JPS5366181A - High dielectric strength mis type transistor - Google Patents
High dielectric strength mis type transistorInfo
- Publication number
- JPS5366181A JPS5366181A JP14124276A JP14124276A JPS5366181A JP S5366181 A JPS5366181 A JP S5366181A JP 14124276 A JP14124276 A JP 14124276A JP 14124276 A JP14124276 A JP 14124276A JP S5366181 A JPS5366181 A JP S5366181A
- Authority
- JP
- Japan
- Prior art keywords
- type transistor
- high dielectric
- dielectric strength
- mis type
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Abstract
PURPOSE: To produce a MISFET of small on-resistance and high breakdown voltage by disposing an N type layer in adjacent to the N+ type drain layer of an N- type Si substrate and providing the electrode of the same potential as that of the source through an insulation film on the N type layer.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14124276A JPS5366181A (en) | 1976-11-26 | 1976-11-26 | High dielectric strength mis type transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14124276A JPS5366181A (en) | 1976-11-26 | 1976-11-26 | High dielectric strength mis type transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5366181A true JPS5366181A (en) | 1978-06-13 |
Family
ID=15287388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14124276A Pending JPS5366181A (en) | 1976-11-26 | 1976-11-26 | High dielectric strength mis type transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5366181A (en) |
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58206164A (en) * | 1982-05-10 | 1983-12-01 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | Semiconductor device and its manufacturing method |
| JPH01162372A (en) * | 1987-12-18 | 1989-06-26 | Matsushita Electron Corp | Mis transistor |
| US4947232A (en) * | 1980-03-22 | 1990-08-07 | Sharp Kabushiki Kaisha | High voltage MOS transistor |
| US5191396A (en) * | 1978-10-13 | 1993-03-02 | International Rectifier Corp. | High power mosfet with low on-resistance and high breakdown voltage |
| US5338961A (en) * | 1978-10-13 | 1994-08-16 | International Rectifier Corporation | High power MOSFET with low on-resistance and high breakdown voltage |
| US5578509A (en) * | 1993-04-23 | 1996-11-26 | Mitsubishi Denki Kabushiki Kaisha | Method of making a field effect transistor |
| US5663080A (en) * | 1991-11-29 | 1997-09-02 | Sgs-Thomson Microelectronics, S.R.L. | Process for manufacturing MOS-type integrated circuits |
| US5744372A (en) * | 1995-04-12 | 1998-04-28 | National Semiconductor Corporation | Fabrication of complementary field-effect transistors each having multi-part channel |
| US5798554A (en) * | 1995-02-24 | 1998-08-25 | Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | MOS-technology power device integrated structure and manufacturing process thereof |
| US5817546A (en) * | 1994-06-23 | 1998-10-06 | Stmicroelectronics S.R.L. | Process of making a MOS-technology power device |
| US5841167A (en) * | 1995-12-28 | 1998-11-24 | Sgs-Thomson Microelectronics S.R.L. | MOS-technology power device integrated structure |
| US5869371A (en) * | 1995-06-07 | 1999-02-09 | Stmicroelectronics, Inc. | Structure and process for reducing the on-resistance of mos-gated power devices |
| US5874338A (en) * | 1994-06-23 | 1999-02-23 | Sgs-Thomson Microelectronics S.R.L. | MOS-technology power device and process of making same |
| US5981343A (en) * | 1995-10-30 | 1999-11-09 | Sgs-Thomas Microelectronics, S.R.L. | Single feature size mos technology power device |
| US6020227A (en) * | 1995-09-12 | 2000-02-01 | National Semiconductor Corporation | Fabrication of multiple field-effect transistor structure having local threshold-adjust doping |
| US6030870A (en) * | 1995-10-30 | 2000-02-29 | Sgs-Thomson Microelectronics, S.R.L. | High density MOS technology power device |
| US6228719B1 (en) | 1995-11-06 | 2001-05-08 | Stmicroelectronics S.R.L. | MOS technology power device with low output resistance and low capacitance, and related manufacturing process |
| US6492691B2 (en) | 1998-05-26 | 2002-12-10 | Stmicroelectronics S.R.L. | High integration density MOS technology power device structure |
-
1976
- 1976-11-26 JP JP14124276A patent/JPS5366181A/en active Pending
