JPS5368570A - Formation method of semiconductor epitaxial film - Google Patents

Formation method of semiconductor epitaxial film

Info

Publication number
JPS5368570A
JPS5368570A JP14333876A JP14333876A JPS5368570A JP S5368570 A JPS5368570 A JP S5368570A JP 14333876 A JP14333876 A JP 14333876A JP 14333876 A JP14333876 A JP 14333876A JP S5368570 A JPS5368570 A JP S5368570A
Authority
JP
Japan
Prior art keywords
epitaxial film
formation method
semiconductor epitaxial
substrate
placement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14333876A
Other languages
Japanese (ja)
Inventor
Kikuo Watanabe
Motonao Hirao
Tetsuo Asano
Masao Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14333876A priority Critical patent/JPS5368570A/en
Publication of JPS5368570A publication Critical patent/JPS5368570A/en
Pending legal-status Critical Current

Links

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To make the supply of epitaxial film forming molecules to substrate crystal surface uniform and obtain a grown layer of an even thickness by beforehand making rough the surface of a support jig for placement of a semiconductor crystal substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP14333876A 1976-12-01 1976-12-01 Formation method of semiconductor epitaxial film Pending JPS5368570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14333876A JPS5368570A (en) 1976-12-01 1976-12-01 Formation method of semiconductor epitaxial film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14333876A JPS5368570A (en) 1976-12-01 1976-12-01 Formation method of semiconductor epitaxial film

Publications (1)

Publication Number Publication Date
JPS5368570A true JPS5368570A (en) 1978-06-19

Family

ID=15336451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14333876A Pending JPS5368570A (en) 1976-12-01 1976-12-01 Formation method of semiconductor epitaxial film

Country Status (1)

Country Link
JP (1) JPS5368570A (en)

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