JPS5212590B1 - - Google Patents

Info

Publication number
JPS5212590B1
JPS5212590B1 JP2638368A JP2638368A JPS5212590B1 JP S5212590 B1 JPS5212590 B1 JP S5212590B1 JP 2638368 A JP2638368 A JP 2638368A JP 2638368 A JP2638368 A JP 2638368A JP S5212590 B1 JPS5212590 B1 JP S5212590B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2638368A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH576267A external-priority patent/CH475559A/fr
Application filed filed Critical
Publication of JPS5212590B1 publication Critical patent/JPS5212590B1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Measuring Fluid Pressure (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP2638368A 1967-04-21 1968-04-20 Pending JPS5212590B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH576267A CH475559A (fr) 1967-04-21 1967-04-21 Procédé de mesure de la vitesse d'évaporation sous vide, jauge pour la mise en oeuvre de ce procédé et application de ce procédé
CH454168A CH490678A (fr) 1967-04-21 1968-03-26 Jauge de mesure de la vitesse d'évaporation sous vide

Publications (1)

Publication Number Publication Date
JPS5212590B1 true JPS5212590B1 (fr) 1977-04-08

Family

ID=25695723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2638368A Pending JPS5212590B1 (fr) 1967-04-21 1968-04-20

Country Status (5)

Country Link
JP (1) JPS5212590B1 (fr)
CH (1) CH490678A (fr)
DE (1) DE1773242C3 (fr)
FR (1) FR1577403A (fr)
GB (1) GB1194943A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225422A (ja) * 1984-04-24 1985-11-09 Hitachi Ltd 薄膜形成方法およびその装置
DE3521549A1 (de) * 1985-06-15 1986-12-18 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zur messung und/oder regelung eines teilchenstromes
DE60233607D1 (de) * 2002-05-28 2009-10-15 Inficon Inc Ionisationsmesser und Verfahren zur Ermittlung eines Gesamtionendrucks

Also Published As

Publication number Publication date
DE1773242C3 (de) 1974-08-08
DE1773242B2 (de) 1974-01-10
GB1194943A (en) 1970-06-17
FR1577403A (fr) 1969-08-08
CH490678A (fr) 1970-05-15
DE1773242A1 (de) 1971-10-28

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