JPS5367684A - Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering - Google Patents

Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering

Info

Publication number
JPS5367684A
JPS5367684A JP14144577A JP14144577A JPS5367684A JP S5367684 A JPS5367684 A JP S5367684A JP 14144577 A JP14144577 A JP 14144577A JP 14144577 A JP14144577 A JP 14144577A JP S5367684 A JPS5367684 A JP S5367684A
Authority
JP
Japan
Prior art keywords
ceramic substrate
coating glass
cathode sputtering
continuously coating
continuously
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14144577A
Other languages
English (en)
Japanese (ja)
Inventor
Adamu Herumuuto
Keraa Matsukusu
Kuriyuugaa Giyuntaa
Buriru Kurausu
Horutsugureefue Fuorukaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Original Assignee
Robert Bosch GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH filed Critical Robert Bosch GmbH
Publication of JPS5367684A publication Critical patent/JPS5367684A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Breeding Of Plants And Reproduction By Means Of Culturing (AREA)
JP14144577A 1976-11-26 1977-11-25 Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering Pending JPS5367684A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762653736 DE2653736A1 (de) 1976-11-26 1976-11-26 Verfahren und vorrichtung zur kontinuierlichen beschichtung von glas- oder keramiksubstraten mittels kathodenzerstaeubung

Publications (1)

Publication Number Publication Date
JPS5367684A true JPS5367684A (en) 1978-06-16

Family

ID=5994034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14144577A Pending JPS5367684A (en) 1976-11-26 1977-11-25 Method and apparatus for continuously coating glass or ceramic substrate by cathode sputtering

Country Status (5)

Country Link
JP (1) JPS5367684A (it)
CH (1) CH620946A5 (it)
DE (1) DE2653736A1 (it)
FR (1) FR2372243A1 (it)
IT (1) IT1089022B (it)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61119672A (ja) * 1984-11-14 1986-06-06 Ulvac Corp ロ−ドロツク室のベント方法
JPS6461645A (en) * 1987-09-01 1989-03-08 Yasuda Susumu Dangerous harmful gas detecting method
JP2012507634A (ja) * 2008-11-06 2012-03-29 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング テストガラス変動システム
CN111926306A (zh) * 2020-09-22 2020-11-13 上海陛通半导体能源科技股份有限公司 基于多工艺腔传送的沉积设备及晶圆沉积方法
CN114823432A (zh) * 2022-06-28 2022-07-29 江苏邑文微电子科技有限公司 半导体真空传输平台及其控制方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4640221A (en) * 1985-10-30 1987-02-03 International Business Machines Corporation Vacuum deposition system with improved mass flow control
DE102007022431A1 (de) * 2007-05-09 2008-11-13 Leybold Optics Gmbh Behandlungssystem für flache Substrate

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1321861A (en) * 1970-01-13 1973-07-04 Ultra Electronics Ltd Vacuum deposition
DE2116190C3 (de) * 1971-04-02 1979-08-30 Flachglas Ag Delog-Detag, 4650 Gelsenkirchen Vorrichtung zum Beschichten großflächiger Platten wie Glasscheiben, Keramik- oder Kunststoffplatten und dergleichen mittels Kathodenzerstäubung

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61119672A (ja) * 1984-11-14 1986-06-06 Ulvac Corp ロ−ドロツク室のベント方法
JPS6461645A (en) * 1987-09-01 1989-03-08 Yasuda Susumu Dangerous harmful gas detecting method
JP2012507634A (ja) * 2008-11-06 2012-03-29 ライボルト オプティクス ゲゼルシャフト ミット ベシュレンクテル ハフツング テストガラス変動システム
US9157147B2 (en) 2008-11-06 2015-10-13 Leybold Optics Gmbh Test glass changing system
CN111926306A (zh) * 2020-09-22 2020-11-13 上海陛通半导体能源科技股份有限公司 基于多工艺腔传送的沉积设备及晶圆沉积方法
CN114823432A (zh) * 2022-06-28 2022-07-29 江苏邑文微电子科技有限公司 半导体真空传输平台及其控制方法
CN114823432B (zh) * 2022-06-28 2022-09-02 江苏邑文微电子科技有限公司 半导体真空传输平台及其控制方法

Also Published As

Publication number Publication date
IT1089022B (it) 1985-06-10
DE2653736A1 (de) 1978-06-01
FR2372243A1 (fr) 1978-06-23
CH620946A5 (en) 1980-12-31

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