JPH1180321A - Epoxy resin composition and semiconductor device - Google Patents
Epoxy resin composition and semiconductor deviceInfo
- Publication number
- JPH1180321A JPH1180321A JP23935397A JP23935397A JPH1180321A JP H1180321 A JPH1180321 A JP H1180321A JP 23935397 A JP23935397 A JP 23935397A JP 23935397 A JP23935397 A JP 23935397A JP H1180321 A JPH1180321 A JP H1180321A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- stilbene
- type epoxy
- resin composition
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 86
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 86
- 239000000203 mixture Substances 0.000 title claims abstract description 27
- 239000004065 semiconductor Substances 0.000 title claims description 14
- 239000005011 phenolic resin Substances 0.000 claims abstract description 22
- 239000011256 inorganic filler Substances 0.000 claims abstract description 18
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 18
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000002844 melting Methods 0.000 claims abstract description 11
- 230000008018 melting Effects 0.000 claims abstract description 11
- 229920001568 phenolic resin Polymers 0.000 claims abstract description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 9
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 claims abstract description 8
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims abstract description 7
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 4
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 claims description 28
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 claims description 23
- 235000021286 stilbenes Nutrition 0.000 claims description 23
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 238000002156 mixing Methods 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 9
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 claims description 8
- -1 4,4'-bis (2,3-epoxypropoxy) -3-tert-butyl-3', 5,5'-trimethylstilbene Chemical compound 0.000 claims description 7
- 150000002989 phenols Chemical class 0.000 claims description 7
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- DEFAMLKSNGANKT-UHFFFAOYSA-N 2-[[2-tert-butyl-4-[2-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]ethenyl]-5-methylphenoxy]methyl]oxirane Chemical compound CC(C)(C)C=1C=C(C=CC=2C=C(C)C(OCC3OC3)=C(C)C=2)C(C)=CC=1OCC1CO1 DEFAMLKSNGANKT-UHFFFAOYSA-N 0.000 claims description 3
- WGFBGCJDVFOVJG-UHFFFAOYSA-N 2-[[4-[2-[3,5-dimethyl-4-(oxiran-2-ylmethoxy)phenyl]ethenyl]-2,6-dimethylphenoxy]methyl]oxirane Chemical compound C=1C(C)=C(OCC2OC2)C(C)=CC=1C=CC(C=C1C)=CC(C)=C1OCC1CO1 WGFBGCJDVFOVJG-UHFFFAOYSA-N 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 238000003860 storage Methods 0.000 abstract description 11
- 238000013329 compounding Methods 0.000 abstract description 6
- 125000000217 alkyl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 description 41
- 238000000465 moulding Methods 0.000 description 19
- 238000000034 method Methods 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 238000004898 kneading Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- 238000006266 etherification reaction Methods 0.000 description 4
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 4
- 238000001721 transfer moulding Methods 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- NVVSVSWYKWRHED-UHFFFAOYSA-N 2-tert-butyl-4-[2-(3-tert-butyl-4-hydroxy-5-methylphenyl)ethenyl]-6-methylphenol Chemical compound CC(C)(C)C1=C(O)C(C)=CC(C=CC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 NVVSVSWYKWRHED-UHFFFAOYSA-N 0.000 description 1
- MHEPBAWJFVJKKU-UHFFFAOYSA-N 2-tert-butyl-4-[2-(5-tert-butyl-4-hydroxy-2-methylphenyl)ethenyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1C=CC1=CC(C(C)(C)C)=C(O)C=C1C MHEPBAWJFVJKKU-UHFFFAOYSA-N 0.000 description 1
- QIRPHBPKRGXMJD-UHFFFAOYSA-N 4-[2-(3-tert-butyl-4-hydroxy-5-methylphenyl)ethenyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C=CC=2C=C(C(O)=C(C)C=2)C(C)(C)C)=C1 QIRPHBPKRGXMJD-UHFFFAOYSA-N 0.000 description 1
- WTWMJYNGYCJIGR-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)ethenyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C=CC=2C=C(C)C(O)=C(C)C=2)=C1 WTWMJYNGYCJIGR-UHFFFAOYSA-N 0.000 description 1
- XIWOCLAUIGPSNG-UHFFFAOYSA-N 4-[2-(5-tert-butyl-4-hydroxy-2-methylphenyl)ethenyl]-2,6-dimethylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1C=CC1=CC(C)=C(O)C(C)=C1 XIWOCLAUIGPSNG-UHFFFAOYSA-N 0.000 description 1
- ZYUVGYBAPZYKSA-UHFFFAOYSA-N 5-(3-hydroxybutan-2-yl)-4-methylbenzene-1,3-diol Chemical compound CC(O)C(C)C1=CC(O)=CC(O)=C1C ZYUVGYBAPZYKSA-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 101100028952 Mus musculus Pdia2 gene Proteins 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- NHADDZMCASKINP-HTRCEHHLSA-N decarboxydihydrocitrinin Natural products C1=C(O)C(C)=C2[C@H](C)[C@@H](C)OCC2=C1O NHADDZMCASKINP-HTRCEHHLSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- PVAONLSZTBKFKM-UHFFFAOYSA-N diphenylmethanediol Chemical compound C=1C=CC=CC=1C(O)(O)C1=CC=CC=C1 PVAONLSZTBKFKM-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000004845 glycidylamine epoxy resin Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000005580 one pot reaction Methods 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 239000013500 performance material Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、速硬化性、成形
性、保存安定性、耐パッケージクラック性に優れる半導
体封止用エポキシ樹脂組成物、及びこれを用いた半導体
装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in fast-curing properties, moldability, storage stability and package crack resistance, and a semiconductor device using the same.
