JPH1027390A - Method of manufacturing plastic substrate for optical disk - Google Patents

Method of manufacturing plastic substrate for optical disk

Info

Publication number
JPH1027390A
JPH1027390A JP18078196A JP18078196A JPH1027390A JP H1027390 A JPH1027390 A JP H1027390A JP 18078196 A JP18078196 A JP 18078196A JP 18078196 A JP18078196 A JP 18078196A JP H1027390 A JPH1027390 A JP H1027390A
Authority
JP
Japan
Prior art keywords
substrates
substrate
optical disk
plastic substrate
annealing treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18078196A
Other languages
Japanese (ja)
Inventor
Hidetaka Ito
秀高 伊藤
Tetsuya Mimura
哲哉 三村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP18078196A priority Critical patent/JPH1027390A/en
Publication of JPH1027390A publication Critical patent/JPH1027390A/en
Pending legal-status Critical Current

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  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To eliminate the local double refraction of plastic substrates for optical disks and to obtain the substrates for the optical disks which are uniform in double refraction by averting the application of the same weight at the limited one point or several points of the substrates while oscillating the substrates at a specified frequency in an annealing treatment. SOLUTION: The plastic substrates 1 for the disks are held by a holding case 2 and while the substrates 1 are oscillated by an external oscillation device 3, the substrates are subjected to the annealing treatment. The holding case 2 is provided with stoppers 4 so as to prevent the mispositioning of the case by vibration. When charging the substrates 1 stored in the holding case 2 into a heating furnace, the substrates 1 are placed on a holder 5 already installed in the heating furnace and are oscillated at a specified frequency, for example, 1 to 100kHz, more preferably 1 to 50kHz during the annealing treatment. As a result, the annealing treatment is carried out by avoiding the application of the own weights of the substrates 1 at the limited one point or several points of the substrates 1 always at the same size. The concentration of the load is averted and the occurrence of the parts abnormal in the double refraction is prevented by the application of the oscillation and the consequent slight jumping of the substrates.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は光学的手段によって
情報の記録或いは再生を行う光ディスクに用いる基板の
製造方法に関するものである。詳しくは、合成樹脂を成
形して得たディスク用基板をアニール処理する事により
複屈折の小さな基板を得る方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a substrate used for an optical disk for recording or reproducing information by optical means. More specifically, the present invention relates to a method for obtaining a substrate having small birefringence by annealing a disk substrate obtained by molding a synthetic resin.

【0002】[0002]

【従来の技術】近年、大容量、高速のメモリ媒体として
光記録媒体が注目されている。光記録媒体としては再生
専用型光ディスク(CD、CD−ROM等)、記録再生
型光ディスク(リライタブル型)等が知られている。こ
れらの光記録媒体の基板としては一般に合成樹脂製基板
(ポリカーボネート樹脂、アクリル樹脂等)が用いられ
ている。
2. Description of the Related Art In recent years, optical recording media have attracted attention as large-capacity, high-speed memory media. As an optical recording medium, a read-only optical disk (CD, CD-ROM, etc.), a read / write optical disk (rewritable type) and the like are known. As a substrate of these optical recording media, a substrate made of a synthetic resin (polycarbonate resin, acrylic resin, or the like) is generally used.

【0003】これらのディスク基板は生産性の面から通
常、射出成形法や射出圧縮成形法を用いて行われてい
る。この方法は、固定金型と可動金型との間に型締め状
態で形成されるキャビティー内にプリフォーマット情報
を有する環状の平坦なスタンパーを取付け、キャビティ
ー内に溶融樹脂材を導入する事によってスタンパーの信
号(ピット)やレーザー案内溝等のプリフォーマット情
報が転写されたディスク基板を成形する方法である。
[0003] These disk substrates are usually formed by injection molding or injection compression molding in terms of productivity. According to this method, an annular flat stamper having preformat information is mounted in a cavity formed between a fixed mold and a movable mold in a mold clamped state, and a molten resin material is introduced into the cavity. In this method, a disk substrate on which preformat information such as a signal (pit) of a stamper and a laser guide groove is transferred is formed.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、このよ
うに成形して得られた合成樹脂製のディスク用基板は、
主として射出成形時の分子配向歪による複屈折が大き
く、ガラス基板を用いた場合より信号特性(例えば、C
/N比)が劣るという問題があり、この成形時の複屈折
を下げる事が種々の方法で検討されている。
However, the disk substrate made of synthetic resin obtained in this manner is:
The birefringence due to molecular orientation distortion during injection molding is large, and signal characteristics (for example, C
/ N ratio) is inferior, and reduction of birefringence during molding has been studied by various methods.

