JPS5120785A - Cvd makunokeiseihoho - Google Patents
Cvd makunokeiseihohoInfo
- Publication number
- JPS5120785A JPS5120785A JP9235074A JP9235074A JPS5120785A JP S5120785 A JPS5120785 A JP S5120785A JP 9235074 A JP9235074 A JP 9235074A JP 9235074 A JP9235074 A JP 9235074A JP S5120785 A JPS5120785 A JP S5120785A
- Authority
- JP
- Japan
- Prior art keywords
- makunokeiseihoho
- cvd
- cvd makunokeiseihoho
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9235074A JPS5120785A (en) | 1974-08-14 | 1974-08-14 | Cvd makunokeiseihoho |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9235074A JPS5120785A (en) | 1974-08-14 | 1974-08-14 | Cvd makunokeiseihoho |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5120785A true JPS5120785A (en) | 1976-02-19 |
Family
ID=14051943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9235074A Pending JPS5120785A (en) | 1974-08-14 | 1974-08-14 | Cvd makunokeiseihoho |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5120785A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010163663A (en) * | 2009-01-16 | 2010-07-29 | Nihon Ceratec Co Ltd | Air-open-type cvd apparatus, and method for manufacturing metal oxide film |
| CN102337520A (en) * | 2011-09-22 | 2012-02-01 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for plating thin film on inner wall of slender pipeline |
-
1974
- 1974-08-14 JP JP9235074A patent/JPS5120785A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010163663A (en) * | 2009-01-16 | 2010-07-29 | Nihon Ceratec Co Ltd | Air-open-type cvd apparatus, and method for manufacturing metal oxide film |
| CN102337520A (en) * | 2011-09-22 | 2012-02-01 | 中国航天科技集团公司第五研究院第五一○研究所 | Method for plating thin film on inner wall of slender pipeline |
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