【0002】[0002]
【従来の技術】半導体を機械的、化学的作用から保護す
るためにエポキシ樹脂組成物(以下、樹脂組成物とい
う)が開発、生産されてきた。一般に樹脂組成物は、エ
ポキシ樹脂と硬化剤の硬化反応を速めるために硬化促進
剤を配合するが、多くの硬化促進剤は、常温等の比較的
低温域においても硬化促進作用を示すため、樹脂成分と
他の配合成分との混合の際に加えられる熱によっても硬
化を進行させる。更に、樹脂組成物を保管する際も常温
では徐々に硬化を進行させる。樹脂組成物の硬化が進行
し過ぎると、流動性の低下や成形の際の金線変形等引き
起こし、樹脂組成物の品質は低下する。又樹脂組成物に
要求される項目に、半導体パッケージを実装する際にク
ラックが生じるという問題がある。これは実装時の半田
浴に直接浸漬される等、高温に曝されるため、樹脂組成
物の硬化物が吸湿していた水分が膨張した結果、クラッ
クが生じるというものである。このため樹脂組成物の硬
化物は低吸湿性であることが求められており、この要求
に対し種々検討した結果、樹脂組成物中に無機充填材を
多く含有させることで耐パッケージクラック性はかなり
改善された。この無機充填材の高充填の手法としては、
無機充填材の粒度分布や形状の変更、エポキシ樹脂及び
フェノール樹脂の粘度の低減等があるが、これらの手法
を併用する場合が殆どである。低粘度のエポキシ樹脂と
しては、ビフェニル骨格を有するグリシジルエーテル型
エポキシ樹脂が開発され、実際に使用されている。この
ビフェニル型エポキシ樹脂を用いた樹脂組成物は、低吸
湿性で表面実装用封止材として優れているものの、耐熱
性の観点からは十分ではなく、高温吸湿条件下ではパッ
ケージクラックが発生するという問題点がある。この問
題点を改良するために、ビフェニル骨格より更に剛直な
骨格として、炭素−炭素二重結合に結合している2個の
アリール基が互いに同じであるスチルベン骨格を有する
エポキシ樹脂が開発されてきた。しかしながら、上記の
ようなスチルベン骨格を有するエポキシ樹脂の多くは、
単独では高融点で、樹脂組成物の各成分との混練が困難
であり、作業性が悪い。この作業性の悪さを改良する手
法として、特開平8−301981号公報にはスチルベ
ン骨格の炭素−炭素二重結合に結合しているアリール基
が互いに異なる、融点が150℃以下であるスチルベン
型エポキシ樹脂の1種もしくは2種以上、又はこれとス
チルベン骨格の炭素−炭素二重結合に結合しているアリ
ール基が互いに同じであるスチルベン型エポキシ樹脂の
1種もしくは2種以上との混合物、及びフェノール樹脂
系硬化剤を含む樹脂組成物が提案されており、作業性の
点は改善されている。即ち、この公報では、ビフェニル
型エポキシ樹脂より耐熱性に優れ、高温吸湿条件下では
パッケージクラックが発生しない樹脂組成物が提案され
ている。しかし、この公報で開示されているスチルベン
型エポキシ樹脂もしくはスチルベン型エポキシ樹脂混合
物は、ビフェニル型エポキシ樹脂と同様に、粘度低減の
ためにエポキシ樹脂の分子量は小さくなっており、この
ためエポキシ樹脂の分子は動きやすく、反応の初期段階
では硬化反応が進みやすくなっている。更に元々低分子
量であるために反応の最終段階では充分に架橋密度が上
がらず、樹脂組成物の硬化性が低くなってしまう。2. Description of the Related Art Epoxy resin compositions (hereinafter referred to as resin compositions) have been developed and produced for protecting semiconductors from mechanical and chemical actions. Generally, a resin composition contains a curing accelerator in order to accelerate the curing reaction between an epoxy resin and a curing agent.However, many curing accelerators exhibit a curing acceleration effect even at a relatively low temperature range such as room temperature. Curing also proceeds by the heat applied when mixing the component with other compounding components. Further, when the resin composition is stored, the curing proceeds gradually at room temperature. If the curing of the resin composition proceeds too much, it causes a decrease in fluidity and deformation of a gold wire at the time of molding, and the quality of the resin composition deteriorates. In addition, there is a problem that cracks are generated when mounting a semiconductor package as an item required for the resin composition. This is because the cured product of the resin composition is exposed to a high temperature such as being directly immersed in a solder bath at the time of mounting, and the moisture absorbed by the cured product of the resin composition expands, resulting in a crack. For this reason, the cured product of the resin composition is required to have low hygroscopicity, and as a result of various studies on this requirement, the inclusion of a large amount of the inorganic filler in the resin composition has significantly improved package crack resistance. Improved. As a method of high filling of this inorganic filler,
There are changes in the particle size distribution and shape of the inorganic filler, reduction in the viscosity of the epoxy resin and phenol resin, and the like, but these methods are mostly used in combination. As a low-viscosity epoxy resin, a glycidyl ether type epoxy resin having a biphenyl skeleton has been developed and actually used. Although the resin composition using this biphenyl type epoxy resin has low moisture absorption and is excellent as a sealing material for surface mounting, it is not sufficient from the viewpoint of heat resistance, and package cracks occur under high temperature moisture absorption conditions. There is a problem. In order to improve this problem, an epoxy resin having a stilbene skeleton in which two aryl groups bonded to a carbon-carbon double bond are the same as each other as a stiffer skeleton than a biphenyl skeleton has been developed. . However, many of the epoxy resins having a stilbene skeleton as described above,
When used alone, it has a high melting point, is difficult to knead with each component of the resin composition, and has poor workability. As a method of improving the poor workability, Japanese Patent Laid-Open Publication No. Hei 8-301981 discloses a stilbene type epoxy having different aryl groups bonded to a carbon-carbon double bond of a stilbene skeleton and having a melting point of 150 ° C. or less. A mixture of one or more resins, or one or more stilbene-type epoxy resins having the same aryl group bonded to the carbon-carbon double bond of the stilbene skeleton with the stilbene skeleton, and phenol A resin composition containing a resin-based curing agent has been proposed, and the workability has been improved. That is, this publication proposes a resin composition that is superior in heat resistance to a biphenyl-type epoxy resin and does not generate a package crack under high-temperature moisture absorption conditions. However, the stilbene-type epoxy resin or the stilbene-type epoxy resin mixture disclosed in this publication, like the biphenyl-type epoxy resin, has a low molecular weight of the epoxy resin to reduce the viscosity. Is easy to move, and the curing reaction proceeds easily in the initial stage of the reaction. Furthermore, since the polymer has a low molecular weight, the crosslink density is not sufficiently increased at the final stage of the reaction, and the curability of the resin composition is lowered.
【0003】そこで、近年、常温等の比較的低温域では
硬化促進作用を示さず、成形時の高温域でのみ硬化促進
作用を示す、いわゆる潜伏性触媒を開発するための研究
がなされてきている。樹脂組成物に潜伏性触媒を配合す
ることにより、常温等の比較的低温域での硬化反応は殆
ど進行しなくなり、又、その潜伏性の性質から低粘度・
低分子量のエポキシ樹脂やフェノール樹脂を高度に硬化
させるために潜伏性触媒の添加量を増加させることが可
能となり、保存安定性、耐半田クラック性を具備した樹
脂組成物は開発されてきた。しかしながら上記のような
樹脂組成物でも、使用する条件によっては不具合が生じ
ることがある。例えば、短い成形時間での成形性が劣る
傾向にあることが挙げられる。短時間硬化用の速硬化性
の樹脂組成物には、通常の成形温度(170〜185
℃)、成形時間30〜35秒間程度の条件での良好な成
形性が求められている。しかし潜伏性触媒のみで硬化さ
せる樹脂組成物では、成形時に樹脂組成物中の潜伏性触
媒が活性化しうる温度に達する時間に加え、活性化した
後、充分に反応を促進させる時間が必要であり、封止さ
れるパッケージの構造によっては、短い成形時間では充
分良好な成形性が得られないことがある。[0003] In recent years, studies have been made to develop a so-called latent catalyst which does not exhibit a curing accelerating action at a relatively low temperature range such as normal temperature but exhibits a curing accelerating action only at a high temperature range during molding. . By blending the latent catalyst into the resin composition, the curing reaction in a relatively low temperature range such as room temperature hardly progresses.
