JPS50151997A - - Google Patents
Info
- Publication number
- JPS50151997A JPS50151997A JP5211175A JP5211175A JPS50151997A JP S50151997 A JPS50151997 A JP S50151997A JP 5211175 A JP5211175 A JP 5211175A JP 5211175 A JP5211175 A JP 5211175A JP S50151997 A JPS50151997 A JP S50151997A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46637474A | 1974-05-02 | 1974-05-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50151997A true JPS50151997A (fr) | 1975-12-06 |
| JPS5214278B2 JPS5214278B2 (fr) | 1977-04-20 |
Family
ID=23851510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5211175A Expired JPS5214278B2 (fr) | 1974-05-02 | 1975-05-01 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5214278B2 (fr) |
| BE (1) | BE828670A (fr) |
| DE (3) | DE2518652C2 (fr) |
| FR (1) | FR2269551B1 (fr) |
| GB (2) | GB1516511A (fr) |
Cited By (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5453181A (en) * | 1977-09-14 | 1979-04-26 | Gen Electric | Photoopolymerization initiator |
| JPS5495686A (en) * | 1977-08-05 | 1979-07-28 | Gen Electric | Photocurable composition and curing method |
| JPS61261365A (ja) * | 1985-05-14 | 1986-11-19 | Nippon Oil Co Ltd | 光硬化性被覆組成物 |
| US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
| US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
| US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
| US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
| US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
| US6313188B1 (en) | 1996-09-19 | 2001-11-06 | Nippon Soda Co., Ltd. | Photocationically polymerizable composition comprising a polycyclic aromatic compound |
| EP1348727A2 (fr) | 2002-03-29 | 2003-10-01 | Brother Kogyo Kabushiki Kaisha | Couche réceptrice d'image et composition pour couches de revêtement de supports d'impression par jet d'encre |
| US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| JP2005055864A (ja) * | 2003-07-22 | 2005-03-03 | Fuji Photo Film Co Ltd | 感刺激性組成物、化合物及び該感刺激性組成物を用いたパターン形成方法 |
| US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
| JP2008112186A (ja) * | 2002-02-13 | 2008-05-15 | Fujifilm Corp | 電子線、ｅｕｖ又はｘ線用ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
| EP1983023A1 (fr) | 2007-02-02 | 2008-10-22 | JSR Corporation | composition durcissable par irradiation, composite et procede de preparation |
| WO2009136482A1 (fr) * | 2008-05-06 | 2009-11-12 | サンアプロ株式会社 | Sel de phosphonium, photogénérateur d'acide, composition photodurcissable, et produit durci de la composition photodurcissable |
| WO2010095385A1 (fr) | 2009-02-20 | 2010-08-26 | サンアプロ株式会社 | Sel de sulfonium, photogénérateur d'acide, et composition de résine photosensible |
| WO2011040531A1 (fr) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | Matériau pour électronique organique, élément électronique organique, élément électroluminescent organique, élément d'affichage utilisant un élément électroluminescent organique, dispositif d'éclairage et dispositif d'affichage |
| WO2011132702A1 (fr) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | Matériau électronique organique, initiateur de polymérisation et initiateur de polymérisation thermique, composition d'encre, couche mince organique et son procédé de production, élément électronique organique, élément électroluminescent organique, dispositif d'éclairage, élément d'affichage, et dispositif d'affichage |
| EP2402818A1 (fr) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Composition photosensible, matériau formant des motifs et film photosensible, procédé de formation de motifs, film à motifs, film à faible indice de réfraction, dispositif optique et dispositif d'imagerie à l'état solide l'ultilisant |
| WO2014136900A1 (fr) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | Solution de traitement contenant un composé ionique, élément électronique organique, et procédé de fabrication d'élément électronique organique |
| WO2015001804A1 (fr) | 2013-07-05 | 2015-01-08 | サンアプロ株式会社 | Photogénérateur d'acide et composition de résine pour photolithographie |
| KR20150071026A (ko) | 2012-10-18 | 2015-06-25 | 산아프로 가부시키가이샤 | 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물 |
