JPS4886490A - - Google Patents
Info
- Publication number
- JPS4886490A JPS4886490A JP47128274A JP12827472A JPS4886490A JP S4886490 A JPS4886490 A JP S4886490A JP 47128274 A JP47128274 A JP 47128274A JP 12827472 A JP12827472 A JP 12827472A JP S4886490 A JPS4886490 A JP S4886490A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/137—Collector regions of BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/61—Formation of materials, e.g. in the shape of layers or pillars of insulating materials using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
- H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W15/00—Highly-doped buried regions of integrated devices
- H10W15/01—Manufacture or treatment
Landscapes
- Element Separation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH105572A CH536028A (de) | 1972-01-25 | 1972-01-25 | Verfahren zur Herstellung einer monolithischen Vorrichtung mit isolierten Transistoren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4886490A true JPS4886490A (de) | 1973-11-15 |
Family
ID=4201392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP47128274A Pending JPS4886490A (de) | 1972-01-25 | 1972-12-22 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS4886490A (de) |
| CA (1) | CA992218A (de) |
| CH (1) | CH536028A (de) |
| DE (1) | DE2300412A1 (de) |
| FR (1) | FR2169069A1 (de) |
| IT (1) | IT971839B (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03165048A (ja) * | 1989-11-22 | 1991-07-17 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5049521A (en) * | 1989-11-30 | 1991-09-17 | Silicon General, Inc. | Method for forming dielectrically isolated semiconductor devices with contact to the wafer substrate |
-
1972
- 1972-01-25 CH CH105572A patent/CH536028A/de not_active IP Right Cessation
- 1972-12-14 IT IT32876/72A patent/IT971839B/it active
- 1972-12-22 JP JP47128274A patent/JPS4886490A/ja active Pending
-
1973
- 1973-01-02 CA CA160,404A patent/CA992218A/en not_active Expired
- 1973-01-05 DE DE2300412A patent/DE2300412A1/de active Pending
- 1973-01-09 FR FR7301492A patent/FR2169069A1/fr not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03165048A (ja) * | 1989-11-22 | 1991-07-17 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2169069A1 (de) | 1973-09-07 |
| CA992218A (en) | 1976-06-29 |
| IT971839B (it) | 1974-05-10 |
| DE2300412A1 (de) | 1973-08-02 |
| CH536028A (de) | 1973-04-15 |