Cited By (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5742087A (en) * | 1978-10-13 | 1998-04-21 | International Rectifier Corporation | High power MOSFET with low on-resistance and high breakdown voltage |
| US5191396A (en) * | 1978-10-13 | 1993-03-02 | International Rectifier Corp. | High power mosfet with low on-resistance and high breakdown voltage |
| US5338961A (en) * | 1978-10-13 | 1994-08-16 | International Rectifier Corporation | High power MOSFET with low on-resistance and high breakdown voltage |
| US5598018A (en) * | 1978-10-13 | 1997-01-28 | International Rectifier Corporation | High power MOSFET with low on-resistance and high breakdown voltage |
| US4947232A (en) * | 1980-03-22 | 1990-08-07 | Sharp Kabushiki Kaisha | High voltage MOS transistor |
| JPS58206164A (en) * | 1982-05-10 | 1983-12-01 | エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン | Semiconductor device and its manufacturing method |
| JPH01162372A (en) * | 1987-12-18 | 1989-06-26 | Matsushita Electron Corp | Mis transistor |
| US5696399A (en) * | 1991-11-29 | 1997-12-09 | Sgs-Thomson Microelectronics S.R.L. | Process for manufacturing MOS-type integrated circuits |
| US5663080A (en) * | 1991-11-29 | 1997-09-02 | Sgs-Thomson Microelectronics, S.R.L. | Process for manufacturing MOS-type integrated circuits |
| US5578509A (en) * | 1993-04-23 | 1996-11-26 | Mitsubishi Denki Kabushiki Kaisha | Method of making a field effect transistor |
| US5817546A (en) * | 1994-06-23 | 1998-10-06 | Stmicroelectronics S.R.L. | Process of making a MOS-technology power device |
| US5874338A (en) * | 1994-06-23 | 1999-02-23 | Sgs-Thomson Microelectronics S.R.L. | MOS-technology power device and process of making same |
| US5798554A (en) * | 1995-02-24 | 1998-08-25 | Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | MOS-technology power device integrated structure and manufacturing process thereof |
| US6111297A (en) * | 1995-02-24 | 2000-08-29 | Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno | MOS-technology power device integrated structure and manufacturing process thereof |
| US6078082A (en) * | 1995-04-12 | 2000-06-20 | National Semiconductor Corporation | Field-effect transistor having multi-part channel |
| US5744372A (en) * | 1995-04-12 | 1998-04-28 | National Semiconductor Corporation | Fabrication of complementary field-effect transistors each having multi-part channel |
| US6576966B1 (en) | 1995-04-12 | 2003-06-10 | National Semiconductor Corporation | Field-effect transistor having multi-part channel |
| US5869371A (en) * | 1995-06-07 | 1999-02-09 | Stmicroelectronics, Inc. | Structure and process for reducing the on-resistance of mos-gated power devices |
| US6046473A (en) * | 1995-06-07 | 2000-04-04 | Stmicroelectronics, Inc. | Structure and process for reducing the on-resistance of MOS-gated power devices |
| US6020227A (en) * | 1995-09-12 | 2000-02-01 | National Semiconductor Corporation | Fabrication of multiple field-effect transistor structure having local threshold-adjust doping |
| US6030870A (en) * | 1995-10-30 | 2000-02-29 | Sgs-Thomson Microelectronics, S.R.L. | High density MOS technology power device |
| US6054737A (en) * | 1995-10-30 | 2000-04-25 | Sgs-Thomson Microelectronics S.R.L. | High density MOS technology power device |
| US6064087A (en) * | 1995-10-30 | 2000-05-16 | Sgs-Thomson Microelectronics, S.R.L. | Single feature size MOS technology power device |
| US5985721A (en) * | 1995-10-30 | 1999-11-16 | Sgs-Thomson Microelectronics, S.R.L. | Single feature size MOS technology power device |
| US5981343A (en) * | 1995-10-30 | 1999-11-09 | Sgs-Thomas Microelectronics, S.R.L. | Single feature size mos technology power device |
| US6228719B1 (en) | 1995-11-06 | 2001-05-08 | Stmicroelectronics S.R.L. | MOS technology power device with low output resistance and low capacitance, and related manufacturing process |
| US6051862A (en) * | 1995-12-28 | 2000-04-18 | Sgs-Thomson Microelectronics S.R.L. | MOS-technology power device integrated structure |
| US5841167A (en) * | 1995-12-28 | 1998-11-24 | Sgs-Thomson Microelectronics S.R.L. | MOS-technology power device integrated structure |
| US6492691B2 (en) | 1998-05-26 | 2002-12-10 | Stmicroelectronics S.R.L. | High integration density MOS technology power device structure |
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