JPS5374294A - Production method of thin film resistor - Google Patents
Production method of thin film resistorInfo
- Publication number
- JPS5374294A JPS5374294A JP15021776A JP15021776A JPS5374294A JP S5374294 A JPS5374294 A JP S5374294A JP 15021776 A JP15021776 A JP 15021776A JP 15021776 A JP15021776 A JP 15021776A JP S5374294 A JPS5374294 A JP S5374294A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- production method
- film resistor
- selected temperature
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/067—Borides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
PURPOSE:To stabilize resistance by evaporating zirconium boride with electron beam onto substrate of selected temperature then applying thermal processing under selected temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15021776A JPS5374294A (en) | 1976-12-14 | 1976-12-14 | Production method of thin film resistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15021776A JPS5374294A (en) | 1976-12-14 | 1976-12-14 | Production method of thin film resistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5374294A true JPS5374294A (en) | 1978-07-01 |
Family
ID=15492086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15021776A Pending JPS5374294A (en) | 1976-12-14 | 1976-12-14 | Production method of thin film resistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5374294A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05230633A (en) * | 1992-02-21 | 1993-09-07 | Nissin Electric Co Ltd | Vacuum deposition method |
-
1976
- 1976-12-14 JP JP15021776A patent/JPS5374294A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05230633A (en) * | 1992-02-21 | 1993-09-07 | Nissin Electric Co Ltd | Vacuum deposition method |
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