JPH11163070A - 半導体装置製造の熱処理工程における温度制御方法 - Google Patents
半導体装置製造の熱処理工程における温度制御方法Info
- Publication number
- JPH11163070A JPH11163070A JP9322643A JP32264397A JPH11163070A JP H11163070 A JPH11163070 A JP H11163070A JP 9322643 A JP9322643 A JP 9322643A JP 32264397 A JP32264397 A JP 32264397A JP H11163070 A JPH11163070 A JP H11163070A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- substrate
- covering member
- measuring device
- temperature measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
- G01K1/143—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations for measuring surface temperatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/02—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0436—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0602—Temperature monitoring
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Control Of Temperature (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9322643A JPH11163070A (ja) | 1997-11-25 | 1997-11-25 | 半導体装置製造の熱処理工程における温度制御方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9322643A JPH11163070A (ja) | 1997-11-25 | 1997-11-25 | 半導体装置製造の熱処理工程における温度制御方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH11163070A true JPH11163070A (ja) | 1999-06-18 |
| JPH11163070A5 JPH11163070A5 (2) | 2004-12-02 |
Family
ID=18146001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9322643A Withdrawn JPH11163070A (ja) | 1997-11-25 | 1997-11-25 | 半導体装置製造の熱処理工程における温度制御方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH11163070A (2) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100974502B1 (ko) | 2008-03-28 | 2010-08-10 | 우진 일렉트로나이트(주) | 로내부의 온도감지장치 |
| CN104460764A (zh) * | 2014-11-28 | 2015-03-25 | 广东工业大学 | 一种基于去伪控制的模糊pid的挤出机机筒温度控制方法 |
| JP2016076529A (ja) * | 2014-10-03 | 2016-05-12 | 東京エレクトロン株式会社 | 温度測定用支持部材及び熱処理装置 |
| WO2023230437A1 (en) * | 2022-05-23 | 2023-11-30 | Watlow Electric Manufacturing Company | Compliant temperature sensing system |
-
1997
- 1997-11-25 JP JP9322643A patent/JPH11163070A/ja not_active Withdrawn
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100974502B1 (ko) | 2008-03-28 | 2010-08-10 | 우진 일렉트로나이트(주) | 로내부의 온도감지장치 |
| JP2016076529A (ja) * | 2014-10-03 | 2016-05-12 | 東京エレクトロン株式会社 | 温度測定用支持部材及び熱処理装置 |
| CN104460764A (zh) * | 2014-11-28 | 2015-03-25 | 广东工业大学 | 一种基于去伪控制的模糊pid的挤出机机筒温度控制方法 |
| WO2023230437A1 (en) * | 2022-05-23 | 2023-11-30 | Watlow Electric Manufacturing Company | Compliant temperature sensing system |
| TWI872551B (zh) * | 2022-05-23 | 2025-02-11 | 美商瓦特洛威電子製造公司 | 順應式溫度感測系統 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20031212 |
|
| A621 | Written request for application examination |
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| A977 | Report on retrieval |
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| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060110 |
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| A761 | Written withdrawal of application |
Free format text: JAPANESE INTERMEDIATE CODE: A761 Effective date: 20060313 |