JPS51140888A - A vapor phase growth apparatus - Google Patents

A vapor phase growth apparatus

Info

Publication number
JPS51140888A
JPS51140888A JP6420075A JP6420075A JPS51140888A JP S51140888 A JPS51140888 A JP S51140888A JP 6420075 A JP6420075 A JP 6420075A JP 6420075 A JP6420075 A JP 6420075A JP S51140888 A JPS51140888 A JP S51140888A
Authority
JP
Japan
Prior art keywords
vapor phase
phase growth
growth apparatus
semicondcutor
letting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6420075A
Other languages
Japanese (ja)
Inventor
Hiroo Tochikubo
Masataka Nomura
Yushi Kase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6420075A priority Critical patent/JPS51140888A/en
Publication of JPS51140888A publication Critical patent/JPS51140888A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:An apparatus for letting semicondcutor crystals grow epitaxial on a substrate without causing low temperature decomposition of vapor phase growing gas.
JP6420075A 1975-05-30 1975-05-30 A vapor phase growth apparatus Pending JPS51140888A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6420075A JPS51140888A (en) 1975-05-30 1975-05-30 A vapor phase growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6420075A JPS51140888A (en) 1975-05-30 1975-05-30 A vapor phase growth apparatus

Publications (1)

Publication Number Publication Date
JPS51140888A true JPS51140888A (en) 1976-12-04

Family

ID=13251179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6420075A Pending JPS51140888A (en) 1975-05-30 1975-05-30 A vapor phase growth apparatus

Country Status (1)

Country Link
JP (1) JPS51140888A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59187133U (en) * 1983-05-30 1984-12-12 ロ−ム株式会社 Vapor deposition equipment

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918463B1 (en) * 1970-03-18 1974-05-10
JPS508782A (en) * 1973-05-28 1975-01-29
JPS5024075A (en) * 1973-07-05 1975-03-14

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4918463B1 (en) * 1970-03-18 1974-05-10
JPS508782A (en) * 1973-05-28 1975-01-29
JPS5024075A (en) * 1973-07-05 1975-03-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59187133U (en) * 1983-05-30 1984-12-12 ロ−ム株式会社 Vapor deposition equipment

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