It has become possible to increase the amount of the latent catalyst to harden a low molecular weight epoxy resin or phenol resin to a high degree, and resin compositions having storage stability and solder crack resistance have been developed. However, even with the above resin composition, a problem may occur depending on the conditions used. For example, moldability in a short molding time tends to be inferior. For a quick-curing resin composition for short-time curing, a usual molding temperature (170 to 185) is used.
C), and good moldability under conditions of a molding time of about 30 to 35 seconds is required. However, in the case of a resin composition cured with only a latent catalyst, in addition to the time required to activate the latent catalyst in the resin composition during molding, it is necessary to have sufficient time to promote the reaction after activation. Depending on the structure of the package to be sealed, short molding time may not provide sufficiently good moldability.
【0004】更に、ウスバリの問題が挙げられる。ウス
バリは樹脂成分中の低分子量成分が原因だが、潜伏性触
媒のみで硬化させる樹脂組成物では、材料混練時に樹脂
成分中の、特に低分子量成分の反応までもが抑制される
ために、発生しやすくなるものである。又、この現象
は、成形金型の摩耗度合いが大きくなると出やすい傾向
にある。[0004] Further, there is the problem of usbari. Usbari is caused by the low molecular weight component in the resin component.However, in a resin composition cured with only a latent catalyst, it occurs because the reaction of the resin component, especially even the low molecular weight component, in the resin component during kneading is suppressed. It will be easier. Also, this phenomenon tends to occur when the degree of wear of the molding die increases.
【0005】[0005]
【発明が解決しようとする課題】本発明は、速硬化性、
成形性特にウスバリ特性、保存安定性、耐パッケージク
ラック性に優れる半導体封止用樹脂組成物、及びこれを
用いた半導体装置を提供するものである。DISCLOSURE OF THE INVENTION The present invention provides a quick-curing,
An object of the present invention is to provide a resin composition for semiconductor encapsulation which is excellent in moldability, particularly excellent usability, storage stability and package crack resistance, and a semiconductor device using the same.
【0006】[0006]
【課題を解決するための手段】本発明は、(A)一般式
(1)で示されるスチルベン型エポキシ樹脂と一般式
(2)で示されるスチルベン型エポキシ樹脂との混合
物、(B)1分子内にフェノール性水酸基を2個以上有
するフェノール樹脂、(C)テトラフェニルホスホニウ
ム・テトラナフトイルオキシボレート、(D)トリフェ
ニルホスフィン、1,8−ジアザビシクロ(5,4,
0)ウンデセン−7、又は2−メチルイミダゾールのう
ちの少なくとも1種、及び(E)無機充填材を必須成分
とし、全エポキシ樹脂のエポキシ基と全フェノール樹脂
のフェノール性水酸基の当量比が0.5〜2であり、無
機充填材(E)の配合量が全エポキシ樹脂と全フェノー
ル樹脂の合計量100重量部あたり200〜2400重
量部であることを特徴とするエポキシ樹脂組成物であ
る。The present invention provides (A) a mixture of a stilbene type epoxy resin represented by the general formula (1) and a stilbene type epoxy resin represented by the general formula (2), and (B) one molecule. A phenolic resin having two or more phenolic hydroxyl groups therein, (C) tetraphenylphosphonium tetranaphthoyloxyborate, (D) triphenylphosphine, 1,8-diazabicyclo (5,4,
0) At least one of undecene-7 or 2-methylimidazole and (E) an inorganic filler are essential components, and the equivalent ratio of the epoxy group of all epoxy resins to the phenolic hydroxyl group of all phenol resins is 0.1. 5 to 2, wherein the blending amount of the inorganic filler (E) is 200 to 2400 parts by weight per 100 parts by weight of the total amount of all epoxy resins and all phenolic resins.
【化3】 (ここで、R1〜R8は、それぞれ独立に、炭素数1〜6
の鎖状、又は環状アルキル基、水素原子、又はハロゲン
原子を示す。炭素−炭素二重結合に結合している2個の
アリール基は互いに異なる。)Embedded image (Wherein, R 1 to R 8 each independently represent 1 to 6 carbon atoms)
Represents a chain or cyclic alkyl group, a hydrogen atom or a halogen atom. The two aryl groups attached to the carbon-carbon double bond are different from each other. )
【0007】[0007]
【化4】 (ここで、R9〜R12は、それぞれ独立に、炭素数1〜
6の鎖状、又は環状アルキル基、水素原子、又はハロゲ
ン原子を示す。炭素−炭素二重結合に結合している2個
のアリール基は互いに同じである。)Embedded image (Where R 9 to R 12 each independently represent a carbon number of 1 to
6 represents a chain or cyclic alkyl group, a hydrogen atom, or a halogen atom. The two aryl groups attached to the carbon-carbon double bond are the same as each other. )
【0008】[0008]
【発明の実施の形態】本発明に用いられる一般式(1)
及び(2)で示されるスチルベン型エポキシ樹脂の置換
基R1〜R12としては、例えば、それぞれメチル基、エ
チル基、プロピル基、ブチル基、アミル基、ヘキシル基
(各異性体を含む)、シクロヘキシル基、塩素原子、及
び臭素原子等が挙げられる。これらの中では、樹脂の溶
融粘度の低さから、メチル基、エチル基、プロピル基、
及びブチル基がより好ましい。本発明に用いられるエポ
キシ樹脂は、一般式(1)のスチルベン型エポキシ樹脂
と一般式(2)のスチルベン型エポキシ樹脂との混合物
である。一般式(1)のスチルベン型エポキシ樹脂、一
般式(2)のスチルベン型エポキシ樹脂は、共に置換基
の種類等により種々の構造のものがあり、一般式(1)
及び一般式(2)の各々のスチルベン型エポキシ樹脂
は、1種類の構造のものでも、2種類以上の構造のもの
の混合物でもかまわない。一般式(1)のスチルベン型
エポキシ樹脂と一般式(2)のスチルベン型エポキシ樹
脂との混合は、両方の樹脂を混合することにより融点が
低くなれば、混合方法については特に限定しない。例え
ば、スチルベン型エポキシ樹脂の原料であるスチルベン
型フェノール類をグリシジルエーテル化する前に混合し
ておいたり、両方のスチルベン型エポキシ樹脂を溶融混
合する方法等がある。一般式(1)のスチルベン型エポ
キシ樹脂と一般式(2)のスチルベン型エポキシ樹脂と
の混合物の融点は、150〜50℃が好ましい。150
℃を越えると、樹脂組成物を構成する他の成分との混練
等の作業性に問題が生じるおそれがあるので好ましくな
い。50℃未満だと、エポキシ樹脂が固結しやすく、仕
込みの際の計量等の作業性に問題が生じるおそれがある
ので好ましくない。本発明のスチルベン型エポキシ樹脂
の融点は、示差走査熱量計を用いて、常温から昇温速度
5℃/分で昇温した結晶融解の吸熱ピークの頂点の温度
を示す。本発明に用いられる一般式(1)のスチルベン
型エポキシ樹脂は、原料である炭素−炭素二重結合に結
合している2個のアリール基が互いに異なったスチルベ
ン型フェノール類のグリシジルエーテル化によって得ら
れるが、入手のし易さ、性能、原料価格の点から、5-タ
ーシャリブチル-4,4'-ジヒドロキシ-2,3',5'-トリメチ
ルスチルベン、3-ターシャリブチル-4,4'-ジヒドロキシ
-3',5,5'-トリメチルスチルベンが特に好ましい。一般
式(2)のスチルベン型エポキシ樹脂は、原料である炭
素−炭素二重結合に結合している2個のアリール基が互
いに同じであるスチルベン型フェノール類のグリシジル
エーテル化によって得られるが、性能、原料価格の点か
ら、4,4'-ジヒドロキシ-3,3',5,5'-テトラメチルスチル
ベン、4,4'-ジヒドロキシ-3,3'-ジターシャリブチル-6,
6'-ジメチルスチルベン、4,4'-ジヒドロキシ-3,3'-ジタ
ーシャリブチル-5,5'-ジメチルスチルベンが特に好まし
