3,5-triazine compound |
| KR20160005379A (ko) | 2008-06-04 | 2016-01-14 | 가부시키가이샤 아데카 | 2,4,6-트리스(하이드록시페닐)-1,3,5-트리아진 화합물의 제조 방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| SK160196A3 (en) | 1997-08-06 |
| US5726310A (en) | 1998-03-10 |
| CZ291267B6 (cs) | 2003-01-15 |
| EP0779280A1 (de) | 1997-06-18 |
| CZ365796A3 (en) | 1997-07-16 |
| CA2192774A1 (en) | 1997-06-15 |
| SK283174B6 (sk) | 2003-03-04 |
| EP0779280B1 (de) | 2002-02-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20031209 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20031209 |
|
| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20060525 |