CA933791A - Additives to positive photoresists which increase the sensitivity thereof - Google Patents

Additives to positive photoresists which increase the sensitivity thereof

Info

Publication number: CA933791A
Authority: CA; Canada
Prior art keywords: additives; sensitivity; increase; positive photoresists; photoresists
Prior art date: 1969-06-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA083755A

Other languages

English (en)

Inventor

Broyde Barret

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AT&T Corp

Original Assignee

Western Electric Co Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1969-06-13

Filing date

1970-05-26

Publication date

1973-09-18

1970-05-26 Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc

1973-09-18 Application granted granted Critical

1973-09-18 Publication of CA933791A publication Critical patent/CA933791A/en

Status Expired legal-status Critical Current

Links

239000000654 additive Substances 0.000 title 1
229920002120 photoresistant polymer Polymers 0.000 title 1
230000035945 sensitivity Effects 0.000 title 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Preparing Plates And Mask In Photomechanical Process (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Materials For Photolithography (AREA)

CA083755A 1969-06-13 1970-05-26 Additives to positive photoresists which increase the sensitivity thereof Expired CA933791A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US83307769A	1969-06-13	1969-06-13
US2198970A	1970-03-23	1970-03-23

Publications (1)

Publication Number	Publication Date
CA933791A true CA933791A (en)	1973-09-18

Family

ID=26695345

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA083755A Expired CA933791A (en)	1969-06-13	1970-05-26	Additives to positive photoresists which increase the sensitivity thereof

Country Status (10)

Country	Link
JP (2)	JPS4812242B1 (fr)
BE (1)	BE751614A (fr)
CA (1)	CA933791A (fr)
DE (1)	DE2028214A1 (fr)
ES (1)	ES381238A1 (fr)
FR (1)	FR2046745B1 (fr)
GB (1)	GB1317796A (fr)
MY (2)	MY7400106A (fr)
NL (1)	NL7008342A (fr)
SE (1)	SE365623B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3981856A (en) *	1974-03-07	1976-09-21	Princeton Polymer Laboratories, Incorporated	Degradable hydrocarbon polymers containing a metal compound and a benzotriazole
JPS5280022A (en) *	1975-12-26	1977-07-05	Fuji Photo Film Co Ltd	Light solubilizable composition
AU8021782A (en) *	1981-02-20	1982-08-26	Polychrome Corp.	Non-silver positive working radiation sensitive compositions
JPS6235350A (ja) *	1985-08-07	1987-02-16	インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション	像反転に有用な保存寿命の長いフオトレジスト
US5362607A (en) *	1986-06-13	1994-11-08	Microsi, Inc.	Method for making a patterned resist substrate composite
US5310619A (en) *	1986-06-13	1994-05-10	Microsi, Inc.	Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US4871644A (en) *	1986-10-01	1989-10-03	Ciba-Geigy Corporation	Photoresist compositions with a bis-benzotriazole
JPH083628B2 (ja) *	1986-10-13	1996-01-17	三菱電機株式会社	非帯電性レジスト
JP2622267B2 (ja) *	1988-03-23	1997-06-18	日立化成工業株式会社	感光性樹脂組成物
EP0410606B1 (fr)	1989-07-12	1996-11-13	Fuji Photo Film Co., Ltd.	Polysiloxanes et compositions photoréserves positives
JPH0876380A (ja)	1994-09-06	1996-03-22	Fuji Photo Film Co Ltd	ポジ型印刷版組成物
JP3190967B2 (ja)	1996-12-16	2001-07-23	住友ベークライト株式会社	アルカリ性水溶液及び感光性樹脂組成物のパターン形成方法
JP4543923B2 (ja) *	2004-12-28	2010-09-15	住友ベークライト株式会社	ポジ型感光性樹脂組成物並びにそれらを用いた半導体装置及び表示素子

1970
- 1970-05-26 CA CA083755A patent/CA933791A/en not_active Expired
- 1970-06-05 SE SE07833/70A patent/SE365623B/xx unknown
- 1970-06-08 BE BE751614D patent/BE751614A/fr unknown
- 1970-06-09 NL NL7008342A patent/NL7008342A/xx unknown
- 1970-06-09 DE DE19702028214 patent/DE2028214A1/de active Pending
- 1970-06-10 GB GB2808970A patent/GB1317796A/en not_active Expired
- 1970-06-11 FR FR7021504A patent/FR2046745B1/fr not_active Expired
- 1970-06-12 JP JP45050387A patent/JPS4812242B1/ja active Pending
- 1970-06-12 ES ES381238A patent/ES381238A1/es not_active Expired
1972
- 1972-03-02 JP JP2108772A patent/JPS4835402B1/ja active Pending
1974
- 1974-12-30 MY MY7400106A patent/MY7400106A/xx unknown
- 1974-12-30 MY MY7400101A patent/MY7400101A/xx unknown

Also Published As

Publication number	Publication date
GB1317796A (en)	1973-05-23
MY7400101A (en)	1974-12-31
NL7008342A (fr)	1970-12-15
JPS4812242B1 (fr)	1973-04-19
ES381238A1 (es)	1972-11-01
BE751614A (fr)	1970-11-16
SE365623B (fr)	1974-03-25
FR2046745A1 (fr)	1971-03-12
MY7400106A (en)	1974-12-31
JPS4835402B1 (fr)	1973-10-27
FR2046745B1 (fr)	1973-01-12
DE2028214A1 (de)	1971-01-07

Publication	Publication Date	Title
CA933791A (en)	1973-09-18	Additives to positive photoresists which increase the sensitivity thereof
CA956631A (en)	1974-10-22	Benzoxazines
CA873961A (en)	1971-06-22	Level
AU1936070A (en)	1972-03-09	Novel 4-amino-2-methyl-pyrimidines
AU450491B2 (en)	1971-12-09	Additives to positive photoresists which increase the sensitivity thereof
AU1605570A (en)	1971-12-09	Additives to positive photoresists which increase the sensitivity thereof
CA921312A (en)	1973-02-20	Additives to negative photoresists which increase the sensitivity thereof
CA949922A (en)	1974-06-25	Additives to negative photoresists which increase the sensitivity thereof
CA806958A (en)	1969-02-25	Governor
CA820317A (en)	1969-08-12	Substituted 2-aminobenzimidazoles
CA903541A (en)	1972-06-27	Additives to negative photoresists which increase the sensitivity thereof
CA818197A (en)	1969-07-22	Flyweight
CA811057A (en)	1969-04-22	Cadmium compounds
AU408549B2 (en)	1971-01-21	Novel substituted guandines
CA811402A (en)	1969-04-29	Dynamometer
CA827940A (en)	1969-11-25	Isochronous-droop governor
CA805923A (en)	1969-02-11	Governor
AU436549B2 (en)	1971-11-18	Substituted n-methylcarbamates
CA818503A (en)	1969-07-22	Substituted cycloalkanoindoles
CA822119A (en)	1969-09-02	Substituted 17-hydraziyohimbanes
AU441559B2 (en)	1971-10-07	Governors
CA803780A (en)	1969-01-14	Engine
CA815854A (en)	1969-06-24	Engine
AU425499B2 (en)	1972-04-13	Novel imidazolidinediones
AU451732B2 (en)	1972-01-27	Novel 1-phenoxy-2-hydroxy-3-cycloalkyl-aminopropanes