JPH0319152A - Manufacturing method of plastic substrate for optical disc - Google Patents

Manufacturing method of plastic substrate for optical disc

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Publication number
JPH0319152A
JPH0319152A JP1152149A JP15214989A JPH0319152A JP H0319152 A JPH0319152 A JP H0319152A JP 1152149 A JP1152149 A JP 1152149A JP 15214989 A JP15214989 A JP 15214989A JP H0319152 A JPH0319152 A JP H0319152A
Authority
JP
Japan
Prior art keywords
substrate
manufacturing
optical disc
optical disk
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1152149A
Other languages
Japanese (ja)
Other versions
JP2709144B2 (en
Inventor
Kunio Takada
高田 國夫
Kosho Okuda
晃章 奥田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP1152149A priority Critical patent/JP2709144B2/en
Publication of JPH0319152A publication Critical patent/JPH0319152A/en
Application granted granted Critical
Publication of JP2709144B2 publication Critical patent/JP2709144B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明は、光ディスク用基板の製造方法および該製造方
法により得られる光ディスク用基板に関する。
[Industrial Field of Application] The present invention relates to a method for manufacturing an optical disc substrate and an optical disc substrate obtained by the manufacturing method.

【従来の技術】[Conventional technology]

近年、情報記録担体として、再生専用のコンパクトディ
スクやビデオディスク、また追記も出来る光ディスク、
さらに記録・再生・消去可能な光磁気ディスク等が利用
されている. これらのディスクの基板は、生産性の面から射出成形や
射出圧縮成形によるプラスチック基板が用いられている
が、従来の技術では平坦な鏡面板上に平坦なスタンパを
取付け、スタンパに対向する側の鏡面板も平坦なものを
用いて扁平なキャビティを形威し、そこに溶融樹脂を流
し込むことによって扁平なディスク用基板を製造してい
た。 [発明が解決しようとする課題] このようにして成形した光ディスク用基板は、第4図(
1)に示すように成形直後はフラットな形状を有してい
るが、経時および熱的変化により第4図(2)に示すよ
うな反りが発生してしまう.また、基板上に記録膜を成
膜した場合は、さらに第4図(3)に示すように反りの
度合いが大きくなっていた.このような反りはコンパク
トディスク等の低速回転で使用する場合には特に問題と
ならないが、近年のように高密度化・高速化が要求され
る光ディスクでは、振動等による誤作動を招き好ましく
ない。 このような問題を解決するために特開昭60−67 1
24、特開昭60−131651 ,特開昭60−26
1042に開示されているように基板の内周側を厚くし
て強度を持たせたり、内周から外周までの基板の厚みを
変えることで回転による振動を小さくしようとする試み
がなされているが、基板の厚みを部分的に変えることは
製品設計上許容されない場合が多く、また部分的に強度
を持たせても、経時的および熱的変化に対してはそれほ
ど大きな効果は認められなかった。 〔課題を解決するための手段] 本発明者らは上記課題を解決すべく、基板の経時および
熱的変化の挙動を詳細に検討したところ、その変形の方
向と量とがある一定の範囲内に納まることを見出した.
そして成形後、ある一定条件で熱処理すればその変形を
短時間に起させることができ、その後の変化は極めて小
さいものである. すなわち本発明は、光ディスク用プラスチック基板にお
いて、プラスチック基板の形状の経時変化及び基板上に
成膜する際の熱応力、膜応力等による変化量を予め補正
して製造し、また、該方法により得られる基板を熱処理
することによる光ディスク用基板の製造方法、およびこ
れらの方法により得られる光ディスク用基板である。 第4図に見られるように、従来の方法により得られる基
板lは、その上面に情報またはグループ2が形成されて
おり、その後の経時変化により反りが発生していた.例
えば、有効外半径(D2)6 0mm,有効内半径(D
 +)30mm,板厚1. 2mm基板では、成形直後
は第4図(1)のようにほぼフラットであるが、この基
板に耐久試験(60〜90℃、60〜90%RH、 5
00〜1000時間)を行なうと、第4図(2)に示す
ような形状変化をきたす。このときの変化IH.は、約
50〜150μmであった。さらに基板上に記録膜を成
膜すると、成膜中の温度や膜自身の応力によって第4図
(3)のように変形する。その変化量H2は約150〜
300μ瓜であった。本発明ではこれらの変化を予め補
正して基板を成形することにより、経時変化及び基板上
に成膜する際の熱応力、膜応力等による変化が起きるこ
とにより、基板形状がフラットになる。また、得られた
基板を加熱処理により強制的に変化を起させることによ
り、以後の処理における形状の変化はほとんど発生しな
くなる. つまり本発明では、第1図に示すようにこの補正量をH
とした場合、H/ (D2−D.)が0〜0.05の範
囲で基板を製造することにより上記目的が達成される. 【実施例1 次に本発明を実施例を挙げて説明する。 X息盟ユ 第2図の概略断面図に示す金型を用いて基板を成形した
。 同図において、4は可動側鏡面板、5はスタンパ、6は
固定側鏡面板、7は注型樹脂、8は外周スタンパ押え、
9は内周スタンバ押えである。 可動側鏡面板の曲率半径Rについては補正量H=0.1
mm , D+ =30mm, Dz =60mmとし
て次式により決定した. H=  (R” −D+”)     (R”  D2
”)上式を満たす曲率半径を有する鏡面板を製作し金型
に組み込み、注型樹脂としてポリカーボネート樹脂を用
いて基板の成形を行った。 得られた基板はH = 0. 08mmで出来上がり、
これを90℃、3時間の熱処理を行なうことによりHは
0〜0. 05mmとなった.その後この基板に耐久試
験を行なっても形状の変化はほとんど発生しなかった. 実施例2 第3図のような形状の基板を作製した。本実施例におい
ては曲面形状を円錐台形状とし、成形に用いる金型の鏡
面板の角度θを次式により決定して行なった。 θ=tan−’ H/ (Dz  D+ )得られた基
板はH = 0. 08mmで出来上がり、これを90
℃、3時間の熱処理を行なうことによりHは0〜0. 
03mmとなった.その後この基板に耐久試験を行なっ
ても形状の変化はほとんど発生しなかった. (発明の効果1 以上説明したように、成形後の変化量を予め補正して基
板を成形することにより、経時変化及び基板上に成膜す
る際の熱応力、膜応力等による変化により、基板形状が
フラットになる。また、得られた基板を加熱処理により
強制的に変化を起させることにより、以後の処理におけ