| KR20150092176A (ko) | 2012-12-07 | 2015-08-12 | 디에스피 고쿄 후도 ＆ 케미카루 가부시키가이샤 | 신규한 술포늄염 화합물, 그 제조 방법 및 광산발생제 |
| EP2915843A1 (fr) | 2014-03-05 | 2015-09-09 | Shin-Etsu Chemical Co., Ltd. | Composition de silicone durcissable par radiation |
| KR20160089419A (ko) | 2013-11-25 | 2016-07-27 | 와꼬 쥰야꾸 고교 가부시키가이샤 | 산 및 라디칼 발생제, 그리고 산 및 라디칼 발생 방법 |
| JPWO2015125745A1 (ja) * | 2014-02-19 | 2017-03-30 | 日本化薬株式会社 | 新規化合物、該化合物を含有する光酸発生剤及び該光酸発生剤を含有する感光性樹脂組成物 |
| KR20170065560A (ko) | 2014-09-26 | 2017-06-13 | 도쿄 오카 고교 가부시키가이샤 | 설포늄 염, 광산발생제 및 감광성 조성물 |
| KR20170080574A (ko) | 2014-11-07 | 2017-07-10 | 산아프로 가부시키가이샤 | 술포네이트 화합물, 광산 발생제 및 포토리소그래피용 수지 조성물 |
| KR20180048561A (ko) | 2015-09-03 | 2018-05-10 | 산아프로 가부시키가이샤 | 경화성 조성물 및 그것을 사용한 경화체 |
| KR20190017757A (ko) | 2016-06-09 | 2019-02-20 | 산아프로 가부시키가이샤 | 술포늄염, 광산 발생제, 경화성 조성물 및 레지스트 조성물 |
| KR20190022447A (ko) | 2016-06-29 | 2019-03-06 | 산아프로 가부시키가이샤 | 술포늄염, 광산 발생제, 광 경화성 조성물, 및 그 경화체 |
| KR20190037230A (ko) | 2016-07-28 | 2019-04-05 | 산아프로 가부시키가이샤 | 술포늄염, 열 또는 광산 발생제, 열 또는 광 경화성 조성물 및 그 경화체 |
| KR20190091436A (ko) | 2016-12-12 | 2019-08-06 | 산아프로 가부시키가이샤 | 광산 발생제 및 포토리소그래피용 수지 조성물 |
| WO2020145043A1 (fr) | 2019-01-10 | 2020-07-16 | サンアプロ株式会社 | Sel de sulfonium, générateur photoacide, composition durcissable et composition de réserve |
| KR20210092713A (ko) | 2018-11-22 | 2021-07-26 | 산아프로 가부시키가이샤 | 광산 발생제 및 포토리소그래피용 수지 조성물 |
| WO2021186846A1 (fr) | 2020-03-17 | 2021-09-23 | サンアプロ株式会社 | Sel de sulfonium, générateur de photoacide, composition durcissable et composition de résine photosensible |
| US11926581B2 (en) | 2018-05-25 | 2024-03-12 | San-Apro Limited | Sulfonium salt, photoacid generator, curable composition, and resist composition |
| US12422747B2 (en) | 2020-07-08 | 2025-09-23 | San-Apro Ltd. | Negative photosensitive resin composition, pattern formation method, and laminated film |
Families Citing this family (73)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4256828A (en) * | 1975-09-02 | 1981-03-17 | Minnesota Mining And Manufacturing Company | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| AU517415B2 (en) * | 1976-07-09 | 1981-07-30 | General Electric Company | Curable polymer composition |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
| US4090936A (en) | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| US4246298A (en) * | 1979-03-14 | 1981-01-20 | American Can Company | Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4319974A (en) | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
| JPS57125212A (en) | 1981-01-27 | 1982-08-04 | Toshiba Corp | Photo-polymerizable composition |
| US4387216A (en) | 1981-05-06 | 1983-06-07 | Ciba-Geigy Corporation | Heat-polymerizable compositions comprising epoxide resins, aromatic sulfoxonium salts, and organic oxidants |
| DE3135636A1 (de) | 1981-09-09 | 1983-03-17 | Basf Ag, 6700 Ludwigshafen | Haertbare epoxidharze |
| GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
| JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| JPS61242615A (ja) * | 1985-04-18 | 1986-10-28 | Nippon Air Filter Kk | 集塵方法及びその装置 |
| DE3604580A1 (de) * | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US4882201A (en) * | 1988-03-21 | 1989-11-21 | General Electric Company | Non-toxic aryl onium salts, UV curable coating compositions and food packaging use |
| US4871786A (en) * | 1988-10-03 | 1989-10-03 | Minnesota Mining And Manufacturing Company | Organic fluoride sources |
| US5047568A (en) * | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
| JPH0347573A (ja) * | 1989-07-12 | 1991-02-28 | Ishigaki Kiko Kk | 微粉体の分級方法並びにその装置 |
| EP0410606B1 (fr) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Polysiloxanes et compositions photoréserves positives |
| DE3933420C1 (fr) * | 1989-10-06 | 1991-03-07 | Th. Goldschmidt Ag, 4300 Essen, De | |
| JP2697937B2 (ja) * | 1989-12-15 | 1998-01-19 | キヤノン株式会社 | 活性エネルギー線硬化性樹脂組成物 |
| KR960000980B1 (ko) * | 1990-03-27 | 1996-01-15 | 가부시기가이샤 히다찌 세이사꾸쇼 | 무전해도금용 기재 접착제, 이 접착제를 사용한 프린트 회로판 및 이의 용도 |
| US5108859A (en) * | 1990-04-16 | 1992-04-28 | Eastman Kodak Company | Photoelectrographic elements and imaging method |
| DE4027437C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds. |
