JPS51135363A - Method of manufacturing semiconductors and its equipment - Google Patents

Method of manufacturing semiconductors and its equipment

Info

Publication number
JPS51135363A
JPS51135363A JP50060401A JP6040175A JPS51135363A JP S51135363 A JPS51135363 A JP S51135363A JP 50060401 A JP50060401 A JP 50060401A JP 6040175 A JP6040175 A JP 6040175A JP S51135363 A JPS51135363 A JP S51135363A
Authority
JP
Japan
Prior art keywords
equipment
manufacturing semiconductors
wafer
heating
make
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50060401A
Other languages
Japanese (ja)
Inventor
Kiyohiro Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP50060401A priority Critical patent/JPS51135363A/en
Publication of JPS51135363A publication Critical patent/JPS51135363A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To make the film thickness of the vapor phase grown film uniform by heating the peripheral section a semiconductor wafer at a temperature higher than that of the central section of te wafer.
JP50060401A 1975-05-19 1975-05-19 Method of manufacturing semiconductors and its equipment Pending JPS51135363A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50060401A JPS51135363A (en) 1975-05-19 1975-05-19 Method of manufacturing semiconductors and its equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50060401A JPS51135363A (en) 1975-05-19 1975-05-19 Method of manufacturing semiconductors and its equipment

Publications (1)

Publication Number Publication Date
JPS51135363A true JPS51135363A (en) 1976-11-24

Family

ID=13141094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50060401A Pending JPS51135363A (en) 1975-05-19 1975-05-19 Method of manufacturing semiconductors and its equipment

Country Status (1)

Country Link
JP (1) JPS51135363A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111932U (en) * 1982-01-25 1983-07-30 ウシオ電機株式会社 heater
JPS60140765U (en) * 1984-12-20 1985-09-18 松下電子工業株式会社 plasma deposition equipment
JPH02186623A (en) * 1989-01-13 1990-07-20 Toshiba Ceramics Co Ltd Susceptor
JPH02185973A (en) * 1989-01-13 1990-07-20 Tokyo Electron Ltd Formation of metal silicide film
JPH0623240U (en) * 1992-08-21 1994-03-25 日新電機株式会社 Susceptor for semiconductor manufacturing equipment
JP2002203797A (en) * 2001-09-27 2002-07-19 Hitachi Kokusai Electric Inc Semiconductor manufacturing equipment
JP2003515949A (en) * 1999-11-30 2003-05-07 ウエファーマスターズ， インコーポレイテッド Single wafer annealing oven

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945681A (en) * 1972-07-01 1974-05-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4945681A (en) * 1972-07-01 1974-05-01

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111932U (en) * 1982-01-25 1983-07-30 ウシオ電機株式会社 heater
JPS60140765U (en) * 1984-12-20 1985-09-18 松下電子工業株式会社 plasma deposition equipment
JPH02186623A (en) * 1989-01-13 1990-07-20 Toshiba Ceramics Co Ltd Susceptor
JPH02185973A (en) * 1989-01-13 1990-07-20 Tokyo Electron Ltd Formation of metal silicide film
JPH0623240U (en) * 1992-08-21 1994-03-25 日新電機株式会社 Susceptor for semiconductor manufacturing equipment
JP2003515949A (en) * 1999-11-30 2003-05-07 ウエファーマスターズ， インコーポレイテッド Single wafer annealing oven
JP2002203797A (en) * 2001-09-27 2002-07-19 Hitachi Kokusai Electric Inc Semiconductor manufacturing equipment

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