【0005】この基板の複屈折は、主として成形時にお
ける分子配向(せん断応力)による複屈折と熱応力によ
る複屈折の総和として観察される。射出成形時における
成形条件や金型圧縮代の最適化によってせん断応力によ
る複屈折を低減させることができる。又、射出成形によ
って得られたディスク用基板を加熱処理(アニール処
理)によって成形時の熱応力による歪は緩和され、熱応
力による複屈折を低減させることができる。
[0005] The birefringence of the substrate is mainly observed as the sum of birefringence due to molecular orientation (shear stress) and birefringence due to thermal stress during molding. Birefringence due to shear stress can be reduced by optimizing molding conditions and mold compression allowance during injection molding. In addition, distortion due to thermal stress during molding is reduced by heat treatment (annealing treatment) of the disk substrate obtained by injection molding, and birefringence due to thermal stress can be reduced.

【0006】上記アニール処理としては種々の方法が提
案されている。 (1)基板を保持ケースに立て掛けて入れ、該ケースの
内側で基板の外周二点を支持した状態でアニール処理を
行う方法(例えば特開平3−248345号参照)。 (2)基板の中心孔に支持体を貫通させ、その支持体で
基板を支持してアニール処理する方法(例えば特開平3
−248345号参照)。
Various methods have been proposed for the annealing treatment. (1) A method in which a substrate is leaned against a holding case and an annealing process is performed in a state where two outer peripheral points of the substrate are supported inside the case (for example, see JP-A-3-248345). (2) A method in which a support is penetrated through a center hole of a substrate, and the substrate is supported by the support and an annealing process is performed (for example, Japanese Unexamined Patent Application Publication No.
-248345).

【0007】しかしながら、上記(1)の方法でアニー
ル処理すると、基板がケースと接触している部分、すな
わち、基板外周部の支持位置における複屈折の周方向分
布が局所的に変化し、この複屈折の局所的変化の為、光
ディスクを製造した場合、再生信号を読み出した時に再
生信号のエンベロープが変化するという不具合がある。
又、上記(2)の方法では基板の中心孔を支持体で支持
する為、基板の中心孔の支持体と接触部に自重による歪
が発生し、垂直複屈折低減に必要な比較的高い温度でア
ニール処理する際、基板が変形し、光ディスクの機械特
性が悪化する問題がある。
However, when annealing is performed by the method (1), the circumferential distribution of birefringence in the portion where the substrate is in contact with the case, that is, the supporting position of the outer peripheral portion of the substrate is locally changed. When an optical disc is manufactured due to local change in refraction, there is a problem that the envelope of the reproduced signal changes when the reproduced signal is read.
In the above method (2), since the center hole of the substrate is supported by the support, distortion occurs due to its own weight in the support and the contact portion of the center hole of the substrate, and a relatively high temperature required for reducing the vertical birefringence. When the annealing process is performed, there is a problem that the substrate is deformed and the mechanical characteristics of the optical disc are deteriorated.

【0008】本発明は、このような問題点に鑑みて、光
ディスク用プラスチック基板のアニール処理に際して、
光ディスク用プラスチック基板を振動させながらアニー
ル処理を行うことにより、保持ケースに接触する光ディ
スク用プラスチック基板の位置を変化させ、光ディスク
用プラスチック基板の外周部の同じ位置にかかる力が、
常には同じにならないようにした。すなわち、光ディス
ク用プラスチック基板のある部分にのみ常に同じ大きさ
の荷重が加わることを避ける事により、局部的な複屈折
の異常を無くした光ディスク用プラスチック基板を製造
する方法を提供する事を目的とする。
[0008] In view of the above problems, the present invention provides a method for annealing plastic substrates for optical discs.
By performing the annealing process while vibrating the plastic substrate for the optical disk, the position of the plastic substrate for the optical disk in contact with the holding case is changed, and the force applied to the same position on the outer peripheral portion of the plastic substrate for the optical disk is
I tried not to always be the same. That is, an object of the present invention is to provide a method of manufacturing a plastic substrate for an optical disk in which local birefringence abnormality is eliminated by avoiding that a load of the same magnitude is always applied only to a certain portion of the plastic substrate for an optical disk. I do.

【0009】[0009]

【課題を解決するための手段】本発明の要旨は、光ディ
スク用プラスチック基板を成形した後、アニール処理を
行う光ディスク用プラスチック基板の製造方法におい
て、基板にアニール処理を行う際、基板を振動させなが
ら行うことを特徴とする光ディスク用プラスチック基板
の製造方法に存する。
SUMMARY OF THE INVENTION The gist of the present invention is to provide a method of manufacturing a plastic substrate for an optical disk in which a plastic substrate for an optical disk is molded and then annealed. And a method of manufacturing a plastic substrate for an optical disk.

