JPS51130222A - A process for producing an electron beam resist image - Google Patents

A process for producing an electron beam resist image

Info

Publication number
JPS51130222A
JPS51130222A JP50053881A JP5388175A JPS51130222A JP S51130222 A JPS51130222 A JP S51130222A JP 50053881 A JP50053881 A JP 50053881A JP 5388175 A JP5388175 A JP 5388175A JP S51130222 A JPS51130222 A JP S51130222A
Authority
JP
Japan
Prior art keywords
producing
electron beam
beam resist
resist image
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50053881A
Other languages
Japanese (ja)
Inventor
Yukio Hatano
Saburo Nonogaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50053881A priority Critical patent/JPS51130222A/en
Publication of JPS51130222A publication Critical patent/JPS51130222A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a high sensitivity (reduciton in the amount of the elctron beam irradiation) and sharp image.
JP50053881A 1975-05-07 1975-05-07 A process for producing an electron beam resist image Pending JPS51130222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50053881A JPS51130222A (en) 1975-05-07 1975-05-07 A process for producing an electron beam resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50053881A JPS51130222A (en) 1975-05-07 1975-05-07 A process for producing an electron beam resist image

Publications (1)

Publication Number Publication Date
JPS51130222A true JPS51130222A (en) 1976-11-12

Family

ID=12955074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50053881A Pending JPS51130222A (en) 1975-05-07 1975-05-07 A process for producing an electron beam resist image

Country Status (1)

Country Link
JP (1) JPS51130222A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5675646A (en) * 1979-11-27 1981-06-22 Fujitsu Ltd Developing solution composition for radiation sensitive material
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS5984519A (en) * 1982-11-08 1984-05-16 Hitachi Ltd Developer
JPH07231170A (en) * 1994-02-21 1995-08-29 Nec Ibaraki Ltd Manufacture of multilayer wiring ceramic board
JPH07240581A (en) * 1994-02-28 1995-09-12 Nec Ibaraki Ltd Method for forming via hole of high-density circuit substrate

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5359367A (en) * 1976-11-10 1978-05-29 Hitachi Ltd Formation of electron beam resist image
JPS5675646A (en) * 1979-11-27 1981-06-22 Fujitsu Ltd Developing solution composition for radiation sensitive material
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS5984519A (en) * 1982-11-08 1984-05-16 Hitachi Ltd Developer
JPH07231170A (en) * 1994-02-21 1995-08-29 Nec Ibaraki Ltd Manufacture of multilayer wiring ceramic board
JPH07240581A (en) * 1994-02-28 1995-09-12 Nec Ibaraki Ltd Method for forming via hole of high-density circuit substrate

Similar Documents

Publication Publication Date Title
JPS5412675A (en) Electon beam exposure method
JPS51130222A (en) A process for producing an electron beam resist image
JPS52143776A (en) Electron beam exposure apparatus
JPS5427369A (en) Pattern formation method
JPS524821A (en) Process for manufacturing composition for thermodevelopable photosensi tive material
JPS52139381A (en) Electron beam exposure apparatus
JPS5263062A (en) Electron gun for color picture tube
IL48720A0 (en) An electron beam vapor source
JPS5360178A (en) Target for focusing of electron beam
JPS5215267A (en) Fine processing method
JPS51148370A (en) Electron ray exposure method
JPS5358770A (en) Electron beam exposure apparatus
JPS53114744A (en) Etching method
JPS5587432A (en) Electron beam exposure method
JPS5350978A (en) Electron beam exposure method
JPS5360162A (en) Electron beam irradiation device
JPS5223327A (en) Method for producing image formation material
JPS51148369A (en) Manufacturing method of semiconductor
JPS52101964A (en) Device for generating electron beam in crt
JPS52101965A (en) Device for generating electron beam in crt
JPS51117569A (en) Sample drift correction device
JPS53127267A (en) Inspection method for pattern
JPS5354974A (en) Electron beam exposure system
JPS52117578A (en) Electron beam exposing method
JPS5772327A (en) Formation of resist pattern