い。更に好ましくは、一般式(1)で示されるスチルベ
ン型エポキシ樹脂と一般式(2)で示されるスチルベン
型エポキシ樹脂との混合物が、4,4'-ビス(2,3-エポキシ
プロポキシ)-5-ターシャリブチル-2,3',5'-トリメチル
スチルベン20〜60重量%と、4,4'-ビス(2,3-エポキ
シプロポキシ)-3,3',5,5'-テトラメチルスチルベン40
〜80重量%からなり、この範囲内のものは特に性能、
原料価格等の優れた特性を有する。又、上記のスチルベ
ン型エポキシ樹脂は、他のエポキシ樹脂と併用しても良
い。併用するエポキシ樹脂としては、例えば、ビスフェ
ノールA型エポキシ樹脂、含臭素エポキシ樹脂、ビスフ
ェノールF型エポキシ樹脂、ビスフェノールAD型エポ
キシ樹脂、ビフェニル型エポキシ樹脂、ジヒドロキシジ
フェニルメタン型エポキシ樹脂、フェノールノボラック
型エポキシ樹脂、クレゾールノボラック型エポキシ樹
脂、環状脂肪族エポキシ樹脂、グリシジルエステル系エ
ポキシ樹脂、グリシジルアミン系エポキシ樹脂、複素環
式エポキシ樹脂、3官能型エポキシ樹脂、トリスヒドロ
キシフェニルメタン型エポキシ樹脂、及びジシクロペン
タジエンとフェノール類を付加反応により重合させたフ
ェノール樹脂をグリシジルエーテル化することによって
得られるエポキシ樹脂等が挙げられ、これらは単独でも
混合して用いても良い。本発明のエポキシ樹脂とは、モ
ノマー、オリゴマー、及びポリマー全般を言う。DESCRIPTION OF THE PREFERRED EMBODIMENTS The general formula (1) used in the present invention
And the substituents R 1 to R 12 of the stilbene type epoxy resin represented by (2) include, for example, methyl group, ethyl group, propyl group, butyl group, amyl group, hexyl group (including each isomer), Examples include a cyclohexyl group, a chlorine atom, and a bromine atom. Among these, from the low melt viscosity of the resin, methyl group, ethyl group, propyl group,
And butyl groups are more preferred. The epoxy resin used in the present invention is a mixture of a stilbene type epoxy resin of the general formula (1) and a stilbene type epoxy resin of the general formula (2). The stilbene type epoxy resin of the general formula (1) and the stilbene type epoxy resin of the general formula (2) both have various structures depending on the type of the substituent and the like.
Each of the stilbene-type epoxy resins of the general formula (2) may have a single structure or a mixture of two or more structures. The mixing method of the stilbene-type epoxy resin of the general formula (1) and the stilbene-type epoxy resin of the general formula (2) is not particularly limited as long as the melting point is reduced by mixing both resins. For example, there is a method of mixing stilbene-type phenols, which are raw materials of the stilbene-type epoxy resin, before glycidyl etherification, or a method of melt-mixing both stilbene-type epoxy resins. The melting point of the mixture of the stilbene type epoxy resin of the general formula (1) and the stilbene type epoxy resin of the general formula (2) is preferably from 150 to 50 ° C. 150
If the temperature exceeds ℃, there is a possibility that a problem may occur in workability such as kneading with other components constituting the resin composition, which is not preferable. If the temperature is lower than 50 ° C., the epoxy resin is liable to solidify, which may cause a problem in workability such as measurement during preparation, which is not preferable. The melting point of the stilbene-type epoxy resin of the present invention indicates the temperature at the top of the endothermic peak of crystal melting when the temperature is raised from room temperature at a rate of 5 ° C./min using a differential scanning calorimeter. The stilbene-type epoxy resin of the general formula (1) used in the present invention is obtained by glycidyl etherification of stilbene-type phenols in which two aryl groups bonded to a carbon-carbon double bond are different from each other. However, from the viewpoint of availability, performance, and raw material price, 5-tert-butyl-4,4'-dihydroxy-2,3 ', 5'-trimethylstilbene and 3-tert-butyl-4,4 '-Dihydroxy
-3 ', 5,5'-Trimethylstilbene is particularly preferred. The stilbene type epoxy resin of the general formula (2) is obtained by glycidyl etherification of a stilbene type phenol in which two aryl groups bonded to a carbon-carbon double bond as a raw material are the same as each other. In terms of raw material prices, 4,4'-dihydroxy-3,3 ', 5,5'-tetramethylstilbene, 4,4'-dihydroxy-3,3'-ditert-butyl-6,
6'-dimethylstilbene, 4,4'-dihydroxy-3,3'-ditert-butyl-5,5'-dimethylstilbene are particularly preferred. More preferably, a mixture of the stilbene type epoxy resin represented by the general formula (1) and the stilbene type epoxy resin represented by the general formula (2) is 4,4′-bis (2,3-epoxypropoxy) -5 -Tert-butyl-2,3 ', 5'-trimethylstilbene 20 to 60% by weight and 4,4'-bis (2,3-epoxypropoxy) -3,3', 5,5'-tetramethylstilbene 40
~ 80% by weight, and those within this range have particularly good performance,
Has excellent properties such as raw material prices. Further, the stilbene type epoxy resin may be used in combination with another epoxy resin. Examples of the epoxy resin to be used in combination include bisphenol A type epoxy resin, bromine-containing epoxy resin, bisphenol F type epoxy resin, bisphenol AD type epoxy resin, biphenyl type epoxy resin, dihydroxydiphenylmethane type epoxy resin, phenol novolak type epoxy resin, and cresol. Novolak epoxy resin, cycloaliphatic epoxy resin, glycidyl ester epoxy resin, glycidylamine epoxy resin, heterocyclic epoxy resin, trifunctional epoxy resin, trishydroxyphenylmethane epoxy resin, and dicyclopentadiene and phenols And the like. Epoxy resins obtained by glycidyl etherification of a phenol resin obtained by polymerizing a phenol resin by an addition reaction are mentioned, and these may be used alone or in combination. The epoxy resin of the present invention refers to monomers, oligomers, and polymers in general.