る形状の変化はほとんど発生しなくなり、その結果反り
面振れといった機械的特性が非常に安定した基板を得る
ことが可能となった.
In recent years, playback-only compact discs and video discs, as well as optical discs that can record additionally, have been used as information recording carriers.
Furthermore, magneto-optical disks that can be recorded, played back, and erased are also used. For the substrates of these disks, plastic substrates made by injection molding or injection compression molding are used from the viewpoint of productivity, but in the conventional technology, a flat stamper is mounted on a flat mirror plate, and the side facing the stamper is A flat mirror plate was used to form a flat cavity, and molten resin was poured into the cavity to produce a flat disk substrate. [Problems to be Solved by the Invention] The optical disc substrate molded in this manner is shown in FIG.
As shown in Figure 4 (2), it has a flat shape immediately after molding, but due to aging and thermal changes, warping occurs as shown in Figure 4 (2). Furthermore, when the recording film was formed on the substrate, the degree of warping was further increased as shown in FIG. 4 (3). Such warping does not pose a particular problem when used at low rotation speeds such as compact discs, but it is not desirable for optical discs that are required to have higher density and higher speed in recent years, as it may lead to malfunctions due to vibrations and the like. In order to solve such problems, Japanese Patent Application Laid-Open No. 1986-671
24, JP-A-60-131651, JP-A-60-26
Attempts have been made to reduce the vibration caused by rotation by thickening the inner periphery of the substrate to give it strength, or by changing the thickness of the substrate from the inner periphery to the outer periphery, as disclosed in No. 1042. In many cases, it is not permissible to partially change the thickness of the substrate in terms of product design, and even if some strength is imparted, it has not been found to have much of an effect on changes over time or heat. [Means for Solving the Problems] In order to solve the above problems, the present inventors investigated in detail the behavior of the substrate over time and thermal changes, and found that the direction and amount of deformation were within a certain range. I found that it fits.
After molding, the deformation can be caused in a short time by heat treatment under certain conditions, and subsequent changes are extremely small. That is, the present invention produces a plastic substrate for an optical disk by correcting in advance changes in the shape of the plastic substrate over time and the amount of change due to thermal stress, film stress, etc. when forming a film on the substrate, and also produces a plastic substrate obtained by the method. The present invention discloses a method for manufacturing an optical disk substrate by heat-treating a substrate obtained by heat treatment, and an optical disk substrate obtained by these methods. As seen in FIG. 4, the substrate l obtained by the conventional method had information or group 2 formed on its upper surface, and warped due to subsequent changes over time. For example, the effective outer radius (D2) is 60 mm, the effective inner radius (D
+) 30mm, plate thickness 1. Immediately after molding, the 2 mm substrate is almost flat as shown in Figure 4 (1), but this substrate was subjected to an endurance test (60 to 90°C, 60 to 90% RH, 5
