JPS5372467A - Manufacture for semiconductor device - Google Patents

Manufacture for semiconductor device

Info

Publication number
JPS5372467A
JPS5372467A JP14804976A JP14804976A JPS5372467A JP S5372467 A JPS5372467 A JP S5372467A JP 14804976 A JP14804976 A JP 14804976A JP 14804976 A JP14804976 A JP 14804976A JP S5372467 A JPS5372467 A JP S5372467A
Authority
JP
Japan
Prior art keywords
manufacture
semiconductor device
restricting
causes
temperature rise
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14804976A
Other languages
Japanese (ja)
Inventor
Akira Abiru
Kazunari Shirai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14804976A priority Critical patent/JPS5372467A/en
Publication of JPS5372467A publication Critical patent/JPS5372467A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)

Abstract

PURPOSE:To manufacture the semiconductor device having a good performance, by restricting the temperature rise of substrate due to causes other than ion collision.
JP14804976A 1976-12-08 1976-12-08 Manufacture for semiconductor device Pending JPS5372467A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14804976A JPS5372467A (en) 1976-12-08 1976-12-08 Manufacture for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14804976A JPS5372467A (en) 1976-12-08 1976-12-08 Manufacture for semiconductor device

Publications (1)

Publication Number Publication Date
JPS5372467A true JPS5372467A (en) 1978-06-27

Family

ID=15443989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14804976A Pending JPS5372467A (en) 1976-12-08 1976-12-08 Manufacture for semiconductor device

Country Status (1)

Country Link
JP (1) JPS5372467A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60183720A (en) * 1984-03-01 1985-09-19 Mitsubishi Electric Corp Thin film evaporating apparatus
JPS60183721A (en) * 1984-03-01 1985-09-19 Mitsubishi Electric Corp Thin film deposition equipment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60183720A (en) * 1984-03-01 1985-09-19 Mitsubishi Electric Corp Thin film evaporating apparatus
JPS60183721A (en) * 1984-03-01 1985-09-19 Mitsubishi Electric Corp Thin film deposition equipment

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