JPH10214783A5 - - Google Patents

Info

Publication number
JPH10214783A5
JPH10214783A5 JP1997343740A JP34374097A JPH10214783A5 JP H10214783 A5 JPH10214783 A5 JP H10214783A5 JP 1997343740 A JP1997343740 A JP 1997343740A JP 34374097 A JP34374097 A JP 34374097A JP H10214783 A5 JPH10214783 A5 JP H10214783A5
Authority
JP
Japan
Prior art keywords
stage
substrate
projection
sensitive substrate
positional relationship
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997343740A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10214783A (ja
JP4029183B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP34374097A priority Critical patent/JP4029183B2/ja
Priority claimed from JP34374097A external-priority patent/JP4029183B2/ja
Publication of JPH10214783A publication Critical patent/JPH10214783A/ja
Publication of JPH10214783A5 publication Critical patent/JPH10214783A5/ja
Application granted granted Critical
Publication of JP4029183B2 publication Critical patent/JP4029183B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP34374097A 1996-11-28 1997-11-28 投影露光装置及び投影露光方法 Expired - Lifetime JP4029183B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP8-332843 1996-11-28
JP33284396 1996-11-28
JP34374097A JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Publications (3)

Publication Number Publication Date
JPH10214783A JPH10214783A (ja) 1998-08-11
JPH10214783A5 true JPH10214783A5 (2) 2005-08-11
JP4029183B2 JP4029183B2 (ja) 2008-01-09

Family

ID=26574314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34374097A Expired - Lifetime JP4029183B2 (ja) 1996-11-28 1997-11-28 投影露光装置及び投影露光方法

Country Status (1)

Country Link
JP (1) JP4029183B2 (2)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation

