JPS50118802A - - Google Patents
Info
- Publication number
- JPS50118802A JPS50118802A JP2394074A JP2394074A JPS50118802A JP S50118802 A JPS50118802 A JP S50118802A JP 2394074 A JP2394074 A JP 2394074A JP 2394074 A JP2394074 A JP 2394074A JP S50118802 A JPS50118802 A JP S50118802A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2394074A JPS5534929B2 (fr) | 1974-02-28 | 1974-02-28 | |
| GB813175A GB1505739A (en) | 1974-02-28 | 1975-02-26 | Photosensitive composition |
| CA221,185A CA1060252A (fr) | 1974-02-28 | 1975-02-27 | Produit photosensible comprenant un compose disazoique et un copolymere |
| DE19752508618 DE2508618C2 (de) | 1974-02-28 | 1975-02-27 | Lichtempfindliches Gemisch |
| FR7506415A FR2262813B1 (fr) | 1974-02-28 | 1975-02-28 | |
| US05/760,371 US4123276A (en) | 1974-02-28 | 1977-01-18 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2394074A JPS5534929B2 (fr) | 1974-02-28 | 1974-02-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50118802A true JPS50118802A (fr) | 1975-09-17 |
| JPS5534929B2 JPS5534929B2 (fr) | 1980-09-10 |
Family
ID=12124516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2394074A Expired JPS5534929B2 (fr) | 1974-02-28 | 1974-02-28 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5534929B2 (fr) |
| CA (1) | CA1060252A (fr) |
| DE (1) | DE2508618C2 (fr) |
| FR (1) | FR2262813B1 (fr) |
| GB (1) | GB1505739A (fr) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
| JPS5498613A (en) * | 1978-01-09 | 1979-08-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
| JPS5552054A (en) * | 1978-10-11 | 1980-04-16 | Konishiroku Photo Ind Co Ltd | Developing solution composition |
| JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| JPS575042A (en) * | 1980-04-30 | 1982-01-11 | Minnesota Mining & Mfg | Photosensitive composition capable of being aqueously developed and printing block |
| JPS60217356A (ja) * | 1984-04-13 | 1985-10-30 | Asahi Chem Ind Co Ltd | 感光性組成物 |
| JPS63285537A (ja) * | 1987-05-18 | 1988-11-22 | Koyo Kagaku Kogyo Kk | 平版製版用感光性組成物 |
| JPH03125151A (ja) * | 1989-10-11 | 1991-05-28 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148663A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148662A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH08211606A (ja) * | 1995-12-18 | 1996-08-20 | Asahi Chem Ind Co Ltd | 感光性組成物の製造方法 |
| US6689539B2 (en) | 2000-01-05 | 2004-02-10 | Kodak Polychrome Graphics Llc | Photosensitive composition and photosensitive lithographic printing plate |
| EP1625944A1 (fr) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Procédé pour la production d'un support pour plaque lithographique |
| WO2006023667A1 (fr) | 2004-08-23 | 2006-03-02 | Eastman Kodak Company | Précurseur de plaques d’impression lithographique |
| EP1712368A1 (fr) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Procédé de fabrication d'un substrat pour plaque lithographique |
| JP2007160594A (ja) * | 2005-12-12 | 2007-06-28 | Okamoto Kagaku Kogyo Kk | 平版印刷版用捨版およびその製造方法 |
| EP2100677A1 (fr) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5964396A (ja) * | 1982-10-05 | 1984-04-12 | Fuji Photo Film Co Ltd | 平版印刷版用版面保護剤 |
| FR2651337B1 (fr) * | 1989-08-31 | 1991-12-06 | Efi | Composition photosensible a base de condensat diazouique pour plaques offset. |
| DE4430680A1 (de) * | 1994-08-29 | 1996-03-07 | Hoechst Ag | Lichtempfindliches Gemisch |
| EP2042338A3 (fr) | 2007-09-26 | 2010-03-10 | Fujifilm Corporation | Composition de solution de mouillage pour impression lithographique et procédé d'impression en offset utilisant des encres thermoséchantes |
