JPS5244571A - Method of forming fine pattern - Google Patents

Method of forming fine pattern

Info

Publication number
JPS5244571A
JPS5244571A JP50120962A JP12096275A JPS5244571A JP S5244571 A JPS5244571 A JP S5244571A JP 50120962 A JP50120962 A JP 50120962A JP 12096275 A JP12096275 A JP 12096275A JP S5244571 A JPS5244571 A JP S5244571A
Authority
JP
Japan
Prior art keywords
fine pattern
forming fine
corrosion resistance
ion implantation
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50120962A
Other languages
Japanese (ja)
Inventor
Tadahiro Hashimoto
Yasushi Okuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP50120962A priority Critical patent/JPS5244571A/en
Publication of JPS5244571A publication Critical patent/JPS5244571A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To provide corrosion resistance to a photoresist film by ion implantation thereby performing etching of a fine pattern.
COPYRIGHT: (C)1977,JPO&Japio
JP50120962A 1975-10-06 1975-10-06 Method of forming fine pattern Pending JPS5244571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50120962A JPS5244571A (en) 1975-10-06 1975-10-06 Method of forming fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50120962A JPS5244571A (en) 1975-10-06 1975-10-06 Method of forming fine pattern

Publications (1)

Publication Number Publication Date
JPS5244571A true JPS5244571A (en) 1977-04-07

Family

ID=14799296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50120962A Pending JPS5244571A (en) 1975-10-06 1975-10-06 Method of forming fine pattern

Country Status (1)

Country Link
JP (1) JPS5244571A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157523A (en) * 1981-03-25 1982-09-29 Hitachi Ltd Forming method for pattern
JPS5884430A (en) * 1981-11-14 1983-05-20 Daikin Ind Ltd Method of increasing etching resistance of resist film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57157523A (en) * 1981-03-25 1982-09-29 Hitachi Ltd Forming method for pattern
JPS5884430A (en) * 1981-11-14 1983-05-20 Daikin Ind Ltd Method of increasing etching resistance of resist film

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