【0009】本発明に用いられる1分子内にフェノール
性水酸基を2個以上有するフェノール樹脂は、モノマ
ー、オリゴマー、及びポリマー全般を言い、例えば、フ
ェノールノボラック樹脂、クレゾールノボラック樹脂、
パラキシリレン変性フェノール樹脂、メタキシリレン・
パラキシリレン変性フェノール樹脂、テルペン変性フェ
ノール樹脂、ジシクロペンタジエン変性フェノール樹脂
等が挙げられ、これらは単独でも混合して用いても良
い。これらのフェノール樹脂は、分子量、軟化点、水酸
基当量等に特に制限なく使用することができる。The phenolic resin having two or more phenolic hydroxyl groups in one molecule used in the present invention refers to monomers, oligomers and polymers in general, such as phenol novolak resin, cresol novolak resin,
Para-xylylene-modified phenolic resin, meta-xylylene
Examples thereof include a paraxylylene-modified phenol resin, a terpene-modified phenol resin, and a dicyclopentadiene-modified phenol resin. These may be used alone or in combination. These phenol resins can be used without any particular limitation in molecular weight, softening point, hydroxyl equivalent, and the like.
【0010】本発明に用いられる全エポキシ樹脂のエポ
キシ基と全フェノール樹脂のフェノール性水酸基の当量
比は、好ましくは0.5〜2であり、特に0.7〜1.
5がより好ましい。0.5〜2の範囲を外れると、耐湿
性、硬化性等が低下するので好ましくない。The equivalent ratio of the epoxy groups of all epoxy resins used in the present invention to the phenolic hydroxyl groups of all phenolic resins is preferably 0.5-2, especially 0.7-1.
5 is more preferred. If the ratio is out of the range of 0.5 to 2, the moisture resistance, the curability and the like are undesirably reduced.
【0011】本発明に用いられるテトラフェニルホスホ
ニウム・テトラナフトイルオキシボレートは、潜伏性を
有する硬化促進剤である。この硬化促進剤は、比較的低
温域においては触媒活性を示さないので樹脂組成物の硬
化反応が進むことがない。即ち、各成分の混練時に、一
部の架橋反応が速やかに進むことがなく所定の流動性を
保持し、又、同じ理由から樹脂組成物の常温保存性にも
優れる。しかも成形時の高温域では従来の硬化促進剤よ
りも強い触媒活性を示し、樹脂組成物を高度に硬化させ
る。The tetraphenylphosphonium tetranaphthoyloxyborate used in the present invention is a latent curing accelerator. Since this curing accelerator does not show catalytic activity in a relatively low temperature range, the curing reaction of the resin composition does not proceed. That is, at the time of kneading the respective components, a part of the cross-linking reaction does not proceed rapidly, so that a predetermined fluidity is maintained, and for the same reason, the resin composition is excellent in the room temperature storage stability. In addition, in the high temperature range during molding, the catalyst exhibits higher catalytic activity than conventional curing accelerators, and cures the resin composition to a high degree.
【0012】本発明に用いられるトリフェニルホスフィ
ン(以下、TPPという)、1,8−ジアザビシクロ
(5,4,0)ウンデセン−7(以下、DBUとい
う)、2−メチルイミダゾール(以下、2MZという)
はいずれも一般的なエポキシ樹脂の硬化促進剤であり、
常温等の比較的低温域でも硬化促進作用がある。これら
の硬化促進剤の少なくとも1種と、潜伏性の硬化促進剤
であるテトラフェニルホスホニウム・テトラナフトイル
オキシボレートを併用することにより、保存安定性、耐
半田クラック性に加え、速硬化性、成形性特にウスバリ
特性を兼ね備えた樹脂組成物が可能となる。つまり、テ
トラフェニルホスホニウム・テトラナフトイルオキシボ
レートを使用することで、樹脂成分と他の成分との混練
の際にも硬化反応は進行せず、又、樹脂組成物の保存時
の品質低下も抑制され、保存安定性が良好となり、充分
な流動性を有したまま無機充填材を高充填できることか
ら、耐半田クラック性も良好となる。更に、速硬化性と
ウスバリ防止のためには、TPP、DBU、又は2MZ
のうちの適当な1種以上が、その成形時間や半導体パッ
ケージの種類によって選ばれるが、2種以上を組み合わ
せて使用しても問題ない。これらの硬化促進剤は、常温
等の比較的低温域でも硬化促進作用があるため、樹脂成
分と他の成分との混練の際に動きやすい低分子量成分の
硬化を促進してウスバリを防止し、又、成形時の高温域
での触媒活性も高いため、速硬化性にも役立つ。テトラ
フェニルホスホニウム・テトラナフトイルオキシボレー
トの配合量としては、全硬化促進剤中に50〜95重量
%が望ましい。Triphenylphosphine (hereinafter referred to as TPP), 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU), 2-methylimidazole (hereinafter referred to as 2MZ) used in the present invention.
Are general epoxy resin curing accelerators,
It has a hardening promoting effect even in a relatively low temperature range such as normal temperature. By using at least one of these curing accelerators and a latent curing accelerator, tetraphenylphosphonium / tetranaphthoyloxyborate, in addition to storage stability and solder crack resistance, rapid curing and molding This makes it possible to obtain a resin composition having both properties and, in particular, Usbari characteristics. In other words, by using tetraphenylphosphonium / tetranaphthoyloxyborate, the curing reaction does not proceed even when the resin component and other components are kneaded, and also suppresses the deterioration of the quality of the resin composition during storage. In addition, the storage stability is improved, and the inorganic filler can be highly filled while having sufficient fluidity, so that the solder crack resistance is also improved. Furthermore, for fast curing and preventing burrs, TPP, DBU or 2MZ
One or more of them is selected depending on the molding time and the type of the semiconductor package, but there is no problem if two or more kinds are used in combination. Since these curing accelerators have a curing promoting action even in a relatively low temperature range such as room temperature, it promotes curing of a low-molecular weight component that is easily movable when kneading with a resin component and other components, thereby preventing burrs. In addition, since the catalyst has a high catalytic activity in a high temperature range during molding, it is useful for quick curing. The compounding amount of tetraphenylphosphonium / tetranaphthoyloxyborate is desirably 50 to 95% by weight in the total curing accelerator.