00 to 1000 hours), the shape changes as shown in FIG. 4 (2). Change at this time IH. was approximately 50 to 150 μm. Further, when a recording film is formed on the substrate, it is deformed as shown in FIG. 4(3) due to the temperature during film formation and the stress of the film itself. The amount of change H2 is about 150~
It was 300μ melon. In the present invention, by correcting these changes in advance and molding the substrate, the shape of the substrate becomes flat due to changes over time and due to thermal stress, film stress, etc. when forming a film on the substrate. Furthermore, by forcibly changing the obtained substrate through heat treatment, the shape hardly changes during subsequent treatments. In other words, in the present invention, as shown in FIG.
In this case, the above objective can be achieved by manufacturing a substrate with H/(D2-D.) in the range of 0 to 0.05. [Example 1] Next, the present invention will be explained by giving examples. A substrate was molded using the mold shown in the schematic cross-sectional view of FIG. In the figure, 4 is a movable side mirror plate, 5 is a stamper, 6 is a fixed side mirror plate, 7 is a casting resin, 8 is an outer stamper holder,
9 is an inner circumference stand bar presser. For the radius of curvature R of the movable mirror plate, the correction amount H = 0.1
It was determined using the following formula, with mm, D+ = 30 mm, and Dz = 60 mm. H= (R"-D+") (R"D2
”) A mirror plate with a radius of curvature that satisfies the above formula was manufactured, incorporated into a mold, and a substrate was molded using polycarbonate resin as the casting resin.The obtained substrate was completed with H = 0.08 mm.
By heat-treating this at 90°C for 3 hours, H is 0 to 0. It became 05mm. Even when this board was subsequently subjected to durability tests, there was almost no change in shape. Example 2 A substrate having a shape as shown in FIG. 3 was produced. In this example, the curved surface shape was a truncated cone shape, and the angle θ of the mirror plate of the mold used for molding was determined by the following formula. θ=tan-' H/ (Dz D+) The obtained substrate has H=0. It is completed with 08mm, and this is 90mm.
By performing heat treatment at ℃ for 3 hours, H becomes 0 to 0.
It became 03mm. Even when this board was subsequently subjected to durability tests, there was almost no change in shape. (Effect of the invention 1 As explained above, by correcting the amount of change after molding in advance and molding the substrate, the substrate The shape becomes flat.Also, by forcibly changing the obtained substrate through heat treatment, the shape hardly changes during subsequent processing, and as a result, mechanical properties such as warping and surface runout are significantly reduced. It became possible to obtain a stable substrate.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明を実施したディスク基板の断面図、第2
図は本発明を実施するのに好適に用いられる金型の概略
断面図、第3図は本発明を実施したディスク基板の他の
例の断面図、第4図は従来のディスク基板の成形後の変
形挙動を示す図である. 1・・・基板 3・・・記録膜 5・・・スタンパ 7・・・注型樹脂 9・・・内周スタンパ押え 2・・・情報またはグループ 4・・・可動側鏡面板 6・・・固定側鏡面板 8・・・外周スタンパ押え
FIG. 1 is a cross-sectional view of a disk substrate embodying the present invention, and FIG.
The figure is a schematic cross-sectional view of a mold preferably used to carry out the present invention, Figure 3 is a cross-sectional view of another example of a disk substrate in which the present invention is implemented, and Figure 4 is a conventional disk substrate after molding. This is a diagram showing the deformation behavior of . 1...Substrate 3...Recording film 5...Stamper 7...Casting resin 9...Inner stamper holder 2...Information or group 4...Movable side mirror plate 6... Fixed side mirror plate 8...outer stamper holder