【0010】本発明に係る製造方法によれば、光ディス
ク用プラスチック基板のアニール処理の際、光ディスク
用プラスチック基板の自重を常に限られた一点又は数点
で同じ力で支持することを避けて、局部的な力が限られ
た一点又は数点にのみ光ディスク用プラスチック基板に
掛かる事が避けられ、局部的な複屈折異常の発生を防止
する事ができる。即ち、アニール処理中光ディスク用プ
ラスチック基板上の点の定点に同じ加重がかかる時間を
10分程度以下にして、局部的複屈折異常の発生を防止
するというものである。
According to the manufacturing method of the present invention, when annealing the plastic substrate for an optical disk, the weight of the plastic substrate for the optical disk is not always supported at a limited point or several points by the same force, and the local weight is reduced. It is possible to avoid applying to a plastic substrate for an optical disk only at one or a few points where the local force is limited, and it is possible to prevent the occurrence of local birefringence abnormality. That is, the time during which the same weight is applied to a fixed point on the plastic substrate for an optical disk during the annealing process is set to about 10 minutes or less to prevent the occurrence of local birefringence abnormality.

【0011】本発明の方法の一例につき、図面を用いて
更に説明する。図1は本発明の方法に用いる装置の一例
の概略側面図、図2は同縦断正面図、図3は本発明方法
で処理した基板のTES波形、図4は従来の方法で処理
した基板のTES波形をそれぞれ示す。図中1は基板、
2は保持ケース、3は振動装置、4はストッパー、5は
保持台をそれぞれ示す。
An example of the method of the present invention will be further described with reference to the drawings. FIG. 1 is a schematic side view of an example of an apparatus used in the method of the present invention, FIG. 2 is a vertical front view of the same, FIG. 3 is a TES waveform of a substrate processed by the method of the present invention, and FIG. TES waveforms are shown. In the figure, 1 is a substrate,
2 denotes a holding case, 3 denotes a vibration device, 4 denotes a stopper, and 5 denotes a holding table.

【0012】光ディスク用基板1は通常合成樹脂、例え
ばポリカーボネート樹脂、アクリル樹脂等を射出成形法
や射出圧縮法を用いて成形される。成形方法は固定金型
と可動金型との間に形成されるキャビティー内にプリフ
ォーマット情報を有する環状の平坦なスタンパーを取付
けて行なわれる。キャビティー内に溶融合成樹脂を導入
する事によってスタンパーの信号(ピット)やレーザー
案内溝等のプリフォーマット情報が転写されたディスク
用基板が成形される。成形後、離型用の空気を噴出しつ
つ、金型が開かれ、基板が金型から取り出される。
The optical disc substrate 1 is usually formed of a synthetic resin, for example, a polycarbonate resin or an acrylic resin, by using an injection molding method or an injection compression method. The molding method is performed by mounting an annular flat stamper having preformat information in a cavity formed between a fixed mold and a movable mold. By introducing the molten synthetic resin into the cavity, a disk substrate to which preformat information such as a signal (pit) of a stamper and a laser guide groove is transferred is formed. After molding, the mold is opened while blowing air for release, and the substrate is removed from the mold.

【0013】本発明は上記で得られたディスク用基板を
図1、図2に示す装置を用い、特殊のアニール処理を行
う事を特徴とするものである。アニール温度としては通
常は、基板樹脂のガラス転移点(TG)に対して10〜
60℃低い温度が用いられ、好ましくはTGに対して1
0〜50℃低い温度である。ポリカーボネート樹脂を用
いた場合は通常80〜120℃の範囲が好適である。ア
ニール処理がTGに対して10℃未満低い温度ではアニ
ール処理装置から基板を取り出す際、ディスク用基板が
変形したり、アニール処理中に基板の溝やピット形状が
変形する恐れがある。
The present invention is characterized in that the disk substrate obtained as described above is subjected to a special annealing treatment using the apparatus shown in FIGS. The annealing temperature is usually 10 to the glass transition point (TG) of the substrate resin.
A temperature 60 ° C. lower is used, preferably 1 to TG.
0 to 50 ° C lower temperature. When a polycarbonate resin is used, the temperature is preferably in the range of usually 80 to 120C. If the annealing process is performed at a temperature lower than the TG by less than 10 ° C., when the substrate is taken out from the annealing device, the disk substrate may be deformed, or the groove or pit shape of the substrate may be deformed during the annealing process.