【0013】本発明に用いられる全硬化促進剤の配合量
としては、全エポキシ樹脂と全フェノール樹脂の合計量
100重量部あたり0.4〜20重量部が好ましく、通
常70〜150℃で混合することができる。配合量が
0.4重量部未満だと、加熱成形時に充分な硬化性が得
られないおそれがあり、一方、20重量部を越えると、
硬化が速すぎて成形時に流動性の低下による充填不良等
を生じるおそれがあるので好ましくない。The total amount of the curing accelerator used in the present invention is preferably 0.4 to 20 parts by weight per 100 parts by weight of the total of all epoxy resins and all phenolic resins, and is usually mixed at 70 to 150 ° C. be able to. If the amount is less than 0.4 parts by weight, sufficient curability may not be obtained during heat molding, while if it exceeds 20 parts by weight,
It is not preferable because the curing is too fast and there is a possibility that poor filling may occur due to a decrease in fluidity during molding.
【0014】本発明に用いられる無機充填材の種類につ
いては特に制限はなく、一般に封止材料に用いられてい
る無機充填材を使用することができる。例えば、溶融破
砕シリカ粉末、溶融球状シリカ粉末、結晶シリカ粉末、
2次凝集シリカ粉末、アルミナ、チタンホワイト、水酸
化アルミニウム、タルク、クレー、ガラス繊維等が挙げ
られ、特に溶融球状シリカ粉末が好ましい。形状は限り
なく真球状であることが好ましく、又、粒子の大きさの
異なるものを混合することにより充填量を多くすること
ができる。この無機充填材の配合量としては、全エポキ
シ樹脂と全フェノール樹脂の合計量100重量部あたり
200〜2400重量部が好ましい。200重量部未満
だと、無機充填材による補強効果が充分に発現しないお
それがあり、2400重量部を越えると、樹脂組成物の
流動性が低下し成形時に充填不良等が生じるおそれがあ
るので好ましくない。特に無機充填材の配合量が全エポ
キシ樹脂と全フェノール樹脂の合計量100重量部あた
り250〜1400重量部であれば、半導体封止用とし
て、樹脂組成物の硬化物の吸湿率が低く、パッケージク
ラックの発生を防止することができ、更に溶融時の樹脂
組成物の粘度が低くなるため、半導体パッケージ内部の
金線変形を引き起こすおそれがなく、より好ましい。本
発明に用いられる無機充填材は、予め充分混合しておく
ことが好ましい。又、必要に応じて無機充填材をカップ
リング剤や樹脂で予め処理して用いても良く、処理の方
法としては、溶剤を用いて混合した後に溶媒を除去する
方法や、直接無機充填材に添加し混合機を用いて処理す
る方法等がある。The type of the inorganic filler used in the present invention is not particularly limited, and an inorganic filler generally used for a sealing material can be used. For example, fused silica powder, fused spherical silica powder, crystalline silica powder,
Secondary aggregated silica powder, alumina, titanium white, aluminum hydroxide, talc, clay, glass fiber, and the like are listed, and fused spherical silica powder is particularly preferred. The shape is preferably infinitely spherical, and the filling amount can be increased by mixing particles having different particle sizes. The compounding amount of the inorganic filler is preferably 200 to 2400 parts by weight per 100 parts by weight of the total amount of all epoxy resins and all phenol resins. If it is less than 200 parts by weight, the reinforcing effect of the inorganic filler may not be sufficiently exhibited, and if it is more than 2400 parts by weight, the fluidity of the resin composition may be reduced, and poor filling or the like may occur during molding. Absent. In particular, when the compounding amount of the inorganic filler is 250 to 1,400 parts by weight per 100 parts by weight of the total amount of all epoxy resins and all phenolic resins, the moisture absorption of the cured product of the resin composition is low for semiconductor encapsulation, The generation of cracks can be prevented, and the viscosity of the resin composition at the time of melting is lowered, so that there is no possibility of causing gold wire deformation inside the semiconductor package, which is more preferable. It is preferable that the inorganic filler used in the present invention is sufficiently mixed in advance. Also, if necessary, the inorganic filler may be pre-treated with a coupling agent or a resin and used, and as a treatment method, a method of removing the solvent after mixing using a solvent, or directly treating the inorganic filler. There is a method of adding and treating using a mixer.
【0015】本発明の樹脂組成物は、(A)〜(E)成
分の他、必要に応じてカーボンブラック等の着色剤、臭
素化エポキシ樹脂、酸化アンチモン、リン化合物等の難
燃剤、γ-グリシドキシプロピルトリメトキシシラン等
のカップリング剤、シリコーンオイル、シリコーンゴム
等の低応力成分、天然ワックス、合成ワックス、高級脂
肪酸及びその金属塩類もしくはパラフィン等の離型剤、
酸化防止剤等の各種添加剤を配合することができる。本
発明の樹脂組成物は、(A)〜(E)成分、及びその他
の添加剤等をミキサーを用いて常温混合し、ロール、押
出機等の混練機で混練し、冷却後粉砕して得られる。本
発明の樹脂組成物を用いて、半導体等の電子部品を封止
し、半導体装置を製造するには、トランスファーモール
ド、コンプレッションモールド、インジェクションモー
ルド等の従来からの成形方法で硬化成形すればよい。The resin composition of the present invention comprises, in addition to the components (A) to (E), if necessary, a coloring agent such as carbon black, a brominated epoxy resin, a flame retardant such as antimony oxide and a phosphorus compound, and γ- Coupling agents such as glycidoxypropyltrimethoxysilane, silicone oil, low stress components such as silicone rubber, natural wax, synthetic wax, higher fatty acids and release agents such as metal salts or paraffin,
Various additives such as antioxidants can be blended. The resin composition of the present invention is obtained by mixing the components (A) to (E) and other additives at room temperature using a mixer, kneading the mixture with a kneading machine such as a roll or an extruder, cooling, and pulverizing. Can be In order to manufacture a semiconductor device by encapsulating an electronic component such as a semiconductor using the resin composition of the present invention, it is only necessary to cure and mold by a conventional molding method such as transfer molding, compression molding and injection molding.
【0016】[0016]
【実施例】以下に本発明の実施例を示すが、本発明はこ
れらに限定されるものではない。配合単位は重量部とす
る。又、テトラフェニルホスホニウム・テトラナフトイ
ルオキシボレートの化学式を以下に示す。EXAMPLES Examples of the present invention will be shown below, but the present invention is not limited to these examples. The mixing unit is parts by weight. The chemical formula of tetraphenylphosphonium / tetranaphthoyloxyborate is shown below.
