JPS5342679A - Apparatus for and method of manufacturing miniature object such as integrated circuit and the like - Google Patents

Apparatus for and method of manufacturing miniature object such as integrated circuit and the like

Info

Publication number
JPS5342679A
JPS5342679A JP11618777A JP11618777A JPS5342679A JP S5342679 A JPS5342679 A JP S5342679A JP 11618777 A JP11618777 A JP 11618777A JP 11618777 A JP11618777 A JP 11618777A JP S5342679 A JPS5342679 A JP S5342679A
Authority
JP
Japan
Prior art keywords
integrated circuit
miniature object
manufacturing miniature
manufacturing
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11618777A
Other languages
English (en)
Japanese (ja)
Inventor
Aran Buriyutsukunaa Kiisu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xonics Inc
Original Assignee
Xonics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xonics Inc filed Critical Xonics Inc
Publication of JPS5342679A publication Critical patent/JPS5342679A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2047—X-ray beam lithography processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11618777A 1976-09-29 1977-09-29 Apparatus for and method of manufacturing miniature object such as integrated circuit and the like Pending JPS5342679A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72794976A 1976-09-29 1976-09-29

Publications (1)

Publication Number Publication Date
JPS5342679A true JPS5342679A (en) 1978-04-18

Family

ID=24924778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11618777A Pending JPS5342679A (en) 1976-09-29 1977-09-29 Apparatus for and method of manufacturing miniature object such as integrated circuit and the like

Country Status (7)

Country Link
JP (1) JPS5342679A (fr)
BE (1) BE857362A (fr)
DE (1) DE2740366A1 (fr)
FR (1) FR2366694A1 (fr)
GB (1) GB1522568A (fr)
IT (1) IT1089816B (fr)
NL (1) NL7707485A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS62208631A (ja) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd 縮小型ｘ線リソグラフイ装置
JPS6318626A (ja) * 1986-07-11 1988-01-26 Canon Inc 投影露光装置
JPS63312641A (ja) * 1987-06-15 1988-12-21 Canon Inc Ｘ線露光装置
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1224839A (fr) * 1983-06-06 1987-07-28 Barukh Yaakobi Lithographie a rayons x

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS62208631A (ja) * 1986-03-07 1987-09-12 Sanyo Electric Co Ltd 縮小型ｘ線リソグラフイ装置
JPS6318626A (ja) * 1986-07-11 1988-01-26 Canon Inc 投影露光装置
JPS63312641A (ja) * 1987-06-15 1988-12-21 Canon Inc Ｘ線露光装置
JPH07147230A (ja) * 1994-08-04 1995-06-06 Canon Inc 縮小投影露光装置および半導体製造方法

Also Published As

Publication number Publication date
GB1522568A (en) 1978-08-23
NL7707485A (nl) 1978-03-31
DE2740366A1 (de) 1978-03-30
BE857362A (fr) 1977-12-01
FR2366694A1 (fr) 1978-04-28
IT1089816B (it) 1985-06-18

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