JPH11231549A5 - - Google Patents
Info
- Publication number
- JPH11231549A5 JPH11231549A5 JP1998046203A JP4620398A JPH11231549A5 JP H11231549 A5 JPH11231549 A5 JP H11231549A5 JP 1998046203 A JP1998046203 A JP 1998046203A JP 4620398 A JP4620398 A JP 4620398A JP H11231549 A5 JPH11231549 A5 JP H11231549A5
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- optical system
- mask
- photosensitive substrate
- projection optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04620398A JP4110606B2 (ja) | 1998-02-12 | 1998-02-12 | 走査型露光装置および露光方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04620398A JP4110606B2 (ja) | 1998-02-12 | 1998-02-12 | 走査型露光装置および露光方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11231549A JPH11231549A (ja) | 1999-08-27 |
| JPH11231549A5 true JPH11231549A5 (2) | 2005-11-10 |
| JP4110606B2 JP4110606B2 (ja) | 2008-07-02 |
Family
ID=12740537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04620398A Expired - Lifetime JP4110606B2 (ja) | 1998-02-12 | 1998-02-12 | 走査型露光装置および露光方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4110606B2 (2) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4211252B2 (ja) * | 2001-11-05 | 2009-01-21 | 株式会社日立製作所 | パターン露光方法及びその装置 |
| CN101976018B (zh) | 2006-02-16 | 2013-01-30 | 株式会社尼康 | 光罩及其制造方法 |
| WO2008065977A1 (en) * | 2006-11-27 | 2008-06-05 | Nikon Corporation | Exposure method, pattern forming method, exposure device, and device manufacturing method |
| TW202041978A (zh) * | 2015-03-31 | 2020-11-16 | 日商尼康股份有限公司 | 曝光裝置、平面顯示器之製造方法、元件製造方法、及曝光方法 |
| JP6701597B2 (ja) * | 2015-03-31 | 2020-05-27 | 株式会社ニコン | 露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法 |
-
1998
- 1998-02-12 JP JP04620398A patent/JP4110606B2/ja not_active Expired - Lifetime
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