JPS5368075A - Manufacture of element containing micro pattern - Google Patents

Manufacture of element containing micro pattern

Info

Publication number
JPS5368075A
JPS5368075A JP14365176A JP14365176A JPS5368075A JP S5368075 A JPS5368075 A JP S5368075A JP 14365176 A JP14365176 A JP 14365176A JP 14365176 A JP14365176 A JP 14365176A JP S5368075 A JPS5368075 A JP S5368075A
Authority
JP
Japan
Prior art keywords
manufacture
element containing
containing micro
micro pattern
sticked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14365176A
Other languages
Japanese (ja)
Inventor
Hiroshi Gokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14365176A priority Critical patent/JPS5368075A/en
Publication of JPS5368075A publication Critical patent/JPS5368075A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To ensure an ion etching with a high pattern accuracy by using the ion beam which have different angles to the normal line direction of the test sample and by removing the flush sticked the wall of the resist side.
COPYRIGHT: (C)1978,JPO&Japio
JP14365176A 1976-11-29 1976-11-29 Manufacture of element containing micro pattern Pending JPS5368075A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14365176A JPS5368075A (en) 1976-11-29 1976-11-29 Manufacture of element containing micro pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14365176A JPS5368075A (en) 1976-11-29 1976-11-29 Manufacture of element containing micro pattern

Publications (1)

Publication Number Publication Date
JPS5368075A true JPS5368075A (en) 1978-06-17

Family

ID=15343734

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14365176A Pending JPS5368075A (en) 1976-11-29 1976-11-29 Manufacture of element containing micro pattern

Country Status (1)

Country Link
JP (1) JPS5368075A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137635A (en) * 1980-03-31 1981-10-27 Toshiba Corp Ion etching method
JPS56137636A (en) * 1980-03-31 1981-10-27 Toshiba Corp Ion etching method
JPS5821333A (en) * 1981-07-30 1983-02-08 Kokusai Electric Co Ltd Sample holding device for ion beam etching equipment
JPS58225637A (en) * 1982-06-23 1983-12-27 Sony Corp Ion beam apparatus
JPS6078135U (en) * 1983-11-02 1985-05-31 株式会社日立国際電気 Ion beam etching device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137635A (en) * 1980-03-31 1981-10-27 Toshiba Corp Ion etching method
JPS56137636A (en) * 1980-03-31 1981-10-27 Toshiba Corp Ion etching method
JPS5821333A (en) * 1981-07-30 1983-02-08 Kokusai Electric Co Ltd Sample holding device for ion beam etching equipment
JPS58225637A (en) * 1982-06-23 1983-12-27 Sony Corp Ion beam apparatus
JPS6078135U (en) * 1983-11-02 1985-05-31 株式会社日立国際電気 Ion beam etching device

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