【0014】又、アニール処理時間は30分以上、好ま
しくは30分〜5時間の範囲である。アニール処理時間
が30分未満では基板の複屈折や基板のそり(Til
t)が変化している過程にあり、高温高湿度の加速試験
において特性が変化する恐れがある。図1、図2に示す
装置は本発明の特徴を最も良く表わす図面であり、光デ
ィスク用プラスチック基板1を保持ケース2で保持し、
光ディスク用プラスチック基板1を外部振動装置3によ
り振動を加えつつアニール処理するものである。振動に
より保持ケース2の位置がずれないようにストッパー4
が設けられている。外部振動装置で発生した振動を保持
ケースを介して光ディスク用プラスチック基板に伝える
ための保持台5は振動を良く伝えるため、金属板等によ
って作られているのが良い。
[0014] The annealing time is 30 minutes or more, preferably 30 minutes to 5 hours. If the annealing time is less than 30 minutes, the substrate birefringence and the substrate warpage (Til)
Since t) is in the process of changing, the characteristics may change in an accelerated test at high temperature and high humidity. The apparatus shown in FIGS. 1 and 2 is a drawing that best illustrates the features of the present invention, in which a plastic substrate 1 for an optical disk is held by a holding case 2,
The annealing process is performed while applying vibration to the plastic substrate 1 for an optical disk by the external vibration device 3. Stopper 4 so that the position of holding case 2 does not shift due to vibration.
Is provided. The holding table 5 for transmitting the vibration generated by the external vibration device to the plastic substrate for the optical disk via the holding case is preferably made of a metal plate or the like in order to transmit the vibration well.

【0015】図におけるアニール処理では、図で示した
保持ケースに保管された光ディスク用プラスチック基板
を加熱炉(オーブン)に投入する際に、加熱炉内に既に
設置された保持装置5の上に乗せ、アニール処理中一定
周波数、例えば、1〜100kHz、望ましくは1〜5
0kHzで振動させる事によって、光ディスク用プラス
チック基板の自重が光ディスク用プラスチック基板の限
られた1点又は数点に常に同じ大きさでかかることを避
け、アニール処理を行う事ができる。振動を加えること
により、基板1が回転したり、わずかに飛びはねること
により荷重が集中しない状態となって、複屈折異常部分
の発生が防止されるものと思われる。
In the annealing process shown in the figure, when the plastic substrate for an optical disk stored in the holding case shown in the figure is put into a heating furnace (oven), it is put on the holding device 5 already installed in the heating furnace. A constant frequency during the annealing process, for example, 1 to 100 kHz, preferably 1 to 5 kHz.
By vibrating at 0 kHz, it is possible to prevent the weight of the plastic substrate for the optical disk from being always applied to one or several limited points of the plastic substrate for the optical disk with the same size, and to perform the annealing process. It is considered that by applying the vibration, the substrate 1 is rotated or slightly jumped, so that the load is not concentrated and the occurrence of the abnormal birefringence portion is prevented.

【0016】外部振動発生装置3は、光ディスク用プラ
スチック基板1を保管する保持ケース2を一定周波数で
振動させるようなものであればどのようなものでもよ
く、本実施例では、保持ケース2の下面全体を支え、且
つ保持ケースの位置がずれないようにストッパー4を取
り付けた厚み5mmのステンレスの保持装置5に発振器
を取り付けたものを用いた。尚、周波数は1kHzで振
動させた。パワーはケース2の大きさにもよるが、20
枚程度の基板1を収納したケース2であれば50〜20
0w程度のパワーで良い。
The external vibration generator 3 may be of any type as long as it vibrates the holding case 2 for storing the plastic substrate 1 for an optical disk at a constant frequency. In this embodiment, the lower surface of the holding case 2 A 5 mm-thick stainless steel holding device 5 equipped with a stopper 4 so as to support the whole and prevent the position of the holding case from shifting was used. In addition, the frequency was vibrated at 1 kHz. The power depends on the size of case 2, but is 20
50 to 20 for case 2 containing about one substrate 1
A power of about 0 w may be sufficient.

