JPS5377472A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5377472A
JPS5377472A JP15294876A JP15294876A JPS5377472A JP S5377472 A JPS5377472 A JP S5377472A JP 15294876 A JP15294876 A JP 15294876A JP 15294876 A JP15294876 A JP 15294876A JP S5377472 A JPS5377472 A JP S5377472A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
forming
emitter
setting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15294876A
Other languages
Japanese (ja)
Inventor
Shinichi Saiki
Norio Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP15294876A priority Critical patent/JPS5377472A/en
Publication of JPS5377472A publication Critical patent/JPS5377472A/en
Pending legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)

Abstract

PURPOSE: To obtain a graft base transistor of a good high-frequency characteristic by forming the emitter and base contact forming windows simultaneously and setting the distance according to the pattern dimension precision of a photomask used at this time.
COPYRIGHT: (C)1978,JPO&Japio
JP15294876A 1976-12-21 1976-12-21 Production of semiconductor device Pending JPS5377472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15294876A JPS5377472A (en) 1976-12-21 1976-12-21 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15294876A JPS5377472A (en) 1976-12-21 1976-12-21 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5377472A true JPS5377472A (en) 1978-07-08

Family

ID=15551649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15294876A Pending JPS5377472A (en) 1976-12-21 1976-12-21 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5377472A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135964A (en) * 1980-03-28 1981-10-23 Nec Corp Semiconductor device
JPS59149055A (en) * 1983-02-12 1984-08-25 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド Method of producing bipolar planar transistor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135964A (en) * 1980-03-28 1981-10-23 Nec Corp Semiconductor device
JPS59149055A (en) * 1983-02-12 1984-08-25 アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド Method of producing bipolar planar transistor

Similar Documents

Publication Publication Date Title
JPS52128066A (en) Manufacture of semiconductor device
JPS5244186A (en) Semiconductor intergrated circuit device
JPS5223263A (en) Method of manufacturing semiconductor device
JPS5377472A (en) Production of semiconductor device
JPS53120383A (en) Production of semiconductor device
JPS53127266A (en) Forming method of marker
JPS5244569A (en) Process for production of semiconductor element
JPS52154367A (en) Production of semiconductor device
JPS51139267A (en) Photo-mask
JPS5420675A (en) Production of semiconductor device
JPS53123083A (en) Production of semiconductor device
JPS5347779A (en) Production of semiconductor device
JPS51112279A (en) Semiconductor device
JPS534477A (en) Production of semiconductor device
JPS5315074A (en) Mask alignment method
JPS52130567A (en) Preparation of semiconductor device
JPS5390763A (en) Semiconductor element and mask for producing semiconductor element
JPS5279664A (en) Forming method for electrodes of semiconductor devices
JPS51135367A (en) Semiconductor device
JPS5286087A (en) Manufacture of semiconductor device
JPS5283063A (en) Production of semiconductor device
JPS51113469A (en) Manufacturing method of semiconductor device
JPS52143767A (en) Production of semiconductor device
JPS539488A (en) Production of semiconductor device
JPS5269273A (en) Production of semiconductor device