【化5】 Embedded image
【0017】 実施例1 エポキシ樹脂A(4,4'-ビス(2,3-エポキシプロポキシ)-5-ターシャリブチル-2,3 ',5'-トリメチルスチルベンを主成分とする樹脂40重量%と4,4'-ビス(2,3-エ ポキシプロポキシ)-3,3',5,5'-テトラメチルスチルベンを主成分とする樹脂60 重量%との混合物。融点120℃、エポキシ当量209) 55.6重量部 式(3)のフェノール樹脂(軟化点73℃) 44.4重量部Example 1 Epoxy Resin A (4,4′-bis (2,3-epoxypropoxy) -5-tert-butyl-2,3 ′, 5′-trimethylstilbene 40% by weight of resin Of a resin having a main component of 4,4'-bis (2,3-epoxypropoxy) -3,3 ', 5,5'-tetramethylstilbene at a melting point of 120 ° C and an epoxy equivalent of 209 55.6 parts by weight Phenol resin of the formula (3) (softening point 73 ° C.) 44.4 parts by weight
【化6】 テトラフェニルホスホニウム・テトラナフトイルオキシボレート(以下、TPP K−NAという) 5.0重量部 TPP 1.5重量部 溶融球状シリカ(平均粒径15μm) 830重量部 カーボンブラック 2.0重量部 臭素化フェノールノボラック型エポキシ樹脂 1.7重量部 カルナバワックス 2.8重量部 を常温でミキサーを用いて混合した後、100℃で二軸
ロールを用いて混練し、冷却後粉砕し、樹脂組成物を得
た。得られた樹脂組成物を以下の方法で評価した。結果
を表1に示す。Embedded image Tetraphenylphosphonium / tetranaphthoyloxyborate (hereinafter referred to as TPP K-NA) 5.0 parts by weight TPP 1.5 parts by weight Fused spherical silica (average particle size 15 μm) 830 parts by weight Carbon black 2.0 parts by weight Bromination 1.7 parts by weight of a phenol novolak type epoxy resin, 2.8 parts by weight of carnauba wax were mixed at room temperature using a mixer, kneaded at 100 ° C. using a biaxial roll, cooled and pulverized to obtain a resin composition. Was. The obtained resin composition was evaluated by the following method. Table 1 shows the results.
【0018】評価方法 スパイラルフロー:EMMI−I−66に準じたスパイ
ラルフロー測定用の金型を用い、金型温度175℃、注
入圧力70kg/cm2、硬化時間2分で測定した。ス
パイラルフローは流動性のパラメータであり、数値が大
きい方が流動性が良好である。単位cm。 30℃の保存性:樹脂組成物を30℃で1週間保存した
後、スパイラルフローを測定し、保存性試験に入る直前
のスパイラルフローに対する百分率として表した。数値
の大きい方が保存性が良好である。単位%。 耐パッケージクラック性:低圧トランスファー成形機を
用いて、成形温度175℃、圧力70kg/cm2、硬
化時間2分で80pQFP(厚さ1.5mm)を成形
し、175℃、8時間の後硬化を行い、8個のパッケー
ジを得た。85℃、相対湿度85%で168時間吸湿さ
せた後、240℃のIRリフロー10秒を2回行い、パ
ッケージクラックを目視で観察し、クラックの生じたパ
ッケージがn個であるとき、n/8と表示する。 速硬化性:低圧トランスファー成形機を用いて、成形温
度175℃、圧力70kg/cm2、硬化時間30秒で
16pDIP(厚さ3.5mm)を成形し、速硬化性を
評価した。金型と成形物との離型が良好であるものを
○、不良であるものを×として評価した。 ウスバリ特性:低圧トランスファー成形機を用いて、成
形温度175℃、圧力150kg/cm2、硬化時間2
分で成形物を成形した。成形金型は1個のポットと14
個のキャビティーからなり、各々のキャビティーの末端
にはエアベント(幅4mm×厚さ20μm )があり、
このエアベント部から流出するウスバリを評価した。評
価は全14個のキャビティーのウスバリ部の長さを合計
してウスバリ特性の得点とし、得点が小さいほどウスバ
リ特性が良好であることを示す。Evaluation method Spiral flow: Spiral flow was measured using a mold for measuring spiral flow according to EMMI-I-66 at a mold temperature of 175 ° C., an injection pressure of 70 kg / cm 2 and a curing time of 2 minutes. Spiral flow is a parameter of fluidity, and the larger the value, the better the fluidity. Unit cm. Storage at 30 ° C .: After storing the resin composition at 30 ° C. for 1 week, the spiral flow was measured and expressed as a percentage of the spiral flow immediately before entering the storage test. The larger the value, the better the preservability. unit%. Package crack resistance: 80 pQFP (thickness: 1.5 mm) was molded using a low-pressure transfer molding machine at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 and a curing time of 2 minutes, and was post-cured at 175 ° C. for 8 hours. Then, eight packages were obtained. After absorbing moisture for 168 hours at 85 ° C. and a relative humidity of 85%, IR reflow at 240 ° C. was performed twice for 10 seconds, and package cracks were visually observed. When n packages had cracks, n / 8 Is displayed. Rapid curability: Using a low-pressure transfer molding machine, 16 pDIP (3.5 mm thick) was molded at a molding temperature of 175 ° C., a pressure of 70 kg / cm 2 , and a curing time of 30 seconds, and the rapid curability was evaluated. A sample having good mold release from the mold and a molded product were evaluated as ○, and a sample having poor release was evaluated as ×. Usbari characteristics: using a low-pressure transfer molding machine, molding temperature 175 ° C., pressure 150 kg / cm 2 , curing time 2
A molded article was formed in minutes. The mold is one pot and 14
Each cavity has an air vent (4mm wide x 20µm thick) at the end of each cavity.
Usbari flowing out of the air vent was evaluated. In the evaluation, the sum of the lengths of the Usbari portions of all 14 cavities was used as the score of the Usbari characteristics, and the smaller the score, the better the Usbari characteristics.
【0019】実施例2〜5 表1の処方に従って配合し、実施例1と同様にして樹脂
組成物を得、実施例1と同様にして評価した。結果を表
1に示す。 比較例1〜3 表1の処方に従って配合し、実施例1と同様にして樹脂
組成物を得、実施例1と同様にして評価した。結果を表
1に示す。比較例3で使用した式(4)のエポキシ樹脂
(融点105℃)を以下に示す。Examples 2 to 5 Compounded according to the formulation shown in Table 1, a resin composition was obtained in the same manner as in Example 1, and evaluated in the same manner as in Example 1. Table 1 shows the results. Comparative Examples 1 to 3 The resin composition was blended according to the formulation shown in Table 1 to obtain a resin composition in the same manner as in Example 1, and evaluated in the same manner as in Example 1. Table 1 shows the results. The epoxy resin of the formula (4) (melting point 105 ° C.) used in Comparative Example 3 is shown below.
