JPS52136831A - Producing method of high purity silicon - Google Patents

Producing method of high purity silicon

Info

Publication number
JPS52136831A
JPS52136831A JP5418777A JP5418777A JPS52136831A JP S52136831 A JPS52136831 A JP S52136831A JP 5418777 A JP5418777 A JP 5418777A JP 5418777 A JP5418777 A JP 5418777A JP S52136831 A JPS52136831 A JP S52136831A
Authority
JP
Japan
Prior art keywords
high purity
producing method
purity silicon
silicon
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5418777A
Other languages
English (en)
Japanese (ja)
Inventor
Shiyumitsuto Deiitoritsuhi
Rangu Buinfuriito
Jirutoru Eruharuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Publication of JPS52136831A publication Critical patent/JPS52136831A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP5418777A 1976-05-11 1977-05-11 Producing method of high purity silicon Pending JPS52136831A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762620739 DE2620739A1 (de) 1976-05-11 1976-05-11 Verfahren zur herstellung von hochreinem silicium

Publications (1)

Publication Number Publication Date
JPS52136831A true JPS52136831A (en) 1977-11-15

Family

ID=5977608

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5418777A Pending JPS52136831A (en) 1976-05-11 1977-05-11 Producing method of high purity silicon

Country Status (8)

Country Link
JP (1) JPS52136831A (da)
BE (1) BE854394A (da)
DE (1) DE2620739A1 (da)
DK (1) DK204377A (da)
FR (1) FR2351051A1 (da)
GB (1) GB1570131A (da)
IT (1) IT1079005B (da)
NL (1) NL7703799A (da)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5527890A (en) * 1978-08-18 1980-02-28 Jiee Shii Shiyumatsuchiyaa Co Manufacture of highly pure silicon
JP2003511338A (ja) * 1999-10-11 2003-03-25 ソーラーワールド・アクチエンゲゼルシヤフト 低圧における高純度粒子状ケイ素の製造法
JP2013539823A (ja) * 2010-10-07 2013-10-28 マーク ダブリュー ダッセル シリコンの製造に適した機械式流動化反応器システム及び方法
US9365929B2 (en) 2012-05-25 2016-06-14 Rokstar Technologies Llc Mechanically fluidized silicon deposition systems and methods

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR880000618B1 (ko) * 1985-12-28 1988-04-18 재단법인 한국화학연구소 초단파 가열 유동상 반응에 의한 고순도 다결정 실리콘의 제조 방법
JPS63222011A (ja) * 1987-03-11 1988-09-14 Mitsubishi Metal Corp 多結晶シリコンの製造方法
AU2002329626A1 (en) * 2002-07-22 2004-02-23 Stephen M. Lord Methods for heating a fluidized bed silicon manufacture apparatus
US9156705B2 (en) * 2010-12-23 2015-10-13 Sunedison, Inc. Production of polycrystalline silicon by the thermal decomposition of dichlorosilane in a fluidized bed reactor
WO2013049325A1 (en) * 2011-09-30 2013-04-04 Memc Electronic Materials, Inc. Production of polycrystalline silicon by the thermal decomposition of silane in a fluidized bed reactor
CN107253723B (zh) 2011-09-30 2020-06-26 各星有限公司 通过使硅烷在流化床反应器中热分解而制备多晶硅

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50155423A (da) * 1974-05-13 1975-12-15

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50155423A (da) * 1974-05-13 1975-12-15

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5527890A (en) * 1978-08-18 1980-02-28 Jiee Shii Shiyumatsuchiyaa Co Manufacture of highly pure silicon
JP2003511338A (ja) * 1999-10-11 2003-03-25 ソーラーワールド・アクチエンゲゼルシヤフト 低圧における高純度粒子状ケイ素の製造法
JP2013539823A (ja) * 2010-10-07 2013-10-28 マーク ダブリュー ダッセル シリコンの製造に適した機械式流動化反応器システム及び方法
US9365929B2 (en) 2012-05-25 2016-06-14 Rokstar Technologies Llc Mechanically fluidized silicon deposition systems and methods

Also Published As

Publication number Publication date
FR2351051A1 (fr) 1977-12-09
GB1570131A (en) 1980-06-25
DE2620739A1 (de) 1977-12-01
NL7703799A (nl) 1977-11-15
BE854394A (fr) 1977-11-09
IT1079005B (it) 1985-05-08
DK204377A (da) 1977-11-12

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