JPS51142980A - Photo resistance layer formation method - Google Patents

Photo resistance layer formation method

Info

Publication number
JPS51142980A
JPS51142980A JP50066516A JP6651675A JPS51142980A JP S51142980 A JPS51142980 A JP S51142980A JP 50066516 A JP50066516 A JP 50066516A JP 6651675 A JP6651675 A JP 6651675A JP S51142980 A JPS51142980 A JP S51142980A
Authority
JP
Japan
Prior art keywords
formation method
resistance layer
layer formation
photo resistance
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50066516A
Other languages
Japanese (ja)
Inventor
Shizuo Ishitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP50066516A priority Critical patent/JPS51142980A/en
Publication of JPS51142980A publication Critical patent/JPS51142980A/en
Pending legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To secure the photo-resistive material in close contact with the conductive layer which is to be etched.
COPYRIGHT: (C)1976,JPO&Japio
JP50066516A 1975-06-04 1975-06-04 Photo resistance layer formation method Pending JPS51142980A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50066516A JPS51142980A (en) 1975-06-04 1975-06-04 Photo resistance layer formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50066516A JPS51142980A (en) 1975-06-04 1975-06-04 Photo resistance layer formation method

Publications (1)

Publication Number Publication Date
JPS51142980A true JPS51142980A (en) 1976-12-08

Family

ID=13318085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50066516A Pending JPS51142980A (en) 1975-06-04 1975-06-04 Photo resistance layer formation method

Country Status (1)

Country Link
JP (1) JPS51142980A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106147A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS5856340A (en) * 1981-09-30 1983-04-04 Toshiba Corp Purification of semiconductor wafer
JPS5941837A (en) * 1982-08-31 1984-03-08 Mitsubishi Electric Corp How to apply photoresist
JPS6112045A (en) * 1984-06-28 1986-01-20 Oki Electric Ind Co Ltd Formation of bump electrode

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106147A (en) * 1980-12-24 1982-07-01 Fujitsu Ltd Manufacture of semiconductor device
JPS5856340A (en) * 1981-09-30 1983-04-04 Toshiba Corp Purification of semiconductor wafer
JPS5941837A (en) * 1982-08-31 1984-03-08 Mitsubishi Electric Corp How to apply photoresist
JPS6112045A (en) * 1984-06-28 1986-01-20 Oki Electric Ind Co Ltd Formation of bump electrode

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