MY7400106A - Positive quinone diazide photoresists - Google Patents

Positive quinone diazide photoresists

Info

Publication number
MY7400106A
MY7400106A MY7400106A MY7400106A MY7400106A MY 7400106 A MY7400106 A MY 7400106A MY 7400106 A MY7400106 A MY 7400106A MY 7400106 A MY7400106 A MY 7400106A MY 7400106 A MY7400106 A MY 7400106A
Authority
MY
Malaysia
Prior art keywords
photoresists
quinone diazide
positive
positive quinone
diazide
Prior art date
Application number
MY7400106A
Other languages
English (en)
Inventor
Barret Broyde
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of MY7400106A publication Critical patent/MY7400106A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
MY7400106A 1969-06-13 1974-12-30 Positive quinone diazide photoresists MY7400106A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83307769A 1969-06-13 1969-06-13
US2198970A 1970-03-23 1970-03-23

Publications (1)

Publication Number Publication Date
MY7400106A true MY7400106A (en) 1974-12-31

Family

ID=26695345

Family Applications (2)

Application Number Title Priority Date Filing Date
MY7400106A MY7400106A (en) 1969-06-13 1974-12-30 Positive quinone diazide photoresists
MY7400101A MY7400101A (en) 1969-06-13 1974-12-30 Positive quinone diazide photoresists

Family Applications After (1)

Application Number Title Priority Date Filing Date
MY7400101A MY7400101A (en) 1969-06-13 1974-12-30 Positive quinone diazide photoresists

Country Status (10)

Country Link
JP (2) JPS4812242B1 (fr)
BE (1) BE751614A (fr)
CA (1) CA933791A (fr)
DE (1) DE2028214A1 (fr)
ES (1) ES381238A1 (fr)
FR (1) FR2046745B1 (fr)
GB (1) GB1317796A (fr)
MY (2) MY7400106A (fr)
NL (1) NL7008342A (fr)
SE (1) SE365623B (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3981856A (en) * 1974-03-07 1976-09-21 Princeton Polymer Laboratories, Incorporated Degradable hydrocarbon polymers containing a metal compound and a benzotriazole
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS6235350A (ja) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 像反転に有用な保存寿命の長いフオトレジスト
US5362607A (en) * 1986-06-13 1994-11-08 Microsi, Inc. Method for making a patterned resist substrate composite
US5310619A (en) * 1986-06-13 1994-05-10 Microsi, Inc. Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JPH083628B2 (ja) * 1986-10-13 1996-01-17 三菱電機株式会社 非帯電性レジスト
JP2622267B2 (ja) * 1988-03-23 1997-06-18 日立化成工業株式会社 感光性樹脂組成物
EP0410606B1 (fr) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Polysiloxanes et compositions photoréserves positives
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3190967B2 (ja) 1996-12-16 2001-07-23 住友ベークライト株式会社 アルカリ性水溶液及び感光性樹脂組成物のパターン形成方法
JP4543923B2 (ja) * 2004-12-28 2010-09-15 住友ベークライト株式会社 ポジ型感光性樹脂組成物並びにそれらを用いた半導体装置及び表示素子

Also Published As

Publication number Publication date
GB1317796A (en) 1973-05-23
MY7400101A (en) 1974-12-31
NL7008342A (fr) 1970-12-15
JPS4812242B1 (fr) 1973-04-19
ES381238A1 (es) 1972-11-01
BE751614A (fr) 1970-11-16
SE365623B (fr) 1974-03-25
FR2046745A1 (fr) 1971-03-12
JPS4835402B1 (fr) 1973-10-27
FR2046745B1 (fr) 1973-01-12
DE2028214A1 (de) 1971-01-07
CA933791A (en) 1973-09-18

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