【0017】射出成形後の厚さ1.2mmの光ディスク
用プラスチック基板1を本発明方法により炉内温度90
℃で3時間保持後、徐冷を行うアニール条件でアニール
処理した。そのアニール処理した直径130mm光ディ
スク基板の外周部(半径63mmの位置)のTES波形
を図3に示す。同様にして振動を加えずにアニール処理
を行ったプラスチック基板1の外周部のTESを示した
グラフを図4に示す。本発明によるアニール処理後のT
ES波形は従来法によるものと比較して明らかに局部的
な異常が改善されていることが分かる。
The plastic substrate 1 for an optical disk having a thickness of 1.2 mm after injection molding is subjected to a furnace temperature of 90 by the method of the present invention.
After holding at 3 ° C. for 3 hours, annealing was performed under annealing conditions of slow cooling. FIG. 3 shows a TES waveform of the outer peripheral portion (at a position of a radius of 63 mm) of the optical disk substrate having a diameter of 130 mm that has been annealed. FIG. 4 is a graph showing the TES of the outer peripheral portion of the plastic substrate 1 that has been subjected to the annealing process without applying vibration in the same manner. T after annealing according to the present invention
It can be seen that the ES waveform clearly has improved local abnormalities as compared with the conventional waveform.

【0018】本発明によれば、顕著な局部的複屈折異常
の改善が見られ、実施例で得られた光ディスク用プラス
チック基板のサンプルテストの結果、局部的な複屈折異
常不良は0%であり、その効果を確認した。
According to the present invention, a remarkable improvement in local birefringence abnormality was observed. As a result of a sample test of the plastic substrate for an optical disk obtained in the embodiment, the local birefringence abnormality was 0%. , Confirmed its effect.

【0019】[0019]

【発明の効果】本発明によれば、光ディスク用プラスチ
ック基板のアニール処理時に光ディスク用プラスチック
基板を一定周波数で振動させながら光ディスク用プラス
チック基板の限られた一点又は数点に同じ加重がかかる
ことを避けた事で、光ディスク用プラスチック基板の局
部的な複屈折異常を無くし、複屈折の均一な光ディスク
用プラスチック基板を得る事ができる。その光ディスク
用プラスチック基板を用いて作製した光ディスクは記録
再生信号及びTES波形に局所的な異常の無い光ディス
クとする事ができる。
According to the present invention, it is possible to prevent the same weight from being applied to a limited point or several points of the plastic substrate for an optical disk while vibrating the plastic substrate for an optical disk at a constant frequency during the annealing process of the plastic substrate for an optical disk. As a result, it is possible to eliminate the local birefringence abnormality of the plastic substrate for optical discs and obtain a plastic substrate for optical discs having uniform birefringence. An optical disk manufactured using the plastic substrate for an optical disk can be an optical disk having no local abnormality in a recording / reproducing signal and a TES waveform.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の方法に用いる装置の一例の概略側面
図。
FIG. 1 is a schematic side view of an example of an apparatus used in the method of the present invention.

【図2】図1に示した装置の縦断正面図。FIG. 2 is a longitudinal sectional front view of the apparatus shown in FIG. 1;

【図3】本発明におけるアニール処理後の光ディスクの
外周部におけるTES波形。
FIG. 3 is a TES waveform in an outer peripheral portion of an optical disk after an annealing process according to the present invention.

【図4】従来例の光ディスクの外周部におけるTES波
形。
FIG. 4 is a TES waveform at an outer peripheral portion of a conventional optical disc.

【符号の説明】[Explanation of symbols]

1 光ディスク用プラスチック基板 2 保持ケース 3 外部振動発生装置 4 ストッパー 5 保持台 Reference Signs List 1 plastic substrate for optical disk 2 holding case 3 external vibration generator 4 stopper 5 holding table

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光ディスク用プラスチック基板を成形し
た後、アニール処理を行う光ディスク用プラスチック基
板の製造方法において、基板にアニール処理を行う際、
基板を振動させながら行うことを特徴とする光ディスク
用プラスチック基板の製造方法。
In a method for manufacturing a plastic substrate for an optical disk, the method comprises the steps of:
A method for producing a plastic substrate for an optical disk, wherein the method is performed while vibrating the substrate.
JP18078196A 1996-07-10 1996-07-10 Method of manufacturing plastic substrate for optical disk Pending JPH1027390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18078196A JPH1027390A (en) 1996-07-10 1996-07-10 Method of manufacturing plastic substrate for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18078196A JPH1027390A (en) 1996-07-10 1996-07-10 Method of manufacturing plastic substrate for optical disk

Publications (1)

Publication Number Publication Date
JPH1027390A true JPH1027390A (en) 1998-01-27

Family

ID=16089225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18078196A Pending JPH1027390A (en) 1996-07-10 1996-07-10 Method of manufacturing plastic substrate for optical disk

Country Status (1)

Country Link
JP (1) JPH1027390A (en)

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