JPS5327376A - Forming method of high resistanc e layer - Google Patents

Forming method of high resistanc e layer

Info

Publication number
JPS5327376A
JPS5327376A JP10202976A JP10202976A JPS5327376A JP S5327376 A JPS5327376 A JP S5327376A JP 10202976 A JP10202976 A JP 10202976A JP 10202976 A JP10202976 A JP 10202976A JP S5327376 A JPS5327376 A JP S5327376A
Authority
JP
Japan
Prior art keywords
layer
forming method
resistanc
substrate
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10202976A
Other languages
English (en)
Other versions
JPS587065B2 (ja
Inventor
Shunji Nojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP51102029A priority Critical patent/JPS587065B2/ja
Publication of JPS5327376A publication Critical patent/JPS5327376A/ja
Publication of JPS587065B2 publication Critical patent/JPS587065B2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Semiconductor Integrated Circuits (AREA)
JP51102029A 1976-08-26 1976-08-26 高抵抗層を有する半導体装置及びその製造方法 Expired JPS587065B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51102029A JPS587065B2 (ja) 1976-08-26 1976-08-26 高抵抗層を有する半導体装置及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51102029A JPS587065B2 (ja) 1976-08-26 1976-08-26 高抵抗層を有する半導体装置及びその製造方法

Publications (2)

Publication Number Publication Date
JPS5327376A true JPS5327376A (en) 1978-03-14
JPS587065B2 JPS587065B2 (ja) 1983-02-08

Family

ID=14316318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51102029A Expired JPS587065B2 (ja) 1976-08-26 1976-08-26 高抵抗層を有する半導体装置及びその製造方法

Country Status (1)

Country Link
JP (1) JPS587065B2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62244160A (ja) * 1986-04-17 1987-10-24 Mitsubishi Electric Corp 半導体装置
US4851359A (en) * 1985-12-27 1989-07-25 Bull S.A. Method of producing an electrical resistor by implanting a semiconductor material with rare gas

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851359A (en) * 1985-12-27 1989-07-25 Bull S.A. Method of producing an electrical resistor by implanting a semiconductor material with rare gas
JPS62244160A (ja) * 1986-04-17 1987-10-24 Mitsubishi Electric Corp 半導体装置

Also Published As

Publication number Publication date
JPS587065B2 (ja) 1983-02-08

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