| DE4027438C1 (en) * | 1990-08-30 | 1991-08-29 | Th. Goldschmidt Ag, 4300 Essen, De | Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp. |
| US5354590A (en) * | 1991-02-16 | 1994-10-11 | Canon Kabushiki Kaisha | Optical recording medium |
| US5166125A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Method of forming color filter array element with patternable overcoat layer |
| US5166126A (en) * | 1992-02-19 | 1992-11-24 | Eastman Kodak Company | Color filter array element with protective overcoat layer and method of forming same |
| US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
| GB9309275D0 (en) * | 1993-05-05 | 1993-06-16 | Smith & Nephew | Orthopaedic material |
| US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
| JP3442176B2 (ja) | 1995-02-10 | 2003-09-02 | 富士写真フイルム株式会社 | 光重合性組成物 |
| JP4130030B2 (ja) | 1999-03-09 | 2008-08-06 | 富士フイルム株式会社 | 感光性組成物および１，３−ジヒドロ−１−オキソ−２ｈ−インデン誘導体化合物 |
| FR2794126B1 (fr) * | 1999-05-26 | 2003-07-18 | Gemplus Card Int | Nouvelle composition adhesive et conductrice, procede de connexion, procede de constitution de composants electriques ou electroniques, utilisation de cette composition, element conducteur |
| ATE419241T1 (de) | 2002-03-04 | 2009-01-15 | Wako Pure Chem Ind Ltd | Heterocyclustragende oniumsalze |
| JP4452572B2 (ja) | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
| EP1701213A3 (fr) | 2005-03-08 | 2006-11-22 | Fuji Photo Film Co., Ltd. | Composition photosensible |
| JP4474317B2 (ja) | 2005-03-31 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| JP2006335826A (ja) | 2005-05-31 | 2006-12-14 | Fujifilm Holdings Corp | インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法 |
| JP2007254454A (ja) * | 2006-02-23 | 2007-10-04 | Fujifilm Corp | スルホニウム塩、硬化性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
| JP5276264B2 (ja) | 2006-07-03 | 2013-08-28 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法 |
| US8541063B2 (en) | 2007-02-06 | 2013-09-24 | Fujifilm Corporation | Undercoat solution, ink-jet recording method and ink-jet recording device |
| DE602008006279D1 (de) | 2007-02-07 | 2011-06-01 | Fujifilm Corp | Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf |
| JP5227521B2 (ja) | 2007-02-26 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、インクセット |
| JP5224699B2 (ja) | 2007-03-01 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版 |
| JP5306681B2 (ja) | 2007-03-30 | 2013-10-02 | 富士フイルム株式会社 | 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法 |
| JP5243072B2 (ja) | 2007-03-30 | 2013-07-24 | 富士フイルム株式会社 | インク組成物、並びに、それを用いた画像記録方法及び画像記録物 |
| JP4898618B2 (ja) | 2007-09-28 | 2012-03-21 | 富士フイルム株式会社 | インクジェット記録方法 |
| JP5265165B2 (ja) | 2007-09-28 | 2013-08-14 | 富士フイルム株式会社 | 塗布装置及びこれを用いるインクジェット記録装置 |
| JP5227560B2 (ja) | 2007-09-28 | 2013-07-03 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法 |
| JP5254632B2 (ja) | 2008-02-07 | 2013-08-07 | 富士フイルム株式会社 | インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物 |
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| US3412046A (en) | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
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- 1975-04-16 GB GB1570175A patent/GB1516511A/en not_active Expired
- 1975-04-16 GB GB49978A patent/GB1516512A/en not_active Expired
- 1975-04-26 DE DE19752518652 patent/DE2518652C2/de not_active Expired
- 1975-04-26 DE DE19752559718 patent/DE2559718C2/de not_active Expired
- 1975-04-26 DE DE19752559833 patent/DE2559833C2/de not_active Expired
- 1975-04-30 FR FR7513519A patent/FR2269551B1/fr not_active Expired
- 1975-05-01 JP JP5211175A patent/JPS5214278B2/ja not_active Expired
- 1975-05-02 BE BE156013A patent/BE828670A/fr not_active IP Right Cessation
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Also Published As
| Publication number | Publication date |
|---|---|
| DE2559833C2 (de) | 1983-12-22 |
| GB1516511A (en) | 1978-07-05 |
| DE2518652C2 (de) | 1983-05-11 |
| FR2269551B1 (fr) | 1978-09-01 |
| BE828670A (fr) | 1975-09-01 |
| JPS5214278B2 (fr) | 1977-04-20 |
| DE2518652A1 (de) | 1975-11-06 |
| FR2269551A1 (fr) | 1975-11-28 |
| DE2559718C2 (de) | 1983-08-04 |
| DE2559718A1 (de) | 1977-08-18 |
| GB1516512A (en) | 1978-07-05 |