JPS51118187A - Method of cutting brittle materials - Google Patents
Method of cutting brittle materialsInfo
- Publication number
- JPS51118187A JPS51118187A JP4284775A JP4284775A JPS51118187A JP S51118187 A JPS51118187 A JP S51118187A JP 4284775 A JP4284775 A JP 4284775A JP 4284775 A JP4284775 A JP 4284775A JP S51118187 A JPS51118187 A JP S51118187A
- Authority
- JP
- Japan
- Prior art keywords
- brittle materials
- cutting brittle
- cutting
- crossing
- grooves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D1/00—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor
- B28D1/22—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising
- B28D1/221—Working stone or stone-like materials, e.g. brick, concrete or glass, not provided for elsewhere; Machines, devices, tools therefor by cutting, e.g. incising by thermic methods
Landscapes
- Engineering & Computer Science (AREA)
- Mining & Mineral Resources (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
PURPOSE:A cutting method to make a hole deeper than the grooves at a point at which the cutting lines are crossing on a brittle semiconductor wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4284775A JPS51118187A (en) | 1975-04-10 | 1975-04-10 | Method of cutting brittle materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4284775A JPS51118187A (en) | 1975-04-10 | 1975-04-10 | Method of cutting brittle materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS51118187A true JPS51118187A (en) | 1976-10-16 |
Family
ID=12647382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4284775A Pending JPS51118187A (en) | 1975-04-10 | 1975-04-10 | Method of cutting brittle materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS51118187A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0588681A1 (en) * | 1992-08-31 | 1994-03-23 | Sumitomo Electric Industries, Ltd. | Method for cutting a wafer hard to cut |
| JP2005332841A (en) * | 2004-05-18 | 2005-12-02 | Disco Abrasive Syst Ltd | Wafer division method |
| JP2007149820A (en) * | 2005-11-25 | 2007-06-14 | Disco Abrasive Syst Ltd | Wafer laser processing method |
| JP2007149743A (en) * | 2005-11-24 | 2007-06-14 | Disco Abrasive Syst Ltd | Wafer laser processing method |
-
1975
- 1975-04-10 JP JP4284775A patent/JPS51118187A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0588681A1 (en) * | 1992-08-31 | 1994-03-23 | Sumitomo Electric Industries, Ltd. | Method for cutting a wafer hard to cut |
| JP2005332841A (en) * | 2004-05-18 | 2005-12-02 | Disco Abrasive Syst Ltd | Wafer division method |
| JP2007149743A (en) * | 2005-11-24 | 2007-06-14 | Disco Abrasive Syst Ltd | Wafer laser processing method |
| JP2007149820A (en) * | 2005-11-25 | 2007-06-14 | Disco Abrasive Syst Ltd | Wafer laser processing method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5228281A (en) | Light emitting semiconductor device | |
| JPS5214287A (en) | Holsaw | |
| DK140561B (en) | Process for the production of urokinase. | |
| JPS5226675A (en) | Manufacturing method of edged tool with regular arc cutting edte | |
| JPS51131997A (en) | Wire cutting electrical discharge machinging device | |
| JPS523387A (en) | Manufacturing method of semiconductor device | |
| JPS5211632A (en) | Method of construction and operation of plants | |
| JPS51121272A (en) | Manufacturing method for semiconductor devices | |
| JPS524780A (en) | Manufacturing method of semiconductor equipment | |
| JPS51111071A (en) | Semiconductor equipment | |
| JPS5276872A (en) | Cutting method of semiconductor wafer | |
| JPS5274280A (en) | Semiconductor device and its production | |
| JPS51116477A (en) | Clamping tool | |
| JPS5211761A (en) | Method of cutting semiconductor wafers | |
| JPS5279664A (en) | Forming method for electrodes of semiconductor devices | |
| JPS5213778A (en) | Plasma-etching method | |
| JPS51145082A (en) | Device of cutting running long composite material to a length of hard substrate | |
| JPS51137980A (en) | High feed multiblade cutting tool | |
| JPS5299773A (en) | Forming method for small size regions | |
| JPS5218283A (en) | Cutting device | |
| JPS51142795A (en) | Grinding device | |
| JPS5210080A (en) | Method for manufacturing semiconductor device | |
| JPS51134565A (en) | Schottky barrier diode manufacturing process | |
| JPS51131277A (en) | Semi-conductor unit manufacturing process | |
| JPS5248187A (en) | Cutting method for highly hard ceramic boards |