JPS5379737A - Chemical dry etching method - Google Patents

Chemical dry etching method

Info

Publication number
JPS5379737A
JPS5379737A JP15578276A JP15578276A JPS5379737A JP S5379737 A JPS5379737 A JP S5379737A JP 15578276 A JP15578276 A JP 15578276A JP 15578276 A JP15578276 A JP 15578276A JP S5379737 A JPS5379737 A JP S5379737A
Authority
JP
Japan
Prior art keywords
dry etching
etching method
chemical dry
chemical
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15578276A
Other languages
Japanese (ja)
Other versions
JPS5913591B2 (en
Inventor
Toshiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP15578276A priority Critical patent/JPS5913591B2/en
Publication of JPS5379737A publication Critical patent/JPS5379737A/en
Publication of JPS5913591B2 publication Critical patent/JPS5913591B2/en
Expired legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP15578276A 1976-12-24 1976-12-24 Dry etching method Expired JPS5913591B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15578276A JPS5913591B2 (en) 1976-12-24 1976-12-24 Dry etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15578276A JPS5913591B2 (en) 1976-12-24 1976-12-24 Dry etching method

Publications (2)

Publication Number Publication Date
JPS5379737A true JPS5379737A (en) 1978-07-14
JPS5913591B2 JPS5913591B2 (en) 1984-03-30

Family

ID=15613283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15578276A Expired JPS5913591B2 (en) 1976-12-24 1976-12-24 Dry etching method

Country Status (1)

Country Link
JP (1) JPS5913591B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1998373A3 (en) 2005-09-29 2012-10-31 Semiconductor Energy Laboratory Co, Ltd. Semiconductor device having oxide semiconductor layer and manufacturing method thereof

Also Published As

Publication number Publication date
JPS5913591B2 (en) 1984-03-30

Similar Documents

Publication Publication Date Title
ZA777175B (en) Chemical process
PT67232A (en) Chemical process
AU513159B2 (en) Chemical process
JPS54135794A (en) Chemical method
JPS5376095A (en) Chemical analyzer
JPS5381292A (en) Chemical analyzer
JPS54163784A (en) Chemical method
ZA776879B (en) Chemical compounds and processes
JPS5381230A (en) Tritioocarbonet intensifing chemical
FI772548A7 (en) NOW CHEMICAL PROCESS
JPS52125431A (en) Dry etching method
JPS5315397A (en) Chemical method
JPS532361A (en) Etching method
JPS537549A (en) Etchant for dry etching
JPS5373473A (en) Gassliquid contact method
JPS5364636A (en) Dry etching device
JPS5379737A (en) Chemical dry etching method
JPS5277840A (en) Device for chemical dry etching
JPS5355217A (en) Drying method
JPS52148305A (en) Etching method
JPS52108349A (en) Etching method
JPS5480685A (en) Dry etching method
JPS5470772A (en) Dry etching method
JPS5290436A (en) Plasm etching method
JPS52149238A (en) Chemical etching solution for semiiconductors