Families Citing this family (201)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897963B1 (en) * 1997-12-18 2005-05-24 Nikon Corporation Stage device and exposure apparatus
JP4134406B2 (ja) 1998-12-04 2008-08-20 株式会社ニコン 平面モータ装置及び露光装置
WO2001023933A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
WO2001023935A1 (en) 1999-09-29 2001-04-05 Nikon Corporation Projection exposure method and apparatus and projection optical system
JP2001160530A (ja) 1999-12-01 2001-06-12 Nikon Corp ステージ装置及び露光装置
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
JP2002287023A (ja) 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG157962A1 (en) 2002-12-10 2010-01-29 Nikon Corp Exposure apparatus and method for producing device
WO2004053952A1 (ja) * 2002-12-10 2004-06-24 Nikon Corporation 露光装置及びデバイス製造方法
JP4525062B2 (ja) * 2002-12-10 2010-08-18 株式会社ニコン 露光装置及びデバイス製造方法、露光システム
KR20050085026A (ko) 2002-12-10 2005-08-29 가부시키가이샤 니콘 광학 소자 및 그 광학 소자를 사용한 투영 노광 장치
KR101643112B1 (ko) 2003-02-26 2016-07-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
KR101431938B1 (ko) 2003-04-10 2014-08-19 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
SG141426A1 (en) 2003-04-10 2008-04-28 Nikon Corp Environmental system including vacuum scavange for an immersion lithography apparatus
SG139733A1 (en) 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
KR101289959B1 (ko) 2003-04-11 2013-07-26 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
KR101790914B1 (ko) 2003-05-06 2017-10-26 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI474380B (zh) 2003-05-23 2015-02-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
TW201515064A (zh) 2003-05-23 2015-04-16 尼康股份有限公司 曝光方法及曝光裝置以及元件製造方法
WO2004107417A1 (ja) 2003-05-28 2004-12-09 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
EP3104396B1 (en) 2003-06-13 2018-03-21 Nikon Corporation Exposure method, substrate stage, exposure apparatus, and device manufacturing method
KR101476087B1 (ko) 2003-06-19 2014-12-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP1646074A4 (en) 2003-07-09 2007-10-03 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
EP2264531B1 (en) 2003-07-09 2013-01-16 Nikon Corporation Exposure apparatus and device manufacturing method
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
KR20190002749A (ko) 2003-07-28 2019-01-08 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
KR101613384B1 (ko) 2003-08-21 2016-04-18 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
TWI439823B (zh) 2003-08-26 2014-06-01 尼康股份有限公司 Optical components and exposure devices
TWI625762B (zh) 2003-08-29 2018-06-01 尼康股份有限公司 Liquid recovery device, exposure device, exposure method, and component manufacturing method
KR101419192B1 (ko) 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US6954256B2 (en) 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101301804B1 (ko) 2003-09-26 2013-08-29 가부시키가이샤 니콘 투영노광장치 및 투영노광장치의 세정방법, 메인터넌스 방법 그리고 디바이스의 제조방법
JP4438748B2 (ja) 2003-09-29 2010-03-24 株式会社ニコン 投影露光装置、投影露光方法およびデバイス製造方法
KR101498437B1 (ko) 2003-09-29 2015-03-03 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
TW200514138A (en) 2003-10-09 2005-04-16 Nippon Kogaku Kk Exposure equipment and exposure method, manufacture method of component
KR20060071430A (ko) 2003-10-22 2006-06-26 가부시키가이샤 니콘 노광 장치, 노광 방법, 디바이스의 제조 방법
TWI360158B (en) 2003-10-28 2012-03-11 Nikon Corp Projection exposure device,exposure method and dev
WO2005041276A1 (ja) 2003-10-28 2005-05-06 Nikon Corporation 露光装置、露光方法、デバイスの製造方法
WO2005043607A1 (ja) 2003-10-31 2005-05-12 Nikon Corporation 露光装置及びデバイス製造方法
TWI385414B (zh) 2003-11-20 2013-02-11 尼康股份有限公司 光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
EP3370115A1 (en) 2003-12-03 2018-09-05 Nikon Corporation Exposure apparatus, exposure method and method for producing a device
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
KR101281397B1 (ko) 2003-12-15 2013-07-02 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
KR101440743B1 (ko) 2004-01-05 2014-09-17 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US20070164234A1 (en) 2004-01-15 2007-07-19 Nikon Corporation Exposure apparatus and device manufacturing method
CN1938646B (zh) 2004-01-20 2010-12-15 卡尔蔡司Smt股份公司 曝光装置和用于投影透镜的测量装置
JP4319189B2 (ja) 2004-01-26 2009-08-26 株式会社ニコン 露光装置及びデバイス製造方法
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
JP4506674B2 (ja) 2004-02-03 2010-07-21 株式会社ニコン 露光装置及びデバイス製造方法
EP3093873B1 (en) 2004-02-04 2017-10-11 Nikon Corporation Exposure apparatus, exposure method, and method for producing a device
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
US7557900B2 (en) 2004-02-10 2009-07-07 Nikon Corporation Exposure apparatus, device manufacturing method, maintenance method, and exposure method
WO2005081292A1 (ja) 2004-02-20 2005-09-01 Nikon Corporation 露光装置、供給方法及び回収方法、露光方法、ならびにデバイス製造方法
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
