JPS51148370A - Electron ray exposure method - Google Patents

Electron ray exposure method

Info

Publication number
JPS51148370A
JPS51148370A JP50072595A JP7259575A JPS51148370A JP S51148370 A JPS51148370 A JP S51148370A JP 50072595 A JP50072595 A JP 50072595A JP 7259575 A JP7259575 A JP 7259575A JP S51148370 A JPS51148370 A JP S51148370A
Authority
JP
Japan
Prior art keywords
electron ray
exposure method
ray exposure
electron
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50072595A
Other languages
Japanese (ja)
Inventor
Kimio Yanagida
Kenichi Kawashima
Yasutaka Ban
Takaharu Shima
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP50072595A priority Critical patent/JPS51148370A/en
Publication of JPS51148370A publication Critical patent/JPS51148370A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To enable a minute pattern processing on an electron ray sense material by doing various kinds of printing using an electron ray exposure method.
COPYRIGHT: (C)1976,JPO&Japio
JP50072595A 1975-06-14 1975-06-14 Electron ray exposure method Pending JPS51148370A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50072595A JPS51148370A (en) 1975-06-14 1975-06-14 Electron ray exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50072595A JPS51148370A (en) 1975-06-14 1975-06-14 Electron ray exposure method

Publications (1)

Publication Number Publication Date
JPS51148370A true JPS51148370A (en) 1976-12-20

Family

ID=13493899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50072595A Pending JPS51148370A (en) 1975-06-14 1975-06-14 Electron ray exposure method

Country Status (1)

Country Link
JP (1) JPS51148370A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366284U (en) * 1976-11-02 1978-06-03
JPS54101674A (en) * 1978-01-27 1979-08-10 Cho Lsi Gijutsu Kenkyu Kumiai Method of forming electron beam pattern
JPS6236820A (en) * 1985-08-12 1987-02-17 Canon Inc Alignment device and its mask
JPH0799683B2 (en) * 1986-03-07 1995-10-25 ヒユ−ズ・エアクラフト・カンパニ− Masked ion beam lithography system and method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN=1974 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366284U (en) * 1976-11-02 1978-06-03
JPS54101674A (en) * 1978-01-27 1979-08-10 Cho Lsi Gijutsu Kenkyu Kumiai Method of forming electron beam pattern
JPS6236820A (en) * 1985-08-12 1987-02-17 Canon Inc Alignment device and its mask
JPH0799683B2 (en) * 1986-03-07 1995-10-25 ヒユ−ズ・エアクラフト・カンパニ− Masked ion beam lithography system and method

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