Claims (1)

【特許請求の範囲】 1、光ディスク用プラスチック基板において、プラスチ
ック基板の形状の経時変化及び基板上に成膜する際の熱
応力、膜応力等による変化量を予め補正して製造するこ
とを特徴とする光ディスク用基板の製造方法。 2、得られる光ディスク用基板の情報記録面が凹面形状
である請求項1記載の製造方法。3、補正量をH、基板
の有効内半径をD_1、有効外半径をD_2とした場合
、H/(D_2−D_1)が0〜0.05であることを
特徴とする請求項1記載の製造方法。 4、請求項1の製造方法により得られる光ディスク基板
を熱処理することを特徴とする光ディスク用基板の製造
方法 5、請求項1〜4のいずれかの方法で製造される光ディ
スク用基板
[Claims] 1. A plastic substrate for an optical disk is manufactured by correcting in advance changes in the shape of the plastic substrate over time and changes due to thermal stress, film stress, etc. when forming a film on the substrate. A method for manufacturing an optical disc substrate. 2. The manufacturing method according to claim 1, wherein the information recording surface of the obtained optical disc substrate has a concave shape. 3. Manufacturing according to claim 1, characterized in that, where H is the correction amount, D_1 is the effective inner radius of the substrate, and D_2 is the effective outer radius, H/(D_2-D_1) is 0 to 0.05. Method. 4. A method for manufacturing an optical disk substrate, characterized in that the optical disk substrate obtained by the manufacturing method of claim 1 is heat treated. 5. An optical disk substrate manufactured by the method according to any one of claims 1 to 4.
JP1152149A 1989-06-16 1989-06-16 Method of manufacturing plastic substrate for optical disk Expired - Fee Related JP2709144B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1152149A JP2709144B2 (en) 1989-06-16 1989-06-16 Method of manufacturing plastic substrate for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1152149A JP2709144B2 (en) 1989-06-16 1989-06-16 Method of manufacturing plastic substrate for optical disk

Publications (2)

Publication Number Publication Date
JPH0319152A true JPH0319152A (en) 1991-01-28
JP2709144B2 JP2709144B2 (en) 1998-02-04

Family

ID=15534106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1152149A Expired - Fee Related JP2709144B2 (en) 1989-06-16 1989-06-16 Method of manufacturing plastic substrate for optical disk

Country Status (1)

Country Link
JP (1) JP2709144B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558997U (en) * 1992-01-20 1993-08-03 株式会社ニフコ Micro-damper housing single-sided structure

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6168744A (en) * 1984-09-12 1986-04-09 Canon Inc Method for manufacturing optical recording media
JPS6427908A (en) * 1987-07-24 1989-01-30 Hitachi Ltd Production of base plate for optical disc
JPS6482346A (en) * 1987-09-24 1989-03-28 Seiko Epson Corp Production of optical recording medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6168744A (en) * 1984-09-12 1986-04-09 Canon Inc Method for manufacturing optical recording media
JPS6427908A (en) * 1987-07-24 1989-01-30 Hitachi Ltd Production of base plate for optical disc
JPS6482346A (en) * 1987-09-24 1989-03-28 Seiko Epson Corp Production of optical recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0558997U (en) * 1992-01-20 1993-08-03 株式会社ニフコ Micro-damper housing single-sided structure

Also Published As

Publication number Publication date
JP2709144B2 (en) 1998-02-04

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