KR101250155B1 (ko) 2004-03-25 2013-04-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2005096354A1 (ja) * 2004-03-30 2005-10-13 Nikon Corporation 露光装置、露光方法及びデバイス製造方法、並びに面形状検出装置
US7034917B2 (en) 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
JP4677986B2 (ja) 2004-04-19 2011-04-27 株式会社ニコン ノズル部材、露光方法、露光装置及びデバイス製造方法
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7486381B2 (en) 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100594430C (zh) 2004-06-04 2010-03-17 卡尔蔡司Smt股份公司 用于测量光学成像系统的图像质量的系统
KR101421915B1 (ko) 2004-06-09 2014-07-22 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN103558737A (zh) 2004-06-09 2014-02-05 尼康股份有限公司 基板保持装置、具备其之曝光装置、方法
US8717533B2 (en) 2004-06-10 2014-05-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR20170010906A (ko) 2004-06-10 2017-02-01 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
US8373843B2 (en) 2004-06-10 2013-02-12 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8508713B2 (en) 2004-06-10 2013-08-13 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP2624282B1 (en) 2004-06-10 2017-02-08 Nikon Corporation Immersion exposure apparatus and method, and methods for producing a device
US8698998B2 (en) 2004-06-21 2014-04-15 Nikon Corporation Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
JP5119666B2 (ja) 2004-06-21 2013-01-16 株式会社ニコン 露光装置、液体除去方法、及びデバイス製造方法
US20090225286A1 (en) 2004-06-21 2009-09-10 Nikon Corporation Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1780772B1 (en) 2004-07-12 2009-09-02 Nikon Corporation Exposure equipment and device manufacturing method
JP4677987B2 (ja) 2004-07-21 2011-04-27 株式会社ニコン 露光方法及びデバイス製造方法
KR101230712B1 (ko) 2004-08-03 2013-02-07 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101187611B1 (ko) 2004-09-01 2012-10-08 가부시키가이샤 니콘 기판 홀더, 스테이지 장치, 및 노광 장치
JP4780412B2 (ja) 2004-09-13 2011-09-28 株式会社ニコン 投影光学系、投影光学系の製造方法、露光装置及び露光方法
KR101264939B1 (ko) 2004-09-17 2013-05-15 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
US8102512B2 (en) 2004-09-17 2012-01-24 Nikon Corporation Substrate holding device, exposure apparatus, and device manufacturing method
WO2006038563A1 (ja) 2004-10-01 2006-04-13 Nikon Corporation リニアモータ、ステージ装置、及び露光装置
SG156635A1 (en) 2004-10-15 2009-11-26 Nikon Corp Exposure apparatus and device manufacturing method
CN101044594B (zh) 2004-10-26 2010-05-12 株式会社尼康 衬底处理方法、曝光装置及器件制造方法
JP4848956B2 (ja) 2004-11-01 2011-12-28 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US8294873B2 (en) 2004-11-11 2012-10-23 Nikon Corporation Exposure method, device manufacturing method, and substrate
JP4905135B2 (ja) 2004-12-01 2012-03-28 株式会社ニコン ステージ装置及び露光装置
JP4784513B2 (ja) 2004-12-06 2011-10-05 株式会社ニコン メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
JP4752473B2 (ja) 2004-12-09 2011-08-17 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
WO2006064851A1 (ja) 2004-12-15 2006-06-22 Nikon Corporation 基板保持装置、露光装置、及びデバイス製造方法
US7450217B2 (en) 2005-01-12 2008-11-11 Asml Netherlands B.V. Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
KR20180125636A (ko) 2005-01-31 2018-11-23 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI424260B (zh) 2005-03-18 2014-01-21 尼康股份有限公司 A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
EP1879217A4 (en) 2005-03-18 2010-06-09 Nikon Corp EXPOSURE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS EVALUATION METHOD
EP3159738B1 (en) 2005-03-25 2018-12-12 Nikon Corporation Method of determining distortion of a projection optical system
JP4605219B2 (ja) 2005-03-30 2011-01-05 株式会社ニコン 露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
US8089608B2 (en) 2005-04-18 2012-01-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2527921A3 (en) 2005-04-28 2017-10-18 Nikon Corporation Exposure method and exposure apparatus
KR20140140648A (ko) 2005-05-12 2014-12-09 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
WO2006126522A1 (ja) 2005-05-24 2006-11-30 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
US7838858B2 (en) 2005-05-31 2010-11-23 Nikon Corporation Evaluation system and method of a search operation that detects a detection subject on an object
JP5045437B2 (ja) 2005-06-21 2012-10-10 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
EP1901338A4 (en) 2005-06-30 2011-06-29 Nikon Corp EXPOSURE DEVICE AND METHOD, EXPOSURE DEVICE MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD
TW200710616A (en) 2005-07-11 2007-03-16 Nikon Corp Exposure apparatus and method for manufacturing device
KR101449055B1 (ko) 2005-08-23 2014-10-08 가부시키가이샤 니콘 노광 장치, 노광 방법, 및 디바이스 제조 방법
CN101258581B (zh) 2005-09-09 2011-05-11 株式会社尼康 曝光装置及曝光方法以及设备制造方法
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
EP1936665A4 (en) 2005-09-21 2010-03-31 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
EP1950795A4 (en) 2005-11-01 2010-06-02 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
EP1947683A4 (en) * 2005-11-09 2010-08-25 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
JPWO2007055373A1 (ja) 2005-11-14 2009-04-30 株式会社ニコン 液体回収部材、露光装置、露光方法、及びデバイス製造方法
