JPS4812242B1 - - Google Patents

Info

Publication number
JPS4812242B1
JPS4812242B1 JP45050387A JP5038770A JPS4812242B1 JP S4812242 B1 JPS4812242 B1 JP S4812242B1 JP 45050387 A JP45050387 A JP 45050387A JP 5038770 A JP5038770 A JP 5038770A JP S4812242 B1 JPS4812242 B1 JP S4812242B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45050387A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4812242B1 publication Critical patent/JPS4812242B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP45050387A 1969-06-13 1970-06-12 Pending JPS4812242B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83307769A 1969-06-13 1969-06-13
US2198970A 1970-03-23 1970-03-23

Publications (1)

Publication Number Publication Date
JPS4812242B1 true JPS4812242B1 (fr) 1973-04-19

Family

ID=26695345

Family Applications (2)

Application Number Title Priority Date Filing Date
JP45050387A Pending JPS4812242B1 (fr) 1969-06-13 1970-06-12
JP2108772A Pending JPS4835402B1 (fr) 1969-06-13 1972-03-02

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2108772A Pending JPS4835402B1 (fr) 1969-06-13 1972-03-02

Country Status (10)

Country Link
JP (2) JPS4812242B1 (fr)
BE (1) BE751614A (fr)
CA (1) CA933791A (fr)
DE (1) DE2028214A1 (fr)
ES (1) ES381238A1 (fr)
FR (1) FR2046745B1 (fr)
GB (1) GB1317796A (fr)
MY (2) MY7400106A (fr)
NL (1) NL7008342A (fr)
SE (1) SE365623B (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (fr) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxanes et compositions photoréserves positives
EP0702271A1 (fr) 1994-09-06 1996-03-20 Fuji Photo Film Co., Ltd. Plaque d'impression travaillant en positif
US6284440B1 (en) 1996-12-16 2001-09-04 Sumitomo Bakelite Company Limited Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same
JP2006184660A (ja) * 2004-12-28 2006-07-13 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物並びにそれらを用いた半導体装置及び表示素子

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3981856A (en) * 1974-03-07 1976-09-21 Princeton Polymer Laboratories, Incorporated Degradable hydrocarbon polymers containing a metal compound and a benzotriazole
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS6235350A (ja) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 像反転に有用な保存寿命の長いフオトレジスト
US5362607A (en) * 1986-06-13 1994-11-08 Microsi, Inc. Method for making a patterned resist substrate composite
US5310619A (en) * 1986-06-13 1994-05-10 Microsi, Inc. Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JPH083628B2 (ja) * 1986-10-13 1996-01-17 三菱電機株式会社 非帯電性レジスト
JP2622267B2 (ja) * 1988-03-23 1997-06-18 日立化成工業株式会社 感光性樹脂組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (fr) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Polysiloxanes et compositions photoréserves positives
EP0702271A1 (fr) 1994-09-06 1996-03-20 Fuji Photo Film Co., Ltd. Plaque d'impression travaillant en positif
US6284440B1 (en) 1996-12-16 2001-09-04 Sumitomo Bakelite Company Limited Alkaline aqueous solution and method for forming pattern of photosensitive resin composition using the same
JP2006184660A (ja) * 2004-12-28 2006-07-13 Sumitomo Bakelite Co Ltd ポジ型感光性樹脂組成物並びにそれらを用いた半導体装置及び表示素子

Also Published As

Publication number Publication date
GB1317796A (en) 1973-05-23
MY7400101A (en) 1974-12-31
NL7008342A (fr) 1970-12-15
ES381238A1 (es) 1972-11-01
BE751614A (fr) 1970-11-16
SE365623B (fr) 1974-03-25
FR2046745A1 (fr) 1971-03-12
MY7400106A (en) 1974-12-31
JPS4835402B1 (fr) 1973-10-27
FR2046745B1 (fr) 1973-01-12
DE2028214A1 (de) 1971-01-07
CA933791A (en) 1973-09-18

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