| EP2042339B1 (fr) | 2007-09-26 | 2013-05-22 | FUJIFILM Corporation | Composition de solution de mouillage pour impression lithographique et procédé d'impression en offset utilisant des encres thermoséchantes |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP2009234247A (ja) | 2008-03-07 | 2009-10-15 | Fujifilm Corp | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5288268B2 (ja) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5281130B2 (ja) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | 平版印刷用湿し水組成物 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2034654C2 (de) * | 1970-07-13 | 1982-08-26 | Hoechst Ag, 6000 Frankfurt | Negativ arbeitende Kopierlösung und deren Verwendung zur Herstellung von Druckplatten |
| IT948621B (it) * | 1971-02-19 | 1973-06-11 | Howson Algraphy Ltd | Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute |
-
1974
- 1974-02-28 JP JP2394074A patent/JPS5534929B2/ja not_active Expired
-
1975
- 1975-02-26 GB GB813175A patent/GB1505739A/en not_active Expired
- 1975-02-27 DE DE19752508618 patent/DE2508618C2/de not_active Expired
- 1975-02-27 CA CA221,185A patent/CA1060252A/fr not_active Expired
- 1975-02-28 FR FR7506415A patent/FR2262813B1/fr not_active Expired
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS533216A (en) * | 1976-06-28 | 1978-01-12 | Fuji Photo Film Co Ltd | Diazo photosensitive composition |
| JPS5498613A (en) * | 1978-01-09 | 1979-08-03 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
| JPS5552054A (en) * | 1978-10-11 | 1980-04-16 | Konishiroku Photo Ind Co Ltd | Developing solution composition |
| JPS564144A (en) * | 1979-06-23 | 1981-01-17 | Tokyo Ohka Kogyo Co Ltd | Photosensitive composition |
| JPS575042A (en) * | 1980-04-30 | 1982-01-11 | Minnesota Mining & Mfg | Photosensitive composition capable of being aqueously developed and printing block |
| JPS60217356A (ja) * | 1984-04-13 | 1985-10-30 | Asahi Chem Ind Co Ltd | 感光性組成物 |
| JPS63285537A (ja) * | 1987-05-18 | 1988-11-22 | Koyo Kagaku Kogyo Kk | 平版製版用感光性組成物 |
| JPH03125151A (ja) * | 1989-10-11 | 1991-05-28 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148663A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH03148662A (ja) * | 1989-11-03 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
| JPH08211606A (ja) * | 1995-12-18 | 1996-08-20 | Asahi Chem Ind Co Ltd | 感光性組成物の製造方法 |
| US6689539B2 (en) | 2000-01-05 | 2004-02-10 | Kodak Polychrome Graphics Llc | Photosensitive composition and photosensitive lithographic printing plate |
| EP1625944A1 (fr) | 2004-08-13 | 2006-02-15 | Fuji Photo Film Co., Ltd. | Procédé pour la production d'un support pour plaque lithographique |
| WO2006023667A1 (fr) | 2004-08-23 | 2006-03-02 | Eastman Kodak Company | Précurseur de plaques d’impression lithographique |
| EP1712368A1 (fr) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Procédé de fabrication d'un substrat pour plaque lithographique |
| JP2007160594A (ja) * | 2005-12-12 | 2007-06-28 | Okamoto Kagaku Kogyo Kk | 平版印刷版用捨版およびその製造方法 |
| EP2100677A1 (fr) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Procédé de fabrication d'une plaque en alliage d'aluminium pour une plaque d'impression lithographique, plaque en alliage d'aluminium pour plaque d'impression lithographique obtenue selon ce procédé et support de plaque d'impression lithographique |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5534929B2 (fr) | 1980-09-10 |
| DE2508618A1 (de) | 1975-09-04 |
| FR2262813B1 (fr) | 1977-04-15 |
| FR2262813A1 (fr) | 1975-09-26 |
| GB1505739A (en) | 1978-03-30 |
| CA1060252A (fr) | 1979-08-14 |
| DE2508618C2 (de) | 1984-01-26 |