WO2007058188A1 (ja) 2005-11-15 2007-05-24 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
JP2007165869A (ja) 2005-11-21 2007-06-28 Nikon Corp 露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
US8125610B2 (en) 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
JP2007318069A (ja) * 2005-12-06 2007-12-06 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法、投影光学系
TW200722935A (en) 2005-12-06 2007-06-16 Nikon Corp Exposure apparatus, exposure method, projection optical system and device manufacturing method
KR20080071552A (ko) 2005-12-06 2008-08-04 가부시키가이샤 니콘 노광 방법, 노광 장치 및 디바이스 제조 방법
JP4968076B2 (ja) 2005-12-08 2012-07-04 株式会社ニコン 基板保持装置、露光装置、露光方法、及びデバイス製造方法
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
WO2007077875A1 (ja) 2005-12-28 2007-07-12 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
EP1975981A1 (en) 2005-12-28 2008-10-01 Nikon Corporation Pattern formation method, pattern formation device, and device fabrication method
TWI605491B (zh) * 2006-01-19 2017-11-11 尼康股份有限公司 曝光裝置及曝光方法、以及元件製造方法
KR20080103564A (ko) 2006-02-16 2008-11-27 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR20080102192A (ko) 2006-02-16 2008-11-24 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1990828A4 (en) 2006-02-16 2010-09-15 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
WO2007094407A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
US8134681B2 (en) 2006-02-17 2012-03-13 Nikon Corporation Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
EP3267259A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101356270B1 (ko) 2006-02-21 2014-01-28 가부시키가이샤 니콘 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법
EP3327507B1 (en) 2006-02-21 2019-04-03 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5077770B2 (ja) 2006-03-07 2012-11-21 株式会社ニコン デバイス製造方法、デバイス製造システム及び測定検査装置
EP1995768A4 (en) 2006-03-13 2013-02-06 Nikon Corp EXPOSURE DEVICE, MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20070242254A1 (en) 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JPWO2007116752A1 (ja) 2006-04-05 2009-08-20 株式会社ニコン ステージ装置、露光装置、ステージ制御方法、露光方法、およびデバイス製造方法
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
CN102298274A (zh) 2006-05-18 2011-12-28 株式会社尼康 曝光方法及装置、维护方法、以及组件制造方法
US7728462B2 (en) 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
CN102109773A (zh) 2006-05-22 2011-06-29 株式会社尼康 曝光方法、曝光装置以及维修方法
JP5019170B2 (ja) 2006-05-23 2012-09-05 株式会社ニコン メンテナンス方法、露光方法及び装置、並びにデバイス製造方法
WO2007138834A1 (ja) 2006-05-31 2007-12-06 Nikon Corporation 露光装置及び露光方法
TW200816271A (en) 2006-06-09 2008-04-01 Nikon Corp Pattern formation method, pattern formation device, exposure method, exposure device, and device manufacturing method
WO2007142351A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
CN101390194B (zh) 2006-06-30 2011-04-20 株式会社尼康 维修方法、曝光方法及装置、以及元件制造方法
US20080073563A1 (en) 2006-07-01 2008-03-27 Nikon Corporation Exposure apparatus that includes a phase change circulation system for movers
KR101236043B1 (ko) 2006-07-14 2013-02-21 가부시키가이샤 니콘 스테이지 장치, 노광 장치 및 디바이스 제조 방법
JP5151981B2 (ja) 2006-08-30 2013-02-27 株式会社ニコン 露光装置及びデバイス製造方法
EP3291010A1 (en) 2006-08-31 2018-03-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
KR101669785B1 (ko) 2006-08-31 2016-10-27 가부시키가이샤 니콘 이동체 구동 시스템 및 이동체 구동 방법, 패턴 형성 장치 및 방법, 노광 장치 및 방법, 디바이스 제조 방법, 그리고 결정 방법
TWI416269B (zh) 2006-08-31 2013-11-21 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
TWI622084B (zh) 2006-09-01 2018-04-21 尼康股份有限公司 Mobile body driving method, moving body driving system, pattern forming method and device, exposure method and device, component manufacturing method, and correction method
KR101452524B1 (ko) 2006-09-01 2014-10-21 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP5029611B2 (ja) 2006-09-08 2012-09-19 株式会社ニコン クリーニング用部材、クリーニング方法、露光装置、並びにデバイス製造方法
TWI481968B (zh) 2006-09-08 2015-04-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
US7872730B2 (en) 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
KR101413891B1 (ko) 2006-09-29 2014-06-30 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
KR101549709B1 (ko) 2006-11-09 2015-09-11 가부시키가이샤 니콘 유지 장치, 위치 검출 장치 및 노광 장치, 이동 방법, 위치검출 방법, 노광 방법, 검출계의 조정 방법, 그리고 디바이스 제조 방법
JP5055971B2 (ja) 2006-11-16 2012-10-24 株式会社ニコン 表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
US7973910B2 (en) 2006-11-17 2011-07-05 Nikon Corporation Stage apparatus and exposure apparatus
US20080156356A1 (en) 2006-12-05 2008-07-03 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP5454136B2 (ja) 2007-03-01 2014-03-26 株式会社ニコン ペリクルフレーム装置、マスク、レチクル装置、露光方法及び露光装置並びにデバイスの製造方法
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
KR101409149B1 (ko) 2007-07-24 2014-06-17 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
NL2003363A (en) 2008-09-10 2010-03-15 Asml Netherlands Bv Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8902401B2 (en) 2006-05-09 2014-12-02 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation

Similar Documents

Publication Publication Date Title
JPH10214783A5 (2)
JPH10163099A5 (2)
JP3203719B2 (ja) 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JPH10163097A5 (2)
JPH10209039A5 (2)
JPH10163099A (ja) 露光方法及び露光装置
JPH03116816A (ja) 露光装置
JP3624065B2 (ja) 基板搬送装置、半導体製造装置および露光装置
JPH09115817A (ja) 露光方法及び装置
JP2002050560A (ja) ステージ装置、計測装置及び計測方法、露光装置及び露光方法
US5440397A (en) Apparatus and method for exposure
JPH10163098A5 (2)
JPH0864518A (ja) 露光方法
JP4227402B2 (ja) 走査型露光装置
JP2005101455A (ja) 位置決め装置
JPH1050604A (ja) 位置管理方法及び位置合わせ方法
JPH11143087A (ja) 位置合わせ装置及びそれを用いた投影露光装置
TWI760959B (zh) 對準方法及相關的對準及微影設備
JP2010243413A (ja) 測定装置、露光装置及びデバイスの製造方法
US7782441B2 (en) Alignment method and apparatus of mask pattern
JP3569962B2 (ja) 位置合わせ装置及び位置合わせ方法、それを用いた露光装置及び露光方法
JPH09148236A (ja) 露光装置の基板ステージの移動制御方法及び装置
JP2705778B2 (ja) 投影露光装置
JPH0149007B2 (2)
JPH10177951A (ja) 露光方法及び露光装置