JPS5369582A - Coating method for photo-resist - Google Patents

Coating method for photo-resist

Info

Publication number
JPS5369582A
JPS5369582A JP14600576A JP14600576A JPS5369582A JP S5369582 A JPS5369582 A JP S5369582A JP 14600576 A JP14600576 A JP 14600576A JP 14600576 A JP14600576 A JP 14600576A JP S5369582 A JPS5369582 A JP S5369582A
Authority
JP
Japan
Prior art keywords
photo
resist
coating method
coating
photo resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14600576A
Other languages
Japanese (ja)
Inventor
Shigeki Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14600576A priority Critical patent/JPS5369582A/en
Publication of JPS5369582A publication Critical patent/JPS5369582A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To prevent the peeling of film and pin holes from being caused, by coating the photo resist on one surface after coating the photo resist film on other surface and processing under prebake temperature.
COPYRIGHT: (C)1978,JPO&Japio
JP14600576A 1976-12-03 1976-12-03 Coating method for photo-resist Pending JPS5369582A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14600576A JPS5369582A (en) 1976-12-03 1976-12-03 Coating method for photo-resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14600576A JPS5369582A (en) 1976-12-03 1976-12-03 Coating method for photo-resist

Publications (1)

Publication Number Publication Date
JPS5369582A true JPS5369582A (en) 1978-06-21

Family

ID=15397937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14600576A Pending JPS5369582A (en) 1976-12-03 1976-12-03 Coating method for photo-resist

Country Status (1)

Country Link
JP (1) JPS5369582A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227929A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Processing equipment
JPH08227928A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Resist processing apparatus and resist processing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227929A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Processing equipment
JPH08227928A (en) * 1988-02-12 1996-09-03 Tokyo Electron Ltd Resist processing apparatus and resist processing method

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