【化7】 Embedded image
【0020】[0020]
【表1】 [Table 1]
【0021】[0021]
【発明の効果】本発明のエポキシ樹脂組成物は、速硬化
性、成形性特にウスバリ特性、保存安定性に優れ、これ
を用いた半導体装置は耐パッケージクラック性に優れて
おり、長期吸湿後でもパッケージクラックは発生しないIndustrial Applicability The epoxy resin composition of the present invention is excellent in quick-curing properties, moldability, particularly excellent burrs characteristics and storage stability, and a semiconductor device using the same has excellent package crack resistance, even after long-term moisture absorption. No package crack
Claims (5)
ン型エポキシ樹脂と一般式(2)で示されるスチルベン
型エポキシ樹脂との混合物、(B)1分子内にフェノー
ル性水酸基を2個以上有するフェノール樹脂、(C)テ
トラフェニルホスホニウム・テトラナフトイルオキシボ
レート、(D)トリフェニルホスフィン、1,8−ジア
ザビシクロ(5,4,0)ウンデセン−7、又は2−メ
チルイミダゾールのうちの少なくとも1種、及び(E)
無機充填材を必須成分とし、全エポキシ樹脂のエポキシ
基と全フェノール樹脂のフェノール性水酸基の当量比が
0.5〜2であり、無機充填材(E)の配合量が全エポ
キシ樹脂と全フェノール樹脂の合計量100重量部あた
り200〜2400重量部であることを特徴とするエポ
キシ樹脂組成物。 【化1】 (ここで、R1〜R8は、それぞれ独立に、炭素数1〜6
の鎖状、又は環状アルキル基、水素原子、又はハロゲン
原子を示す。炭素−炭素二重結合に結合している2個の
アリール基は互いに異なる。) 【化2】 (ここで、R9〜R12は、それぞれ独立に、炭素数1〜
6の鎖状、又は環状アルキル基、水素原子、又はハロゲ
ン原子を示す。炭素−炭素二重結合に結合している2個
のアリール基は互いに同じである。)1. A mixture of a stilbene type epoxy resin represented by the general formula (1) and a stilbene type epoxy resin represented by the general formula (2), and (B) two phenolic hydroxyl groups in one molecule. At least one of the phenolic resin having the above, (C) tetraphenylphosphonium tetranaphthoyloxyborate, (D) triphenylphosphine, 1,8-diazabicyclo (5,4,0) undecene-7, or 2-methylimidazole One, and (E)
The inorganic filler is an essential component, the equivalent ratio of the epoxy group of all epoxy resins to the phenolic hydroxyl group of all phenol resins is 0.5 to 2, and the blending amount of the inorganic filler (E) is all epoxy resins and all phenols. An epoxy resin composition characterized by being 200 to 2400 parts by weight per 100 parts by weight of the total amount of the resin. Embedded image (Wherein, R 1 to R 8 each independently represent 1 to 6 carbon atoms)
Represents a chain or cyclic alkyl group, a hydrogen atom or a halogen atom. The two aryl groups attached to the carbon-carbon double bond are different from each other. ) (Where R 9 to R 12 each independently represent a carbon number of 1 to
6 represents a chain or cyclic alkyl group, a hydrogen atom, or a halogen atom. The two aryl groups attached to the carbon-carbon double bond are the same as each other. )
ポキシ樹脂と一般式(2)で示されるスチルベン型エポ
キシ樹脂との混合物の融点が、150〜50℃である請
求項1記載のエポキシ樹脂組成物。2. The epoxy resin according to claim 1, wherein the melting point of a mixture of the stilbene type epoxy resin represented by the general formula (1) and the stilbene type epoxy resin represented by the general formula (2) is 150 to 50 ° C. Composition.
ポキシ樹脂が、4,4'-ビス(2,3-エポキシプロポキシ)-5-
ターシャリブチル-2,3',5'-トリメチルスチルベン、又
は4,4'-ビス(2,3-エポキシプロポキシ)-3-ターシャリブ
チル-3',5,5'-トリメチルスチルベンで、一般式(2)
で示されるスチルベン型エポキシ樹脂が、4,4'-ビス(2,
3-エポキシプロポキシ)-3,3',5,5'-テトラメチルスチル
ベン、4,4'-ビス(2,3-エポキシプロポキシ)-3,3'-ジタ
ーシャリブチル-6,6'-ジメチルスチルベン、又は4,4'-
ビス(2,3-エポキシプロポキシ)-3,3'-ジターシャリブチ
ル-5,5'-ジメチルスチルベンである請求項1、又は2記
載のエポキシ樹脂組成物。3. The stilbene type epoxy resin represented by the general formula (1) is 4,4′-bis (2,3-epoxypropoxy) -5-
Tert-butyl-2,3 ', 5'-trimethylstilbene or 4,4'-bis (2,3-epoxypropoxy) -3-tert-butyl-3', 5,5'-trimethylstilbene, generally Equation (2)
The stilbene epoxy resin represented by 4,4'-bis (2,
3-epoxypropoxy) -3,3 ', 5,5'-tetramethylstilbene, 4,4'-bis (2,3-epoxypropoxy) -3,3'-ditert-butyl-6,6'-dimethyl Stilbene or 4,4'-
3. The epoxy resin composition according to claim 1, which is bis (2,3-epoxypropoxy) -3,3'-ditert-butyl-5,5'-dimethylstilbene.
ポキシ樹脂と一般式(2)で示されるスチルベン型エポ
キシ樹脂との混合物が、4,4'-ビス(2,3-エポキシプロポ
キシ)-5-ターシャリブチル-2,3',5'-トリメチルスチル
ベン20〜60重量%と、4,4'-ビス(2,3-エポキシプロ
ポキシ)-3,3',5,5'-テトラメチルスチルベン40〜80
重量%からなる請求項1、2、又は3記載のエポキシ樹
脂組成物。4. A mixture of a stilbene type epoxy resin represented by the general formula (1) and a stilbene type epoxy resin represented by the general formula (2) is 4,4′-bis (2,3-epoxypropoxy)- 20 to 60% by weight of 5-tert-butyl-2,3 ', 5'-trimethylstilbene and 4,4'-bis (2,3-epoxypropoxy) -3,3', 5,5'-tetramethyl Stilbene 40-80
4. The epoxy resin composition according to claim 1, wherein the epoxy resin composition is composed of a weight percent.
シ樹脂組成物を用いて封止してなることを特徴とする半
導体装置。5. A semiconductor device encapsulated with the epoxy resin composition according to claim 1, 2, 3, or 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23935397A JPH1180321A (en) | 1997-09-04 | 1997-09-04 | Epoxy resin composition and semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23935397A JPH1180321A (en) | 1997-09-04 | 1997-09-04 | Epoxy resin composition and semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH1180321A true JPH1180321A (en) | 1999-03-26 |
Family
ID=17043497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23935397A Pending JPH1180321A (en) | 1997-09-04 | 1997-09-04 | Epoxy resin composition and semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH1180321A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001192534A (en) * | 1999-10-28 | 2001-07-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
| JP2001233946A (en) * | 2000-02-24 | 2001-08-28 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
-
1997
- 1997-09-04 JP JP23935397A patent/JPH1180321A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001192534A (en) * | 1999-10-28 | 2001-07-17 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
| JP2001233946A (en) * | 2000-02-24 | 2001-08-28 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
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