Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu LtdfiledCriticalNEC Kyushu Ltd
Priority to JP11848775ApriorityCriticalpatent/JPS5242376A/en
Publication of JPS5242376ApublicationCriticalpatent/JPS5242376A/en
Preparing Plates And Mask In Photomechanical Process
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Abstract
PURPOSE: To obtain a highly densely integrated photomask by absorbing the irregular reflection light produced at the step of the undulations of a semiconductor substrate.