JPS5299780A - Production of silicon mask for x-ray lithography - Google Patents
Production of silicon mask for x-ray lithographyInfo
- Publication number
- JPS5299780A JPS5299780A JP1670276A JP1670276A JPS5299780A JP S5299780 A JPS5299780 A JP S5299780A JP 1670276 A JP1670276 A JP 1670276A JP 1670276 A JP1670276 A JP 1670276A JP S5299780 A JPS5299780 A JP S5299780A
- Authority
- JP
- Japan
- Prior art keywords
- ray lithography
- production
- silicon mask
- substrate
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001015 X-ray lithography Methods 0.000 title abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 229910001385 heavy metal Inorganic materials 0.000 abstract 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To produce a Si mask for X-ray lithography by providing a high-concentration O2-implanted layer having a required concentration peak at an arbitrary depth in a Si substrate, depositing heavy metal films thereon and etching the substrate from its rear surface down to the O2-implanted layer.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1670276A JPS5299780A (en) | 1976-02-18 | 1976-02-18 | Production of silicon mask for x-ray lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1670276A JPS5299780A (en) | 1976-02-18 | 1976-02-18 | Production of silicon mask for x-ray lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5299780A true JPS5299780A (en) | 1977-08-22 |
Family
ID=11923608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1670276A Pending JPS5299780A (en) | 1976-02-18 | 1976-02-18 | Production of silicon mask for x-ray lithography |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5299780A (en) |
-
1976
- 1976-02-18 JP JP1670276A patent/JPS5299780A/en active Pending
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